JP2004508717A5 - - Google Patents
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- Publication number
- JP2004508717A5 JP2004508717A5 JP2002524227A JP2002524227A JP2004508717A5 JP 2004508717 A5 JP2004508717 A5 JP 2004508717A5 JP 2002524227 A JP2002524227 A JP 2002524227A JP 2002524227 A JP2002524227 A JP 2002524227A JP 2004508717 A5 JP2004508717 A5 JP 2004508717A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- oxide layer
- gate
- polysilicon
- overlap region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 19
- 238000005468 ion implantation Methods 0.000 claims description 15
- 150000002500 ions Chemical class 0.000 claims description 11
- 239000002019 doping agent Substances 0.000 claims description 8
- 230000005684 electric field Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims 18
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 16
- 229920005591 polysilicon Polymers 0.000 claims 16
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 9
- 229910052731 fluorine Inorganic materials 0.000 claims 9
- 239000011737 fluorine Substances 0.000 claims 9
- 230000000295 complement effect Effects 0.000 claims 5
- 239000007943 implant Substances 0.000 claims 5
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- 239000000460 chlorine Substances 0.000 claims 2
- 230000005669 field effect Effects 0.000 claims 2
- 238000002513 implantation Methods 0.000 claims 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims 2
- 150000002739 metals Chemical class 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 229910021332 silicide Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 239000010937 tungsten Substances 0.000 claims 2
- 238000000137 annealing Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/648,044 US7247919B1 (en) | 2000-08-25 | 2000-08-25 | Method and device to reduce gate-induced drain leakage (GIDL) current in thin gate oxides MOSFETs |
| PCT/US2001/026342 WO2002019431A2 (en) | 2000-08-25 | 2001-08-23 | Method and device to reduce gate-induced drain leakage (gidl) current in thin gate oxide mosfets |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004508717A JP2004508717A (ja) | 2004-03-18 |
| JP2004508717A5 true JP2004508717A5 (https=) | 2005-04-21 |
Family
ID=24599198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002524227A Pending JP2004508717A (ja) | 2000-08-25 | 2001-08-23 | 薄いゲート酸化物ＭＯＳＦＥＴｓでのゲート誘起ドレイン漏洩（ＧＩＤＬ）電流を減らす方法およびデバイス |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US7247919B1 (https=) |
| EP (1) | EP1312110A2 (https=) |
| JP (1) | JP2004508717A (https=) |
| KR (1) | KR100563398B1 (https=) |
| AU (1) | AU2001286666A1 (https=) |
| SG (1) | SG140464A1 (https=) |
| WO (1) | WO2002019431A2 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4177192B2 (ja) * | 2003-08-05 | 2008-11-05 | 株式会社日立ハイテクノロジーズ | プラズマエッチング装置およびプラズマエッチング方法 |
| US6797555B1 (en) * | 2003-09-10 | 2004-09-28 | National Semiconductor Corporation | Direct implantation of fluorine into the channel region of a PMOS device |
| US7189292B2 (en) | 2003-10-31 | 2007-03-13 | International Business Machines Corporation | Self-encapsulated silver alloys for interconnects |
| US7245548B2 (en) * | 2004-07-27 | 2007-07-17 | Micron Technology, Inc. | Techniques for reducing leakage current in memory devices |
| US20060291114A1 (en) * | 2005-06-27 | 2006-12-28 | Teo Chee K | Electrostatic discharge protection circuit and method |
| US8154088B1 (en) | 2006-09-29 | 2012-04-10 | Cypress Semiconductor Corporation | Semiconductor topography and method for reducing gate induced drain leakage (GIDL) in MOS transistors |
| US20080286932A1 (en) * | 2007-05-17 | 2008-11-20 | Dongbu Hitek Co., Ltd. | Method of manufacturing semiconductor device |
| US20090090975A1 (en) * | 2007-10-09 | 2009-04-09 | Chartered Semiconductor Manufacturing Ltd. | Integrated circuit system employing fluorine doping |
| KR20120133652A (ko) * | 2011-05-31 | 2012-12-11 | 삼성전자주식회사 | 반도체 소자의 제조 방법 |
| CN102420228B (zh) * | 2011-06-17 | 2015-01-07 | 上海华力微电子有限公司 | 抑制gidl效应的后栅极工艺半导体器件及其制备方法 |
| US8896035B2 (en) | 2012-10-22 | 2014-11-25 | International Business Machines Corporation | Field effect transistor having phase transition material incorporated into one or more components for reduced leakage current |
| KR102065973B1 (ko) | 2013-07-12 | 2020-01-15 | 삼성전자 주식회사 | 반도체 장치 및 그 제조 방법 |
| US10734511B2 (en) | 2016-03-31 | 2020-08-04 | Intel Corporation | High mobility asymmetric field effect transistors with a band-offset semiconductor drain spacer |
| WO2018182570A1 (en) * | 2017-03-28 | 2018-10-04 | Intel IP Corporation | Assymetric transistor arrangements with smartly spaced drain regions |
| CN112864223A (zh) | 2019-11-28 | 2021-05-28 | 联华电子股份有限公司 | 半导体晶体管及其制作方法 |
| MX2023009557A (es) * | 2021-02-18 | 2023-08-22 | Moleaer Inc | Generador de nano burbujas. |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2652108B2 (ja) * | 1991-09-05 | 1997-09-10 | 三菱電機株式会社 | 電界効果トランジスタおよびその製造方法 |
| JPH0653492A (ja) * | 1992-07-29 | 1994-02-25 | Kawasaki Steel Corp | 半導体装置及びその製造方法 |
| US5382533A (en) * | 1993-06-18 | 1995-01-17 | Micron Semiconductor, Inc. | Method of manufacturing small geometry MOS field-effect transistors having improved barrier layer to hot electron injection |
| US5372957A (en) | 1993-07-22 | 1994-12-13 | Taiwan Semiconductor Manufacturing Company | Multiple tilted angle ion implantation MOSFET method |
| JP3297173B2 (ja) * | 1993-11-02 | 2002-07-02 | 三菱電機株式会社 | 半導体記憶装置およびその製造方法 |
| KR0136932B1 (ko) | 1994-07-30 | 1998-04-24 | 문정환 | 반도체 소자 및 그의 제조방법 |
| SG50741A1 (en) * | 1995-07-26 | 1998-07-20 | Chartered Semiconductor Mfg | Method for minimizing the hot carrier effect in m-mosfet devices |
| US5719425A (en) | 1996-01-31 | 1998-02-17 | Micron Technology, Inc. | Multiple implant lightly doped drain (MILDD) field effect transistor |
| JPH1079506A (ja) | 1996-02-07 | 1998-03-24 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
| US5672525A (en) | 1996-05-23 | 1997-09-30 | Chartered Semiconductor Manufacturing Pte Ltd. | Polysilicon gate reoxidation in a gas mixture of oxygen and nitrogen trifluoride gas by rapid thermal processing to improve hot carrier immunity |
| US5804496A (en) | 1997-01-08 | 1998-09-08 | Advanced Micro Devices | Semiconductor device having reduced overlap capacitance and method of manufacture thereof |
| US5840610A (en) * | 1997-01-16 | 1998-11-24 | Advanced Micro Devices, Inc. | Enhanced oxynitride gate dielectrics using NF3 gas |
| US5998274A (en) | 1997-04-10 | 1999-12-07 | Micron Technology, Inc. | Method of forming a multiple implant lightly doped drain (MILDD) field effect transistor |
| JPH1117174A (ja) | 1997-06-20 | 1999-01-22 | Sony Corp | Ｍｉｓ型トランジスタ素子のゲート電極及びその形成方法 |
| US5920782A (en) | 1997-07-18 | 1999-07-06 | United Microelectronics Corp. | Method for improving hot carrier degradation |
| JP2002509361A (ja) | 1997-12-18 | 2002-03-26 | マイクロン テクノロジー， インク． | 半導体製造方法及び電界効果トランジスタ |
| US6030875A (en) | 1997-12-19 | 2000-02-29 | Advanced Micro Devices, Inc. | Method for making semiconductor device having nitrogen-rich active region-channel interface |
| US6188101B1 (en) | 1998-01-14 | 2001-02-13 | Advanced Micro Devices, Inc. | Flash EPROM cell with reduced short channel effect and method for providing same |
| US6238998B1 (en) | 1998-11-20 | 2001-05-29 | International Business Machines Corporation | Shallow trench isolation on a silicon substrate using nitrogen implant into the side wall |
| JP3376305B2 (ja) | 1998-12-25 | 2003-02-10 | 株式会社東芝 | 半導体装置の製造方法 |
| US6242334B1 (en) | 1999-03-23 | 2001-06-05 | United Microelectronics Corp. | Multi-step spacer formation of semiconductor devices |
| US6297098B1 (en) | 1999-11-01 | 2001-10-02 | Taiwan Semiconductor Manufacturing Company | Tilt-angle ion implant to improve junction breakdown in flash memory application |
| US6352912B1 (en) | 2000-03-30 | 2002-03-05 | International Business Machines Corporation | Reduction of reverse short channel effects by deep implantation of neutral dopants |
| US6352885B1 (en) * | 2000-05-25 | 2002-03-05 | Advanced Micro Devices, Inc. | Transistor having a peripherally increased gate insulation thickness and a method of fabricating the same |
-
2000
- 2000-08-25 US US09/648,044 patent/US7247919B1/en not_active Expired - Lifetime
-
2001
- 2001-08-23 WO PCT/US2001/026342 patent/WO2002019431A2/en not_active Ceased
- 2001-08-23 EP EP01966127A patent/EP1312110A2/en not_active Ceased
- 2001-08-23 AU AU2001286666A patent/AU2001286666A1/en not_active Abandoned
- 2001-08-23 SG SG200501097-0A patent/SG140464A1/en unknown
- 2001-08-23 KR KR1020037002699A patent/KR100563398B1/ko not_active Expired - Lifetime
- 2001-08-23 JP JP2002524227A patent/JP2004508717A/ja active Pending
- 2001-12-27 US US10/034,778 patent/US6693012B2/en not_active Expired - Lifetime
-
2006
- 2006-07-31 US US11/496,288 patent/US20060263964A1/en not_active Abandoned
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