JP2005512924A5 - - Google Patents
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- Publication number
- JP2005512924A5 JP2005512924A5 JP2002589422A JP2002589422A JP2005512924A5 JP 2005512924 A5 JP2005512924 A5 JP 2005512924A5 JP 2002589422 A JP2002589422 A JP 2002589422A JP 2002589422 A JP2002589422 A JP 2002589422A JP 2005512924 A5 JP2005512924 A5 JP 2005512924A5
- Authority
- JP
- Japan
- Prior art keywords
- dielectric
- oxide
- conductive oxide
- conductive
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims description 18
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 12
- 229910052787 antimony Inorganic materials 0.000 claims description 8
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 8
- 229910001887 tin oxide Inorganic materials 0.000 claims description 8
- 229910003437 indium oxide Inorganic materials 0.000 claims description 6
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 238000010304 firing Methods 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 229910000510 noble metal Inorganic materials 0.000 claims description 4
- 229910000314 transition metal oxide Inorganic materials 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 238000007650 screen-printing Methods 0.000 claims description 2
- 229910052723 transition metal Inorganic materials 0.000 claims description 2
- 150000003624 transition metals Chemical class 0.000 claims description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 9
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 9
- 239000006104 solid solution Substances 0.000 description 8
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29140801P | 2001-05-16 | 2001-05-16 | |
| US60/291,408 | 2001-05-16 | ||
| PCT/US2002/018398 WO2002092533A1 (en) | 2001-05-16 | 2002-05-14 | Dielectric composition with reduced resistance |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005512924A JP2005512924A (ja) | 2005-05-12 |
| JP2005512924A5 true JP2005512924A5 (enExample) | 2006-01-05 |
| JP4863599B2 JP4863599B2 (ja) | 2012-01-25 |
Family
ID=23120169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002589422A Expired - Fee Related JP4863599B2 (ja) | 2001-05-16 | 2002-05-14 | 電気抵抗を低下させた誘電体組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7763189B2 (enExample) |
| EP (1) | EP1390319A1 (enExample) |
| JP (1) | JP4863599B2 (enExample) |
| KR (1) | KR100924425B1 (enExample) |
| CN (1) | CN100379704C (enExample) |
| BR (1) | BR0209453A (enExample) |
| WO (1) | WO2002092533A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1740113A (zh) * | 2004-08-25 | 2006-03-01 | 日本碍子株式会社 | 电子发射元件 |
| KR20070002934A (ko) * | 2005-06-30 | 2007-01-05 | 삼성전자주식회사 | 페이스트 조성물 |
| JP2007115675A (ja) * | 2005-09-21 | 2007-05-10 | Toray Ind Inc | 電子放出源用ペースト |
| KR100752013B1 (ko) * | 2006-06-28 | 2007-08-28 | 제일모직주식회사 | 전자 방출원 형성용 조성물, 전자 방출원의 제조방법,이로부터 제조되는 전자 방출원 및 이를 포함하는 평면표시 소자 |
| US20100264805A1 (en) * | 2007-10-05 | 2010-10-21 | E.I. Du Pont De Nemours And Company | Under-gate field emission triode with charge dissipation layer |
| KR20100097146A (ko) * | 2007-11-15 | 2010-09-02 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 탄소 나노튜브의 보호 |
| JP5314969B2 (ja) * | 2008-09-03 | 2013-10-16 | 富士フイルム株式会社 | 光学ガラス |
| WO2019123278A2 (en) * | 2017-12-18 | 2019-06-27 | King Abdullah University Of Science And Technology | Indium-based catalysts and pre-catalysts |
| JP2019125481A (ja) * | 2018-01-16 | 2019-07-25 | トヨタ自動車株式会社 | 全固体リチウムイオン二次電池用の負極合材及びその製造方法 |
| CN111627698B (zh) * | 2020-06-08 | 2022-05-17 | 江苏国瓷泓源光电科技有限公司 | 一种mlcc用镍内电极浆料 |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2288106A (en) * | 1938-08-06 | 1942-06-30 | North American Rayon Corp | Viscose spinning solution |
| US3723175A (en) * | 1967-10-09 | 1973-03-27 | Matsushita Electric Industrial Co Ltd | Nonlinear resistors of bulk type |
| US3673117A (en) * | 1969-12-19 | 1972-06-27 | Methode Dev Co | Electrical resistant material |
| JPS5366561A (en) * | 1976-11-26 | 1978-06-14 | Matsushita Electric Industrial Co Ltd | Thick film varistor composition |
| US4415624A (en) * | 1981-07-06 | 1983-11-15 | Rca Corporation | Air-fireable thick film inks |
| NL8800559A (nl) | 1988-03-07 | 1989-10-02 | Philips Nv | Keramische meerlaagscondensator. |
| US5096619A (en) * | 1989-03-23 | 1992-03-17 | E. I. Du Pont De Nemours And Company | Thick film low-end resistor composition |
| JPH02288106A (ja) | 1989-04-28 | 1990-11-28 | Asahi Glass Co Ltd | 抵抗体ペースト及びセラミックス基板 |
| US5202292A (en) * | 1989-06-09 | 1993-04-13 | Asahi Glass Company Ltd. | Resistor paste and ceramic substrate |
| JP3294705B2 (ja) | 1994-02-24 | 2002-06-24 | 住友金属鉱山株式会社 | 高温焼成用導電ペーストおよび透光性導電膜 |
| US5580496A (en) * | 1993-04-05 | 1996-12-03 | Sumitomo Metal Mining Company Limited | Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting |
| US5378408A (en) * | 1993-07-29 | 1995-01-03 | E. I. Du Pont De Nemours And Company | Lead-free thick film paste composition |
| US5631311A (en) * | 1994-08-18 | 1997-05-20 | E. I. Du Pont De Nemours And Company | Transparent static dissipative formulations for coatings |
| US5491118A (en) * | 1994-12-20 | 1996-02-13 | E. I. Du Pont De Nemours And Company | Cadmium-free and lead-free thick film paste composition |
| JPH09115334A (ja) * | 1995-10-23 | 1997-05-02 | Mitsubishi Materiais Corp | 透明導電膜および膜形成用組成物 |
| JP2986094B2 (ja) | 1996-06-11 | 1999-12-06 | 富士通株式会社 | プラズマディスプレイパネル及びその製造方法 |
| US5851732A (en) * | 1997-03-06 | 1998-12-22 | E. I. Du Pont De Nemours And Company | Plasma display panel device fabrication utilizing black electrode between substrate and conductor electrode |
| JP4088721B2 (ja) * | 1997-03-13 | 2008-05-21 | 日産化学工業株式会社 | 導電性酸化スズ微粉末及び導電性酸化スズゾルの製造方法 |
| EP0975464B1 (en) * | 1997-03-21 | 2004-02-11 | Electro-Science Laboratories, Inc. | Silicon nitride coating compositions |
| JPH1140054A (ja) | 1997-07-17 | 1999-02-12 | Canon Inc | ペーストの塗布方法および画像表示装置 |
| EP1040501A1 (en) * | 1997-12-15 | 2000-10-04 | E.I. Du Pont De Nemours And Company | Ion-bombarded graphite electron emitters |
| JP3941201B2 (ja) * | 1998-01-20 | 2007-07-04 | 株式会社デンソー | 導体ペースト組成物及び回路基板 |
| JP4409003B2 (ja) * | 1998-09-24 | 2010-02-03 | 三星エスディアイ株式会社 | フィールドエミッションディスプレイ用エレクトロンエミッタ組成物及びこれを利用したエレクトロンエミッタの製造方法 |
| JP3397711B2 (ja) | 1999-02-25 | 2003-04-21 | キヤノン株式会社 | 電子放出素子、電子源及び画像形成装置 |
| JP2001181039A (ja) | 1999-12-28 | 2001-07-03 | Ngk Insulators Ltd | 複合焼結体およびその製造方法 |
| US7201814B2 (en) * | 2001-01-29 | 2007-04-10 | E. I. Du Pont De Nemours And Company | Fibers and ribbons containing phosphor, conductive metals or dielectric particles for use in the manufacture of flat panel displays |
| US6951666B2 (en) * | 2001-10-05 | 2005-10-04 | Cabot Corporation | Precursor compositions for the deposition of electrically conductive features |
| US20040163034A1 (en) * | 2002-10-17 | 2004-08-19 | Sean Colbath | Systems and methods for labeling clusters of documents |
| JP2004172250A (ja) | 2002-11-19 | 2004-06-17 | Sumitomo Metal Mining Co Ltd | 厚膜抵抗体組成物、これを用いた厚膜抵抗体及びその形成方法 |
| US7147804B2 (en) * | 2003-01-24 | 2006-12-12 | E. I. Du Pont De Nemours And Company | Terminal electrode compositions for multilayer ceramic capacitors |
| KR100480644B1 (ko) * | 2003-02-28 | 2005-03-31 | 삼성전자주식회사 | 셀 구동 전류가 증가된 상 변화 메모리 |
| JP4092699B2 (ja) | 2003-09-26 | 2008-05-28 | 日立金属株式会社 | 回路パターン形成用トナー及びその製造方法、回路パターン形成方法 |
| US7794629B2 (en) | 2003-11-25 | 2010-09-14 | Qinetiq Limited | Composite materials |
| US7462217B2 (en) | 2003-12-08 | 2008-12-09 | E.I. Du Pont De Nemours And Company | Method of preparation for the high performance thermoelectric material indium-cobalt-antimony |
| JP2005231961A (ja) | 2004-02-20 | 2005-09-02 | Taiyo Ink Mfg Ltd | 半導電性ガラスペースト及びその焼成物 |
| JP2008500451A (ja) | 2004-04-14 | 2008-01-10 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 高性能熱電材料およびそれらの調製方法 |
| JP2005302607A (ja) | 2004-04-14 | 2005-10-27 | Sumitomo Metal Mining Co Ltd | 高温焼成用導電ペーストと導電性接着膜およびフィールドエミッションディスプレイ |
| TW200612443A (en) | 2004-09-01 | 2006-04-16 | Tdk Corp | Thick-film resistor paste and thick-film resistor |
| US7214466B1 (en) * | 2005-12-14 | 2007-05-08 | E. I. Du Pont De Nemours And Company | Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof |
| JP4591705B2 (ja) | 2006-01-20 | 2010-12-01 | セイコーエプソン株式会社 | ターゲット材料 |
-
2002
- 2002-05-14 CN CNB028101081A patent/CN100379704C/zh not_active Expired - Fee Related
- 2002-05-14 BR BR0209453-3A patent/BR0209453A/pt not_active IP Right Cessation
- 2002-05-14 EP EP02746493A patent/EP1390319A1/en not_active Withdrawn
- 2002-05-14 JP JP2002589422A patent/JP4863599B2/ja not_active Expired - Fee Related
- 2002-05-14 WO PCT/US2002/018398 patent/WO2002092533A1/en not_active Ceased
- 2002-05-14 US US10/475,212 patent/US7763189B2/en not_active Expired - Fee Related
- 2002-05-14 KR KR1020037014818A patent/KR100924425B1/ko not_active Expired - Fee Related
-
2010
- 2010-07-14 US US12/836,150 patent/US8298449B2/en not_active Expired - Fee Related
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