JP2005322882A - 低温バリア金属層を用いた半導体素子の金属配線製造方法 - Google Patents
低温バリア金属層を用いた半導体素子の金属配線製造方法 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G65/00—Loading or unloading
- B65G65/30—Methods or devices for filling or emptying bunkers, hoppers, tanks, or like containers, of interest apart from their use in particular chemical or physical processes or their application in particular machines, e.g. not covered by a single other subclass
- B65G65/34—Emptying devices
- B65G65/40—Devices for emptying otherwise than from the top
- B65G65/48—Devices for emptying otherwise than from the top using other rotating means, e.g. rotating pressure sluices in pneumatic systems
- B65G65/4809—Devices for emptying otherwise than from the top using other rotating means, e.g. rotating pressure sluices in pneumatic systems rotating about a substantially vertical axis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B17/00—Recovery of plastics or other constituents of waste material containing plastics
- B29B17/04—Disintegrating plastics, e.g. by milling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
- H01L21/76846—Layer combinations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76853—Barrier, adhesion or liner layers characterized by particular after-treatment steps
- H01L21/76855—After-treatment introducing at least one additional element into the layer
- H01L21/76856—After-treatment introducing at least one additional element into the layer by treatment in plasmas or gaseous environments, e.g. nitriding a refractory metal liner
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76871—Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers
- H01L21/76876—Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers for deposition from the gas phase, e.g. CVD
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B17/00—Recovery of plastics or other constituents of waste material containing plastics
- B29B17/04—Disintegrating plastics, e.g. by milling
- B29B2017/0424—Specific disintegrating techniques; devices therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/62—Plastics recycling; Rubber recycling
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- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
バリア金属層の段差被覆性を確保しながら、低温工程が可能なバリア金属層を備えた半導体素子の金属配線製造方法を提供すること。
【解決手段】
半導体基板(51)上に層間絶縁膜(53)を形成する工程と、層間絶縁膜(53)の所定領域をエッチングして接触孔を形成する工程と、接触孔を含む全面にオーミック金属層(55)を形成する工程と、オーミック金属層(55)上にシード層(56)を形成する工程と、シード層(56)上に金属蒸着及び窒化処理を繰返し行いバリア金属層(57A)を形成する工程と、バリア金属層(57A)上に接触孔を埋め込む金属配線(58)を形成する工程とを含む。
【選択図】図5G
Description
最後に表面上に残留する微粒子状の金属残留物を除去するために湿式洗浄を実施する。
選択的タングステン蒸着法は、ブランケットタングステン蒸着法と異なり、純粋金属、金属シリサイド、及びN/P+シリコン等の接触孔内に露出している下部配線材料の異なる成長率を用いた選択的なプラグの形成方法である。これは特に、接着層を形成せずにビアホールにて配線接続される、少なくとも2層以上の配線形成の場合、ビアホールにて配線接続される下部金属層と、単結晶、多結晶シリコン及びビアホールの側壁に形成されるシリコン酸化膜等の絶縁層との蒸着特性の違いを用いている。
2WF6(g)+3Si(s)→2W(s)+3SiF4(g)
この際、第1アルミニウム層58Aが大気中に露出し、表面に自然酸化膜が形成されるため、アルゴンプラズマを用いた物理エッチングを施して自然酸化膜を除去した後(大気露出せずに進行する場合は、この過程を省略)、第2アルミニウム層58Bの蒸着及びリフロー処理を実施する。
51 シリコン基板
52 半導体要素
53 絶縁膜
54 接触孔
55 オーミック金属層
56 シード層
57 タングステン層
57A タングステン窒化層
58 アルミニウム配線
58A 第1アルミニウム層
58B 第2アルミニウム層
59 反射防止膜
60 銅層
61 銅層
Claims (14)
- 半導体基板上に層間絶縁膜を形成する工程と、
前記層間絶縁膜の所定領域をエッチングして接触孔を形成する工程と、
前記接触孔を含む全面にオーミック金属層を形成する工程と、
前記オーミック金属層上にシード層を形成する工程と、
前記シード層上に金属蒸着及び窒化処理を繰返し行いバリア金属層を形成する工程と、
前記バリア金属層上に前記接触孔を埋め込む金属配線を形成する工程と
を含むことを特徴とする半導体素子の金属配線製造方法。 - 前記バリア金属層を形成する工程が、
前記シード層上に前記シード層とのシリコン還元反応を用いた表面反応により金属層を蒸着により形成する工程と、
前記バリア金属層に変換するために前記金属層を窒化する工程と
を含むことを特徴とする請求項1に記載の半導体素子の金属配線製造方法。 - 前記金属層を窒化する工程が、
リモートプラズマを用いて前記金属層を前記バリア金属層に変換することを特徴とする請求項2に記載の半導体素子の金属配線製造方法。 - 前記金属層を窒化する工程が、
窒素を含む気体中で行われることを特徴とする請求項3に記載の半導体素子の金属配線製造方法。 - 前記金属層が、
タングステン層で形成されることを特徴とする請求項2に記載の半導体素子の金属配線製造方法。 - 前記金属層を蒸着により形成する工程が、
約200℃〜300℃の蒸着温度と約0.133〜133Pa(約1mTorr〜1Torr)の蒸着圧力下で行われることを特徴とする請求項2に記載の半導体素子の金属配線製造方法。 - 前記金属層が、
モリブデンまたはシード層の還元反応が起こる耐熱性金属で形成されることを特徴とする請求項2に記載の半導体素子の金属配線製造方法。 - 前記シード層が、
シリコン層または水素を含有するシリコン層で形成されることを特徴とする請求項1に記載の半導体素子の金属配線製造方法。 - 前記シード層が、
約400℃〜500℃の温度で基板を加熱しながらシリコン含有気体を供給して蒸着により形成されることを特徴とする請求項8に記載の半導体素子の金属配線製造方法。 - 前記シード層を形成する工程と前記バリア金属層を形成する工程とが、
反応源を一種類ずつ段階的に反応室に流入させ、又は、各々の反応源を流入させる間に不活性気体を所定時間流入させる工程を含むことを特徴とする請求項1に記載の半導体素子の金属配線製造方法。 - 前記金属配線を形成する工程が、
化学気相蒸着法及び原子層蒸着法にて第1アルミニウム層を形成する工程と、
物理気相蒸着法にて第2アルミニウム層を形成する工程と、
第1及び第2のアルミニウム層にリフロー処理を行う工程とを含むことを特徴とする請求項1に記載の半導体素子の金属配線製造方法。 - 前記第1アルミニウム層を形成する工程において、反応源としてDMAH(dimethylaluminum hydride)またはMPA(methyl pyrrolidine alane)が用いられることを特徴とする請求項11に記載の半導体素子の金属配線製造方法。
- 前記金属配線を形成する工程が、
前記接触孔を完全に埋没させるように化学気相蒸着アルミニウム層を形成する工程と、
前記アルミニウム層上に銅層を蒸着により形成する工程と、
前記アルミニウム層内に銅原子を注入する工程と
を含むことを特徴とする請求項1に記載の半導体素子の金属配線製造方法。 - 前記銅層を蒸着により形成する工程において、反応源としてCu(hfac)TMVSが用いられることを特徴とする請求項13に記載の半導体素子の金属配線製造方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020040032847A KR100688055B1 (ko) | 2004-05-10 | 2004-05-10 | 저온 장벽금속층을 이용한 금속배선 제조 방법 |
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JP2005322882A true JP2005322882A (ja) | 2005-11-17 |
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JP2004373127A Pending JP2005322882A (ja) | 2004-05-10 | 2004-12-24 | 低温バリア金属層を用いた半導体素子の金属配線製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7375024B2 (ja) |
JP (1) | JP2005322882A (ja) |
KR (1) | KR100688055B1 (ja) |
CN (1) | CN100431134C (ja) |
DE (1) | DE102004062472B4 (ja) |
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US7544606B2 (en) * | 2005-06-01 | 2009-06-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method to implement stress free polishing |
DE102006025405B4 (de) * | 2006-05-31 | 2018-03-29 | Globalfoundries Inc. | Verfahren zur Herstellung einer Metallisierungsschicht eines Halbleiterbauelements mit unterschiedlich dicken Metallleitungen |
KR100760920B1 (ko) * | 2006-07-25 | 2007-09-21 | 동부일렉트로닉스 주식회사 | 반도체 집적회로 소자에서 구리 배선을 형성하는 방법 |
TWI343620B (en) * | 2007-02-13 | 2011-06-11 | Nanya Technology Corp | Method of manufacturing a contact structure to avoid open issue |
US7737026B2 (en) * | 2007-03-29 | 2010-06-15 | International Business Machines Corporation | Structure and method for low resistance interconnections |
JP2011082235A (ja) * | 2009-10-05 | 2011-04-21 | Toshiba Corp | 半導体装置及びその製造方法 |
CN102437142A (zh) * | 2011-08-17 | 2012-05-02 | 上海华力微电子有限公司 | 一种降低通孔电阻的金属互联结构及其形成方法 |
DE102011085084B4 (de) | 2011-10-24 | 2022-01-13 | Robert Bosch Gmbh | Verfahren zum Herstellen einer elektrischen Durchkontaktierung in einem Substrat sowie Substrat mit einer elektrischen Durchkontaktierung |
CN103579090A (zh) * | 2012-08-10 | 2014-02-12 | 上海华虹Nec电子有限公司 | 肖特基通孔的制作工艺方法 |
CN103715171B (zh) * | 2013-12-24 | 2017-01-25 | 京东方科技集团股份有限公司 | 导电金属互联线及其制备方法 |
CN105097695B (zh) * | 2014-05-22 | 2018-08-21 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件及其制造方法、电子装置 |
CN105336670B (zh) * | 2014-07-14 | 2018-07-10 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
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2004
- 2004-05-10 KR KR1020040032847A patent/KR100688055B1/ko not_active IP Right Cessation
- 2004-12-20 DE DE102004062472A patent/DE102004062472B4/de not_active Expired - Fee Related
- 2004-12-22 US US11/029,758 patent/US7375024B2/en not_active Expired - Fee Related
- 2004-12-24 JP JP2004373127A patent/JP2005322882A/ja active Pending
- 2004-12-30 CN CNB2004101041772A patent/CN100431134C/zh not_active Expired - Fee Related
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JPH03255632A (ja) * | 1990-03-05 | 1991-11-14 | Fujitsu Ltd | 半導体装置及びその製造方法 |
JPH07297150A (ja) * | 1994-04-22 | 1995-11-10 | Nec Corp | 半導体装置の製造方法 |
JPH08298288A (ja) * | 1995-03-02 | 1996-11-12 | Kawasaki Steel Corp | 半導体装置の製造方法 |
JPH09129575A (ja) * | 1995-11-01 | 1997-05-16 | Hitachi Ltd | 半導体基板の製造方法及びその装置 |
JPH11217672A (ja) * | 1998-01-30 | 1999-08-10 | Sony Corp | 金属窒化物膜の化学的気相成長方法およびこれを用いた電子装置の製造方法 |
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DE102004062472A1 (de) | 2005-12-08 |
US7375024B2 (en) | 2008-05-20 |
CN1697156A (zh) | 2005-11-16 |
US20050250314A1 (en) | 2005-11-10 |
KR20050107966A (ko) | 2005-11-16 |
CN100431134C (zh) | 2008-11-05 |
DE102004062472B4 (de) | 2010-08-05 |
KR100688055B1 (ko) | 2007-02-28 |
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