JP4984747B2 - 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法 - Google Patents

光学素子、それを用いた露光装置及びマイクロデバイスの製造方法 Download PDF

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Publication number
JP4984747B2
JP4984747B2 JP2006232979A JP2006232979A JP4984747B2 JP 4984747 B2 JP4984747 B2 JP 4984747B2 JP 2006232979 A JP2006232979 A JP 2006232979A JP 2006232979 A JP2006232979 A JP 2006232979A JP 4984747 B2 JP4984747 B2 JP 4984747B2
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Prior art keywords
film
optical element
exposure apparatus
light
liquid
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Expired - Fee Related
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JP2006232979A
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Japanese (ja)
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JP2007235088A (ja
JP2007235088A5 (https=
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崇生 國分
隆一 星加
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Nikon Corp
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Nikon Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006232979A 2005-08-31 2006-08-30 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法 Expired - Fee Related JP4984747B2 (ja)

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JP2006232979A JP4984747B2 (ja) 2005-08-31 2006-08-30 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法

Applications Claiming Priority (5)

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JP2005250556 2005-08-31
JP2005250556 2005-08-31
JP2006026516 2006-02-03
JP2006026516 2006-02-03
JP2006232979A JP4984747B2 (ja) 2005-08-31 2006-08-30 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法

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JP2007235088A JP2007235088A (ja) 2007-09-13
JP2007235088A5 JP2007235088A5 (https=) 2009-08-20
JP4984747B2 true JP4984747B2 (ja) 2012-07-25

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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003392A (en) 2008-09-17 2010-03-18 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
NL2004497A (en) 2009-05-01 2010-11-02 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
GB2470049B (en) * 2009-05-07 2011-03-23 Zeiss Carl Smt Ag Optical imaging with reduced immersion liquid evaporation effects
TW201113645A (en) 2009-09-01 2011-04-16 Asahi Glass Co Ltd Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus
JP2013168571A (ja) * 2012-02-16 2013-08-29 Nikon Corp 光学部材および液浸露光装置
US9268231B2 (en) * 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
DE102012112773B4 (de) * 2012-12-20 2020-04-30 Jenoptik Optical Systems Gmbh Verfahren zur Herstellung einer wellenfrontkorrigierten optischen Anordnung aus mindestens zwei optischen Elementen und Verwendung des Verfahrens
JP2017083913A (ja) * 2017-02-14 2017-05-18 株式会社ニコン 液浸露光装置の部材およびその製造方法
WO2019073718A1 (ja) * 2017-10-13 2019-04-18 富士フイルム株式会社 透過フィルター及び液浸露光装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1646074A4 (en) * 2003-07-09 2007-10-03 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
EP2278402B1 (en) * 2003-08-26 2013-03-06 Nikon Corporation Exposure apparatus
JP4513534B2 (ja) * 2003-12-03 2010-07-28 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
SG158922A1 (en) * 2005-01-28 2010-02-26 Nikon Corp Projection optical system, exposure system, and exposure method
JP2007005571A (ja) * 2005-06-24 2007-01-11 Nikon Corp 露光装置及びデバイス製造方法
JP2007096254A (ja) * 2005-08-31 2007-04-12 Nikon Corp 露光装置及びマイクロデバイスの製造方法
KR101240775B1 (ko) * 2006-09-12 2013-03-07 칼 짜이스 에스엠테 게엠베하 소수성 코팅을 갖는 액침 리소그래피용 광학 장치 및 이를 포함하는 투영 노광 장치

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JP2007235088A (ja) 2007-09-13

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