JP2007235088A5 - - Google Patents
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- Publication number
- JP2007235088A5 JP2007235088A5 JP2006232979A JP2006232979A JP2007235088A5 JP 2007235088 A5 JP2007235088 A5 JP 2007235088A5 JP 2006232979 A JP2006232979 A JP 2006232979A JP 2006232979 A JP2006232979 A JP 2006232979A JP 2007235088 A5 JP2007235088 A5 JP 2007235088A5
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- film
- exposure apparatus
- liquid
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 44
- 239000010408 film Substances 0.000 claims 26
- 239000007788 liquid Substances 0.000 claims 20
- 239000005871 repellent Substances 0.000 claims 15
- 230000002940 repellent Effects 0.000 claims 13
- 239000000758 substrate Substances 0.000 claims 13
- 238000007654 immersion Methods 0.000 claims 7
- 239000002184 metal Substances 0.000 claims 6
- 229910052751 metal Inorganic materials 0.000 claims 6
- 238000000034 method Methods 0.000 claims 5
- 229910044991 metal oxide Inorganic materials 0.000 claims 4
- 150000004706 metal oxides Chemical class 0.000 claims 4
- -1 Ta 2 O 5 Inorganic materials 0.000 claims 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims 2
- 229910052804 chromium Inorganic materials 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 229910052759 nickel Inorganic materials 0.000 claims 2
- 229910052763 palladium Inorganic materials 0.000 claims 2
- 229910052697 platinum Inorganic materials 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 229910052709 silver Inorganic materials 0.000 claims 2
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006232979A JP4984747B2 (ja) | 2005-08-31 | 2006-08-30 | 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005250556 | 2005-08-31 | ||
| JP2005250556 | 2005-08-31 | ||
| JP2006026516 | 2006-02-03 | ||
| JP2006026516 | 2006-02-03 | ||
| JP2006232979A JP4984747B2 (ja) | 2005-08-31 | 2006-08-30 | 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007235088A JP2007235088A (ja) | 2007-09-13 |
| JP2007235088A5 true JP2007235088A5 (https=) | 2009-08-20 |
| JP4984747B2 JP4984747B2 (ja) | 2012-07-25 |
Family
ID=38555320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006232979A Expired - Fee Related JP4984747B2 (ja) | 2005-08-31 | 2006-08-30 | 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4984747B2 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2003392A (en) | 2008-09-17 | 2010-03-18 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
| NL2004497A (en) | 2009-05-01 | 2010-11-02 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
| GB2470049B (en) * | 2009-05-07 | 2011-03-23 | Zeiss Carl Smt Ag | Optical imaging with reduced immersion liquid evaporation effects |
| TW201113645A (en) | 2009-09-01 | 2011-04-16 | Asahi Glass Co Ltd | Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus |
| JP2013168571A (ja) * | 2012-02-16 | 2013-08-29 | Nikon Corp | 光学部材および液浸露光装置 |
| US9268231B2 (en) * | 2012-04-10 | 2016-02-23 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| DE102012112773B4 (de) * | 2012-12-20 | 2020-04-30 | Jenoptik Optical Systems Gmbh | Verfahren zur Herstellung einer wellenfrontkorrigierten optischen Anordnung aus mindestens zwei optischen Elementen und Verwendung des Verfahrens |
| JP2017083913A (ja) * | 2017-02-14 | 2017-05-18 | 株式会社ニコン | 液浸露光装置の部材およびその製造方法 |
| WO2019073718A1 (ja) * | 2017-10-13 | 2019-04-18 | 富士フイルム株式会社 | 透過フィルター及び液浸露光装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1646074A4 (en) * | 2003-07-09 | 2007-10-03 | Nikon Corp | EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS |
| EP2278402B1 (en) * | 2003-08-26 | 2013-03-06 | Nikon Corporation | Exposure apparatus |
| JP4513534B2 (ja) * | 2003-12-03 | 2010-07-28 | 株式会社ニコン | 露光装置及び露光方法、デバイス製造方法 |
| SG158922A1 (en) * | 2005-01-28 | 2010-02-26 | Nikon Corp | Projection optical system, exposure system, and exposure method |
| JP2007005571A (ja) * | 2005-06-24 | 2007-01-11 | Nikon Corp | 露光装置及びデバイス製造方法 |
| JP2007096254A (ja) * | 2005-08-31 | 2007-04-12 | Nikon Corp | 露光装置及びマイクロデバイスの製造方法 |
| KR101240775B1 (ko) * | 2006-09-12 | 2013-03-07 | 칼 짜이스 에스엠테 게엠베하 | 소수성 코팅을 갖는 액침 리소그래피용 광학 장치 및 이를 포함하는 투영 노광 장치 |
-
2006
- 2006-08-30 JP JP2006232979A patent/JP4984747B2/ja not_active Expired - Fee Related
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