JP2005150105A5 - - Google Patents

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Publication number
JP2005150105A5
JP2005150105A5 JP2004308397A JP2004308397A JP2005150105A5 JP 2005150105 A5 JP2005150105 A5 JP 2005150105A5 JP 2004308397 A JP2004308397 A JP 2004308397A JP 2004308397 A JP2004308397 A JP 2004308397A JP 2005150105 A5 JP2005150105 A5 JP 2005150105A5
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JP
Japan
Prior art keywords
layer
insulating layer
thin film
film transistor
conductive layer
Prior art date
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Granted
Application number
JP2004308397A
Other languages
English (en)
Japanese (ja)
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JP2005150105A (ja
JP4704006B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2004308397A priority Critical patent/JP4704006B2/ja
Priority claimed from JP2004308397A external-priority patent/JP4704006B2/ja
Publication of JP2005150105A publication Critical patent/JP2005150105A/ja
Publication of JP2005150105A5 publication Critical patent/JP2005150105A5/ja
Application granted granted Critical
Publication of JP4704006B2 publication Critical patent/JP4704006B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004308397A 2003-10-24 2004-10-22 表示装置及びその作製方法、並びに電子機器 Expired - Fee Related JP4704006B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004308397A JP4704006B2 (ja) 2003-10-24 2004-10-22 表示装置及びその作製方法、並びに電子機器

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003365229 2003-10-24
JP2003365229 2003-10-24
JP2004308397A JP4704006B2 (ja) 2003-10-24 2004-10-22 表示装置及びその作製方法、並びに電子機器

Publications (3)

Publication Number Publication Date
JP2005150105A JP2005150105A (ja) 2005-06-09
JP2005150105A5 true JP2005150105A5 (cg-RX-API-DMAC7.html) 2008-01-10
JP4704006B2 JP4704006B2 (ja) 2011-06-15

Family

ID=34703230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004308397A Expired - Fee Related JP4704006B2 (ja) 2003-10-24 2004-10-22 表示装置及びその作製方法、並びに電子機器

Country Status (1)

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JP (1) JP4704006B2 (cg-RX-API-DMAC7.html)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8278818B2 (en) 2004-06-04 2012-10-02 Samsung Mobile Display Co., Ltd. Electroluminescent display device and method of fabricating the same
EP1760776B1 (en) * 2005-08-31 2019-12-25 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for semiconductor device with flexible substrate
JP4754387B2 (ja) * 2006-03-31 2011-08-24 京セラ株式会社 Ｅｌ装置
KR101293562B1 (ko) 2006-06-21 2013-08-06 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
WO2008035556A1 (en) * 2006-09-19 2008-03-27 Sharp Kabushiki Kaisha Organic electroluminescent display and method for manufacturing the same
KR100833768B1 (ko) 2007-01-15 2008-05-29 삼성에스디아이 주식회사 유기 전계 발광 화소 장치 및 그 제조 방법
EP2352360B1 (en) 2008-10-06 2021-09-15 AGC Inc. Substrate for electronic device, electronic device using same and method for producing same
WO2010071089A1 (en) 2008-12-17 2010-06-24 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device and electronic device
JP5305267B2 (ja) * 2009-08-04 2013-10-02 株式会社ジャパンディスプレイ 有機ｅｌ装置
JP5735506B2 (ja) * 2010-06-29 2015-06-17 株式会社Joled 有機発光素子の製造方法
KR20120007305A (ko) * 2010-07-14 2012-01-20 삼성모바일디스플레이주식회사 유기 발광 표시 장치 및 그 제조 방법
US8592261B2 (en) * 2010-08-27 2013-11-26 Semiconductor Energy Laboratory Co., Ltd. Method for designing semiconductor device
JP2012255840A (ja) 2011-06-07 2012-12-27 Japan Display West Co Ltd 表示装置および電子機器
JP2014081421A (ja) * 2012-10-15 2014-05-08 Japan Display Inc 配線基板及び表示装置
TWI644434B (zh) * 2013-04-29 2018-12-11 日商半導體能源研究所股份有限公司 半導體裝置及其製造方法
KR102536780B1 (ko) * 2015-12-23 2023-05-24 엘지디스플레이 주식회사 박막 트랜지스터 기판과 그 제조방법 및 그를 이용한 디스플레이 장치
JP2019095646A (ja) * 2017-11-24 2019-06-20 株式会社ジャパンディスプレイ 表示装置、および表示装置の作製方法
KR102733083B1 (ko) * 2018-12-31 2024-11-22 엘지디스플레이 주식회사 유기 발광 표시 장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW364275B (en) * 1996-03-12 1999-07-11 Idemitsu Kosan Co Organic electroluminescent element and organic electroluminescent display device
JP3645642B2 (ja) * 1996-03-25 2005-05-11 Ｔｄｋ株式会社 有機エレクトロルミネセンス素子
JPH1167460A (ja) * 1997-08-12 1999-03-09 Tdk Corp 有機ｅｌ素子およびその製造方法
JPH11330239A (ja) * 1998-05-15 1999-11-30 Sanyo Electric Co Ltd 半導体装置及び半導体装置の製造方法
JP3691313B2 (ja) * 1998-12-01 2005-09-07 三洋電機株式会社 表示装置
JP2001176673A (ja) * 1999-12-14 2001-06-29 Tdk Corp 有機ｅｌ素子
JP4581187B2 (ja) * 2000-06-13 2010-11-17 ソニー株式会社 表示装置の製造方法
JP2002083689A (ja) * 2000-06-29 2002-03-22 Semiconductor Energy Lab Co Ltd 発光装置
JP4223218B2 (ja) * 2001-02-19 2009-02-12 株式会社半導体エネルギー研究所 発光装置
JP4785339B2 (ja) * 2003-10-24 2011-10-05 株式会社半導体エネルギー研究所 表示装置の作製方法

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