JP2005284867A - 駆動制御装置及び方法及び露光装置 - Google Patents

駆動制御装置及び方法及び露光装置 Download PDF

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Publication number
JP2005284867A
JP2005284867A JP2004099730A JP2004099730A JP2005284867A JP 2005284867 A JP2005284867 A JP 2005284867A JP 2004099730 A JP2004099730 A JP 2004099730A JP 2004099730 A JP2004099730 A JP 2004099730A JP 2005284867 A JP2005284867 A JP 2005284867A
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JP
Japan
Prior art keywords
control
value
cycle
stage
drive control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004099730A
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English (en)
Japanese (ja)
Other versions
JP2005284867A5 (enExample
Inventor
Takayasu Matsui
貴靖 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004099730A priority Critical patent/JP2005284867A/ja
Priority to US11/092,658 priority patent/US7852033B2/en
Publication of JP2005284867A publication Critical patent/JP2005284867A/ja
Publication of JP2005284867A5 publication Critical patent/JP2005284867A5/ja
Pending legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52Details
    • G03B27/58Baseboards, masking frames, or other holders for the sensitive material
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • G03F7/70725Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP2004099730A 2004-03-30 2004-03-30 駆動制御装置及び方法及び露光装置 Pending JP2005284867A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004099730A JP2005284867A (ja) 2004-03-30 2004-03-30 駆動制御装置及び方法及び露光装置
US11/092,658 US7852033B2 (en) 2004-03-30 2005-03-30 Driving control apparatus and method, and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004099730A JP2005284867A (ja) 2004-03-30 2004-03-30 駆動制御装置及び方法及び露光装置

Publications (2)

Publication Number Publication Date
JP2005284867A true JP2005284867A (ja) 2005-10-13
JP2005284867A5 JP2005284867A5 (enExample) 2007-05-31

Family

ID=35053895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004099730A Pending JP2005284867A (ja) 2004-03-30 2004-03-30 駆動制御装置及び方法及び露光装置

Country Status (2)

Country Link
US (1) US7852033B2 (enExample)
JP (1) JP2005284867A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188405A (ja) * 2008-02-08 2009-08-20 Asml Netherlands Bv リソグラフィ装置およびキャリブレーション方法
JP2009237664A (ja) * 2008-03-26 2009-10-15 Taiheiyo Cement Corp 位置決め制御ユニット、位置決め制御方法および位置決め制御プログラム

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013089804A (ja) * 2011-10-19 2013-05-13 Renesas Electronics Corp 半導体装置のスクリーニング装置、半導体装置のスクリーニング方法及びプログラム

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6028889B2 (ja) 1982-02-12 1985-07-08 新日本製鐵株式会社 焼結用含褐鉄鉱石の事前処理方法
JPS58141341U (ja) 1982-03-17 1983-09-22 株式会社クボタ 刈取収穫機
JPS5936806A (ja) 1982-08-24 1984-02-29 Mitsuwa Seiki Co Ltd アクチユエ−タのデイジタル制御方法
JPS62260211A (ja) 1986-05-06 1987-11-12 Nec Corp 半導体装置の製造装置
JP2873748B2 (ja) 1991-06-04 1999-03-24 キヤノン株式会社 半導体製造装置
JP3555230B2 (ja) * 1994-05-18 2004-08-18 株式会社ニコン 投影露光装置
JP3428872B2 (ja) * 1997-08-29 2003-07-22 キヤノン株式会社 露光方法および装置
JP3312297B2 (ja) * 1999-07-02 2002-08-05 住友重機械工業株式会社 ステージ位置制御装置
JP2000306829A (ja) 2000-01-01 2000-11-02 Nikon Corp 投影露光装置、及び素子製造方法
JP2002033271A (ja) * 2000-05-12 2002-01-31 Nikon Corp 投影露光方法、それを用いたデバイス製造方法、及び投影露光装置
SG103303A1 (en) * 2000-07-07 2004-04-29 Nikon Corp Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
JP3762307B2 (ja) 2001-02-15 2006-04-05 キヤノン株式会社 レーザ干渉干渉計システムを含む露光装置
JP4046961B2 (ja) 2001-09-03 2008-02-13 キヤノン株式会社 位置検出方法、位置検出装置、露光装置及び露光方法
JP2003086492A (ja) * 2001-09-12 2003-03-20 Canon Inc 露光装置及びその制御方法並びにデバイスの製造方法
US6668202B2 (en) * 2001-11-21 2003-12-23 Sumitomo Heavy Industries, Ltd. Position control system and velocity control system for stage driving mechanism
JP3913079B2 (ja) 2002-02-28 2007-05-09 キヤノン株式会社 面位置検出装置及び方法並びに露光装置と該露光装置を用いたデバイスの製造方法
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188405A (ja) * 2008-02-08 2009-08-20 Asml Netherlands Bv リソグラフィ装置およびキャリブレーション方法
KR101031274B1 (ko) 2008-02-08 2011-04-29 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 조정 방법
US8248583B2 (en) 2008-02-08 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and calibration method
JP2009237664A (ja) * 2008-03-26 2009-10-15 Taiheiyo Cement Corp 位置決め制御ユニット、位置決め制御方法および位置決め制御プログラム

Also Published As

Publication number Publication date
US20050219500A1 (en) 2005-10-06
US7852033B2 (en) 2010-12-14

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