JP2006319287A - プリント配線板用銅箔とその製造方法およびその製造に用いる3価クロム化成処理液 - Google Patents
プリント配線板用銅箔とその製造方法およびその製造に用いる3価クロム化成処理液 Download PDFInfo
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- JP2006319287A JP2006319287A JP2005143274A JP2005143274A JP2006319287A JP 2006319287 A JP2006319287 A JP 2006319287A JP 2005143274 A JP2005143274 A JP 2005143274A JP 2005143274 A JP2005143274 A JP 2005143274A JP 2006319287 A JP2006319287 A JP 2006319287A
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Abstract
【解決手段】 銅箔1は、プリント配線板用基材との接着面上に、粗化めっき層2、ニッケル−コバルト合金めっき層3、亜鉛めっき層4、クロメート処理層5、シランカップリング処理層6を有しており、クロメート処理層5が3価クロムイオンを金属クロム換算で70mg/L以上500mg/L未満含有し、pHが3.0〜4.5である3価クロム化成処理液を用いて形成されたものであることを特徴とする。
【選択図】 図1
Description
図1は、本発明の実施の形態に係る銅箔の構造を示す断面模式図である。
銅箔1は、プリント配線板用基材と接着を行おうとする面に対し粗化めっき層2を形成し、さらに、ニッケル−コバルト合金めっき層3、亜鉛めっき層4、クロメート処理層(3価クロム化成処理層)5、シランカップリング処理層6の積層構造となっている。使用する銅箔1は、電解銅箔あるいは圧延銅箔のいずれでも良い。また、図示は省略したが、基材との接着面でない側(接着面の裏面側)の銅箔1の表面(銅粗化めっき処理を施さない非粗化面)においても、防錆(耐食、耐酸化)効果を付すために、ニッケル−コバルト合金めっき層、亜鉛めっき層、3価クロム化成処理層を形成することが望ましい。
本発明においては、銅箔1に対して粗化処理を行っても行わなくても良いが、行うことが望ましい。粗化処理は一般的に銅箔中の結晶粒界の選択エッチングもしくは銅または銅合金めっきによるヤケめっき処理として為される。ヤケめっきによる粗化処理の方法には、例えば特許文献4に記載の方法が挙げられる。
3価クロム化成処理に使用する3価クロム化成処理液としては、6価クロムイオンを実質的に含まず、3価クロムイオンが金属クロム換算で70mg/L以上500mg/L未満、好ましくは110mg/L以上400mg/L以下、より好ましくは150mg/L以上300mg/L以下を含有し、pHが3.0〜4.5、好ましくは3.5〜4.0、より好ましくは3.6〜3.8である水溶液を使用する。pH>4.5とすると、めっき液中におけるクロムイオンの安定性(溶解度)が低下して水酸化物等の形で析出・沈殿し易く、クロム皮膜形成の制御が困難となる。3価クロム化成処理液の3価クロムイオン濃度を70〜500mg/L程度に設定し、かつ、めっき液が不安定とならない(期待しない析出物が生成しない)範囲でpHをできる限り高めに設定することにより、Znおよびクロメート製膜量(膜厚)の制御性に優れたプリント配線板用銅箔を得る3価クロム化成処理液とすることができる。3価クロムイオン濃度150〜300mg/L、pH3.8(上限をpH3.8、管理範囲をpH3.6〜3.8)の3価クロム化成処理液が最も好適であり、Znおよびクロメート製膜量(膜厚)の制御性が大幅に改善される。なお、環境保護・低コスト化の観点から、フッ化物イオンを含まない水溶液とすることが望ましい。
3価クロム化成処理を行う前には、ニッケル−コバルト合金めっきを施すのが良い。ニッケル−コバルト合金めっきは、ワット浴やスルファミン酸浴のニッケルめっき液に一定濃度のコバルト塩を溶解し、電気めっきによってニッケルとコバルトを同時に電析させる方法が一般的である。
ニッケル:78g/L
コバルト:20g/L
液温:40℃
pH:4.3〜4.5
電流密度:1.0〜3.0A/dm2
処理時間:2秒〜5秒
亜鉛:20g/L
液温:17℃〜22℃
pH:2.8〜3.0
電流密度:0.3〜1.5A/dm2
処理時間:2秒〜5秒
銅箔のプリント配線板用基材との接着面に上記のような処理を行った後、さらに接着力を向上させるためにシランカップリング処理を行う。シランカップリング処理剤は様々な種類のものが市販されているが、それぞれに特徴があり、接着させるプリント配線板用基材に適したものを選択する必要がある。特に、プリント配線板用基材としてポリイミドを使用する場合は、アミノシラン、望ましくはアミノプロピルトリメトキシシランが有効である。
厚さ18μmの圧延銅箔を、水酸化ナトリウム40g/L、炭酸ナトリウム20g/Lの水溶液において温度40℃、電流密度5A/dm2、処理時間10秒で陰極電解にて電解脱脂処理を行った後、硫酸50g/Lの水溶液において温度25℃、処理時間10秒で浸漬することにより酸洗処理を施した。
ここで、各金属付着量の測定方法について説明する。測定は皮膜を酸溶解させた後、誘導プラズマ発光分光分析装置(ICP-AES)による測定を行った。まず、銅箔を40mm×100mmの大きさに切り出し、測定面と逆の面に粘着テープをよく密着させる。これは後述の酸溶解時に測定面のみを溶解させるためである。酸溶解には、体積比として硝酸1(濃度60〜61質量%、比重1.38)に対して純水9を混合させた硝酸水溶液(以後、(1+9)硝酸と表す)を用いる。(1+9)硝酸30mLを用いて銅箔表面の処理皮膜を溶解し、銅箔を取り出す。次に、該溶解液に純水を加えて100mLとする。この溶解液の金属濃度をICP-AESにより測定する。
後述するZn製膜量とクロメート製膜量との関係、およびZn膜溶解量を評価するために、基準試料としてZnめっき処理のみの(3価クロメート処理を行わない)試料を用意した。表1に示すように0.2〜1.4A/dm2の範囲で電流密度を変化させて(時間は一定)、粗化面(M面)および非粗化面(S面)に亜鉛めっき処理を施し、Zn製膜量を上記のICP-AESを用いて測定した。なお、Znめっき処理時の電流密度条件は、M面が0.2,0.3,0.6,0.9(A/dm2)であり、S面が0.3,0.5,0.9,1.4(A/dm2)である。
(実験1)
上述の基準試料と同様に(表1に示したM面およびS面の電流密度条件で)亜鉛めっき処理を施し、その後、各試料に対してpHを2.6,3.0,3.4,3.8に調整したクロメート液(3価クロムイオン濃度900mg/L)を用いてそれぞれ3価クロメート処理を行った。得られた試料に対し、ZnおよびCrの製膜量を上記のICP-AESを用いて測定した。
別途用意した銅箔を用い、クロメート液の3価クロムイオン濃度を300mg/Lに換えた条件で、その他は上記実験1と同様の処理(Znめっき処理、pH調整した3価クロメート処理)を行い、得られた各試料のZnおよびCrの製膜量を測定した(ICP-AES)。
別途用意した銅箔を用い、クロメート液の3価クロムイオン濃度を150mg/Lに換えた条件で、その他は上記実験1と同様の処理(Znめっき処理、pH調整した3価クロメート処理)を行い、得られた各試料のZnおよびCrの製膜量を測定した(ICP-AES)。
上記実験の比較試料として別途用意した銅箔を用い、Znめっき処理を行わないで3価クロムイオン濃度900mg/Lのクロメート液によりに3価クロメート処理(上記実験1と同様にクロメート液のpH調整は行った)を行い、得られた各試料のCrの製膜量を測定した(ICP-AES)。
しかしながら、Zn膜はpHに代表される溶液環境によって溶解することが考えられる。そこで、図3〜図6に示す測定結果を整理して、3価クロメート処理を行わないZnめっき処理のみのZn製膜量と、3価クロメート処理を行った場合のZn製膜量の差分をZn膜溶解量と見なし、クロメート液のpHおよび3価クロムイオン濃度とZn膜溶解量との関係として図8に示す。図8(a)はM面における関係、(b)はS面における関係を示す。図8には、代表としてZnめっき時の電流密度がM面:0.9A/dm2,S面:1.4A/dm2の場合を示した。
次に、図4〜6に示す測定結果を整理して、クロメート液のpHおよび3価クロムイオン濃度とクロメート製膜量との関係として図9に示す。図9(a)はM面における関係、(b)はS面における関係を示す。図8と同様にZnめっき時の電流密度がM面:0.9A/dm2,S面:1.4A/dm2の場合を代表として示した。
2 粗化めっき層
3 ニッケル−コバルト合金めっき層
4 亜鉛めっき層
5 クロメート処理層
6 シランカップリング処理層
10 プリント配線板用基材
22A,22B Zn膜
23A,23B クロメート膜
Claims (5)
- 銅または銅合金からなり、プリント配線板用基材との接着面上に亜鉛めっき層と3価クロム化成処理によるクロメート処理層とが接するように順に設けられたプリント配線板用銅箔において、
前記クロメート処理層は、3価クロムイオンを金属クロム換算で70mg/L以上500mg/L未満含有し、pHが3.0〜4.5である3価クロム化成処理液を用いて形成されたものであることを特徴とするプリント配線板用銅箔。 - 前記プリント配線板用銅箔は、前記亜鉛めっきの下にニッケルおよびコバルトからなる合金めっき層が設けられており、その付着量がニッケルとコバルトの合計として5〜20μg/cm2であり、かつ前記合金めっき層におけるコバルト濃度が60〜80質量%であることを特徴とする請求項1記載のプリント配線板用銅箔。
- 前記亜鉛めっき層は、その亜鉛付着量が0.5〜3μg/cm2であることを特徴とする請求項1記載のプリント配線板用銅箔。
- プリント配線板用銅箔のプリント配線板用基材との接着面上に亜鉛めっき層を設ける亜鉛めっき工程と、
前記亜鉛めっき層の直上に、3価クロムイオンを金属クロム換算で70mg/L以上500mg/L未満含有し、pHが3.0〜4.5である3価クロム化成処理液に銅箔を浸漬することによりクロメート処理層を設ける3価クロム化成処理工程とを含むことを特徴とするプリント配線板用銅箔の製造方法。 - プリント配線板用銅箔上に設けられた亜鉛めっき層の直上にクロメート処理層を設けるための3価クロム化成処理液であって、3価クロムイオンを金属クロム換算で70mg/L以上500mg/L未満含有し、pHが3.0〜4.5であることを特徴とする3価クロム化成処理液。
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