JP2006286806A - 半導体受光装置及び半導体受光装置の製造方法 - Google Patents
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- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 3
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Abstract
半導体受光装置におけるフォトダイオードを分割する領域での受光感度の低下を抑制する。
【解決手段】
複数のフォトダイオード部2−1、2−2と、分離部21とを具備する半導体受光装置を用いる。複数のフォトダイオード部2−1、2−2は、半導体基板10上に設けられ、受光した光を電気に変換する。分離部21は、複数のフォトダイオード部2−1、2−2を互いに電気的に分離する。分離部21は、表面部分の不純物濃度が、第1濃度以下である。第1濃度は、青紫レーザ光以上の波長に対する分離部21の受光感度が、複数のフォトダイオード部2−1、2−2の各々における受光感度に概ね等しくなる濃度である。
【選択図】 図1
Description
本発明では、分離部の不純物濃度が、第1濃度以下になるので、青紫レーザ光を照射したときでも、分離部での受光感度の低下を防止できる。それにより、照射位置に関わらず、受光感度を一定にすることができる。
2、2’、2−1、2−2、…、2−n、102 フォトダイオード部
3、103 回路部
10、110 p−型半導体基板
11、11a、104 p+型埋込層
12、12a n+型埋込層
13、113 n型エピタキシャル層
14、14a p−型イオン注入層
15、15a p型イオン注入層
16、105 n+型拡散層
17、106 コレクタ引き出し部
18、107 ベース部
19、108 エミッタ部
20、109 青紫レーザ光
21、22 分離部
Claims (11)
- 半導体基板上に設けられ、受光した光を電気に変換する複数のフォトダイオード部と、
前記複数のフォトダイオード部を互いに電気的に分離する分離部と
を具備し、
前記分離部は、表面部分の不純物濃度が、第1濃度以下であり、
前記第1濃度は、青紫レーザ光以上の波長に対する前記分離部の受光感度が、前記複数のフォトダイオード部の各々における受光感度に概ね等しくなる濃度である
半導体受光装置。 - 請求項1に記載の半導体受光装置において、
前記複数のフォトダイオード部の各々は、
前記複数のフォトダイオード部に共通の第1導電型の第1半導体層と、
前記第1半導体層上に接合された第2導電型の第2半導体層と
を備え、
前記分離部は、
前記表面から前記第1半導体層まで貫通する前記第1導電型の第3半導体を備え、
前記第3半導体部は、前記表面部分の前記第1導電型の不純物濃度が、前記第1濃度以下である
半導体受光装置。 - 請求項2に記載の半導体受光装置において、
前記第2半導体層は、受光側に設けられた前記第2導電型の第4半導体層を含む
半導体受光装置。 - 請求項2又は3に記載の半導体受光装置において、
前記第2半導体層の前記第2導電型の不純物濃度は、前記第3半導体部の前記第1導電型の不純物濃度よりも小さい
半導体受光装置。 - 請求項2乃至4に記載の半導体受光装置において、
前記第3半導体部は、前記表面部分よりも深い位置に、前記第1導電型の不純物濃度の極大値を持つ
半導体受光装置。 - 第1導電型の半導体基板と、
前記半導体基板上に設けられた第2導電型の成膜層と、
前記成膜層の表面における互いに隣接する複数の領域に設けられた前記第2導電型の複数の第1埋込層と、
前記複数の領域の前記成膜層を互いに電気的に分割し、前記成膜層の表面から前記半導体基板へ伸び、前記第1導電型を有する第2埋込層と
を具備し、
前記第2埋込層は、表面部分の不純物濃度が、第1濃度以下であり、
前記第1濃度は、青紫レーザ光以上の波長に対する前記第2埋め込み層の受光感度が、前記複数の領域の各々における受光感度に概ね等しくなる濃度である
半導体受光装置。 - (a)第1導電型の第1半導体層上の所定の位置に、前記第1半導体層の前記第1導電型の不純物濃度よりも高い前記第1導電型の不純物濃度を有する埋込層を形成する工程と、
(b)前記第1半導体層及び前記埋込層を覆うように第2導電型の第2半導体層を形成する工程と、
(c)前記第2半導体層における前記埋込層の上方において、前記第2半導体層の表面の前記第1導電型の不純物濃度が、第1濃度以下である第1イオン注入層を形成するように、前記第1導電型の不純物を含むイオンを前記第2半導体層へ注入する工程と、
(d)前記埋込層と前記第1イオン注入層とがつながった分離部を形成するように熱処理を行う工程と
を具備し、
前記第1濃度は、前記分離部の受光感度が、前記第2半導体層の表面における受光感度に概ね等しくなる濃度である
半導体受光装置の製造方法。 - 請求項7に記載の半導体受光装置の製造方法において、
前記(c)工程は、
(c1)前記第2半導体層における前記第1イオン注入層を形成する領域を除くフォトダイオード領域において、前記第2半導体層の前記第2導電型の不純物濃度よりも高い前記第2導電型の不純物濃度を有する第2イオン注入層を表面に形成するように前記第2導電型の不純物を含むイオンを前記第2半導体層へ注入する工程を備える
半導体受光装置の製造方法。 - 請求項7又は8に記載の半導体受光装置の製造方法において、
前記(c)工程は、
(c2)前記第1イオン注入層の表面に、前記第1導電型の第3イオン注入層を形成するように前記第1導電型の不純物を含むイオンを前記第1イオン注入層へ注入する工程を備え、
前記第3イオン注入層の表面の前記第1導電型の不純物濃度は、前記第1濃度以下である
半導体受光装置の製造方法。 - 請求項7又は8に記載の半導体受光装置の製造方法において、
前記(c)工程は、
(c3)前記第1イオン注入層の表面に、前記第1導電型の拡散層を形成するように前記第1導電型の不純物を前記第1イオン注入層へ拡散させる工程を備え、
前記拡散層の表面の前記第1導電型の不純物濃度は、前記第1濃度以下である
半導体受光装置の製造方法。 - 請求項7乃至10のいずれか一項に記載の半導体受光装置の製造方法において、
前記分離部は、表面よりも深い位置に、前記第1導電型の不純物濃度の極大値を持つ
半導体受光装置の製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005102836A JP4919370B2 (ja) | 2005-03-31 | 2005-03-31 | 半導体受光装置及び半導体受光装置の製造方法 |
EP06006425A EP1708267A1 (en) | 2005-03-31 | 2006-03-28 | Semiconductor light receiving device with electrical pixel isolation and method of manufacturing the same |
KR1020060028409A KR20060106753A (ko) | 2005-03-31 | 2006-03-29 | 반도체수광장치 및 그 제조방법 |
TW095111171A TW200644267A (en) | 2005-03-31 | 2006-03-30 | Semiconductor light receiving device and method of manufacturing the same |
CNB2006100738567A CN100485945C (zh) | 2005-03-31 | 2006-03-31 | 半导体光接收器件及其制造方法 |
US11/393,789 US7655965B2 (en) | 2005-03-31 | 2006-03-31 | Semiconductor light receiving device and method of manufacturing the same |
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JP2005102836A JP4919370B2 (ja) | 2005-03-31 | 2005-03-31 | 半導体受光装置及び半導体受光装置の製造方法 |
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JP2006286806A true JP2006286806A (ja) | 2006-10-19 |
JP4919370B2 JP4919370B2 (ja) | 2012-04-18 |
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US (1) | US7655965B2 (ja) |
EP (1) | EP1708267A1 (ja) |
JP (1) | JP4919370B2 (ja) |
KR (1) | KR20060106753A (ja) |
CN (1) | CN100485945C (ja) |
TW (1) | TW200644267A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100937670B1 (ko) | 2007-12-28 | 2010-01-19 | 주식회사 동부하이텍 | 씨모스(cmos) 이미지 센서의 제조방법 |
JP2019029437A (ja) * | 2017-07-27 | 2019-02-21 | キヤノン株式会社 | 固体撮像装置、固体撮像装置の製造方法、及び撮像装置 |
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US20030186882A1 (en) * | 2001-07-31 | 2003-10-02 | Podolsky Daniel K. | Methods and compositions for treating and preventing distal bowel lesions |
JP5538922B2 (ja) | 2009-02-06 | 2014-07-02 | キヤノン株式会社 | 固体撮像装置の製造方法 |
JP2010206178A (ja) * | 2009-02-06 | 2010-09-16 | Canon Inc | 光電変換装置、及び光電変換装置の製造方法 |
JP2010206181A (ja) | 2009-02-06 | 2010-09-16 | Canon Inc | 光電変換装置及び撮像システム |
JP5539105B2 (ja) * | 2009-09-24 | 2014-07-02 | キヤノン株式会社 | 光電変換装置およびそれを用いた撮像システム |
CN112885858A (zh) * | 2021-03-31 | 2021-06-01 | 华虹半导体(无锡)有限公司 | Cmos图像传感器及其制造方法 |
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JP2002329853A (ja) * | 2002-02-22 | 2002-11-15 | Sharp Corp | 回路内蔵受光素子 |
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- 2005-03-31 JP JP2005102836A patent/JP4919370B2/ja not_active Expired - Fee Related
-
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- 2006-03-28 EP EP06006425A patent/EP1708267A1/en not_active Withdrawn
- 2006-03-29 KR KR1020060028409A patent/KR20060106753A/ko active Search and Examination
- 2006-03-30 TW TW095111171A patent/TW200644267A/zh unknown
- 2006-03-31 US US11/393,789 patent/US7655965B2/en not_active Expired - Fee Related
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JPH01205564A (ja) * | 1988-02-12 | 1989-08-17 | Hamamatsu Photonics Kk | 光半導体装置およびその製造方法 |
JP2001135808A (ja) * | 1999-11-08 | 2001-05-18 | Sharp Corp | 半導体装置およびその製造方法 |
JP2002203954A (ja) * | 2000-10-31 | 2002-07-19 | Sharp Corp | 回路内蔵受光素子 |
JP2003051589A (ja) * | 2001-08-07 | 2003-02-21 | Sharp Corp | 受光素子内蔵型半導体装置の製造方法及び受光素子内蔵型半導体装置 |
JP2002329853A (ja) * | 2002-02-22 | 2002-11-15 | Sharp Corp | 回路内蔵受光素子 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100937670B1 (ko) | 2007-12-28 | 2010-01-19 | 주식회사 동부하이텍 | 씨모스(cmos) 이미지 센서의 제조방법 |
JP2019029437A (ja) * | 2017-07-27 | 2019-02-21 | キヤノン株式会社 | 固体撮像装置、固体撮像装置の製造方法、及び撮像装置 |
JP7039205B2 (ja) | 2017-07-27 | 2022-03-22 | キヤノン株式会社 | 固体撮像装置、固体撮像装置の製造方法、及び撮像装置 |
Also Published As
Publication number | Publication date |
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KR20060106753A (ko) | 2006-10-12 |
TW200644267A (en) | 2006-12-16 |
EP1708267A1 (en) | 2006-10-04 |
CN100485945C (zh) | 2009-05-06 |
US20060220079A1 (en) | 2006-10-05 |
US7655965B2 (en) | 2010-02-02 |
CN1841755A (zh) | 2006-10-04 |
JP4919370B2 (ja) | 2012-04-18 |
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