JP2004207711A5 - - Google Patents

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Publication number
JP2004207711A5
JP2004207711A5 JP2003412585A JP2003412585A JP2004207711A5 JP 2004207711 A5 JP2004207711 A5 JP 2004207711A5 JP 2003412585 A JP2003412585 A JP 2003412585A JP 2003412585 A JP2003412585 A JP 2003412585A JP 2004207711 A5 JP2004207711 A5 JP 2004207711A5
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Japan
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liquid
substrate
exposure
optical system
projection optical
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JP2003412585A
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Japanese (ja)
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JP4595320B2 (ja
JP2004207711A (ja
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Publication of JP2004207711A5 publication Critical patent/JP2004207711A5/ja
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JP2003412585A 2002-12-10 2003-12-10 露光装置、及びデバイス製造方法 Expired - Fee Related JP4595320B2 (ja)

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JP2003412585A JP4595320B2 (ja) 2002-12-10 2003-12-10 露光装置、及びデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002357931 2002-12-10
JP2003412585A JP4595320B2 (ja) 2002-12-10 2003-12-10 露光装置、及びデバイス製造方法

Related Child Applications (2)

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JP2009035502A Division JP4596076B2 (ja) 2002-12-10 2009-02-18 露光装置、露光方法、及びデバイス製造方法
JP2010075762A Division JP2010161409A (ja) 2002-12-10 2010-03-29 露光装置及び露光方法、デバイス製造方法

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JP2004207711A JP2004207711A (ja) 2004-07-22
JP2004207711A5 true JP2004207711A5 (https=) 2009-04-02
JP4595320B2 JP4595320B2 (ja) 2010-12-08

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JP3870207B2 (ja) 2004-08-05 2007-01-17 キヤノン株式会社 液浸露光装置及びデバイス製造方法
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US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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KR20070083492A (ko) * 2004-12-02 2007-08-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US7196770B2 (en) 2004-12-07 2007-03-27 Asml Netherlands B.V. Prewetting of substrate before immersion exposure
JP2006179759A (ja) * 2004-12-24 2006-07-06 Nikon Corp 光学素子及び投影露光装置
JP2006178327A (ja) * 2004-12-24 2006-07-06 Nikon Corp 光学素子及びその製造方法、並びに投影露光装置
JP4551758B2 (ja) * 2004-12-27 2010-09-29 株式会社東芝 液浸露光方法および半導体装置の製造方法
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JP5343958B2 (ja) * 2005-02-21 2013-11-13 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
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US8018573B2 (en) * 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US20070004182A1 (en) * 2005-06-30 2007-01-04 Taiwan Semiconductor Manufacturing Company, Ltd. Methods and system for inhibiting immersion lithography defect formation
JP2007012954A (ja) * 2005-07-01 2007-01-18 Canon Inc 露光装置
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208123B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9134622B2 (en) 2003-11-14 2015-09-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9134623B2 (en) 2003-11-14 2015-09-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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