JP2004520710A - 半導体レーザにおける又は関係する改良 - Google Patents
半導体レーザにおける又は関係する改良 Download PDFInfo
- Publication number
- JP2004520710A JP2004520710A JP2002560247A JP2002560247A JP2004520710A JP 2004520710 A JP2004520710 A JP 2004520710A JP 2002560247 A JP2002560247 A JP 2002560247A JP 2002560247 A JP2002560247 A JP 2002560247A JP 2004520710 A JP2004520710 A JP 2004520710A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- laser device
- region
- layer
- ridge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
- H01S5/0651—Mode control
- H01S5/0653—Mode suppression, e.g. specific multimode
- H01S5/0655—Single transverse or lateral mode emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1025—Extended cavities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
- H01S5/164—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions comprising semiconductor material with a wider bandgap than the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/204—Strongly index guided structures
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0101641A GB2371405B (en) | 2001-01-23 | 2001-01-23 | Improvements in or relating to semiconductor lasers |
| PCT/GB2002/000290 WO2002060023A1 (en) | 2001-01-23 | 2002-01-23 | Improvements in or relating to semiconductor lasers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004520710A true JP2004520710A (ja) | 2004-07-08 |
| JP2004520710A5 JP2004520710A5 (enExample) | 2007-04-19 |
Family
ID=9907275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002560247A Pending JP2004520710A (ja) | 2001-01-23 | 2002-01-23 | 半導体レーザにおける又は関係する改良 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6717971B2 (enExample) |
| EP (1) | EP1356553B1 (enExample) |
| JP (1) | JP2004520710A (enExample) |
| CN (1) | CN1224147C (enExample) |
| AT (1) | ATE282901T1 (enExample) |
| DE (1) | DE60201974T2 (enExample) |
| ES (1) | ES2236499T3 (enExample) |
| GB (1) | GB2371405B (enExample) |
| WO (1) | WO2002060023A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009253097A (ja) * | 2008-04-08 | 2009-10-29 | Nippon Telegr & Teleph Corp <Ntt> | 半導体光集積素子 |
| JP2018098490A (ja) * | 2016-12-12 | 2018-06-21 | 聯亜光電工業股▲ふん▼有限公司LandMark Optoelectronics Corporation | 半導体レーザ装置 |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7173953B2 (en) * | 2001-11-06 | 2007-02-06 | Bookham Technology Plc | Anti-reflection coatings for semiconductor lasers |
| GB2387481B (en) * | 2002-04-10 | 2005-08-31 | Intense Photonics Ltd | Integrated active photonic device and photodetector |
| US6878959B2 (en) * | 2002-11-22 | 2005-04-12 | Agilent Technologies, Inc. | Group III-V semiconductor devices including semiconductor materials made by spatially-selective intermixing of atoms on the group V sublattice |
| US10048499B2 (en) | 2005-11-08 | 2018-08-14 | Lumus Ltd. | Polarizing optical system |
| JP2008198944A (ja) * | 2007-02-15 | 2008-08-28 | Fujitsu Ltd | 半導体光集積素子 |
| DE102007026925A1 (de) * | 2007-02-28 | 2008-09-04 | Osram Opto Semiconductors Gmbh | Integrierte Trapezlaseranordnung und Verfahren zu deren Herstellung |
| CN101105503B (zh) * | 2007-06-02 | 2010-10-27 | 中北大学 | 捷联式惯导测量组合中加速度计装配误差标量修正方法 |
| DE102008025922B4 (de) | 2008-05-30 | 2020-02-06 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaser mit Phasenstruktur |
| US8232114B2 (en) * | 2009-01-27 | 2012-07-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | RTP spike annealing for semiconductor substrate dopant activation |
| JP2012015266A (ja) * | 2010-06-30 | 2012-01-19 | Sony Corp | 半導体光増幅器 |
| ES2396109B1 (es) * | 2011-07-05 | 2013-12-27 | Abengoa Solar New Technologies, S.A. | Dispositivo para la transformación de energía solar concentrada. |
| ES2396103B1 (es) * | 2011-07-05 | 2014-01-30 | Abengoa Solar New Technologies, S.A. | Planta solar. |
| US8927306B2 (en) * | 2013-02-28 | 2015-01-06 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Etched-facet lasers having windows with single-layer optical coatings |
| US8988770B2 (en) * | 2013-03-14 | 2015-03-24 | Oracle International Corporation | Hybrid optical source with semiconductor reflector |
| CN104184045B (zh) * | 2014-08-22 | 2017-04-05 | 华中科技大学 | 一种定波长单纵模工作的脊波导分布反馈半导体激光器 |
| CN104201566B (zh) * | 2014-08-22 | 2017-12-29 | 华中科技大学 | 一种具有高单纵模成品率的脊波导分布反馈半导体激光器 |
| DE102015105438A1 (de) * | 2015-04-09 | 2016-10-13 | M2K-Laser Gmbh | Monolithische Diodenlaseranordnung |
| CA3007002C (en) | 2016-11-08 | 2023-02-07 | Lumus Ltd | Light-guide device with optical cutoff edge and corresponding production methods |
| FR3067866B1 (fr) * | 2017-06-19 | 2022-01-14 | Commissariat Energie Atomique | Composant laser semiconducteur hybride et procede de fabrication d'un tel composant |
| WO2019016813A1 (en) | 2017-07-19 | 2019-01-24 | Lumus Ltd. | LIQUID CRYSTAL LIGHTING ON SILICON VIA OPTICAL ELEMENT GUIDE OF LIGHT |
| CN113725725B (zh) * | 2017-09-28 | 2025-05-02 | 苹果公司 | 使用量子阱混合技术的激光架构 |
| US10551544B2 (en) | 2018-01-21 | 2020-02-04 | Lumus Ltd. | Light-guide optical element with multiple-axis internal aperture expansion |
| IL259518B2 (en) | 2018-05-22 | 2023-04-01 | Lumus Ltd | Optical system and method for improving light field uniformity |
| AU2019335612B2 (en) | 2018-09-09 | 2024-07-11 | Lumus Ltd. | Optical systems including light-guide optical elements with two-dimensional expansion |
| US12124050B2 (en) | 2019-02-28 | 2024-10-22 | Lumus Ltd. | Compact collimated image projector |
| WO2021117033A1 (en) | 2019-12-08 | 2021-06-17 | Lumus Ltd. | Optical systems with compact image projector |
| KR20230015318A (ko) * | 2020-04-03 | 2023-01-31 | 오토모티브 코우얼리션 포 트래픽 세이프티, 인크. | 광범위하게 튜닝 가능한 단일 모드 방출 반도체 레이저 |
| CN218848473U (zh) | 2020-05-12 | 2023-04-11 | 鲁姆斯有限公司 | 包括投影光学器件和光导管的设备 |
| CN115885215A (zh) | 2020-08-26 | 2023-03-31 | 鲁姆斯有限公司 | 使用白光作为源生成彩色图像 |
| DE202021104723U1 (de) | 2020-09-11 | 2021-10-18 | Lumus Ltd. | An ein optisches Lichtleiterelement gekoppelter Bildprojektor |
| US12204155B2 (en) | 2021-09-24 | 2025-01-21 | Apple Inc. | Chip-to-chip optical coupling for photonic integrated circuits |
| US12426139B1 (en) | 2022-06-27 | 2025-09-23 | Apple Inc. | Feedback control of a diode element |
| US12320983B1 (en) | 2022-08-18 | 2025-06-03 | Lumus Ltd. | Image projector with polarizing catadioptric collimator |
| CN119965680B (zh) * | 2024-12-26 | 2025-11-14 | 中山大学 | 一种半导体光放大器及其制备方法 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5624397B2 (enExample) * | 1972-07-21 | 1981-06-05 | ||
| JPS54115088A (en) | 1978-02-28 | 1979-09-07 | Nec Corp | Double hetero junction laser element of stripe type |
| US4511408A (en) | 1982-04-22 | 1985-04-16 | The Board Of Trustees Of The University Of Illinois | Semiconductor device fabrication with disordering elements introduced into active region |
| JPS586191A (ja) * | 1981-07-03 | 1983-01-13 | Hitachi Ltd | 半導体レ−ザ装置 |
| US4594603A (en) | 1982-04-22 | 1986-06-10 | Board Of Trustees Of The University Of Illinois | Semiconductor device with disordered active region |
| US4639275A (en) | 1982-04-22 | 1987-01-27 | The Board Of Trustees Of The University Of Illinois | Forming disordered layer by controlled diffusion in heterojunction III-V semiconductor |
| JPS58192394A (ja) * | 1982-05-07 | 1983-11-09 | Hitachi Ltd | 半導体レ−ザ装置 |
| JPS5944884A (ja) * | 1982-09-06 | 1984-03-13 | Nippon Telegr & Teleph Corp <Ntt> | 分布帰還形半導体接合レ−ザ |
| US4831630A (en) * | 1983-04-14 | 1989-05-16 | Xerox Corporation | Phased-locked window lasers |
| US4585491A (en) | 1983-09-02 | 1986-04-29 | Xerox Corporation | Wavelength tuning of quantum well lasers by thermal annealing |
| US4684653A (en) | 1985-03-08 | 1987-08-04 | The Trustees Of Princeton University | Pyrido(2,3-d)pyrimidine derivatives |
| US4727556A (en) | 1985-12-30 | 1988-02-23 | Xerox Corporation | Semiconductor lasers fabricated from impurity induced disordering |
| US4871690A (en) | 1986-01-21 | 1989-10-03 | Xerox Corporation | Semiconductor structures utilizing semiconductor support means selectively pretreated with migratory defects |
| DE3751548T2 (de) * | 1986-07-25 | 1996-04-11 | Mitsubishi Electric Corp | Halbleiterlaser. |
| GB2198603A (en) | 1986-12-05 | 1988-06-15 | Philips Electronic Associated | Divider circuit |
| JPH0648742B2 (ja) * | 1987-02-09 | 1994-06-22 | 日本電気株式会社 | 半導体レ−ザの製造方法 |
| US4857971A (en) | 1987-03-23 | 1989-08-15 | Xerox Corporation | (IV)x (III-V)1-x alloys formed in situ in III-V heterostructures |
| US4845725A (en) * | 1987-05-20 | 1989-07-04 | Spectra Diode Laboratories, Inc. | Window laser with high power reduced divergence output |
| US4764934A (en) * | 1987-07-27 | 1988-08-16 | Ortel Corporation | Superluminescent diode and single mode laser |
| US4875216A (en) * | 1987-11-30 | 1989-10-17 | Xerox Corporation | Buried waveguide window regions for improved performance semiconductor lasers and other opto-electronic applications |
| DE68926029T2 (de) * | 1988-12-21 | 1996-09-12 | Optical Measurement Technology | Optische Halbleitervorrichtung |
| JPH0448792A (ja) * | 1990-06-15 | 1992-02-18 | Anritsu Corp | 窓領域を有する半導体能動光素子 |
| JP3142333B2 (ja) * | 1991-12-17 | 2001-03-07 | 株式会社東芝 | 分布帰還型半導体レ−ザ及びその駆動方法 |
| US5384797A (en) | 1992-09-21 | 1995-01-24 | Sdl, Inc. | Monolithic multi-wavelength laser diode array |
| JPH09326504A (ja) * | 1996-06-06 | 1997-12-16 | Nippon Telegr & Teleph Corp <Ntt> | スーパールミネッセントダイオード |
| JPH10163563A (ja) * | 1996-11-29 | 1998-06-19 | Furukawa Electric Co Ltd:The | 半導体レーザ |
| FR2770938B1 (fr) * | 1997-11-10 | 1999-12-10 | Alsthom Cge Alcatel | Amplificateur optique semi-conducteur et source laser integree l'incorporant |
| US6052397A (en) * | 1997-12-05 | 2000-04-18 | Sdl, Inc. | Laser diode device having a substantially circular light output beam and a method of forming a tapered section in a semiconductor device to provide for a reproducible mode profile of the output beam |
| JPH11354880A (ja) * | 1998-06-03 | 1999-12-24 | Rohm Co Ltd | 半導体レーザ素子およびその製造方法 |
| GB0018576D0 (en) * | 2000-07-27 | 2000-09-13 | Univ Glasgow | Improved semiconductor laser |
-
2001
- 2001-01-23 GB GB0101641A patent/GB2371405B/en not_active Revoked
- 2001-02-20 US US09/788,891 patent/US6717971B2/en not_active Expired - Lifetime
-
2002
- 2002-01-23 ES ES02716151T patent/ES2236499T3/es not_active Expired - Lifetime
- 2002-01-23 DE DE60201974T patent/DE60201974T2/de not_active Expired - Lifetime
- 2002-01-23 AT AT02716151T patent/ATE282901T1/de not_active IP Right Cessation
- 2002-01-23 JP JP2002560247A patent/JP2004520710A/ja active Pending
- 2002-01-23 CN CNB028039653A patent/CN1224147C/zh not_active Expired - Lifetime
- 2002-01-23 EP EP02716151A patent/EP1356553B1/en not_active Expired - Lifetime
- 2002-01-23 WO PCT/GB2002/000290 patent/WO2002060023A1/en not_active Ceased
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009253097A (ja) * | 2008-04-08 | 2009-10-29 | Nippon Telegr & Teleph Corp <Ntt> | 半導体光集積素子 |
| JP2018098490A (ja) * | 2016-12-12 | 2018-06-21 | 聯亜光電工業股▲ふん▼有限公司LandMark Optoelectronics Corporation | 半導体レーザ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US6717971B2 (en) | 2004-04-06 |
| EP1356553A1 (en) | 2003-10-29 |
| DE60201974T2 (de) | 2005-12-15 |
| GB0101641D0 (en) | 2001-03-07 |
| EP1356553B1 (en) | 2004-11-17 |
| ES2236499T3 (es) | 2005-07-16 |
| CN1224147C (zh) | 2005-10-19 |
| DE60201974D1 (de) | 2004-12-23 |
| GB2371405B (en) | 2003-10-15 |
| CN1488183A (zh) | 2004-04-07 |
| GB2371405A (en) | 2002-07-24 |
| US20020097762A1 (en) | 2002-07-25 |
| ATE282901T1 (de) | 2004-12-15 |
| WO2002060023A1 (en) | 2002-08-01 |
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