JP2005228779A - 半導体装置の製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000000758 substrate Substances 0.000 claims abstract description 149
- 238000000034 method Methods 0.000 claims abstract description 48
- 238000002955 isolation Methods 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 230000015572 biosynthetic process Effects 0.000 claims description 35
- 238000005530 etching Methods 0.000 claims description 23
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- 238000000137 annealing Methods 0.000 claims description 12
- 238000005468 ion implantation Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 3
- 230000003213 activating effect Effects 0.000 claims description 2
- 239000003870 refractory metal Substances 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 27
- 150000002500 ions Chemical class 0.000 abstract description 4
- 238000009413 insulation Methods 0.000 abstract 4
- 239000010410 layer Substances 0.000 description 73
- 239000012535 impurity Substances 0.000 description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 239000011229 interlayer Substances 0.000 description 12
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 229910021332 silicide Inorganic materials 0.000 description 7
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- 230000004913 activation Effects 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052785 arsenic Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000002513 implantation Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/66772—Monocristalline silicon transistors on insulating substrates, e.g. quartz substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
- H01L29/458—Ohmic electrodes on silicon for thin film silicon, e.g. source or drain electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78612—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device for preventing the kink- or the snapback effect, e.g. discharging the minority carriers of the channel region for preventing bipolar effect
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78645—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate
- H01L29/78648—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate arranged on opposing sides of the channel
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- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
【解決手段】第1半導体層からなる支持基板10、支持基板上に設けられた絶縁層20、及び絶縁層上に設けられた第2半導体層30を有する積層基板5の素子分離領域50aに含まれる、絶縁層及び第2半導体層をエッチングして、素子分離領域内に支持基板の露出面53を形成する。次に、支持基板の露出面側から、イオン注入を行って、支持基板に基板コンタクト領域12を形成する。その後、支持基板の露出面上に、素子分離絶縁層を形成し、残存第2半導体層上にゲート酸化膜及びゲート電極を形成する。さらに、残存第2半導体層にゲート電極をマスクとしてイオン注入を行って、ドレイン領域及びソース領域を形成した後、基板コンタクト領域、ドレイン領域、及びソース領域を活性化するアニールを行う。その後、ドレイン領域及びソース領域上に高融点の金属層を形成した後、熱処理を行って金属層をシリサイド化する。
【選択図】図1
Description
10、210 支持基板
12、212 基板コンタクト領域
20、220 絶縁層(埋め込み酸化膜)
22 残存絶縁層
30 第2半導体層
32 残存第2半導体層
33a ドレイン領域
33b ソース領域
33a´、33b´、51a 開口部
34、234 ゲート領域
36、236 ドレイン領域
38、238 ソース領域
40 エッチング用マスク
45 積層構造体
50a トレンチ領域
50b 素子形成領域
51 絶縁膜
52、252 素子分離絶縁層
53 露出面
62 シリコン酸化膜
64、264 ゲート酸化膜
72 多結晶シリコン層
74、274 ゲート電極
86、286 ドレイン電極
88、288 ソース電極
90、290 層間絶縁膜
92、292 基板コンタクトホール
96、296 ドレイン用コンタクトホール
98、298 ソース用コンタクトホール
102、302 基板コンタクト用プラグ
106、306 ドレインプラグ
108、308 ソースプラグ
112、312 基板配線
116、316 ドレイン配線
118、318 ソース配線
230 シリコン層
Claims (2)
- 第1半導体層からなる支持基板、該支持基板上に設けられた絶縁層、及び該絶縁層上に設けられた第2半導体層を有する積層基板を用意する工程と、
該積層基板に素子形成領域、及び該素子形成領域を囲む素子分離領域を設定して、該積層基板上に、該素子形成領域を覆い、及び該素子分離領域を露出するマスクを形成する工程と、
該素子分離領域に含まれる、前記絶縁層及び第2半導体層のそれぞれの領域を、前記マスクを用いてエッチングして、前記素子形成領域に残存絶縁層及び残存第2半導体層を含む積層構造体を形成するとともに、前記素子分離領域内に前記支持基板の露出面を形成する工程と、
該支持基板の露出面側から、前記マスクを用いてイオン注入を行って、該支持基板に基板コンタクト領域を形成する工程と、
前記支持基板の露出面上に、前記積層構造体を囲む素子分離絶縁層を形成する工程と、
前記マスクを除去した後、前記残存第2半導体層上にゲート酸化膜を介してゲート電極を形成する工程と、
前記残存第2半導体層に前記ゲート電極をマスクとしてイオン注入を行って、ドレイン領域及びソース領域を形成する工程と、
前記基板コンタクト領域、前記ドレイン領域、及び前記ソース領域を同時に活性化するアニールを行う工程と、
前記ドレイン領域及び前記ソース領域上に高融点の金属層を形成した後、熱処理を行って前記金属層をシリサイド化する工程と
を含むことを特徴とする半導体装置の製造方法。 - 前記第2半導体層をシリコンとし、前記積層基板をSOI基板とすることを特徴とする請求項1に記載の半導体装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004033106A JP2005228779A (ja) | 2004-02-10 | 2004-02-10 | 半導体装置の製造方法 |
US10/963,835 US7205190B2 (en) | 2004-02-10 | 2004-10-14 | Semiconductor device fabrication method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004033106A JP2005228779A (ja) | 2004-02-10 | 2004-02-10 | 半導体装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
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JP2005228779A true JP2005228779A (ja) | 2005-08-25 |
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Application Number | Title | Priority Date | Filing Date |
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JP2004033106A Pending JP2005228779A (ja) | 2004-02-10 | 2004-02-10 | 半導体装置の製造方法 |
Country Status (2)
Country | Link |
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US (1) | US7205190B2 (ja) |
JP (1) | JP2005228779A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007165568A (ja) * | 2005-12-14 | 2007-06-28 | Oki Electric Ind Co Ltd | 半導体装置の製造方法 |
JP2013507873A (ja) * | 2009-10-16 | 2013-03-04 | ファーフィクス リミテッド | スイッチングシステム及びスイッチング方法 |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2009523319A (ja) * | 2006-01-12 | 2009-06-18 | エヌエックスピー ビー ヴィ | 前面基板接点を有する絶縁体上半導体デバイスの製造方法 |
US7718503B2 (en) * | 2006-07-21 | 2010-05-18 | Globalfoundries Inc. | SOI device and method for its fabrication |
US7638376B2 (en) * | 2007-01-12 | 2009-12-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming SOI device |
US7675121B2 (en) * | 2007-10-08 | 2010-03-09 | International Business Machines Corporation | SOI substrate contact with extended silicide area |
US7977200B2 (en) | 2008-03-12 | 2011-07-12 | International Business Machines Corporation | Charge breakdown avoidance for MIM elements in SOI base technology and method |
US20100161424A1 (en) * | 2008-12-22 | 2010-06-24 | Nortel Networks Limited | Targeted advertising system and method |
US7999320B2 (en) * | 2008-12-23 | 2011-08-16 | International Business Machines Corporation | SOI radio frequency switch with enhanced signal fidelity and electrical isolation |
US8131225B2 (en) | 2008-12-23 | 2012-03-06 | International Business Machines Corporation | BIAS voltage generation circuit for an SOI radio frequency switch |
US8026131B2 (en) * | 2008-12-23 | 2011-09-27 | International Business Machines Corporation | SOI radio frequency switch for reducing high frequency harmonics |
US7843005B2 (en) * | 2009-02-11 | 2010-11-30 | International Business Machines Corporation | SOI radio frequency switch with reduced signal distortion |
US8963246B2 (en) * | 2010-03-09 | 2015-02-24 | Inter-University Research Institute Corporation High Energy Accelerator Research Organization | Semiconductor device and method for manufacturing semiconductor device |
JP6104512B2 (ja) * | 2011-04-01 | 2017-03-29 | ローム株式会社 | 温度検出装置 |
JP2012256649A (ja) * | 2011-06-07 | 2012-12-27 | Renesas Electronics Corp | 半導体装置、半導体ウエハ、及びこれらの製造方法 |
US20150129967A1 (en) | 2013-11-12 | 2015-05-14 | Stmicroelectronics International N.V. | Dual gate fd-soi transistor |
US9800204B2 (en) * | 2014-03-19 | 2017-10-24 | Stmicroelectronics International N.V. | Integrated circuit capacitor including dual gate silicon-on-insulator transistor |
JP6673806B2 (ja) * | 2016-11-15 | 2020-03-25 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
KR102324168B1 (ko) | 2017-06-21 | 2021-11-08 | 삼성전자주식회사 | 반도체 장치 및 그 제조 방법 |
CN112992854A (zh) | 2019-12-02 | 2021-06-18 | 联华电子股份有限公司 | 半导体装置以及其制作方法 |
Family Cites Families (11)
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JPH02210871A (ja) * | 1989-02-09 | 1990-08-22 | Fujitsu Ltd | 半導体装置 |
JPH08172174A (ja) | 1994-12-20 | 1996-07-02 | Sony Corp | 不揮発性半導体記憶装置とその製造方法 |
JPH08316348A (ja) | 1995-03-14 | 1996-11-29 | Toshiba Corp | 半導体装置およびその製造方法 |
JP2000243967A (ja) | 1999-02-22 | 2000-09-08 | Sony Corp | 半導体装置の製造方法 |
US6355511B1 (en) * | 2000-06-16 | 2002-03-12 | Advanced Micro Devices, Inc. | Method of providing a frontside contact to substrate of SOI device |
US6303414B1 (en) * | 2000-07-12 | 2001-10-16 | Chartered Semiconductor Manufacturing Ltd. | Method of forming PID protection diode for SOI wafer |
JP2002190521A (ja) | 2000-10-12 | 2002-07-05 | Oki Electric Ind Co Ltd | 半導体装置の製造方法 |
US6787422B2 (en) * | 2001-01-08 | 2004-09-07 | Chartered Semiconductor Manufacturing Ltd. | Method of body contact for SOI mosfet |
JP4304884B2 (ja) * | 2001-06-06 | 2009-07-29 | 日本電気株式会社 | 半導体装置及びその製造方法 |
US6844224B2 (en) * | 2001-11-15 | 2005-01-18 | Freescale Semiconductor, Inc. | Substrate contact in SOI and method therefor |
JP2003218356A (ja) | 2002-01-21 | 2003-07-31 | Sony Corp | Soi型半導体装置の製造方法、設計方法およびsoi型半導体装置 |
-
2004
- 2004-02-10 JP JP2004033106A patent/JP2005228779A/ja active Pending
- 2004-10-14 US US10/963,835 patent/US7205190B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007165568A (ja) * | 2005-12-14 | 2007-06-28 | Oki Electric Ind Co Ltd | 半導体装置の製造方法 |
JP2013507873A (ja) * | 2009-10-16 | 2013-03-04 | ファーフィクス リミテッド | スイッチングシステム及びスイッチング方法 |
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US20050176184A1 (en) | 2005-08-11 |
US7205190B2 (en) | 2007-04-17 |
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