JP2006344685A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2006344685A
JP2006344685A JP2005167353A JP2005167353A JP2006344685A JP 2006344685 A JP2006344685 A JP 2006344685A JP 2005167353 A JP2005167353 A JP 2005167353A JP 2005167353 A JP2005167353 A JP 2005167353A JP 2006344685 A JP2006344685 A JP 2006344685A
Authority
JP
Japan
Prior art keywords
stage
actuator
control
control signal
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005167353A
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English (en)
Japanese (ja)
Other versions
JP2006344685A5 (enExample
Inventor
Taku Shibayama
卓 芝山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005167353A priority Critical patent/JP2006344685A/ja
Priority to US11/446,117 priority patent/US20070035713A1/en
Publication of JP2006344685A publication Critical patent/JP2006344685A/ja
Publication of JP2006344685A5 publication Critical patent/JP2006344685A5/ja
Priority to US12/334,707 priority patent/US7768626B2/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2005167353A 2005-06-07 2005-06-07 露光装置 Pending JP2006344685A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005167353A JP2006344685A (ja) 2005-06-07 2005-06-07 露光装置
US11/446,117 US20070035713A1 (en) 2005-06-07 2006-06-05 Exposure apparatus
US12/334,707 US7768626B2 (en) 2005-06-07 2008-12-15 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005167353A JP2006344685A (ja) 2005-06-07 2005-06-07 露光装置

Publications (2)

Publication Number Publication Date
JP2006344685A true JP2006344685A (ja) 2006-12-21
JP2006344685A5 JP2006344685A5 (enExample) 2008-07-24

Family

ID=37641444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005167353A Pending JP2006344685A (ja) 2005-06-07 2005-06-07 露光装置

Country Status (2)

Country Link
US (2) US20070035713A1 (enExample)
JP (1) JP2006344685A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009004737A (ja) * 2007-03-29 2009-01-08 Asml Netherlands Bv 可動物体の位置依存信号を測定するための測定システム、リソグラフィ装置および方法
JP2014534607A (ja) * 2011-09-09 2014-12-18 マッパー・リソグラフィー・アイピー・ビー．ブイ． フレキシブルカップリングを備えた投影システム
JP2015212932A (ja) * 2014-04-14 2015-11-26 キヤノン株式会社 ステージ制御装置、加工装置、計測装置および露光装置

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344685A (ja) * 2005-06-07 2006-12-21 Canon Inc 露光装置
JP2008256155A (ja) * 2007-04-06 2008-10-23 Canon Inc 除振装置、演算装置、露光装置及びデバイス製造方法
US7880861B2 (en) * 2007-08-17 2011-02-01 Asml Netherlands B.V. Synchronizing timing of multiple physically or logically separated system nodes
JP5350139B2 (ja) * 2008-10-01 2013-11-27 キヤノン株式会社 露光装置、及びデバイスの製造方法
NL2003453A (en) * 2008-10-09 2010-04-12 Asml Netherlands Bv A positioning system, method, and lithographic apparatus.
NL2007633A (en) 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
KR102653016B1 (ko) 2018-09-18 2024-03-29 삼성전자주식회사 척 구동 장치 및 기판 처리 장치

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0729801A (ja) * 1993-07-14 1995-01-31 Nikon Corp 走査型投影露光装置
JPH08241126A (ja) * 1995-03-02 1996-09-17 Canon Inc 同期位置制御方法および装置
JPH0926828A (ja) * 1995-07-13 1997-01-28 Canon Inc 位置制御方法及び装置並びにそれを使用した半導体製造装置
JPH10256144A (ja) * 1997-03-11 1998-09-25 Canon Inc 除振装置
JPH11297587A (ja) * 1998-04-08 1999-10-29 Canon Inc 露光装置およびデバイス製造方法
JP2000349015A (ja) * 1999-06-07 2000-12-15 Canon Inc デバイス製造装置および方法
JP2001126977A (ja) * 1999-10-27 2001-05-11 Nikon Corp ステージ装置および露光装置ならびに回路デバイス製造方法
JP2003299340A (ja) * 2002-04-03 2003-10-17 Nikon Corp 磁石ユニット、リニアモータおよびステージ装置並びに露光装置
JP2004200218A (ja) * 2002-12-16 2004-07-15 Nikon Corp 支持装置及びステージ装置並びに露光装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5699145A (en) * 1993-07-14 1997-12-16 Nikon Corporation Scanning type exposure apparatus
JPH11294520A (ja) * 1998-04-08 1999-10-29 Canon Inc 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
JP2000021702A (ja) * 1998-06-30 2000-01-21 Canon Inc 露光装置ならびにデバイス製造方法
EP1143492A4 (en) * 1998-09-03 2004-06-02 Nikon Corp EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS
FR2818640B1 (fr) * 2000-12-22 2004-02-13 Poudres & Explosifs Ste Nale Procede de synthese de chloroformiates aliphatiques, cycloaliphatiques ou araliphatiques
US20020080339A1 (en) * 2000-12-25 2002-06-27 Nikon Corporation Stage apparatus, vibration control method and exposure apparatus
TWI307526B (en) * 2002-08-06 2009-03-11 Nikon Corp Supporting device and the mamufacturing method thereof, stage device and exposure device
JP4458322B2 (ja) * 2003-01-14 2010-04-28 キヤノン株式会社 露光装置およびデバイス製造方法
JP2006344685A (ja) 2005-06-07 2006-12-21 Canon Inc 露光装置

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0729801A (ja) * 1993-07-14 1995-01-31 Nikon Corp 走査型投影露光装置
JPH08241126A (ja) * 1995-03-02 1996-09-17 Canon Inc 同期位置制御方法および装置
JPH0926828A (ja) * 1995-07-13 1997-01-28 Canon Inc 位置制御方法及び装置並びにそれを使用した半導体製造装置
JPH10256144A (ja) * 1997-03-11 1998-09-25 Canon Inc 除振装置
JPH11297587A (ja) * 1998-04-08 1999-10-29 Canon Inc 露光装置およびデバイス製造方法
JP2000349015A (ja) * 1999-06-07 2000-12-15 Canon Inc デバイス製造装置および方法
JP2001126977A (ja) * 1999-10-27 2001-05-11 Nikon Corp ステージ装置および露光装置ならびに回路デバイス製造方法
JP2003299340A (ja) * 2002-04-03 2003-10-17 Nikon Corp 磁石ユニット、リニアモータおよびステージ装置並びに露光装置
JP2004200218A (ja) * 2002-12-16 2004-07-15 Nikon Corp 支持装置及びステージ装置並びに露光装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009004737A (ja) * 2007-03-29 2009-01-08 Asml Netherlands Bv 可動物体の位置依存信号を測定するための測定システム、リソグラフィ装置および方法
US7903866B2 (en) 2007-03-29 2011-03-08 Asml Netherlands B.V. Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
US8457385B2 (en) 2007-03-29 2013-06-04 Asml Netherlands B.V. Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object
JP2014534607A (ja) * 2011-09-09 2014-12-18 マッパー・リソグラフィー・アイピー・ビー．ブイ． フレキシブルカップリングを備えた投影システム
US9268216B2 (en) 2011-09-09 2016-02-23 Mapper Lithography Ip B.V. Projection system with flexible coupling
KR101806599B1 (ko) 2011-09-09 2017-12-07 마퍼 리쏘그라피 아이피 비.브이. 가요성 커플링을 구비한 투사 시스템
JP2015212932A (ja) * 2014-04-14 2015-11-26 キヤノン株式会社 ステージ制御装置、加工装置、計測装置および露光装置

Also Published As

Publication number Publication date
US7768626B2 (en) 2010-08-03
US20070035713A1 (en) 2007-02-15
US20090141259A1 (en) 2009-06-04

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