JP2006032578A5 - - Google Patents

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Publication number
JP2006032578A5
JP2006032578A5 JP2004207856A JP2004207856A JP2006032578A5 JP 2006032578 A5 JP2006032578 A5 JP 2006032578A5 JP 2004207856 A JP2004207856 A JP 2004207856A JP 2004207856 A JP2004207856 A JP 2004207856A JP 2006032578 A5 JP2006032578 A5 JP 2006032578A5
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JP
Japan
Prior art keywords
light
light source
source device
adjusting
maintaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004207856A
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English (en)
Japanese (ja)
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JP2006032578A (ja
JP4878108B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2004207856A priority Critical patent/JP4878108B2/ja
Priority claimed from JP2004207856A external-priority patent/JP4878108B2/ja
Priority to DE602005025289T priority patent/DE602005025289D1/de
Priority to US11/181,192 priority patent/US7276710B2/en
Priority to EP05254383A priority patent/EP1617292B1/en
Publication of JP2006032578A publication Critical patent/JP2006032578A/ja
Publication of JP2006032578A5 publication Critical patent/JP2006032578A5/ja
Application granted granted Critical
Publication of JP4878108B2 publication Critical patent/JP4878108B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004207856A 2004-07-14 2004-07-14 露光装置、デバイス製造方法、および測定装置 Expired - Fee Related JP4878108B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004207856A JP4878108B2 (ja) 2004-07-14 2004-07-14 露光装置、デバイス製造方法、および測定装置
DE602005025289T DE602005025289D1 (de) 2004-07-14 2005-07-13 Lichtquelle und dieselbe verwendende Belichtungsvorrichtung
US11/181,192 US7276710B2 (en) 2004-07-14 2005-07-13 Light source unit and exposure apparatus having the same
EP05254383A EP1617292B1 (en) 2004-07-14 2005-07-13 Light source unit and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004207856A JP4878108B2 (ja) 2004-07-14 2004-07-14 露光装置、デバイス製造方法、および測定装置

Publications (3)

Publication Number Publication Date
JP2006032578A JP2006032578A (ja) 2006-02-02
JP2006032578A5 true JP2006032578A5 (enExample) 2010-07-22
JP4878108B2 JP4878108B2 (ja) 2012-02-15

Family

ID=35106785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004207856A Expired - Fee Related JP4878108B2 (ja) 2004-07-14 2004-07-14 露光装置、デバイス製造方法、および測定装置

Country Status (4)

Country Link
US (1) US7276710B2 (enExample)
EP (1) EP1617292B1 (enExample)
JP (1) JP4878108B2 (enExample)
DE (1) DE602005025289D1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
JP4574211B2 (ja) * 2004-04-19 2010-11-04 キヤノン株式会社 光源装置、当該光源装置を有する露光装置
JP5025236B2 (ja) * 2006-11-29 2012-09-12 キヤノン株式会社 露光装置及び方法、並びに、デバイス製造方法
JP5149514B2 (ja) * 2007-02-20 2013-02-20 ギガフォトン株式会社 極端紫外光源装置
NL2003192A1 (nl) * 2008-07-30 2010-02-02 Asml Netherlands Bv Alignment of collector device in lithographic apparatus.
ATE536567T1 (de) * 2008-08-14 2011-12-15 Asml Netherlands Bv Strahlungsquelle und verfahren zur strahlungserzeugung
JP5168489B2 (ja) * 2008-09-12 2013-03-21 株式会社ニコン 計測装置、光源装置、露光装置及びデバイスの製造方法
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
JP5670174B2 (ja) * 2010-03-18 2015-02-18 ギガフォトン株式会社 チャンバ装置および極端紫外光生成装置
JP5921548B2 (ja) * 2010-09-08 2016-05-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、ｅｕｖ放射発生装置、およびデバイス製造方法
US9029813B2 (en) * 2011-05-20 2015-05-12 Asml Netherlands B.V. Filter for material supply apparatus of an extreme ultraviolet light source
US9678431B2 (en) 2015-03-16 2017-06-13 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system and method with optimized throughput and stability
US9826615B2 (en) * 2015-09-22 2017-11-21 Taiwan Semiconductor Manufacturing Co., Ltd. EUV collector with orientation to avoid contamination
WO2018131146A1 (ja) * 2017-01-13 2018-07-19 ギガフォトン株式会社 極端紫外光生成システム

Family Cites Families (21)

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Publication number Priority date Publication date Assignee Title
US4870289A (en) * 1987-09-25 1989-09-26 Matsushita Electric Industrial Co., Ltd. Apparatus for controlling relation in position between a photomask and a wafer
US5149972A (en) * 1990-01-18 1992-09-22 University Of Massachusetts Medical Center Two excitation wavelength video imaging microscope
JPH0697027A (ja) * 1992-09-10 1994-04-08 Toshiba Corp Ｘ線リソグラフィ装置
US5390203A (en) * 1994-06-13 1995-02-14 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for locking laser wavelength to an atomic transition
US6355570B1 (en) * 1998-03-04 2002-03-12 Hitachi, Ltd. Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses
JP3833810B2 (ja) * 1998-03-04 2006-10-18 株式会社日立製作所 半導体の製造方法並びにプラズマ処理方法およびその装置
JP2000056099A (ja) * 1998-08-13 2000-02-25 Nikon Corp Ｘ線照射装置及びｘ線発生位置検出器
JP4273574B2 (ja) * 1999-05-27 2009-06-03 株式会社ニコン Ｘ線発生装置及びこれを有するｘ線露光装置及びｘ線の発生方法
US6324255B1 (en) 1998-08-13 2001-11-27 Nikon Technologies, Inc. X-ray irradiation apparatus and x-ray exposure apparatus
JP2000346817A (ja) * 1999-06-07 2000-12-15 Nikon Corp 測定装置、照射装置および露光方法
JP2001032096A (ja) 1999-07-23 2001-02-06 Daihatsu Motor Co Ltd 自動車車体の電着塗装方法
WO2001020733A1 (en) * 1999-09-10 2001-03-22 Nikon Corporation Light source and wavelength stabilization control method, exposure apparatus and exposure method, method for producing exposure apparatus, and device manufacturing method and device
JP2001267239A (ja) * 2000-01-14 2001-09-28 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP4505664B2 (ja) 2000-03-24 2010-07-21 株式会社ニコン Ｘ線発生装置
JP2002006096A (ja) * 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
US6826424B1 (en) * 2000-12-19 2004-11-30 Haishan Zeng Methods and apparatus for fluorescence and reflectance imaging and spectroscopy and for contemporaneous measurements of electromagnetic radiation with multiple measuring devices
US7253032B2 (en) * 2001-04-20 2007-08-07 Semiconductor Energy Laboratory Co., Ltd. Method of flattening a crystallized semiconductor film surface by using a plate
JP4298336B2 (ja) 2002-04-26 2009-07-15 キヤノン株式会社 露光装置、光源装置及びデバイス製造方法
JP2004128105A (ja) * 2002-10-01 2004-04-22 Nikon Corp Ｘ線発生装置及び露光装置
JP2005294087A (ja) * 2004-04-01 2005-10-20 Nikon Corp 光源ユニット、照明光学装置、露光装置および露光方法
JP4574211B2 (ja) * 2004-04-19 2010-11-04 キヤノン株式会社 光源装置、当該光源装置を有する露光装置

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