JP2006120798A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2006120798A
JP2006120798A JP2004306054A JP2004306054A JP2006120798A JP 2006120798 A JP2006120798 A JP 2006120798A JP 2004306054 A JP2004306054 A JP 2004306054A JP 2004306054 A JP2004306054 A JP 2004306054A JP 2006120798 A JP2006120798 A JP 2006120798A
Authority
JP
Japan
Prior art keywords
stator
light shielding
exposure
exposure apparatus
reaction force
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004306054A
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English (en)
Japanese (ja)
Other versions
JP2006120798A5 (enExample
Inventor
Giichi Miyajima
義一 宮島
Takashi Meguro
隆 目黒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004306054A priority Critical patent/JP2006120798A/ja
Priority to US11/251,837 priority patent/US7253877B2/en
Publication of JP2006120798A publication Critical patent/JP2006120798A/ja
Priority to US11/762,286 priority patent/US7463335B2/en
Publication of JP2006120798A5 publication Critical patent/JP2006120798A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP2004306054A 2004-10-20 2004-10-20 露光装置 Pending JP2006120798A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004306054A JP2006120798A (ja) 2004-10-20 2004-10-20 露光装置
US11/251,837 US7253877B2 (en) 2004-10-20 2005-10-18 Exposure apparatus, and device manufacturing method
US11/762,286 US7463335B2 (en) 2004-10-20 2007-06-13 Exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004306054A JP2006120798A (ja) 2004-10-20 2004-10-20 露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011256744A Division JP5539293B2 (ja) 2011-11-24 2011-11-24 露光装置、およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006120798A true JP2006120798A (ja) 2006-05-11
JP2006120798A5 JP2006120798A5 (enExample) 2008-12-18

Family

ID=36538408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004306054A Pending JP2006120798A (ja) 2004-10-20 2004-10-20 露光装置

Country Status (2)

Country Link
US (2) US7253877B2 (enExample)
JP (1) JP2006120798A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010135596A (ja) * 2008-12-05 2010-06-17 Nikon Corp ステージ装置、露光装置及びデバイス製造方法
CN108646402A (zh) * 2018-05-09 2018-10-12 哈尔滨工业大学 一种基于双轴导向的可变光阑
KR20190009808A (ko) * 2016-05-31 2019-01-29 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 마스크 정렬기의 나이프 에지 세트. 넓은-시야-범위 마스크 정렬기, 및 노출 방법
JP2022032960A (ja) * 2020-08-12 2022-02-25 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006120798A (ja) * 2004-10-20 2006-05-11 Canon Inc 露光装置
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
US20100148813A1 (en) 2006-07-18 2010-06-17 Multiprobe, Inc. Apparatus and method for combined micro-scale and nano-scale c-v, q-v, and i-v testing of semiconductor materials
US20080285003A1 (en) * 2007-05-15 2008-11-20 Nikon Corporation Linear motor driven automatic reticle blind
US20100016782A1 (en) * 2008-07-16 2010-01-21 John Erich Oblong Method of Regulating Hair Growth
CN103163738B (zh) * 2011-12-14 2015-03-25 上海微电子装备有限公司 用于补偿照明扫描向刀口驱动反力的装置及光刻设备
US8800998B2 (en) * 2011-12-30 2014-08-12 Multiprobe, Inc. Semiconductor wafer isolated transfer chuck
CN103439865B (zh) * 2013-08-16 2015-03-25 中国科学院上海光学精密机械研究所 用于步进扫描光刻机的扫描狭缝装置

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11189332A (ja) * 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2001223148A (ja) * 2000-02-08 2001-08-17 Nikon Corp 洗浄方法、露光方法及び露光装置、並びにデバイス製造方法
JP2001230178A (ja) * 2000-02-15 2001-08-24 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP2002008971A (ja) * 2000-06-23 2002-01-11 Canon Inc 移動装置、ステージ及び露光装置
JP2002353108A (ja) * 2001-05-24 2002-12-06 Nikon Corp 露光方法、露光装置、フォトマスク、デバイス製造方法、及びフォトマスク製造方法
JP2003163257A (ja) * 2001-11-29 2003-06-06 Canon Inc 位置決め装置及びその製造方法
JP2003318082A (ja) * 2002-04-22 2003-11-07 Canon Inc 駆動装置、露光装置及びデバイス製造方法
JP2004235461A (ja) * 2003-01-30 2004-08-19 Nikon Corp 露光システム
JP2004241576A (ja) * 2003-02-05 2004-08-26 Canon Inc 位置決め装置
WO2005010961A1 (ja) * 2003-07-25 2005-02-03 Nikon Corporation 露光装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3286184B2 (ja) 1996-09-25 2002-05-27 キヤノン株式会社 走査露光装置および方法
JP3890136B2 (ja) 1997-03-25 2007-03-07 キヤノン株式会社 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置
US6408045B1 (en) 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
US6999162B1 (en) * 1998-10-28 2006-02-14 Nikon Corporation Stage device, exposure system, method of device manufacture, and device
US6538720B2 (en) * 2001-02-28 2003-03-25 Silicon Valley Group, Inc. Lithographic tool with dual isolation system and method for configuring the same
US6784978B2 (en) * 2002-03-12 2004-08-31 Asml Holding N.V. Method, system, and apparatus for management of reaction loads in a lithography system
JP4447872B2 (ja) 2003-09-17 2010-04-07 キヤノン株式会社 ステージ装置、該ステージ装置を用いた露光装置および該露光装置を用いたデバイス製造方法
JP4411100B2 (ja) 2004-02-18 2010-02-10 キヤノン株式会社 露光装置
JP2006120798A (ja) * 2004-10-20 2006-05-11 Canon Inc 露光装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11189332A (ja) * 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2001223148A (ja) * 2000-02-08 2001-08-17 Nikon Corp 洗浄方法、露光方法及び露光装置、並びにデバイス製造方法
JP2001230178A (ja) * 2000-02-15 2001-08-24 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP2002008971A (ja) * 2000-06-23 2002-01-11 Canon Inc 移動装置、ステージ及び露光装置
JP2002353108A (ja) * 2001-05-24 2002-12-06 Nikon Corp 露光方法、露光装置、フォトマスク、デバイス製造方法、及びフォトマスク製造方法
JP2003163257A (ja) * 2001-11-29 2003-06-06 Canon Inc 位置決め装置及びその製造方法
JP2003318082A (ja) * 2002-04-22 2003-11-07 Canon Inc 駆動装置、露光装置及びデバイス製造方法
JP2004235461A (ja) * 2003-01-30 2004-08-19 Nikon Corp 露光システム
JP2004241576A (ja) * 2003-02-05 2004-08-26 Canon Inc 位置決め装置
WO2005010961A1 (ja) * 2003-07-25 2005-02-03 Nikon Corporation 露光装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010135596A (ja) * 2008-12-05 2010-06-17 Nikon Corp ステージ装置、露光装置及びデバイス製造方法
KR20190009808A (ko) * 2016-05-31 2019-01-29 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 마스크 정렬기의 나이프 에지 세트. 넓은-시야-범위 마스크 정렬기, 및 노출 방법
JP2019517020A (ja) * 2016-05-31 2019-06-20 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド フォトリソグラフィ装置のナイフエッジ群、大視野フォトリソグラフィ装置、および露光方法
KR102176255B1 (ko) * 2016-05-31 2020-11-09 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 마스크 정렬기의 나이프 에지 세트. 넓은-시야-범위 마스크 정렬기, 및 노출 방법
CN108646402A (zh) * 2018-05-09 2018-10-12 哈尔滨工业大学 一种基于双轴导向的可变光阑
JP2022032960A (ja) * 2020-08-12 2022-02-25 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP7689871B2 (ja) 2020-08-12 2025-06-09 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法

Also Published As

Publication number Publication date
US7253877B2 (en) 2007-08-07
US20060114433A1 (en) 2006-06-01
US20070285648A1 (en) 2007-12-13
US7463335B2 (en) 2008-12-09

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