JP2006210555A5 - - Google Patents

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Publication number
JP2006210555A5
JP2006210555A5 JP2005019293A JP2005019293A JP2006210555A5 JP 2006210555 A5 JP2006210555 A5 JP 2006210555A5 JP 2005019293 A JP2005019293 A JP 2005019293A JP 2005019293 A JP2005019293 A JP 2005019293A JP 2006210555 A5 JP2006210555 A5 JP 2006210555A5
Authority
JP
Japan
Prior art keywords
silicon layer
layer
semiconductor device
gate
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005019293A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006210555A (ja
JP4473741B2 (ja
Filing date
Publication date
Priority claimed from JP2005019293A external-priority patent/JP4473741B2/ja
Priority to JP2005019293A priority Critical patent/JP4473741B2/ja
Application filed filed Critical
Priority to US11/211,746 priority patent/US20060163662A1/en
Priority to CNB2006100066428A priority patent/CN100448008C/zh
Publication of JP2006210555A publication Critical patent/JP2006210555A/ja
Priority to US12/193,668 priority patent/US20080308877A1/en
Publication of JP2006210555A5 publication Critical patent/JP2006210555A5/ja
Priority to US12/618,402 priority patent/US8357580B2/en
Publication of JP4473741B2 publication Critical patent/JP4473741B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2005019293A 2005-01-27 2005-01-27 半導体装置および半導体装置の製造方法 Expired - Lifetime JP4473741B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005019293A JP4473741B2 (ja) 2005-01-27 2005-01-27 半導体装置および半導体装置の製造方法
US11/211,746 US20060163662A1 (en) 2005-01-27 2005-08-26 Semiconductor device and method of manufacturing semiconductor device
CNB2006100066428A CN100448008C (zh) 2005-01-27 2006-01-27 半导体器件和用于制造半导体器件的方法
US12/193,668 US20080308877A1 (en) 2005-01-27 2008-08-18 Semiconductor device and method of manufacturing semiconductor device
US12/618,402 US8357580B2 (en) 2005-01-27 2009-11-13 Semiconductor device and method of manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005019293A JP4473741B2 (ja) 2005-01-27 2005-01-27 半導体装置および半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2006210555A JP2006210555A (ja) 2006-08-10
JP2006210555A5 true JP2006210555A5 (enExample) 2009-10-15
JP4473741B2 JP4473741B2 (ja) 2010-06-02

Family

ID=36695875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005019293A Expired - Lifetime JP4473741B2 (ja) 2005-01-27 2005-01-27 半導体装置および半導体装置の製造方法

Country Status (3)

Country Link
US (3) US20060163662A1 (enExample)
JP (1) JP4473741B2 (enExample)
CN (1) CN100448008C (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4440080B2 (ja) * 2004-11-12 2010-03-24 株式会社東芝 半導体装置およびその製造方法
JP2007081249A (ja) * 2005-09-15 2007-03-29 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
CN1945852A (zh) * 2005-10-06 2007-04-11 松下电器产业株式会社 半导体装置及其制造方法
US20070090417A1 (en) * 2005-10-26 2007-04-26 Chiaki Kudo Semiconductor device and method for fabricating the same
JP2007173347A (ja) * 2005-12-20 2007-07-05 Renesas Technology Corp 半導体装置及びその製造方法
US20080093682A1 (en) * 2006-10-18 2008-04-24 Liang-Gi Yao Polysilicon levels for silicided structures including MOSFET gate electrodes and 3D devices
US20080237743A1 (en) * 2007-03-30 2008-10-02 Texas Instruments Incorporated Integration Scheme for Dual Work Function Metal Gates
US7482270B2 (en) * 2006-12-05 2009-01-27 International Business Machines Corporation Fully and uniformly silicided gate structure and method for forming same
US20080173950A1 (en) * 2007-01-18 2008-07-24 International Business Machines Corporation Structure and Method of Fabricating Electrical Structure Having Improved Charge Mobility
US7550808B2 (en) * 2007-01-18 2009-06-23 International Business Machines Corporation Fully siliciding regions to improve performance
JPWO2009101763A1 (ja) * 2008-02-12 2011-06-09 パナソニック株式会社 半導体装置及びその製造方法
US9934976B2 (en) * 2008-12-18 2018-04-03 Intel Corporation Methods of forming low interface resistance rare earth metal contacts and structures formed thereby
JP2010258124A (ja) * 2009-04-23 2010-11-11 Renesas Electronics Corp 半導体装置及び半導体装置の製造方法
US8642371B2 (en) * 2011-04-06 2014-02-04 Shamsoddin Mohajerzadeh Method and system for fabricating ion-selective field-effect transistor (ISFET)
TW201706396A (zh) * 2011-08-22 2017-02-16 1366科技公司 用於酸性溼式化學蝕刻矽晶片之調配物
US8629512B2 (en) 2012-03-28 2014-01-14 Taiwan Semiconductor Manufacturing Company, Ltd. Gate stack of fin field effect transistor with slanted sidewalls
US9111783B2 (en) * 2012-04-13 2015-08-18 Renesas Electronics Corporation Semiconductor devices with self-aligned source drain contacts and methods for making the same
US8921178B2 (en) * 2012-05-16 2014-12-30 Renesas Electronics Corporation Semiconductor devices with self-aligned source drain contacts and methods for making the same
CN103854980B (zh) * 2012-11-29 2016-05-11 中国科学院微电子研究所 形成半导体器件替代栅的方法以及制造半导体器件的方法
KR20230028588A (ko) * 2013-09-27 2023-02-28 인텔 코포레이션 공통 기판 상의 상이한 일함수를 가지는 비-평면 ｉ／ｏ 및 논리 반도체 디바이스들
US9520500B1 (en) * 2015-12-07 2016-12-13 International Business Machines Corporation Self heating reduction for analog radio frequency (RF) device
US10096596B2 (en) * 2015-12-15 2018-10-09 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device structure having a plurality of gate structures
KR102890787B1 (ko) * 2020-04-07 2025-11-26 삼성전자주식회사 게이트 스페이서를 갖는 반도체 소자들
US12490510B2 (en) * 2020-08-12 2025-12-02 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device and method of forming the same
US20230187535A1 (en) * 2021-12-14 2023-06-15 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor structure with modified spacer and method for forming the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6335254B1 (en) * 2000-08-09 2002-01-01 Micron Technology, Inc. Methods of forming transistors
JP2002141420A (ja) * 2000-10-31 2002-05-17 Mitsubishi Electric Corp 半導体装置及びその製造方法
KR100495023B1 (ko) * 2000-12-28 2005-06-14 가부시끼가이샤 도시바 반도체 장치 및 그 제조 방법
US6372640B1 (en) * 2001-07-31 2002-04-16 Macronix International Co., Ltd. Method of locally forming metal silicide layers
WO2004057659A1 (en) * 2002-12-20 2004-07-08 Koninklijke Philips Electronics N.V. Method of manufacturing a semiconductor device and semiconductor device obtained with such a method

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