JP2004524677A5 - - Google Patents

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Publication number
JP2004524677A5
JP2004524677A5 JP2002555446A JP2002555446A JP2004524677A5 JP 2004524677 A5 JP2004524677 A5 JP 2004524677A5 JP 2002555446 A JP2002555446 A JP 2002555446A JP 2002555446 A JP2002555446 A JP 2002555446A JP 2004524677 A5 JP2004524677 A5 JP 2004524677A5
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JP
Japan
Prior art keywords
electrode
reaction chamber
plasma
silicon
gas
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002555446A
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English (en)
Japanese (ja)
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JP2004524677A (ja
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Publication date
Priority claimed from US09/749,916 external-priority patent/US20020127853A1/en
Application filed filed Critical
Publication of JP2004524677A publication Critical patent/JP2004524677A/ja
Publication of JP2004524677A5 publication Critical patent/JP2004524677A5/ja
Pending legal-status Critical Current

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JP2002555446A 2000-12-29 2001-12-07 プラズマ処理用電極及びその製造方法並びにその使用 Pending JP2004524677A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/749,916 US20020127853A1 (en) 2000-12-29 2000-12-29 Electrode for plasma processes and method for manufacture and use thereof
PCT/US2001/044701 WO2002054444A1 (en) 2000-12-29 2001-12-07 Electrode for plasma processes and method for manufacture and use thereof

Publications (2)

Publication Number Publication Date
JP2004524677A JP2004524677A (ja) 2004-08-12
JP2004524677A5 true JP2004524677A5 (enExample) 2005-12-22

Family

ID=25015746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002555446A Pending JP2004524677A (ja) 2000-12-29 2001-12-07 プラズマ処理用電極及びその製造方法並びにその使用

Country Status (7)

Country Link
US (2) US20020127853A1 (enExample)
EP (1) EP1346394A1 (enExample)
JP (1) JP2004524677A (enExample)
KR (1) KR20030066770A (enExample)
CN (1) CN100466152C (enExample)
TW (1) TW548741B (enExample)
WO (1) WO2002054444A1 (enExample)

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