JP2004536210A5 - - Google Patents
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- Publication number
- JP2004536210A5 JP2004536210A5 JP2003517130A JP2003517130A JP2004536210A5 JP 2004536210 A5 JP2004536210 A5 JP 2004536210A5 JP 2003517130 A JP2003517130 A JP 2003517130A JP 2003517130 A JP2003517130 A JP 2003517130A JP 2004536210 A5 JP2004536210 A5 JP 2004536210A5
- Authority
- JP
- Japan
- Prior art keywords
- polysiloxane
- units
- aryl
- refractive index
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 polysiloxane Polymers 0.000 claims 22
- 229920001296 polysiloxane Polymers 0.000 claims 18
- 238000000034 method Methods 0.000 claims 13
- 125000003118 aryl group Chemical group 0.000 claims 11
- 239000005046 Chlorosilane Substances 0.000 claims 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical compound BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 7
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims 7
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 229910052794 bromium Inorganic materials 0.000 claims 4
- 229910052801 chlorine Inorganic materials 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 3
- 229910020489 SiO3 Inorganic materials 0.000 claims 3
- 239000000010 aprotic solvent Substances 0.000 claims 3
- 125000001309 chloro group Chemical group Cl* 0.000 claims 3
- 125000001188 haloalkyl group Chemical group 0.000 claims 3
- 229910052909 inorganic silicate Inorganic materials 0.000 claims 3
- 229910052740 iodine Inorganic materials 0.000 claims 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 239000002585 base Substances 0.000 claims 2
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 239000011630 iodine Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 239000004593 Epoxy Substances 0.000 claims 1
- 229910008051 Si-OH Chemical group 0.000 claims 1
- 229910006358 Si—OH Chemical group 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000004103 aminoalkyl group Chemical group 0.000 claims 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 150000001805 chlorine compounds Chemical class 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000001624 naphthyl group Chemical group 0.000 claims 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 125000001725 pyrenyl group Chemical group 0.000 claims 1
- 239000011877 solvent mixture Substances 0.000 claims 1
- 150000003512 tertiary amines Chemical class 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0118473.8A GB0118473D0 (en) | 2001-07-28 | 2001-07-28 | High refractive index polysiloxanes and their preparation |
| PCT/EP2002/008545 WO2003011944A2 (en) | 2001-07-28 | 2002-07-18 | High refractive index polysiloxanes and their preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004536210A JP2004536210A (ja) | 2004-12-02 |
| JP2004536210A5 true JP2004536210A5 (enExample) | 2005-12-22 |
Family
ID=9919401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003517130A Pending JP2004536210A (ja) | 2001-07-28 | 2002-07-18 | 高屈折率ポリシロキサン及びそれらの調製 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7429638B2 (enExample) |
| EP (1) | EP1417252B1 (enExample) |
| JP (1) | JP2004536210A (enExample) |
| KR (3) | KR20040030870A (enExample) |
| CN (2) | CN100547014C (enExample) |
| AU (1) | AU2002321283A1 (enExample) |
| CA (1) | CA2455331A1 (enExample) |
| GB (1) | GB0118473D0 (enExample) |
| WO (1) | WO2003011944A2 (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0118473D0 (en) | 2001-07-28 | 2001-09-19 | Dow Corning | High refractive index polysiloxanes and their preparation |
| JP5296297B2 (ja) * | 2005-04-04 | 2013-09-25 | 東レ・ファインケミカル株式会社 | 縮合多環式炭化水素基を有するシリコーン共重合体及びその製造方法 |
| DE602006003095D1 (de) * | 2005-05-26 | 2008-11-20 | Bahadur Maneesh | Zur formung kleiner formen |
| US20090146175A1 (en) * | 2006-01-17 | 2009-06-11 | Maneesh Bahadur | Thermal stable transparent silicone resin compositions and methods for their preparation and use |
| WO2007089340A1 (en) * | 2006-02-01 | 2007-08-09 | Dow Corning Corporation | Impact resistant optical waveguide and method of manufacture thereof |
| CN101389695B (zh) * | 2006-02-24 | 2012-07-04 | 陶氏康宁公司 | 用硅氧烷包封的发光器件和用于制备该硅氧烷的可固化的硅氧烷组合物 |
| WO2007120628A2 (en) * | 2006-04-11 | 2007-10-25 | Dow Corning Corporation | A composition including a siloxane and a method of forming the same |
| US20070272934A1 (en) * | 2006-05-23 | 2007-11-29 | Kee Yean Ng | LED device with improved life performance |
| US20070284687A1 (en) * | 2006-06-13 | 2007-12-13 | Rantala Juha T | Semiconductor optoelectronics devices |
| TWI473255B (zh) * | 2006-07-13 | 2015-02-11 | Silecs Oy | 半導體光電裝置 |
| JP5035770B2 (ja) * | 2007-02-16 | 2012-09-26 | 東レ・ファインケミカル株式会社 | 縮合多環式炭化水素基を有するシリコーン共重合体、及び、その製造方法 |
| KR101430261B1 (ko) * | 2007-02-23 | 2014-08-14 | 삼성전자주식회사 | 유기 실리콘 나노클러스터, 이의 제조방법, 이를 이용한박막형성 방법 |
| JP5318383B2 (ja) * | 2007-08-07 | 2013-10-16 | デクセリアルズ株式会社 | 光学部品封止材及び発光装置 |
| EP2422845B1 (en) | 2010-08-24 | 2013-04-24 | Polyphotonix Limited | Lightguide phototherapy apparatus |
| EP2422844A1 (en) | 2010-08-24 | 2012-02-29 | Polyphotonix Limited | Wearable phototherapy device |
| US8258636B1 (en) | 2011-05-17 | 2012-09-04 | Rohm And Haas Electronic Materials Llc | High refractive index curable liquid light emitting diode encapsulant formulation |
| US8257988B1 (en) | 2011-05-17 | 2012-09-04 | Rohm And Haas Electronic Materials Llc | Method of making light emitting diodes |
| US20140191161A1 (en) * | 2011-07-07 | 2014-07-10 | Masaaki Amako | Curable Silicon Composition, Cured Product Thereof, And Optical Semiconductor Device |
| EP2733160A4 (en) * | 2011-07-07 | 2014-12-17 | Dow Corning Toray Co Ltd | ORGANOPOLYSILOXAN AND MANUFACTURING METHOD THEREFOR |
| US8455607B2 (en) | 2011-08-17 | 2013-06-04 | Rohm And Haas Electronic Materials Llc | Curable liquid composite light emitting diode encapsulant |
| US8450445B2 (en) | 2011-08-17 | 2013-05-28 | Rohm And Haas Electronic Materials Llc | Light emitting diode manufacturing method |
| JP6022236B2 (ja) * | 2012-06-28 | 2016-11-09 | 東レ・ダウコーニング株式会社 | コーティング剤、電気・電子機器、および電気・電子機器の金属部の保護方法 |
| JP6176248B2 (ja) * | 2012-07-19 | 2017-08-09 | 東レ株式会社 | ポリシロキサン組成物、電子デバイスおよび光学デバイス |
| JP2014077117A (ja) * | 2012-09-21 | 2014-05-01 | Dow Corning Toray Co Ltd | 高屈折性表面処理剤、それを用いて表面処理された微細部材および光学材料 |
| TWI689533B (zh) * | 2014-03-28 | 2020-04-01 | 美商道康寧公司 | 包含與多氟聚醚矽烷反應的固化聚有機矽氧烷中間物之共聚物組成物及其相關形成方法 |
| JP7357505B2 (ja) | 2018-11-21 | 2023-10-06 | 信越化学工業株式会社 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むｅｕｖリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 |
| JP7368324B2 (ja) | 2019-07-23 | 2023-10-24 | 信越化学工業株式会社 | ケイ素含有レジスト下層膜形成用組成物及びパターン形成方法 |
| US11685702B2 (en) * | 2019-12-20 | 2023-06-27 | Jsi Silicone Co. | Method for producing arene compounds and arene compounds produced by the same |
| DE102020118247A1 (de) * | 2020-07-10 | 2022-01-13 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Precursor zur Herstellung eines Polysiloxans, Polysiloxan, Polysiloxanharz, Verfahren zur Herstellung eines Polysiloxans, Verfahren zur Herstellung eines Polysiloxanharzes und optoelektronisches Bauelement |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2528355A (en) * | 1949-09-14 | 1950-10-31 | Dow Corning | Halogenated xenyl trichlorosilanes |
| US5260469A (en) * | 1992-03-26 | 1993-11-09 | Ppg Industries, Inc. | Organo-siloxane with modified solubility |
| US5233007A (en) * | 1992-04-14 | 1993-08-03 | Allergan, Inc. | Polysiloxanes, methods of making same and high refractive index silicones made from same |
| EP0665740A1 (en) | 1992-10-22 | 1995-08-09 | The Procter & Gamble Company | Hair care compositions providing conditioning and enhanced shine |
| JPH0782378A (ja) | 1993-09-10 | 1995-03-28 | Nippon Telegr & Teleph Corp <Ntt> | シロキサン共重合体およびその合成方法 |
| US5384383A (en) * | 1994-01-31 | 1995-01-24 | Dow Corning Corporation | Pristine phenylpropylalkylsiloxanes |
| US5539137A (en) * | 1995-06-07 | 1996-07-23 | General Electic Company | Aryl substituted silicone fluids having high refractive indices and method for making |
| US6084050A (en) * | 1997-01-09 | 2000-07-04 | Nippon Telegraph And Telephone Corporation | Thermo-optic devices |
| DE69911529T2 (de) * | 1998-02-05 | 2004-08-05 | Nippon Sheet Glass Co., Ltd. | Gegenstand mit unebener oberfläche, verfahren zu dessen herstellung und zusammenstellung dafür |
| JPH11310755A (ja) | 1998-04-27 | 1999-11-09 | Seiko Epson Corp | コーティング用組成物及び積層体 |
| JP2000231001A (ja) | 1999-02-10 | 2000-08-22 | Konica Corp | 光学用レンズ |
| US6285513B1 (en) * | 1999-02-10 | 2001-09-04 | Konica Corporation | Optical element |
| JP4127599B2 (ja) | 2001-02-07 | 2008-07-30 | Ｔｄｋ株式会社 | 焼結体の製造方法及びこれにより製造される焼結体と磁歪材料 |
| GB0118473D0 (en) | 2001-07-28 | 2001-09-19 | Dow Corning | High refractive index polysiloxanes and their preparation |
-
2001
- 2001-07-28 GB GBGB0118473.8A patent/GB0118473D0/en not_active Ceased
-
2002
- 2002-07-18 AU AU2002321283A patent/AU2002321283A1/en not_active Abandoned
- 2002-07-18 KR KR10-2004-7001259A patent/KR20040030870A/ko not_active Ceased
- 2002-07-18 WO PCT/EP2002/008545 patent/WO2003011944A2/en not_active Ceased
- 2002-07-18 CN CNB028166167A patent/CN100547014C/zh not_active Expired - Fee Related
- 2002-07-18 KR KR1020097001646A patent/KR20090016019A/ko not_active Ceased
- 2002-07-18 EP EP02754964.1A patent/EP1417252B1/en not_active Expired - Lifetime
- 2002-07-18 CN CN2009101680340A patent/CN101633735B/zh not_active Expired - Fee Related
- 2002-07-18 CA CA002455331A patent/CA2455331A1/en not_active Abandoned
- 2002-07-18 KR KR1020107001483A patent/KR20100024506A/ko not_active Ceased
- 2002-07-18 JP JP2003517130A patent/JP2004536210A/ja active Pending
- 2002-07-18 US US10/486,375 patent/US7429638B2/en not_active Expired - Lifetime
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