JP2006086534A5 - - Google Patents

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Publication number
JP2006086534A5
JP2006086534A5 JP2005268362A JP2005268362A JP2006086534A5 JP 2006086534 A5 JP2006086534 A5 JP 2006086534A5 JP 2005268362 A JP2005268362 A JP 2005268362A JP 2005268362 A JP2005268362 A JP 2005268362A JP 2006086534 A5 JP2006086534 A5 JP 2006086534A5
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JP
Japan
Prior art keywords
substrate support
semiconductor substrate
silicon carbide
reactor
carbide material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005268362A
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English (en)
Japanese (ja)
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JP2006086534A (ja
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Publication date
Application filed filed Critical
Publication of JP2006086534A publication Critical patent/JP2006086534A/ja
Publication of JP2006086534A5 publication Critical patent/JP2006086534A5/ja
Pending legal-status Critical Current

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JP2005268362A 2004-09-17 2005-09-15 高温基板処理用の粗面サセプタ Pending JP2006086534A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61099304P 2004-09-17 2004-09-17

Publications (2)

Publication Number Publication Date
JP2006086534A JP2006086534A (ja) 2006-03-30
JP2006086534A5 true JP2006086534A5 (enExample) 2008-10-16

Family

ID=35519641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005268362A Pending JP2006086534A (ja) 2004-09-17 2005-09-15 高温基板処理用の粗面サセプタ

Country Status (3)

Country Link
US (2) US20060060145A1 (enExample)
EP (2) EP1965412A1 (enExample)
JP (1) JP2006086534A (enExample)

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JP5051909B2 (ja) * 2007-03-30 2012-10-17 コバレントマテリアル株式会社 縦型ウエハボート
FR2914488B1 (fr) * 2007-03-30 2010-08-27 Soitec Silicon On Insulator Substrat chauffage dope
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JP5415853B2 (ja) * 2009-07-10 2014-02-12 東京エレクトロン株式会社 表面処理方法
JP5562409B2 (ja) * 2010-02-26 2014-07-30 株式会社日立国際電気 半導体装置の製造方法及び基板製造方法及び基板処理装置
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US10316412B2 (en) 2012-04-18 2019-06-11 Veeco Instruments Inc. Wafter carrier for chemical vapor deposition systems
JP5906318B2 (ja) * 2012-08-17 2016-04-20 株式会社Ihi 耐熱複合材料の製造方法及び製造装置
US10167571B2 (en) 2013-03-15 2019-01-01 Veeco Instruments Inc. Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems
US10763154B2 (en) 2018-08-28 2020-09-01 Applied Materials, Inc. Measurement of flatness of a susceptor of a display CVD chamber

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