JP2004520710A - 半導体レーザにおける又は関係する改良 - Google Patents

半導体レーザにおける又は関係する改良 Download PDF

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Publication number
JP2004520710A
JP2004520710A JP2002560247A JP2002560247A JP2004520710A JP 2004520710 A JP2004520710 A JP 2004520710A JP 2002560247 A JP2002560247 A JP 2002560247A JP 2002560247 A JP2002560247 A JP 2002560247A JP 2004520710 A JP2004520710 A JP 2004520710A
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Japan
Prior art keywords
semiconductor laser
laser device
region
layer
ridge
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Pending
Application number
JP2002560247A
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English (en)
Japanese (ja)
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JP2004520710A5 (enExample
Inventor
クレイグ, ジェームズ ハミルトン,
ジョン, ヘイグ マーシュ,
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University of Glasgow
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University of Glasgow
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Publication of JP2004520710A publication Critical patent/JP2004520710A/ja
Publication of JP2004520710A5 publication Critical patent/JP2004520710A5/ja
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0425Electrodes, e.g. characterised by the structure
    • H01S5/04256Electrodes, e.g. characterised by the structure characterised by the configuration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/065Mode locking; Mode suppression; Mode selection ; Self pulsating
    • H01S5/0651Mode control
    • H01S5/0653Mode suppression, e.g. specific multimode
    • H01S5/0655Single transverse or lateral mode emission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1025Extended cavities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • H01S5/164Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions comprising semiconductor material with a wider bandgap than the active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/204Strongly index guided structures

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Semiconductor Lasers (AREA)
JP2002560247A 2001-01-23 2002-01-23 半導体レーザにおける又は関係する改良 Pending JP2004520710A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0101641A GB2371405B (en) 2001-01-23 2001-01-23 Improvements in or relating to semiconductor lasers
PCT/GB2002/000290 WO2002060023A1 (en) 2001-01-23 2002-01-23 Improvements in or relating to semiconductor lasers

Publications (2)

Publication Number Publication Date
JP2004520710A true JP2004520710A (ja) 2004-07-08
JP2004520710A5 JP2004520710A5 (enExample) 2007-04-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002560247A Pending JP2004520710A (ja) 2001-01-23 2002-01-23 半導体レーザにおける又は関係する改良

Country Status (9)

Country Link
US (1) US6717971B2 (enExample)
EP (1) EP1356553B1 (enExample)
JP (1) JP2004520710A (enExample)
CN (1) CN1224147C (enExample)
AT (1) ATE282901T1 (enExample)
DE (1) DE60201974T2 (enExample)
ES (1) ES2236499T3 (enExample)
GB (1) GB2371405B (enExample)
WO (1) WO2002060023A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009253097A (ja) * 2008-04-08 2009-10-29 Nippon Telegr & Teleph Corp <Ntt> 半導体光集積素子
JP2018098490A (ja) * 2016-12-12 2018-06-21 聯亜光電工業股▲ふん▼有限公司LandMark Optoelectronics Corporation 半導体レーザ装置

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7173953B2 (en) * 2001-11-06 2007-02-06 Bookham Technology Plc Anti-reflection coatings for semiconductor lasers
GB2387481B (en) * 2002-04-10 2005-08-31 Intense Photonics Ltd Integrated active photonic device and photodetector
US6878959B2 (en) * 2002-11-22 2005-04-12 Agilent Technologies, Inc. Group III-V semiconductor devices including semiconductor materials made by spatially-selective intermixing of atoms on the group V sublattice
US10048499B2 (en) 2005-11-08 2018-08-14 Lumus Ltd. Polarizing optical system
JP2008198944A (ja) * 2007-02-15 2008-08-28 Fujitsu Ltd 半導体光集積素子
DE102007026925A1 (de) * 2007-02-28 2008-09-04 Osram Opto Semiconductors Gmbh Integrierte Trapezlaseranordnung und Verfahren zu deren Herstellung
CN101105503B (zh) * 2007-06-02 2010-10-27 中北大学 捷联式惯导测量组合中加速度计装配误差标量修正方法
DE102008025922B4 (de) 2008-05-30 2020-02-06 Osram Opto Semiconductors Gmbh Kantenemittierender Halbleiterlaser mit Phasenstruktur
US8232114B2 (en) * 2009-01-27 2012-07-31 Taiwan Semiconductor Manufacturing Co., Ltd. RTP spike annealing for semiconductor substrate dopant activation
JP2012015266A (ja) * 2010-06-30 2012-01-19 Sony Corp 半導体光増幅器
ES2396109B1 (es) * 2011-07-05 2013-12-27 Abengoa Solar New Technologies, S.A. Dispositivo para la transformación de energía solar concentrada.
ES2396103B1 (es) * 2011-07-05 2014-01-30 Abengoa Solar New Technologies, S.A. Planta solar.
US8927306B2 (en) * 2013-02-28 2015-01-06 Avago Technologies General Ip (Singapore) Pte. Ltd. Etched-facet lasers having windows with single-layer optical coatings
US8988770B2 (en) * 2013-03-14 2015-03-24 Oracle International Corporation Hybrid optical source with semiconductor reflector
CN104184045B (zh) * 2014-08-22 2017-04-05 华中科技大学 一种定波长单纵模工作的脊波导分布反馈半导体激光器
CN104201566B (zh) * 2014-08-22 2017-12-29 华中科技大学 一种具有高单纵模成品率的脊波导分布反馈半导体激光器
DE102015105438A1 (de) * 2015-04-09 2016-10-13 M2K-Laser Gmbh Monolithische Diodenlaseranordnung
CA3007002C (en) 2016-11-08 2023-02-07 Lumus Ltd Light-guide device with optical cutoff edge and corresponding production methods
FR3067866B1 (fr) * 2017-06-19 2022-01-14 Commissariat Energie Atomique Composant laser semiconducteur hybride et procede de fabrication d'un tel composant
WO2019016813A1 (en) 2017-07-19 2019-01-24 Lumus Ltd. LIQUID CRYSTAL LIGHTING ON SILICON VIA OPTICAL ELEMENT GUIDE OF LIGHT
CN113725725B (zh) * 2017-09-28 2025-05-02 苹果公司 使用量子阱混合技术的激光架构
US10551544B2 (en) 2018-01-21 2020-02-04 Lumus Ltd. Light-guide optical element with multiple-axis internal aperture expansion
IL259518B2 (en) 2018-05-22 2023-04-01 Lumus Ltd Optical system and method for improving light field uniformity
AU2019335612B2 (en) 2018-09-09 2024-07-11 Lumus Ltd. Optical systems including light-guide optical elements with two-dimensional expansion
US12124050B2 (en) 2019-02-28 2024-10-22 Lumus Ltd. Compact collimated image projector
WO2021117033A1 (en) 2019-12-08 2021-06-17 Lumus Ltd. Optical systems with compact image projector
KR20230015318A (ko) * 2020-04-03 2023-01-31 오토모티브 코우얼리션 포 트래픽 세이프티, 인크. 광범위하게 튜닝 가능한 단일 모드 방출 반도체 레이저
CN218848473U (zh) 2020-05-12 2023-04-11 鲁姆斯有限公司 包括投影光学器件和光导管的设备
CN115885215A (zh) 2020-08-26 2023-03-31 鲁姆斯有限公司 使用白光作为源生成彩色图像
DE202021104723U1 (de) 2020-09-11 2021-10-18 Lumus Ltd. An ein optisches Lichtleiterelement gekoppelter Bildprojektor
US12204155B2 (en) 2021-09-24 2025-01-21 Apple Inc. Chip-to-chip optical coupling for photonic integrated circuits
US12426139B1 (en) 2022-06-27 2025-09-23 Apple Inc. Feedback control of a diode element
US12320983B1 (en) 2022-08-18 2025-06-03 Lumus Ltd. Image projector with polarizing catadioptric collimator
CN119965680B (zh) * 2024-12-26 2025-11-14 中山大学 一种半导体光放大器及其制备方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5624397B2 (enExample) * 1972-07-21 1981-06-05
JPS54115088A (en) 1978-02-28 1979-09-07 Nec Corp Double hetero junction laser element of stripe type
US4511408A (en) 1982-04-22 1985-04-16 The Board Of Trustees Of The University Of Illinois Semiconductor device fabrication with disordering elements introduced into active region
JPS586191A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd 半導体レ−ザ装置
US4594603A (en) 1982-04-22 1986-06-10 Board Of Trustees Of The University Of Illinois Semiconductor device with disordered active region
US4639275A (en) 1982-04-22 1987-01-27 The Board Of Trustees Of The University Of Illinois Forming disordered layer by controlled diffusion in heterojunction III-V semiconductor
JPS58192394A (ja) * 1982-05-07 1983-11-09 Hitachi Ltd 半導体レ−ザ装置
JPS5944884A (ja) * 1982-09-06 1984-03-13 Nippon Telegr & Teleph Corp <Ntt> 分布帰還形半導体接合レ−ザ
US4831630A (en) * 1983-04-14 1989-05-16 Xerox Corporation Phased-locked window lasers
US4585491A (en) 1983-09-02 1986-04-29 Xerox Corporation Wavelength tuning of quantum well lasers by thermal annealing
US4684653A (en) 1985-03-08 1987-08-04 The Trustees Of Princeton University Pyrido(2,3-d)pyrimidine derivatives
US4727556A (en) 1985-12-30 1988-02-23 Xerox Corporation Semiconductor lasers fabricated from impurity induced disordering
US4871690A (en) 1986-01-21 1989-10-03 Xerox Corporation Semiconductor structures utilizing semiconductor support means selectively pretreated with migratory defects
DE3751548T2 (de) * 1986-07-25 1996-04-11 Mitsubishi Electric Corp Halbleiterlaser.
GB2198603A (en) 1986-12-05 1988-06-15 Philips Electronic Associated Divider circuit
JPH0648742B2 (ja) * 1987-02-09 1994-06-22 日本電気株式会社 半導体レ−ザの製造方法
US4857971A (en) 1987-03-23 1989-08-15 Xerox Corporation (IV)x (III-V)1-x alloys formed in situ in III-V heterostructures
US4845725A (en) * 1987-05-20 1989-07-04 Spectra Diode Laboratories, Inc. Window laser with high power reduced divergence output
US4764934A (en) * 1987-07-27 1988-08-16 Ortel Corporation Superluminescent diode and single mode laser
US4875216A (en) * 1987-11-30 1989-10-17 Xerox Corporation Buried waveguide window regions for improved performance semiconductor lasers and other opto-electronic applications
DE68926029T2 (de) * 1988-12-21 1996-09-12 Optical Measurement Technology Optische Halbleitervorrichtung
JPH0448792A (ja) * 1990-06-15 1992-02-18 Anritsu Corp 窓領域を有する半導体能動光素子
JP3142333B2 (ja) * 1991-12-17 2001-03-07 株式会社東芝 分布帰還型半導体レ−ザ及びその駆動方法
US5384797A (en) 1992-09-21 1995-01-24 Sdl, Inc. Monolithic multi-wavelength laser diode array
JPH09326504A (ja) * 1996-06-06 1997-12-16 Nippon Telegr & Teleph Corp <Ntt> スーパールミネッセントダイオード
JPH10163563A (ja) * 1996-11-29 1998-06-19 Furukawa Electric Co Ltd:The 半導体レーザ
FR2770938B1 (fr) * 1997-11-10 1999-12-10 Alsthom Cge Alcatel Amplificateur optique semi-conducteur et source laser integree l'incorporant
US6052397A (en) * 1997-12-05 2000-04-18 Sdl, Inc. Laser diode device having a substantially circular light output beam and a method of forming a tapered section in a semiconductor device to provide for a reproducible mode profile of the output beam
JPH11354880A (ja) * 1998-06-03 1999-12-24 Rohm Co Ltd 半導体レーザ素子およびその製造方法
GB0018576D0 (en) * 2000-07-27 2000-09-13 Univ Glasgow Improved semiconductor laser

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009253097A (ja) * 2008-04-08 2009-10-29 Nippon Telegr & Teleph Corp <Ntt> 半導体光集積素子
JP2018098490A (ja) * 2016-12-12 2018-06-21 聯亜光電工業股▲ふん▼有限公司LandMark Optoelectronics Corporation 半導体レーザ装置

Also Published As

Publication number Publication date
US6717971B2 (en) 2004-04-06
EP1356553A1 (en) 2003-10-29
DE60201974T2 (de) 2005-12-15
GB0101641D0 (en) 2001-03-07
EP1356553B1 (en) 2004-11-17
ES2236499T3 (es) 2005-07-16
CN1224147C (zh) 2005-10-19
DE60201974D1 (de) 2004-12-23
GB2371405B (en) 2003-10-15
CN1488183A (zh) 2004-04-07
GB2371405A (en) 2002-07-24
US20020097762A1 (en) 2002-07-25
ATE282901T1 (de) 2004-12-15
WO2002060023A1 (en) 2002-08-01

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