JP2005340746A - 半導体封止用エポキシ樹脂組成物およびそれを用いた半導体装置、ならびに半導体装置の製法 - Google Patents
半導体封止用エポキシ樹脂組成物およびそれを用いた半導体装置、ならびに半導体装置の製法 Download PDFInfo
- Publication number
- JP2005340746A JP2005340746A JP2004229715A JP2004229715A JP2005340746A JP 2005340746 A JP2005340746 A JP 2005340746A JP 2004229715 A JP2004229715 A JP 2004229715A JP 2004229715 A JP2004229715 A JP 2004229715A JP 2005340746 A JP2005340746 A JP 2005340746A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- substrate
- semiconductor device
- resin composition
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 178
- 238000007789 sealing Methods 0.000 title claims abstract description 68
- 238000004519 manufacturing process Methods 0.000 title claims description 50
- 239000011342 resin composition Substances 0.000 title description 2
- 239000003822 epoxy resin Substances 0.000 claims abstract description 107
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 107
- 239000000758 substrate Substances 0.000 claims abstract description 80
- 239000000203 mixture Substances 0.000 claims abstract description 76
- 229920005989 resin Polymers 0.000 claims abstract description 65
- 239000011347 resin Substances 0.000 claims abstract description 65
- 238000005452 bending Methods 0.000 claims abstract description 16
- 239000000853 adhesive Substances 0.000 claims description 112
- 230000001070 adhesive effect Effects 0.000 claims description 112
- 239000010410 layer Substances 0.000 claims description 54
- 239000012790 adhesive layer Substances 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 33
- 239000000155 melt Substances 0.000 claims description 12
- 238000005538 encapsulation Methods 0.000 claims description 7
- 230000009477 glass transition Effects 0.000 claims description 5
- 229920001187 thermosetting polymer Polymers 0.000 claims description 5
- 238000002844 melting Methods 0.000 abstract description 7
- 230000008018 melting Effects 0.000 abstract description 7
- 239000000463 material Substances 0.000 description 39
- 238000001723 curing Methods 0.000 description 20
- 229910052751 metal Inorganic materials 0.000 description 19
- 239000002184 metal Substances 0.000 description 19
- 239000011888 foil Substances 0.000 description 18
- 239000003795 chemical substances by application Substances 0.000 description 13
- 239000005011 phenolic resin Substances 0.000 description 12
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 10
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- 239000003566 sealing material Substances 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229920000459 Nitrile rubber Polymers 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 239000011256 inorganic filler Substances 0.000 description 7
- 229910003475 inorganic filler Inorganic materials 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 238000012546 transfer Methods 0.000 description 7
- 238000001721 transfer moulding Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 5
- 235000010290 biphenyl Nutrition 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 229920001971 elastomer Polymers 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- -1 polyethylene naphthalate Polymers 0.000 description 5
- 239000005060 rubber Substances 0.000 description 5
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 239000011231 conductive filler Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 235000010893 Bischofia javanica Nutrition 0.000 description 2
- 240000005220 Bischofia javanica Species 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 229920000800 acrylic rubber Polymers 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000003712 anti-aging effect Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000004209 oxidized polyethylene wax Substances 0.000 description 2
- 235000013873 oxidized polyethylene wax Nutrition 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000011417 postcuring Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000002507 cathodic stripping potentiometry Methods 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 1
- 239000011086 glassine Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Substances C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 1
- 238000005040 ion trap Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B62—LAND VEHICLES FOR TRAVELLING OTHERWISE THAN ON RAILS
- B62B—HAND-PROPELLED VEHICLES, e.g. HAND CARTS OR PERAMBULATORS; SLEDGES
- B62B1/00—Hand carts having only one axis carrying one or more transport wheels; Equipment therefor
- B62B1/10—Hand carts having only one axis carrying one or more transport wheels; Equipment therefor in which the load is intended to be transferred totally to the wheels
- B62B1/14—Hand carts having only one axis carrying one or more transport wheels; Equipment therefor in which the load is intended to be transferred totally to the wheels involving means for grappling or securing in place objects to be carried; Loading or unloading equipment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/688—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/05—Bonding or intermediate layer characterised by chemical composition, e.g. sealant or spacer
- C09K2323/055—Epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Transportation (AREA)
- Mechanical Engineering (AREA)
- Combustion & Propulsion (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Epoxy Resins (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
【解決手段】基板9上に搭載した半導体素子5の電極6と、上記半導体素子5の周囲に設けられた複数の導電部4とを電気的に接続するワイヤー7と、上記基板9と、半導体素子5と、複数の導電部4とが封止樹脂層8中に内蔵され、上記基板9の底面と導電部4の底面とが、上記封止樹脂層8から露出している半導体装置の上記封止樹脂層8の形成に用いられる半導体封止用エポキシ樹脂組成物である。そして、上記エポキシ樹脂組成物が、下記の特性(α)および(β)を備えている半。
(α)上記エポキシ樹脂組成物の175℃における溶融粘度が2〜10Pa・sである。(β)上記エポキシ樹脂組成物の硬化体における常温での曲げ強度が130MPa以上である。
【選択図】図5
Description
(α)上記エポキシ樹脂組成物の175℃における溶融粘度が2〜10Pa・sである。(β)上記エポキシ樹脂組成物の硬化体における常温での曲げ強度が130MPa以上である。
(α)上記エポキシ樹脂組成物の175℃における溶融粘度が2〜10Pa・sである。(β)上記エポキシ樹脂組成物の硬化体における常温での曲げ強度が130MPa以上である。
下記の一般式(a)で表されるビフェニル型エポキシ樹脂(エポキシ当量192、融点100℃)
下記の一般式(b)で表される繰り返し単位を有するエポキシ樹脂(エポキシ当量170、融点60℃)
下記の一般式(c)で表されるエポキシ樹脂(エポキシ当量198、融点60℃)
下記の一般式(d)で表されるビフェニルノボラック樹脂(水酸基当量203、融点90℃)
下記の一般式(e)で表されるフェノールアラルキル樹脂(水酸基当量170、融点83℃)
下記の一般式(f)で表されるフェノール樹脂(水酸基当量215、融点81℃)
トリフェニルホスフィン(TPP)
酸化ポリエチレンワックス
平均粒径30μmの球状溶融シリカ粉末
平均粒径1μmの球状溶融シリカ粉末
アクリロニトリル−ブタジエンゴム(Nipol 1072J 、日本ゼオン社製、アクリロニトリル含有量18重量%)20部、エポキシ樹脂(EPPN−501HY、日本化薬社製)50部、フェノール樹脂(MEH−7500−3S、明和化成社製)30部、触媒(TPP、北興化学社製)0.5部をメチルエチルケトン(MEK)350部に溶解して接着剤溶液を調製した。ついで、上記接着剤溶液を用いて、厚み100μmの片面粗化銅合金箔(BHY−13B−7025、ジャパンエナジー社製)に塗布した後、150℃で3分間乾燥させることにより、厚み15μmの接着剤層が形成された接着シートを作製した。上記接着シートの接着剤層の硬化前の100℃での弾性率は2.5×10-3Paであり、硬化後の200℃での弾性率は4.3MPaであった。また、銅合金箔に対する接着力は、12N/20mmであった。そして、上記接着シートの接着剤層の硬化後のガラス転移温度は190℃であった。さらに、基材として用いた銅合金箔の200℃での弾性率は130GPaであった。なお、上記ガラス転移温度は、レオメトリックス社製の粘弾性測定装置(DMA)を用い、昇温速度5℃/分で測定した。また、上記各弾性率は、各温度条件下、つぎのようにして測定した。
評価機器:レオメトリックス社製の粘弾性スペクトルメータ(ARES)
昇温速度:5℃/min
周波数:1Hz
測定モード:引張モード
後記の表1に示す各成分を同表に示す割合で配合し、80〜120℃に加熱したロール混練機(5分間)にかけて溶融混練することによりエポキシ樹脂組成物を作製した。なお、得られたエポキシ樹脂組成物の175℃における溶融粘度をつぎのようにして測定し、その結果を後記の表1に併せて示した。得られたエポキシ樹脂組成物を2g精秤し、タブレット状に成形した。そして、これを高化式フローテスターのポット内に入れ、10kgの荷重をかけて175℃で測定した。溶融したエポキシ樹脂組成物がダイスの穴(直径1.0mm×10mm)を通過して押し出されるときのピストンの移動速度からサンプルの溶融粘度(フローテスター粘度)を求めた。その結果を後記の表1に示す。
まず、図1に示すように、上記作製した接着シート3を準備し、この接着シート3の接着剤層2面の所定部分に、半導体素子搭載用の基板9(大きさ:4.2mm×4.2mm)および複数の導電部4(大きさ:直径0.3mm)を形成した。
成形温度:175℃
時間:120秒
クランプ圧力:200kN
トランスファースピード:3mm/秒
トランスファー圧:5kN
1パッケージ当たり156個の導電部(直径0.3mm)を有する。
パッケージ全体のサイズ:8.2mm×8.2mm
パッケージ(封止樹脂層8)の厚み:0.45mm
エポキシ樹脂組成物の配合成分および配合量を下記の表1〜表2に示す内容に代えて、上記実施例1と同様にしてエポキシ樹脂組成物を作製した。そして、上記実施例1と同様にして接着シート3面上に半導体装置を形成した。なお、作製した各エポキシ樹脂組成物の溶融粘度(フローテスター粘度)および各エポキシ樹脂組成物硬化体の曲げ強度を上記と同様にして測定し後記の表1〜表2に併せて示す。
2 接着剤層
3 接着シート
4 導電部
5 半導体素子
6 電極
7 ワイヤー
8 封止樹脂層
9 基板
Claims (8)
- 基板上に搭載された半導体素子の電極と、上記半導体素子の周囲に設けられた複数の導電部とを電気的に接続する電気的接続部と、上記基板と、半導体素子と、複数の導電部とが封止樹脂層中に内蔵され、上記基板の底面と導電部の底面とが、上記封止樹脂層から露出している半導体装置の上記封止樹脂層の形成に用いられる半導体封止用エポキシ樹脂組成物であって、上記エポキシ樹脂組成物が、下記の特性(α)および(β)を備えていることを特徴とする半導体封止用エポキシ樹脂組成物。
(α)上記エポキシ樹脂組成物の175℃における溶融粘度が2〜10Pa・sである。(β)上記エポキシ樹脂組成物の硬化体における常温での曲げ強度が130MPa以上である。 - 上記導電部が、上下にそれぞれ張り出し部分を有している請求項1記載の半導体封止用エポキシ樹脂組成物。
- 基板上に搭載された半導体素子の電極と、上記半導体素子の周囲に設けられた複数の導電部とを電気的に接続する電気的接続部と、上記基板と、半導体素子と、複数の導電部とが封止樹脂層中に内蔵され、上記基板の底面と導電部の底面とが、上記封止樹脂層から露出している半導体装置であって、上記封止樹脂層が請求項1または2記載の半導体封止用エポキシ樹脂組成物の硬化体によって形成されていることを特徴とする半導体装置。
- 上記導電部が、上下にそれぞれ張り出し部分を有している請求項3記載の半導体装置。
- 請求項3または4記載の半導体装置の製造方法であって、基材面に接着剤層を形成してなる接着シートを準備する工程と、上記接着シートの接着剤層面の所定部分に,半導体素子搭載用の基板と,複数の導電部を形成する工程と、半導体素子の電極が形成されていない面を上記基板上に固着して半導体素子を搭載する工程と、上記基板上に搭載された上記半導体素子の電極と上記導電部とを電気的に接続する工程と、上記基板と,上記基板上に搭載された半導体素子と,上記接着シート上に形成された導電部と,それらの電気的接続部とを包含するよう,下記の特性(α)および(β)を備えたエポキシ樹脂組成物を用いて樹脂封止して接着シート面上に半導体装置を形成する工程と、上記形成された半導体装置から、接着シートを剥離する工程とを備えたことを特徴とする半導体装置の製法。
(α)上記エポキシ樹脂組成物の175℃における溶融粘度が2〜10Pa・sである。(β)上記エポキシ樹脂組成物の硬化体における常温での曲げ強度が130MPa以上である。 - 上記導電部が、上下にそれぞれ張り出し部分を有している請求項5記載の半導体装置の製法。
- 上記接着シートの接着剤層が、熱硬化型接着剤組成物を用いて形成されたものである請求項5または6記載の半導体装置の製法。
- 上記接着シートの接着剤層が、下記の特性(x)および(y)を備えたエポキシ樹脂組成物を用いて形成されたものである請求項5〜7のいずれか一項に記載の半導体装置の製法。
(x)硬化後のガラス転移温度が150℃以上である。
(y)硬化後の200℃での弾性率が1MPa以上である。
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004229715A JP4421972B2 (ja) | 2004-04-30 | 2004-08-05 | 半導体装置の製法 |
EP05009138A EP1591465B1 (en) | 2004-04-30 | 2005-04-26 | Epoxy resin composition for semiconductor encapsulation, semiconductor device using the same, and process for producing semiconductor device |
DE602005000085T DE602005000085T2 (de) | 2004-04-30 | 2005-04-26 | Epoxidharzzusammensetzung zum einkapseln von Halbleitern, Halbleiter davon und Herstellungsverfahren von Halbleitern |
AT05009138T ATE337350T1 (de) | 2004-04-30 | 2005-04-26 | Epoxidharzzusammensetzung zum einkapseln von halbleitern, halbleiter davon und herstellungsverfahren von halbleitern |
SG200502570A SG116646A1 (en) | 2004-04-30 | 2005-04-27 | Epoxy resin composition for semiconductor encapsulation, semiconductor device using the same, and process for producing semiconductor device. |
US11/115,307 US7262514B2 (en) | 2004-04-30 | 2005-04-27 | Epoxy resin composition for semiconductor encapsulation, semiconductor device using the same, and process for producing semiconductor device |
MYPI20051891A MY138595A (en) | 2004-04-30 | 2005-04-28 | Epoxy resin composition for semiconductor encapsulation, semiconductor device using the same, and process for producing semiconductor device |
KR1020050036135A KR100880968B1 (ko) | 2004-04-30 | 2005-04-29 | 반도체 밀봉용 에폭시 수지 조성물 및 그것을 사용한반도체 장치, 및 반도체 장치의 제법 |
TW094113849A TWI366574B (en) | 2004-04-30 | 2005-04-29 | Process for producing semiconductor device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004136137 | 2004-04-30 | ||
JP2004229715A JP4421972B2 (ja) | 2004-04-30 | 2004-08-05 | 半導体装置の製法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005340746A true JP2005340746A (ja) | 2005-12-08 |
JP4421972B2 JP4421972B2 (ja) | 2010-02-24 |
Family
ID=34935769
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004229715A Expired - Fee Related JP4421972B2 (ja) | 2004-04-30 | 2004-08-05 | 半導体装置の製法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US7262514B2 (ja) |
EP (1) | EP1591465B1 (ja) |
JP (1) | JP4421972B2 (ja) |
KR (1) | KR100880968B1 (ja) |
AT (1) | ATE337350T1 (ja) |
DE (1) | DE602005000085T2 (ja) |
MY (1) | MY138595A (ja) |
SG (1) | SG116646A1 (ja) |
TW (1) | TWI366574B (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006077213A (ja) * | 2004-09-13 | 2006-03-23 | Nitto Denko Corp | 半導体封止用エポキシ樹脂組成物およびそれを用いた半導体装置、ならびに半導体装置の製法 |
JP2008072010A (ja) * | 2006-09-15 | 2008-03-27 | Nitto Denko Corp | 片面封止型光半導体装置の製造方法およびそれにより得られる片面封止型光半導体装置 |
JP2008247936A (ja) * | 2007-03-29 | 2008-10-16 | Lintec Corp | 粘接着剤組成物、粘接着シートおよび半導体装置の製造方法 |
US8203083B2 (en) | 2007-04-17 | 2012-06-19 | Nano Interface Technology | Electromagnetic wave shielding heat-radiation sheet and manufactured method thereof |
JP2013145825A (ja) * | 2012-01-16 | 2013-07-25 | Dainippon Printing Co Ltd | 半導体装置用リードフレーム |
JP2014086685A (ja) * | 2012-10-26 | 2014-05-12 | Sumitomo Metal Mining Co Ltd | 半導体素子搭載用基板及びその製造方法 |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4562118B2 (ja) * | 2003-12-19 | 2010-10-13 | 日東電工株式会社 | 半導体装置の製造方法 |
JP4421972B2 (ja) * | 2004-04-30 | 2010-02-24 | 日東電工株式会社 | 半導体装置の製法 |
JP4426917B2 (ja) * | 2004-07-16 | 2010-03-03 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
CN101310379B (zh) * | 2005-11-17 | 2010-09-15 | 富士通半导体股份有限公司 | 半导体器件 |
JP4954569B2 (ja) * | 2006-02-16 | 2012-06-20 | 日東電工株式会社 | 半導体装置の製造方法 |
KR20070090108A (ko) * | 2006-03-01 | 2007-09-05 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 반도체 캡슐화 에폭시 수지 조성물 및 반도체 장치 |
JP4171499B2 (ja) * | 2006-04-10 | 2008-10-22 | 日立電線株式会社 | 電子装置用基板およびその製造方法、並びに電子装置およびその製造方法 |
KR101370245B1 (ko) * | 2006-05-23 | 2014-03-05 | 린텍 가부시키가이샤 | 점접착제 조성물, 점접착 시트 및 반도체장치의 제조방법 |
DE102006033701B4 (de) * | 2006-07-20 | 2012-02-23 | Infineon Technologies Ag | Herstellungsverfahren für ein elektronisches Bauelement in VQFN-Bauweise |
US7993732B2 (en) * | 2006-07-28 | 2011-08-09 | Ricoh Company, Ltd. | Heat-sensitive pressure-sensitive adhesive and heat-sensitive adhesive material |
CN101118895A (zh) * | 2006-08-03 | 2008-02-06 | 飞思卡尔半导体公司 | 具有内置热沉的半导体器件 |
US20090001611A1 (en) * | 2006-09-08 | 2009-01-01 | Takeshi Matsumura | Adhesive sheet for manufacturing semiconductor device, manufacturing method of semiconductor device using the sheet, and semiconductor device obtained by the method |
JP2008108890A (ja) * | 2006-10-25 | 2008-05-08 | Three M Innovative Properties Co | 回路基板の接続方法及び接続構造体 |
KR20080047990A (ko) * | 2006-11-27 | 2008-05-30 | 린텍 가부시키가이샤 | 점접착제 조성물, 점접착 시트 및 반도체 장치의 제조방법 |
US20080237842A1 (en) * | 2007-03-29 | 2008-10-02 | Manepalli Rahul N | Thermally conductive molding compounds for heat dissipation in semiconductor packages |
KR100899720B1 (ko) * | 2008-01-10 | 2009-05-27 | 엘에스엠트론 주식회사 | 다이 접착 필름과 이를 위한 수지 조성물 |
JP4939574B2 (ja) | 2008-08-28 | 2012-05-30 | 日東電工株式会社 | 熱硬化型ダイボンドフィルム |
JP5715747B2 (ja) * | 2008-09-30 | 2015-05-13 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 回路装置およびその製造方法 |
WO2011083737A1 (ja) * | 2010-01-05 | 2011-07-14 | 富士電機システムズ株式会社 | 半導体装置用ユニットおよび半導体装置 |
CN103080144B (zh) * | 2010-05-28 | 2015-02-25 | 住友电木株式会社 | 酯化物的制造方法 |
TWI401755B (zh) * | 2010-08-10 | 2013-07-11 | Adl Engineering Inc | 四邊扁平無接腳封裝方法 |
JP5868043B2 (ja) * | 2011-07-04 | 2016-02-24 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US8525312B2 (en) * | 2011-08-12 | 2013-09-03 | Tessera, Inc. | Area array quad flat no-lead (QFN) package |
WO2013047696A1 (ja) | 2011-09-29 | 2013-04-04 | 日立化成株式会社 | エポキシ樹脂組成物及び電子部品装置 |
TWI496865B (zh) * | 2012-01-06 | 2015-08-21 | Lg Chemical Ltd | 電子裝置之製法 |
KR101961952B1 (ko) * | 2012-02-29 | 2019-07-17 | 에스케이하이닉스 주식회사 | 다이 어태치 접착제 및 반도체 장치 |
CN104465418B (zh) * | 2014-12-24 | 2017-12-19 | 通富微电子股份有限公司 | 一种扇出晶圆级封装方法 |
US9595501B1 (en) | 2015-10-30 | 2017-03-14 | Automated Assembly Corporation | Wire bonded electronic devices to round wire |
DE102016000051A1 (de) * | 2016-01-05 | 2017-07-06 | Siltectra Gmbh | Verfahren und Vorrichtung zum planaren Erzeugen von Modifikationen in Festkörpern |
EP3433876B1 (de) | 2016-03-24 | 2023-09-13 | Siltectra GmbH | Ein splitting-verfahren |
JP6918445B2 (ja) * | 2016-06-24 | 2021-08-11 | 日東電工株式会社 | 加熱接合用シート及びダイシングテープ付き加熱接合用シート |
JP6864505B2 (ja) | 2016-06-24 | 2021-04-28 | 日東電工株式会社 | 加熱接合用シート及びダイシングテープ付き加熱接合用シート |
US10381325B1 (en) | 2017-08-04 | 2019-08-13 | Automated Assembly Corporation | Guide posts for wire bonding |
EP3511977B1 (en) | 2018-01-16 | 2021-11-03 | Infineon Technologies AG | Semiconductor module and method for producing the same |
US10171133B1 (en) | 2018-02-20 | 2019-01-01 | Automated Assembly Corporation | Transponder arrangement |
KR102455146B1 (ko) * | 2020-02-10 | 2022-10-17 | 주식회사 나노인 | 기판의 구조충진을 위한 가역적 코팅 방법 및 봉지 방법 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1083851C (zh) * | 1995-01-05 | 2002-05-01 | 东丽株式会社 | 环氧树脂组合物 |
JPH09252014A (ja) * | 1996-03-15 | 1997-09-22 | Nissan Motor Co Ltd | 半導体素子の製造方法 |
EP0827159B1 (en) * | 1996-08-29 | 2003-05-21 | Mitsubishi Denki Kabushiki Kaisha | Epoxy resin composition and semiconductor device encapsulated therewith |
US5998509A (en) * | 1996-11-29 | 1999-12-07 | Kabushiki Kaisha Toshiba | Resin composition and semiconductor device employing the same |
US6143423A (en) * | 1997-04-07 | 2000-11-07 | Shin-Etsu Chemical Co., Ltd. | Flame retardant epoxy resin compositions |
KR100562454B1 (ko) * | 1998-07-21 | 2006-03-21 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 반도체 봉지용 에폭시 수지 조성물 및 반도체 장치 |
KR100894208B1 (ko) * | 2000-03-31 | 2009-04-22 | 히다치 가세고교 가부시끼가이샤 | 접착제 조성물, 그의 제조 방법, 이것을 사용한 접착 필름,반도체 탑재용 기판 및 반도체 장치 |
JP3702877B2 (ja) * | 2000-09-29 | 2005-10-05 | 日立化成工業株式会社 | 樹脂封止型半導体装置、これに用いるダイボンド材および封止材 |
US6794481B2 (en) * | 2001-06-28 | 2004-09-21 | Mitsubishi Gas Chemical Company, Inc. | Bifunctional phenylene ether oligomer, its derivatives, its use and process for the production thereof |
US6835785B2 (en) * | 2002-01-28 | 2004-12-28 | Mitsubishi Gas Chemical Company, Inc. | Polyphenylene ether oligomer compound, derivatives thereof and use thereof |
JP4421972B2 (ja) * | 2004-04-30 | 2010-02-24 | 日東電工株式会社 | 半導体装置の製法 |
-
2004
- 2004-08-05 JP JP2004229715A patent/JP4421972B2/ja not_active Expired - Fee Related
-
2005
- 2005-04-26 DE DE602005000085T patent/DE602005000085T2/de active Active
- 2005-04-26 EP EP05009138A patent/EP1591465B1/en not_active Not-in-force
- 2005-04-26 AT AT05009138T patent/ATE337350T1/de not_active IP Right Cessation
- 2005-04-27 SG SG200502570A patent/SG116646A1/en unknown
- 2005-04-27 US US11/115,307 patent/US7262514B2/en not_active Expired - Fee Related
- 2005-04-28 MY MYPI20051891A patent/MY138595A/en unknown
- 2005-04-29 TW TW094113849A patent/TWI366574B/zh not_active IP Right Cessation
- 2005-04-29 KR KR1020050036135A patent/KR100880968B1/ko not_active IP Right Cessation
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006077213A (ja) * | 2004-09-13 | 2006-03-23 | Nitto Denko Corp | 半導体封止用エポキシ樹脂組成物およびそれを用いた半導体装置、ならびに半導体装置の製法 |
JP4494912B2 (ja) * | 2004-09-13 | 2010-06-30 | 日東電工株式会社 | 半導体装置、ならびに半導体装置の製法 |
JP2008072010A (ja) * | 2006-09-15 | 2008-03-27 | Nitto Denko Corp | 片面封止型光半導体装置の製造方法およびそれにより得られる片面封止型光半導体装置 |
JP2008247936A (ja) * | 2007-03-29 | 2008-10-16 | Lintec Corp | 粘接着剤組成物、粘接着シートおよび半導体装置の製造方法 |
US8203083B2 (en) | 2007-04-17 | 2012-06-19 | Nano Interface Technology | Electromagnetic wave shielding heat-radiation sheet and manufactured method thereof |
JP2013145825A (ja) * | 2012-01-16 | 2013-07-25 | Dainippon Printing Co Ltd | 半導体装置用リードフレーム |
JP2014086685A (ja) * | 2012-10-26 | 2014-05-12 | Sumitomo Metal Mining Co Ltd | 半導体素子搭載用基板及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20060047646A (ko) | 2006-05-18 |
KR100880968B1 (ko) | 2009-02-03 |
ATE337350T1 (de) | 2006-09-15 |
MY138595A (en) | 2009-07-31 |
US20050253286A1 (en) | 2005-11-17 |
US7262514B2 (en) | 2007-08-28 |
DE602005000085T2 (de) | 2006-12-28 |
JP4421972B2 (ja) | 2010-02-24 |
TW200600523A (en) | 2006-01-01 |
EP1591465A1 (en) | 2005-11-02 |
DE602005000085D1 (de) | 2006-10-05 |
SG116646A1 (en) | 2005-11-28 |
TWI366574B (en) | 2012-06-21 |
EP1591465B1 (en) | 2006-08-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4421972B2 (ja) | 半導体装置の製法 | |
JP4374317B2 (ja) | 電子部品用接着テープ組成物 | |
KR100618640B1 (ko) | 반도체 장치 제조용 접착시트와, 반도체 장치 및 그제조방법 | |
JP2004253674A (ja) | 半導体装置及びその製造方法 | |
JP4397653B2 (ja) | 半導体装置製造用接着シート | |
JP4125668B2 (ja) | 半導体装置の製造方法 | |
JP4449325B2 (ja) | 半導体用接着フィルム、半導体装置、及び半導体装置の製造方法。 | |
JPWO2018207408A1 (ja) | 半導体封止成形用仮保護フィルム | |
JP2006318999A (ja) | 半導体装置製造用接着フィルム | |
JP4002736B2 (ja) | 半導体装置組立用マスクシートおよび半導体装置の組み立て方法 | |
JP2004296549A (ja) | 半導体装置製造用接着シート及びそれを用いた半導体装置並びに製造方法 | |
JP4494912B2 (ja) | 半導体装置、ならびに半導体装置の製法 | |
JP5053687B2 (ja) | 半導体装置製造用接着シート | |
JP3779601B2 (ja) | 半導体装置組立用マスクシート | |
KR100635053B1 (ko) | 전자부품용 접착테이프 | |
CN100462402C (zh) | 半导体封装用环氧树脂组合物、半导体器件及其制造方法 | |
JP2002338910A (ja) | 半導体装置製造用粘着シート | |
JP2001207031A (ja) | 半導体封止用樹脂組成物及び半導体装置 | |
JP2007129016A (ja) | 半導体装置製造用接着シート | |
JP3857953B2 (ja) | 半導体装置製造用接着シート | |
JP4902627B2 (ja) | 半導体装置 | |
WO2022176585A1 (ja) | 半導体装置製造用接着シート及びそれを用いた半導体装置の製造方法 | |
WO2021200405A1 (ja) | 粘着テープ | |
JP4140963B2 (ja) | 半導体装置の製造方法及びその方法に使用する接着テープ並びにその方法によって製造される半導体装置 | |
JP2005142208A (ja) | 半導体装置製造用接着シート |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061106 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20081218 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090901 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091026 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20091124 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091203 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121211 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121211 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151211 Year of fee payment: 6 |
|
LAPS | Cancellation because of no payment of annual fees |