KR100989606B1 - 투영 광학계, 노광 장치 및 디바이스 제조 방법 - Google Patents

투영 광학계, 노광 장치 및 디바이스 제조 방법 Download PDF

Info

Publication number
KR100989606B1
KR100989606B1 KR1020030044235A KR20030044235A KR100989606B1 KR 100989606 B1 KR100989606 B1 KR 100989606B1 KR 1020030044235 A KR1020030044235 A KR 1020030044235A KR 20030044235 A KR20030044235 A KR 20030044235A KR 100989606 B1 KR100989606 B1 KR 100989606B1
Authority
KR
South Korea
Prior art keywords
optical system
projection optical
lens group
lens
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020030044235A
Other languages
English (en)
Korean (ko)
Other versions
KR20040004115A (ko
Inventor
시게마츠코지
후지시마유헤이
오무라야스히로
이시야마도시로
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20040004115A publication Critical patent/KR20040004115A/ko
Application granted granted Critical
Publication of KR100989606B1 publication Critical patent/KR100989606B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/146—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation with corrections for use in multiple wavelength bands, such as infrared and visible light, e.g. FLIR systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020030044235A 2002-07-04 2003-07-01 투영 광학계, 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR100989606B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2002-00196212 2002-07-04
JP2002196212 2002-07-04
JPJP-P-2003-00003869 2003-01-10
JP2003003869A JP2004086128A (ja) 2002-07-04 2003-01-10 投影光学系、露光装置、およびデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20040004115A KR20040004115A (ko) 2004-01-13
KR100989606B1 true KR100989606B1 (ko) 2010-10-26

Family

ID=29720925

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030044235A Expired - Fee Related KR100989606B1 (ko) 2002-07-04 2003-07-01 투영 광학계, 노광 장치 및 디바이스 제조 방법

Country Status (6)

Country Link
US (1) US7154585B2 (enExample)
EP (1) EP1378780A3 (enExample)
JP (1) JP2004086128A (enExample)
KR (1) KR100989606B1 (enExample)
CN (1) CN1322373C (enExample)
TW (1) TWI308360B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
EP1690139B1 (en) * 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2014085569A (ja) * 2012-10-25 2014-05-12 Canon Inc 照明光学系および投射型表示装置
CN103499877B (zh) * 2013-10-10 2016-04-27 中国科学院光电技术研究所 一种大数值孔径的投影光学系统
KR20200134214A (ko) 2018-03-26 2020-12-01 소니 주식회사 촬상 광학계 및 촬상 장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000206410A (ja) 1999-01-12 2000-07-28 Nikon Corp 投影光学系、投影露光装置、及び投影露光方法
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP2002365538A (ja) 2001-06-13 2002-12-18 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07220988A (ja) * 1994-01-27 1995-08-18 Canon Inc 投影露光方法及び装置及びこれを用いたデバイス製造方法
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH11352012A (ja) 1998-06-11 1999-12-24 Nikon Corp 光学系の検査方法、光学系の製造方法及び露光装置の製造方法
JP2000075493A (ja) 1998-08-28 2000-03-14 Nikon Corp 露光装置及びその調整方法
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
JP4296701B2 (ja) * 2000-10-11 2009-07-15 株式会社ニコン 投影光学系，該投影光学系を備えた露光装置，及び該露光装置を用いたデバイスの製造方法
US6449101B1 (en) * 2000-11-08 2002-09-10 Acer Communications And Multimedia Inc. Projection zoom lens with a long back focal length and exit pupil position
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000206410A (ja) 1999-01-12 2000-07-28 Nikon Corp 投影光学系、投影露光装置、及び投影露光方法
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP2002365538A (ja) 2001-06-13 2002-12-18 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Also Published As

Publication number Publication date
TW200401337A (en) 2004-01-16
CN1322373C (zh) 2007-06-20
TWI308360B (en) 2009-04-01
US20040009415A1 (en) 2004-01-15
EP1378780A3 (en) 2004-09-01
CN1493924A (zh) 2004-05-05
EP1378780A2 (en) 2004-01-07
US7154585B2 (en) 2006-12-26
KR20040004115A (ko) 2004-01-13
JP2004086128A (ja) 2004-03-18

Similar Documents

Publication Publication Date Title
KR100866818B1 (ko) 투영광학계 및 이 투영광학계를 구비한 노광장치
US6867922B1 (en) Projection optical system and projection exposure apparatus using the same
KR100989606B1 (ko) 투영 광학계, 노광 장치 및 디바이스 제조 방법
JP2006086141A (ja) 投影光学系、露光装置、および露光方法
JP4706171B2 (ja) 反射屈折投影光学系、露光装置及び露光方法
EP1816502B1 (en) Projection optical system, exposure equipment and exposure method
JP4779394B2 (ja) 投影光学系、露光装置、および露光方法
US6621555B1 (en) Projection optical system and projection exposure apparatus with the same, and device manufacturing method
JP4300509B2 (ja) 投影光学系、露光装置、および露光方法
JP2002244035A (ja) 投影光学系および該投影光学系を備えた露光装置
JP2005115127A (ja) 反射屈折投影光学系、露光装置及び露光方法
JP2005114881A (ja) 投影光学系、露光装置、および露光方法
JPWO2004084281A1 (ja) 投影光学系、露光装置、および露光方法
JP2005017734A (ja) 投影光学系、露光装置、およびデバイス製造方法
JP4328940B2 (ja) 投影光学系、露光装置、および露光方法
JP2007206319A (ja) 反射屈折光学系、露光装置及びマイクロデバイスの製造方法
JP4239212B2 (ja) 投影光学系、露光装置および露光方法
JP2002365538A (ja) 投影光学系および該投影光学系を備えた露光装置
JP2004086110A (ja) 投影光学系、露光装置及び露光方法
JP2009104184A (ja) 投影光学系、露光装置、およびデバイス製造方法
JP2019091057A (ja) 露光装置及びデバイス製造方法
JP2019082711A (ja) 投影光学系、露光装置、露光方法、及びデバイス製造方法
JP2011049571A (ja) 反射屈折投影光学系、露光装置及び露光方法
JP2018010303A (ja) 露光装置およびデバイス製造方法
JP2004126100A (ja) 投影光学系、露光装置及び露光方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20130924

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20141001

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20150917

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20160921

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20170920

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20181004

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

FPAY Annual fee payment

Payment date: 20191001

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20201019

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20201019

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000