JP2004502859A - ポリイミドハイブリッド接着剤 - Google Patents
ポリイミドハイブリッド接着剤 Download PDFInfo
- Publication number
- JP2004502859A JP2004502859A JP2002509429A JP2002509429A JP2004502859A JP 2004502859 A JP2004502859 A JP 2004502859A JP 2002509429 A JP2002509429 A JP 2002509429A JP 2002509429 A JP2002509429 A JP 2002509429A JP 2004502859 A JP2004502859 A JP 2004502859A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy
- adhesive composition
- curing agent
- hybrid adhesive
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 83
- 239000004642 Polyimide Substances 0.000 title claims abstract description 82
- 239000000853 adhesive Substances 0.000 title claims abstract description 62
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 62
- 239000000203 mixture Substances 0.000 claims abstract description 81
- 239000004593 Epoxy Substances 0.000 claims abstract description 54
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 28
- 229920000647 polyepoxide Polymers 0.000 claims description 53
- 239000003822 epoxy resin Substances 0.000 claims description 52
- 238000000034 method Methods 0.000 claims description 25
- 150000008064 anhydrides Chemical group 0.000 claims description 17
- 238000002156 mixing Methods 0.000 claims description 17
- 239000003054 catalyst Substances 0.000 claims description 11
- 239000011941 photocatalyst Substances 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 229920001187 thermosetting polymer Polymers 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 230000004913 activation Effects 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- 239000011952 anionic catalyst Substances 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 229920004738 ULTEM® Polymers 0.000 description 34
- 229920005989 resin Polymers 0.000 description 27
- 239000011347 resin Substances 0.000 description 24
- 239000000463 material Substances 0.000 description 22
- 238000011160 research Methods 0.000 description 21
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000000376 reactant Substances 0.000 description 18
- -1 ether anhydride Chemical class 0.000 description 16
- 238000002360 preparation method Methods 0.000 description 15
- 239000011521 glass Substances 0.000 description 13
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 12
- 239000000126 substance Substances 0.000 description 10
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 239000000945 filler Substances 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 239000011151 fibre-reinforced plastic Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 229920006332 epoxy adhesive Polymers 0.000 description 4
- 239000012943 hotmelt Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 3
- 229940018563 3-aminophenol Drugs 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000008240 homogeneous mixture Substances 0.000 description 3
- 238000010128 melt processing Methods 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000010998 test method Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OLQWMCSSZKNOLQ-ZXZARUISSA-N (3s)-3-[(3r)-2,5-dioxooxolan-3-yl]oxolane-2,5-dione Chemical compound O=C1OC(=O)C[C@H]1[C@@H]1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-ZXZARUISSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- NJWZAJNQKJUEKC-UHFFFAOYSA-N 4-[4-[2-[4-[(1,3-dioxo-2-benzofuran-4-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C=1C=C(OC=2C=3C(=O)OC(=O)C=3C=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=CC2=C1C(=O)OC2=O NJWZAJNQKJUEKC-UHFFFAOYSA-N 0.000 description 2
- DGQOZCNCJKEVOA-UHFFFAOYSA-N 5-(2,5-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1CC(=O)OC1=O DGQOZCNCJKEVOA-UHFFFAOYSA-N 0.000 description 2
- MQAHXEQUBNDFGI-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C)(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)C)=C1 MQAHXEQUBNDFGI-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000013557 residual solvent Substances 0.000 description 2
- 238000007655 standard test method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- AWNXKZVIZARMME-UHFFFAOYSA-N 1-[[5-[2-[(2-chloropyridin-4-yl)amino]pyrimidin-4-yl]-4-(cyclopropylmethyl)pyrimidin-2-yl]amino]-2-methylpropan-2-ol Chemical compound N=1C(NCC(C)(O)C)=NC=C(C=2N=C(NC=3C=C(Cl)N=CC=3)N=CC=2)C=1CC1CC1 AWNXKZVIZARMME-UHFFFAOYSA-N 0.000 description 1
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- XGKKWUNSNDTGDS-UHFFFAOYSA-N 2,5-dimethylheptane-1,7-diamine Chemical compound NCC(C)CCC(C)CCN XGKKWUNSNDTGDS-UHFFFAOYSA-N 0.000 description 1
- YXOKJIRTNWHPFS-UHFFFAOYSA-N 2,5-dimethylhexane-1,6-diamine Chemical compound NCC(C)CCC(C)CN YXOKJIRTNWHPFS-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- QPIOXOJERGNNMX-UHFFFAOYSA-N 3-(3-aminopropylsulfanyl)propan-1-amine Chemical compound NCCCSCCCN QPIOXOJERGNNMX-UHFFFAOYSA-N 0.000 description 1
- XQGMTFGZVRBDPQ-UHFFFAOYSA-N 3-(4-propylphenoxy)phthalic acid Chemical compound C1=CC(CCC)=CC=C1OC1=CC=CC(C(O)=O)=C1C(O)=O XQGMTFGZVRBDPQ-UHFFFAOYSA-N 0.000 description 1
- HPIXFUTWHVJYBG-UHFFFAOYSA-N 3-[1-(3-aminopropoxy)ethoxy]propan-1-amine Chemical compound NCCCOC(C)OCCCN HPIXFUTWHVJYBG-UHFFFAOYSA-N 0.000 description 1
- FUJGQJMITCJTFA-UHFFFAOYSA-N 3-[3-(2,3-dicarboxyphenoxy)phenoxy]phthalic acid Chemical compound OC(=O)C1=CC=CC(OC=2C=C(OC=3C(=C(C(O)=O)C=CC=3)C(O)=O)C=CC=2)=C1C(O)=O FUJGQJMITCJTFA-UHFFFAOYSA-N 0.000 description 1
- KHDSXXRHWXXXBY-UHFFFAOYSA-N 3-[4-(2,3-dicarboxyphenoxy)phenoxy]phthalic acid Chemical compound OC(=O)C1=CC=CC(OC=2C=CC(OC=3C(=C(C(O)=O)C=CC=3)C(O)=O)=CC=2)=C1C(O)=O KHDSXXRHWXXXBY-UHFFFAOYSA-N 0.000 description 1
- WQYOBFRCLOZCRC-UHFFFAOYSA-N 3-[4-[4-(2,3-dicarboxyphenoxy)benzoyl]phenoxy]phthalic acid Chemical compound OC(=O)C1=CC=CC(OC=2C=CC(=CC=2)C(=O)C=2C=CC(OC=3C(=C(C(O)=O)C=CC=3)C(O)=O)=CC=2)=C1C(O)=O WQYOBFRCLOZCRC-UHFFFAOYSA-N 0.000 description 1
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 description 1
- YEEIWUUBRYZFEH-UHFFFAOYSA-N 3-methoxyhexane-1,6-diamine Chemical compound NCCC(OC)CCCN YEEIWUUBRYZFEH-UHFFFAOYSA-N 0.000 description 1
- SGEWZUYVXQESSB-UHFFFAOYSA-N 3-methylheptane-1,7-diamine Chemical compound NCCC(C)CCCCN SGEWZUYVXQESSB-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- JQGUWEUKOQRRJU-UHFFFAOYSA-N 4-(4-aminobutyl-methyl-trimethylsilyloxysilyl)butan-1-amine Chemical compound NCCCC[Si](C)(O[Si](C)(C)C)CCCCN JQGUWEUKOQRRJU-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- GQUSLIBGUTZKJZ-UHFFFAOYSA-N 4-[3-(3,4-dicarboxyphenoxy)phenoxy]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=CC(OC=2C=C(C(C(O)=O)=CC=2)C(O)=O)=C1 GQUSLIBGUTZKJZ-UHFFFAOYSA-N 0.000 description 1
- PEHWKKLPRVXJNU-UHFFFAOYSA-N 4-[4-benzoyl-1-(3,4-dicarboxyphenoxy)cyclohexa-2,4-dien-1-yl]oxyphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1(OC=2C=C(C(C(O)=O)=CC=2)C(O)=O)C=CC(C(=O)C=2C=CC=CC=2)=CC1 PEHWKKLPRVXJNU-UHFFFAOYSA-N 0.000 description 1
- BBTGUNMUUYNPLH-UHFFFAOYSA-N 5-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 BBTGUNMUUYNPLH-UHFFFAOYSA-N 0.000 description 1
- ZOXBWJMCXHTKNU-UHFFFAOYSA-N 5-methyl-2-benzofuran-1,3-dione Chemical compound CC1=CC=C2C(=O)OC(=O)C2=C1 ZOXBWJMCXHTKNU-UHFFFAOYSA-N 0.000 description 1
- MBRGOFWKNLPACT-UHFFFAOYSA-N 5-methylnonane-1,9-diamine Chemical compound NCCCCC(C)CCCCN MBRGOFWKNLPACT-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- OCROGAXNSVAYBT-UHFFFAOYSA-L C1(=CC=CC2=CC=CC=C12)[O-].[Co+2].C1(=CC=CC2=CC=CC=C12)[O-] Chemical compound C1(=CC=CC2=CC=CC=C12)[O-].[Co+2].C1(=CC=CC2=CC=CC=C12)[O-] OCROGAXNSVAYBT-UHFFFAOYSA-L 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- OQXSSPQKPIRZFQ-UHFFFAOYSA-N NCCC(CCCCN)C.NCCCC(CCCN)(C)C Chemical compound NCCC(CCCCN)C.NCCCC(CCCN)(C)C OQXSSPQKPIRZFQ-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- UTTHLMXOSUFZCQ-UHFFFAOYSA-N benzene-1,3-dicarbohydrazide Chemical compound NNC(=O)C1=CC=CC(C(=O)NN)=C1 UTTHLMXOSUFZCQ-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- CBLAIDIBZHTGLV-UHFFFAOYSA-N dodecane-2,11-diamine Chemical compound CC(N)CCCCCCCCC(C)N CBLAIDIBZHTGLV-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012764 mineral filler Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- VQXBKCWOCJSIRT-UHFFFAOYSA-N octadecane-1,12-diamine Chemical compound CCCCCCC(N)CCCCCCCCCCCN VQXBKCWOCJSIRT-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000012745 toughening agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/101—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/101—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents
- C08G73/1014—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents in the form of (mono)anhydrid
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J179/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
- C09J179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09J179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/611,450 US6294259B1 (en) | 2000-07-06 | 2000-07-06 | Polyimide hybrid adhesives |
| PCT/US2000/030829 WO2002004572A1 (en) | 2000-07-06 | 2000-11-10 | Polyimide hybrid adhesives |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004502859A true JP2004502859A (ja) | 2004-01-29 |
| JP2004502859A5 JP2004502859A5 (enExample) | 2007-12-13 |
Family
ID=24449066
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002509429A Withdrawn JP2004502859A (ja) | 2000-07-06 | 2000-11-10 | ポリイミドハイブリッド接着剤 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6294259B1 (enExample) |
| EP (1) | EP1303571B1 (enExample) |
| JP (1) | JP2004502859A (enExample) |
| KR (1) | KR100676331B1 (enExample) |
| AT (1) | ATE267858T1 (enExample) |
| AU (1) | AU2001217593A1 (enExample) |
| DE (1) | DE60011150T2 (enExample) |
| TW (1) | TWI288773B (enExample) |
| WO (1) | WO2002004572A1 (enExample) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005100433A1 (ja) * | 2004-04-19 | 2005-10-27 | Kaneka Corporation | 熱硬化性樹脂組成物、及びそれを用いてなる積層体、回路基板 |
| JP2006307091A (ja) * | 2005-04-28 | 2006-11-09 | Kaneka Corp | 活性エステル化合物およびその利用 |
| WO2018139559A1 (ja) * | 2017-01-27 | 2018-08-02 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、接着フィルム、カバーレイフィルム、フレキシブル銅張積層板、及び、回路基板 |
| WO2018221217A1 (ja) * | 2017-05-31 | 2018-12-06 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、接着フィルム、カバーレイフィルム、及び、プリント配線板 |
| JP2018203991A (ja) * | 2017-05-31 | 2018-12-27 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、及び、接着フィルム |
| JP2018203992A (ja) * | 2017-05-31 | 2018-12-27 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、接着フィルム、カバーレイフィルム、及び、プリント配線板 |
| JP2019056102A (ja) * | 2017-05-31 | 2019-04-11 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、及び、接着フィルム |
| CN109642027A (zh) * | 2017-01-27 | 2019-04-16 | 积水化学工业株式会社 | 固化性树脂组合物、固化物、粘接剂、粘接膜、覆盖层膜、柔性覆铜层叠板和电路基板 |
| WO2019188436A1 (ja) | 2018-03-28 | 2019-10-03 | 積水化学工業株式会社 | 硬化性樹脂組成物、接着剤、接着フィルム、回路基板、層間絶縁材料、及び、プリント配線板 |
| CN110691805A (zh) * | 2017-05-31 | 2020-01-14 | 积水化学工业株式会社 | 固化性树脂组合物、固化物、粘接剂、粘接膜、覆盖层膜和印制电路布线板 |
| CN111263782A (zh) * | 2017-10-27 | 2020-06-09 | 积水化学工业株式会社 | 固化性树脂组合物、固化物、粘接剂和粘接膜 |
| KR20200135761A (ko) * | 2018-03-20 | 2020-12-03 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 접착제, 접착 필름, 커버레이 필름 및 플렉시블 구리 피복 적층판 |
| CN114276654A (zh) * | 2021-11-24 | 2022-04-05 | 久耀电子科技(江苏)有限公司 | 一种树脂组合物、半固化片以及高cti覆铜板 |
| JPWO2022138407A1 (enExample) * | 2020-12-23 | 2022-06-30 | ||
| TWI770178B (zh) * | 2017-05-31 | 2022-07-11 | 日商積水化學工業股份有限公司 | 硬化性樹脂組成物、硬化物、接著劑、接著膜、覆蓋膜及印刷配線板 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004109403A1 (ja) * | 2003-06-02 | 2004-12-16 | Toray Industries, Inc. | 感光性樹脂組成物およびそれを用いた電子部品ならびに表示装置 |
| US7816487B2 (en) * | 2004-09-30 | 2010-10-19 | Intel Corporation | Die-attach films for chip-scale packaging, packages made therewith, and methods of assembling same |
| US20060116476A1 (en) * | 2004-12-01 | 2006-06-01 | 3M Innovative Properties Company | Hybrid thermosetting composition |
| US20060116492A1 (en) * | 2004-12-01 | 2006-06-01 | 3M Innovative Properties Company | Branched polymer |
| TWI416671B (zh) * | 2005-05-31 | 2013-11-21 | 住友電木股份有限公司 | A pre-coated encapsulated resin composition, a semiconductor device using the same, and a method for manufacturing the same |
| SG177608A1 (en) * | 2009-07-10 | 2012-02-28 | Toray Industries | Adhesive composition, adhesive sheet, circuit board and semiconductor device both produced using these, and processes for producing these |
| CN108865047A (zh) * | 2018-06-12 | 2018-11-23 | 山东科思姆特种材料技术开发有限公司 | 耐高温抗辐射胶黏剂及其制备方法 |
| CN115536816B (zh) * | 2022-10-28 | 2024-02-20 | 中国科学院兰州化学物理研究所 | 一种热固性环氧树脂形状记忆聚合物及其制备方法 |
Family Cites Families (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4217389A (en) | 1969-05-08 | 1980-08-12 | General Electric Company | Curable mixture of water soluble polyester and polyimide precursor, process of coating and products |
| FR2094607A5 (enExample) | 1970-06-26 | 1972-02-04 | Rhone Poulenc Sa | |
| US3989670A (en) | 1972-12-29 | 1976-11-02 | General Electric Company | Method for making polyetherimides |
| GB1422396A (en) | 1973-01-26 | 1976-01-28 | Ciba Geigy Ag | Film adhesives |
| US4073773A (en) | 1976-12-30 | 1978-02-14 | General Electric Company | Melt polymerization method for making polyetherimides |
| JPS5923330B2 (ja) | 1977-11-01 | 1984-06-01 | 三菱電機株式会社 | 耐熱性エポキシ樹脂組成物 |
| JPS5815948B2 (ja) | 1979-11-28 | 1983-03-28 | 日東電工株式会社 | 回路基板用絶縁材料 |
| FR2514772B1 (fr) | 1981-10-19 | 1985-09-06 | Inst Francais Du Petrole | Compositions reactives de polyimides thermostables presentant une solubilite elevee et leurs utilisations |
| US4416973A (en) | 1982-01-04 | 1983-11-22 | E. I. Du Pont De Nemours & Co. | Radiation-sensitive polyimide precursor composition derived from a diaryl fluoro compound |
| JPS58223149A (ja) | 1982-06-22 | 1983-12-24 | Toray Ind Inc | 感光性ポリイミド用現像液 |
| US4410664A (en) | 1982-09-20 | 1983-10-18 | Plastics Engineering Company | Polyimide-epoxy thermoset resins |
| US4443592A (en) | 1983-01-21 | 1984-04-17 | General Electric Company | Method for making polyetherimide |
| US4443591A (en) | 1983-01-21 | 1984-04-17 | General Electric Company | Method for making polyetherimide |
| US4604230A (en) | 1984-10-15 | 1986-08-05 | Stauffer Chemical Company | Thermally stable adhesive |
| US4585852A (en) | 1984-11-20 | 1986-04-29 | General Electric Company | Two-step process for producing polyetherimides |
| JPS61270852A (ja) | 1985-05-24 | 1986-12-01 | Nitto Electric Ind Co Ltd | 半導体装置 |
| US4769476A (en) | 1985-09-27 | 1988-09-06 | General Electric Company | Bis(dialkyl aromatic ether anhydride) and polymers obtained therefrom |
| US4611048A (en) | 1985-10-04 | 1986-09-09 | General Electric Company | Hydroxy terminated polyetherimide oligomers |
| US4996268A (en) | 1986-07-01 | 1991-02-26 | National Starch And Chemical Investment Holding Corporation | Carbinol-containing polyimide oligomers terminated with epoxide-reactive groups |
| US4820779A (en) | 1986-07-01 | 1989-04-11 | National Starch And Chemical Corporation | Adduct of a carbinol-containing polyimide oligomer terminated with epoxide-reactive groups and a polyepoxide |
| US4757150A (en) | 1986-07-31 | 1988-07-12 | General Electric Company | Polyetherimide bisphenol compositions |
| JPS6375034A (ja) | 1986-09-18 | 1988-04-05 | Agency Of Ind Science & Technol | 付加硬化型可溶性イミドオリゴマ及びそれを用いた繊維強化複合材料用中間素材 |
| US5028681A (en) | 1986-12-31 | 1991-07-02 | Peters Edward N | Novel poly(imide-siloxane) block copolymers and process for their preparation |
| US4835249A (en) | 1986-12-31 | 1989-05-30 | General Electric Company | Process for preparing polyimides |
| EP0309190A3 (en) | 1987-09-22 | 1990-10-17 | National Starch And Chemical Investment Holding Corporation | Polyimide coating compositions |
| JP2708191B2 (ja) | 1988-09-20 | 1998-02-04 | 株式会社日立製作所 | 半導体装置 |
| ES2069052T3 (es) | 1989-01-20 | 1995-05-01 | Ciba Geigy Ag | Mezclas reticulables de sustancias-resina epoxi que contienen un termoplastico con grupos terminales fenolicos. |
| JP2678934B2 (ja) | 1989-01-20 | 1997-11-19 | 宇部興産株式会社 | 熱硬化性樹脂組成物およびその硬化物 |
| EP0379467A3 (de) | 1989-01-20 | 1991-07-10 | Ciba-Geigy Ag | Hydroxylgruppen-endständige stickstoffhaltige Polymere |
| JP2643518B2 (ja) | 1989-02-10 | 1997-08-20 | 東レ株式会社 | プリプレグ |
| US5108825A (en) | 1989-12-21 | 1992-04-28 | General Electric Company | Epoxy/polyimide copolymer blend dielectric and layered circuits incorporating it |
| EP0441047B1 (en) | 1990-01-19 | 1996-06-05 | Minnesota Mining And Manufacturing Company | Thermosettable composition |
| US5135990A (en) | 1990-10-05 | 1992-08-04 | General Electric Company | Polyetherimide-liquid crystalline polymer blends |
| FR2674860B1 (fr) | 1991-04-04 | 1994-02-18 | Ciba Geigy | Solutions d'impregnation a base d'au moins un oligomere poly(imide-amide) thermoplastique reactif et d'un co-reactif, utilisables notamment pour la realisation d'articles intermediaires pre-impregnes. |
| US5252700A (en) | 1991-04-30 | 1993-10-12 | Mitsui Toatsu Chemicals, Inc. | Heat-resistant adhesive and method of adhesion by using adhesive |
| US5250228A (en) | 1991-11-06 | 1993-10-05 | Raychem Corporation | Conductive polymer composition |
| US5169911A (en) | 1992-02-18 | 1992-12-08 | General Electric Company | Heat curable blends of silicone polymide and epoxy resin |
| US5800575A (en) | 1992-04-06 | 1998-09-01 | Zycon Corporation | In situ method of forming a bypass capacitor element internally within a capacitive PCB |
| JPH0660230A (ja) | 1992-08-07 | 1994-03-04 | Omron Corp | 非接触パスゲートシステム |
| JP3288439B2 (ja) | 1992-08-19 | 2002-06-04 | 株式会社お茶の玉露園 | 粉茶の製造方法 |
| US5412065A (en) | 1993-04-09 | 1995-05-02 | Ciba-Geigy Corporation | Polyimide oligomers |
| US5606014A (en) | 1995-08-04 | 1997-02-25 | The United States Of America As Represented By The United States National Aeronautics And Space Administration | Imide oligomers and co-oligomers containing pendent phenylethynyl groups and polymers therefrom |
| GB9612523D0 (en) | 1996-06-14 | 1996-08-14 | Fiberite Inc | Improvements relating to resin compositions |
| US5883182A (en) | 1997-01-06 | 1999-03-16 | A Creative Research & Testing Co. | Coating compositions and coatings thereof |
-
2000
- 2000-07-06 US US09/611,450 patent/US6294259B1/en not_active Expired - Fee Related
- 2000-11-10 EP EP00980313A patent/EP1303571B1/en not_active Expired - Lifetime
- 2000-11-10 AU AU2001217593A patent/AU2001217593A1/en not_active Abandoned
- 2000-11-10 KR KR1020037000107A patent/KR100676331B1/ko not_active Expired - Fee Related
- 2000-11-10 DE DE60011150T patent/DE60011150T2/de not_active Expired - Fee Related
- 2000-11-10 AT AT00980313T patent/ATE267858T1/de not_active IP Right Cessation
- 2000-11-10 WO PCT/US2000/030829 patent/WO2002004572A1/en not_active Ceased
- 2000-11-10 JP JP2002509429A patent/JP2004502859A/ja not_active Withdrawn
-
2001
- 2001-06-26 TW TW090115459A patent/TWI288773B/zh not_active IP Right Cessation
Cited By (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005100433A1 (ja) * | 2004-04-19 | 2005-10-27 | Kaneka Corporation | 熱硬化性樹脂組成物、及びそれを用いてなる積層体、回路基板 |
| JP2006307091A (ja) * | 2005-04-28 | 2006-11-09 | Kaneka Corp | 活性エステル化合物およびその利用 |
| KR20190104130A (ko) * | 2017-01-27 | 2019-09-06 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 경화물, 접착제, 접착 필름, 커버레이 필름, 플렉시블 구리 피복 적층판, 및, 회로 기판 |
| WO2018139559A1 (ja) * | 2017-01-27 | 2018-08-02 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、接着フィルム、カバーレイフィルム、フレキシブル銅張積層板、及び、回路基板 |
| US11802177B2 (en) | 2017-01-27 | 2023-10-31 | Sekisui Chemical Co., Ltd. | Curable resin composition, adhesive, imide oligomer, imide oligomer composition, and curing agent |
| KR102501343B1 (ko) * | 2017-01-27 | 2023-02-17 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 경화물, 접착제, 접착 필름, 커버레이 필름, 플렉시블 구리 피복 적층판, 및, 회로 기판 |
| US11421107B2 (en) | 2017-01-27 | 2022-08-23 | Sekisui Chemical Co., Ltd. | Curable resin composition, cured product, adhesive, bonding film, coverlay film, flexible copper-clad laminate and circuit board |
| CN109642027A (zh) * | 2017-01-27 | 2019-04-16 | 积水化学工业株式会社 | 固化性树脂组合物、固化物、粘接剂、粘接膜、覆盖层膜、柔性覆铜层叠板和电路基板 |
| JP7207863B2 (ja) | 2017-05-31 | 2023-01-18 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、及び、接着フィルム |
| TWI770178B (zh) * | 2017-05-31 | 2022-07-11 | 日商積水化學工業股份有限公司 | 硬化性樹脂組成物、硬化物、接著劑、接著膜、覆蓋膜及印刷配線板 |
| CN110691805A (zh) * | 2017-05-31 | 2020-01-14 | 积水化学工业株式会社 | 固化性树脂组合物、固化物、粘接剂、粘接膜、覆盖层膜和印制电路布线板 |
| KR20200013649A (ko) | 2017-05-31 | 2020-02-07 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 경화물, 접착제, 접착 필름, 커버레이 필름, 및, 프린트 배선판 |
| JP2018203992A (ja) * | 2017-05-31 | 2018-12-27 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、接着フィルム、カバーレイフィルム、及び、プリント配線板 |
| JP7144182B2 (ja) | 2017-05-31 | 2022-09-29 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、及び、接着フィルム |
| JP2019056102A (ja) * | 2017-05-31 | 2019-04-11 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、及び、接着フィルム |
| KR102671097B1 (ko) * | 2017-05-31 | 2024-05-30 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 경화물, 접착제, 접착 필름, 커버레이 필름, 및, 프린트 배선판 |
| WO2018221217A1 (ja) * | 2017-05-31 | 2018-12-06 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、接着フィルム、カバーレイフィルム、及び、プリント配線板 |
| JP2018203991A (ja) * | 2017-05-31 | 2018-12-27 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、及び、接着フィルム |
| JP7211715B2 (ja) | 2017-05-31 | 2023-01-24 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、接着フィルム、カバーレイフィルム、及び、プリント配線板 |
| CN111263782A (zh) * | 2017-10-27 | 2020-06-09 | 积水化学工业株式会社 | 固化性树脂组合物、固化物、粘接剂和粘接膜 |
| KR102752119B1 (ko) * | 2018-03-20 | 2025-01-09 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 접착제, 접착 필름, 커버레이 필름 및 플렉시블 구리 피복 적층판 |
| KR20200135761A (ko) * | 2018-03-20 | 2020-12-03 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 접착제, 접착 필름, 커버레이 필름 및 플렉시블 구리 피복 적층판 |
| KR20200138165A (ko) | 2018-03-28 | 2020-12-09 | 세키스이가가쿠 고교가부시키가이샤 | 경화성 수지 조성물, 접착제, 접착 필름, 회로 기판, 층간 절연 재료, 및 프린트 배선판 |
| US12139576B2 (en) | 2018-03-28 | 2024-11-12 | Sekisui Chemical Co., Ltd. | Curable resin composition, adhesive agent, adhesive film, circuit substrate, interlayer insulating material, and printed wiring board |
| WO2019188436A1 (ja) | 2018-03-28 | 2019-10-03 | 積水化学工業株式会社 | 硬化性樹脂組成物、接着剤、接着フィルム、回路基板、層間絶縁材料、及び、プリント配線板 |
| WO2022138407A1 (ja) * | 2020-12-23 | 2022-06-30 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、接着剤、及び、接着フィルム |
| JPWO2022138407A1 (enExample) * | 2020-12-23 | 2022-06-30 | ||
| CN114276654B (zh) * | 2021-11-24 | 2023-10-17 | 久耀电子科技(江苏)有限公司 | 一种树脂组合物、半固化片以及高cti覆铜板 |
| CN114276654A (zh) * | 2021-11-24 | 2022-04-05 | 久耀电子科技(江苏)有限公司 | 一种树脂组合物、半固化片以及高cti覆铜板 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20040030387A (ko) | 2004-04-09 |
| EP1303571B1 (en) | 2004-05-26 |
| WO2002004572A1 (en) | 2002-01-17 |
| US6294259B1 (en) | 2001-09-25 |
| AU2001217593A1 (en) | 2002-01-21 |
| EP1303571A1 (en) | 2003-04-23 |
| KR100676331B1 (ko) | 2007-02-05 |
| TWI288773B (en) | 2007-10-21 |
| DE60011150D1 (de) | 2004-07-01 |
| DE60011150T2 (de) | 2005-06-16 |
| ATE267858T1 (de) | 2004-06-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6294259B1 (en) | Polyimide hybrid adhesives | |
| TWI822976B (zh) | 聚醯胺酸樹脂、聚醯亞胺樹脂及含有該等的樹脂組成物 | |
| TWI821171B (zh) | 硬化性樹脂組成物、接著劑、醯亞胺寡聚物、醯亞胺寡聚物組成物、及硬化劑 | |
| TWI876067B (zh) | 異氰酸酯改質聚醯亞胺樹脂、樹脂組成物及其硬化物 | |
| JP4535245B2 (ja) | 部分ブロックポリイミド−ポリシロキサン共重合体及びその製造方法並びに該共重合体を含む樹脂組成物 | |
| TWI823848B (zh) | 硬化性樹脂組成物、硬化物、接著劑、接著膜、覆蓋膜、可撓性覆銅積層板、及電路基板 | |
| JP4235808B2 (ja) | 接着剤組成物及び接着フィルム | |
| TWI797117B (zh) | 醯亞胺寡聚物、硬化劑、接著劑、及醯亞胺寡聚物之製造方法 | |
| JP3645604B2 (ja) | 樹脂組成物 | |
| JPS62270618A (ja) | エポキシ樹脂組成物 | |
| WO1998010009A1 (en) | Process for preparing polyimide-containing polyhydric phenol resin, epoxy resin composition comprising the same, and cured product thereof | |
| TWI805715B (zh) | 硬化性樹脂組成物、接著劑、接著膜、覆蓋膜、及可撓性覆銅積層板 | |
| JP2005120270A (ja) | 接着剤組成物及び接着フイルム | |
| JP2530530B2 (ja) | エポキシ樹脂組成物およびその製造方法 | |
| TWI573816B (zh) | 聚醯亞胺前驅物組成物及其應用 | |
| JPH0345626A (ja) | 付加型イミド樹脂プレポリマーの製造方法、プリプレグおよび積層板 | |
| JPS629250B2 (enExample) | ||
| JP2021155493A (ja) | 熱硬化性接着フィルム | |
| JPS61143436A (ja) | 耐熱性樹脂の製造方法 | |
| JPH0474368B2 (enExample) | ||
| JPH01165661A (ja) | 芳香族ポリアミドイミド系樹脂組成物 | |
| JPH0364356A (ja) | 芳香族ポリイミド樹脂組成物 | |
| JPH01158071A (ja) | ポリイミド系樹脂組成物 | |
| JPH0611862B2 (ja) | 芳香族ポリエーテルイミド樹脂組成物 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071024 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071024 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20080516 |