JP4902627B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP4902627B2 JP4902627B2 JP2008309498A JP2008309498A JP4902627B2 JP 4902627 B2 JP4902627 B2 JP 4902627B2 JP 2008309498 A JP2008309498 A JP 2008309498A JP 2008309498 A JP2008309498 A JP 2008309498A JP 4902627 B2 JP4902627 B2 JP 4902627B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/4501—Shape
- H01L2224/45012—Cross-sectional shape
- H01L2224/45015—Cross-sectional shape being circular
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
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- H01L2924/01079—Gold [Au]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
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- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18165—Exposing the passive side of the semiconductor or solid-state body of a wire bonded chip
Description
〔接着シートの作製〕
ビスフェノールA型エポキシ樹脂(ジャパンエポキシレジン社製「エビコート1002」)100重量部、アクリロニトリルブタジエン共重合体(日本ゼオン社製「ニッポール1072J」)35重量部、フェノール樹脂(荒川化学社製「P−180」)4重量部、イミダゾール(四国ファイン社製「C11Z」)2重量部を、メチルエチルケトン350重量部に溶解し、接着剤溶液を得た。これを厚さ100μmの片面粗化銅合金箔(ジャパンエナジー社製「BHY−13B−7025」)に塗布した後、150℃で3分間乾燥させることにより、厚さ15μmの接着剤層を形成した接着シートを得た。この接着シートにおける接着剤層の硬化前の100℃での弾性率は2.5×10-3Paであり、硬化後の200℃での弾性率は4.3MPaであり、銅箔に対する接着力は12N/20mmであった。なお、基材層として用いた銅箔の200℃での弾性率は130GPaであった。
まず、厚さ40μmの銅箔(「Olin7025」)の両面にドライフィルムレジスト(東京応化製「オーディルAR330」)をラミネートした。そして、そのドライフィルムレジストをフォトリソグラフィー法により導電部とは逆のパターンでパターニングした。次いで、パターニングされたドライフィルムレジストをマスクとして、銅箔の両面にニッケルめっきとAuめっきを順次施した後、ドライフィルムレジストを除去した。続いて、ニッケルめっき層とAuめっき層の積層物が部分的に配された銅箔を接着シートに接着剤層を介して貼り付けた。そして、この貼り付け状態で、Auめっき層をレジストとして銅箔をエッチングし導電部を独立させた。このエッチング加工に際して、銅箔の側面をもエッチングすることにより、銅箔の上下にAuとニッケルからなる張出部分を設けた。最後に、プレス加工により接着シートの外形を加工した。
試験用のアルミ蒸着シリコンチップ(6mm×6mm)を、前記接着シートの接着剤層面(図5(b)の71に相当)へ固着した。具体的には、175℃、0.3MPa、1秒間の条件で貼り付けた後、150℃で1時間、乾燥させて固着した。次いで、直径25μmの金ワイヤーを用いて、シリコンチップの電極と導電部との間をボンディングした。ワイヤーボンド数は1個のチップ当たり64点である。
装置:株式会社新川製「UTC−300BI SUPER」
超音波周波数:115KHz
超音波出力時間:15ミリ秒
超音波出力:120mW
ボンド荷重:1018N
サーチ荷重:1037N
装置:TOWA成形機
成形温度:175℃
時間:90秒
クランプ圧力:200KN
トランスファースピード:3mm/秒
トランスファー圧:5KN
基材層、接着剤層のいずれも
評価機器:レオメトリックス社製の粘弾性スペクトルメータ「ARES」
昇温速度:5℃/min
周波数:1HZ
測定モード:引張モード
幅20mm、長さ50mmの接着シートを、120℃×0.5MPa×0.5m/minの条件で、35μm銅箔(ジャパンエナジー製「C7025」)にラミネートした後、150℃の熱風オーブンにて1時間放置後、温度23℃、湿度65%RHの雰囲気条件で、引張り速度300mm/min、180°方向に35μm銅箔を引張り、その中心値を接着強度とした。
ワイヤーボンドのプル強度を、株式会社レスカ製のボンディングテスタ「PTR−30」を用い、測定モード:プルテスト、測定スピード:0.5mm/secで測定した。プル強度が0.04N以上の場合を成功、0.04Nより小さい場合を失敗とした。ワイヤーボンド成功率は、これらの測定結果から成功の割合を算出した値である。
実施例1において、金属箔として18μmの銅−ニッケル合金箔(ジャパンエナジー製「C7025」)を用いたこと以外は実施例1と同様にして半導体装置を製造した。ワイヤーボンドの成功率は100%であった。半導体装置の内部観察を行ったところ、ワイヤー変形やチップズレ等がなく、導電部と封止樹脂との接合強度の高い半導体装置が得られていたことを確認した。
11 電極
20 導電部
20a 張出部分
30 ワイヤー
40 封止樹脂
50 接着シート
51 基材層
52 接着剤層
60 金属箔
61 ドライフィルムレジスト
62 バリア層
63 貴金属めっき層
70 ブロック
71 半導体素子固着領域
Claims (2)
- 半導体素子の上側にある電極と複数の導電部の上側とがそれぞれワイヤーで電気的に接続され、半導体素子の電極が形成されていない下側と導電部のワイヤーに接続していない下側とが裏面に露出した状態で半導体素子とワイヤーと導電部とが封止樹脂で封止されてなるリードレス構造の半導体装置であって、導電部は上下に貴金属めっき層からなる張出部分を有した形状になっていることを特徴とする半導体装置。
- 導電部は金属箔で形成され、その側面は貴金属めっき層をマスクとしてエッチングされていることを特徴とする請求項1に記載の半導体装置。
Priority Applications (1)
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JP2008309498A JP4902627B2 (ja) | 2008-12-04 | 2008-12-04 | 半導体装置 |
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JP2008309498A JP4902627B2 (ja) | 2008-12-04 | 2008-12-04 | 半導体装置 |
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JP2003043680A Division JP4245370B2 (ja) | 2003-02-21 | 2003-02-21 | 半導体装置の製造方法 |
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JP2009049442A JP2009049442A (ja) | 2009-03-05 |
JP4902627B2 true JP4902627B2 (ja) | 2012-03-21 |
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JPH05129473A (ja) * | 1991-11-06 | 1993-05-25 | Sony Corp | 樹脂封止表面実装型半導体装置 |
JPH1012773A (ja) * | 1996-06-24 | 1998-01-16 | Matsushita Electron Corp | 樹脂封止型半導体装置およびその製造方法 |
JP3521758B2 (ja) * | 1997-10-28 | 2004-04-19 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
JP3992877B2 (ja) * | 1999-05-18 | 2007-10-17 | 大日本印刷株式会社 | 樹脂封止型半導体装置の製造方法 |
JP3691335B2 (ja) * | 2000-03-28 | 2005-09-07 | 三洋電機株式会社 | 回路装置の製造方法 |
JP3510839B2 (ja) * | 2000-03-28 | 2004-03-29 | 三洋電機株式会社 | 半導体装置およびその製造方法 |
JP2001217372A (ja) * | 2000-06-28 | 2001-08-10 | Sanyo Electric Co Ltd | 回路装置およびその製造方法 |
JP3634735B2 (ja) * | 2000-10-05 | 2005-03-30 | 三洋電機株式会社 | 半導体装置および半導体モジュール |
JP4159431B2 (ja) * | 2002-11-15 | 2008-10-01 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
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