JP2004086128A - 投影光学系、露光装置、およびデバイス製造方法 - Google Patents

投影光学系、露光装置、およびデバイス製造方法 Download PDF

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Publication number
JP2004086128A
JP2004086128A JP2003003869A JP2003003869A JP2004086128A JP 2004086128 A JP2004086128 A JP 2004086128A JP 2003003869 A JP2003003869 A JP 2003003869A JP 2003003869 A JP2003003869 A JP 2003003869A JP 2004086128 A JP2004086128 A JP 2004086128A
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JP
Japan
Prior art keywords
optical system
projection optical
lens
surface facing
lens group
Prior art date
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Pending
Application number
JP2003003869A
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English (en)
Japanese (ja)
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JP2004086128A5 (enExample
Inventor
Koji Shigematsu
重松　幸二
Yohei Fujishima
藤島　洋平
Yasuhiro Omura
大村　泰弘
Toshiro Ishiyama
石山　敏朗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2003003869A priority Critical patent/JP2004086128A/ja
Priority to TW092114235A priority patent/TWI308360B/zh
Priority to KR1020030044235A priority patent/KR100989606B1/ko
Priority to CNB03148266XA priority patent/CN1322373C/zh
Priority to US10/611,966 priority patent/US7154585B2/en
Priority to EP03014535A priority patent/EP1378780A3/en
Publication of JP2004086128A publication Critical patent/JP2004086128A/ja
Publication of JP2004086128A5 publication Critical patent/JP2004086128A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/146—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation with corrections for use in multiple wavelength bands, such as infrared and visible light, e.g. FLIR systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003003869A 2002-07-04 2003-01-10 投影光学系、露光装置、およびデバイス製造方法 Pending JP2004086128A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2003003869A JP2004086128A (ja) 2002-07-04 2003-01-10 投影光学系、露光装置、およびデバイス製造方法
TW092114235A TWI308360B (en) 2002-07-04 2003-05-27 Optical projection system, exposure device and method for making devices
KR1020030044235A KR100989606B1 (ko) 2002-07-04 2003-07-01 투영 광학계, 노광 장치 및 디바이스 제조 방법
CNB03148266XA CN1322373C (zh) 2002-07-04 2003-07-01 投影光学系统、曝光装置以及组件制造方法
US10/611,966 US7154585B2 (en) 2002-07-04 2003-07-03 Projection optical system, exposure apparatus, and device production method
EP03014535A EP1378780A3 (en) 2002-07-04 2003-07-04 Projection optical system, exposure apparatus, and device production method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002196212 2002-07-04
JP2003003869A JP2004086128A (ja) 2002-07-04 2003-01-10 投影光学系、露光装置、およびデバイス製造方法

Related Child Applications (1)

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JP2009022160A Division JP2009104184A (ja) 2002-07-04 2009-02-03 投影光学系、露光装置、およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2004086128A true JP2004086128A (ja) 2004-03-18
JP2004086128A5 JP2004086128A5 (enExample) 2008-02-28

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003003869A Pending JP2004086128A (ja) 2002-07-04 2003-01-10 投影光学系、露光装置、およびデバイス製造方法

Country Status (6)

Country Link
US (1) US7154585B2 (enExample)
EP (1) EP1378780A3 (enExample)
JP (1) JP2004086128A (enExample)
KR (1) KR100989606B1 (enExample)
CN (1) CN1322373C (enExample)
TW (1) TWI308360B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007513372A (ja) * 2003-12-02 2007-05-24 カール・ツァイス・エスエムティー・アーゲー 投影光学系
CN103499877A (zh) * 2013-10-10 2014-01-08 中国科学院光电技术研究所 一种大数值孔径的投影光学系统

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2014085569A (ja) * 2012-10-25 2014-05-12 Canon Inc 照明光学系および投射型表示装置
KR20200134214A (ko) 2018-03-26 2020-12-01 소니 주식회사 촬상 광학계 및 촬상 장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07220988A (ja) * 1994-01-27 1995-08-18 Canon Inc 投影露光方法及び装置及びこれを用いたデバイス製造方法
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH11352012A (ja) 1998-06-11 1999-12-24 Nikon Corp 光学系の検査方法、光学系の製造方法及び露光装置の製造方法
JP2000075493A (ja) 1998-08-28 2000-03-14 Nikon Corp 露光装置及びその調整方法
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
JP2000206410A (ja) 1999-01-12 2000-07-28 Nikon Corp 投影光学系、投影露光装置、及び投影露光方法
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP4296701B2 (ja) * 2000-10-11 2009-07-15 株式会社ニコン 投影光学系，該投影光学系を備えた露光装置，及び該露光装置を用いたデバイスの製造方法
US6449101B1 (en) * 2000-11-08 2002-09-10 Acer Communications And Multimedia Inc. Projection zoom lens with a long back focal length and exit pupil position
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002365538A (ja) 2001-06-13 2002-12-18 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007513372A (ja) * 2003-12-02 2007-05-24 カール・ツァイス・エスエムティー・アーゲー 投影光学系
CN103499877A (zh) * 2013-10-10 2014-01-08 中国科学院光电技术研究所 一种大数值孔径的投影光学系统

Also Published As

Publication number Publication date
TW200401337A (en) 2004-01-16
KR100989606B1 (ko) 2010-10-26
CN1322373C (zh) 2007-06-20
TWI308360B (en) 2009-04-01
US20040009415A1 (en) 2004-01-15
EP1378780A3 (en) 2004-09-01
CN1493924A (zh) 2004-05-05
EP1378780A2 (en) 2004-01-07
US7154585B2 (en) 2006-12-26
KR20040004115A (ko) 2004-01-13

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