JP2004363571A5 - - Google Patents
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- Publication number
- JP2004363571A5 JP2004363571A5 JP2004141240A JP2004141240A JP2004363571A5 JP 2004363571 A5 JP2004363571 A5 JP 2004363571A5 JP 2004141240 A JP2004141240 A JP 2004141240A JP 2004141240 A JP2004141240 A JP 2004141240A JP 2004363571 A5 JP2004363571 A5 JP 2004363571A5
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- JP
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- Prior art keywords
- mirror
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- mirror holding
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 claims 9
- 238000000034 method Methods 0.000 claims 6
- 230000005484 gravity Effects 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004141240A JP4590205B2 (ja) | 2003-05-14 | 2004-05-11 | ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003135931 | 2003-05-14 | ||
| JP2004141240A JP4590205B2 (ja) | 2003-05-14 | 2004-05-11 | ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004363571A JP2004363571A (ja) | 2004-12-24 |
| JP2004363571A5 true JP2004363571A5 (https=) | 2007-06-21 |
| JP4590205B2 JP4590205B2 (ja) | 2010-12-01 |
Family
ID=34067226
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004141240A Expired - Fee Related JP4590205B2 (ja) | 2003-05-14 | 2004-05-11 | ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4590205B2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006245374A (ja) * | 2005-03-04 | 2006-09-14 | Nikon Corp | Ｅｕｖ露光装置の調整方法 |
| JP5620638B2 (ja) * | 2005-07-19 | 2014-11-05 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学結像装置 |
| EP3264444A1 (en) * | 2006-03-10 | 2018-01-03 | Nikon Corporation | Projection optical system, exposure apparatus and method for manufacuring semiconductor device |
| JP5116726B2 (ja) * | 2009-06-01 | 2013-01-09 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP5634521B2 (ja) * | 2009-09-08 | 2014-12-03 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 表面外形（ｓｕｒｆａｃｅｆｉｇｕｒｅ）変形の少ない光学素子 |
| CN115629462B (zh) * | 2022-12-07 | 2023-03-17 | 山西汉威激光科技股份有限公司 | 一种半自动化镜片安装调节结构及其方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19807094A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation |
| JP2003218023A (ja) * | 2002-01-28 | 2003-07-31 | Nikon Corp | Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法 |
| US20030235682A1 (en) * | 2002-06-21 | 2003-12-25 | Sogard Michael R. | Method and device for controlling thermal distortion in elements of a lithography system |
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2004
- 2004-05-11 JP JP2004141240A patent/JP4590205B2/ja not_active Expired - Fee Related