CN1322373C - 投影光学系统、曝光装置以及组件制造方法 - Google Patents

投影光学系统、曝光装置以及组件制造方法 Download PDF

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Publication number
CN1322373C
CN1322373C CNB03148266XA CN03148266A CN1322373C CN 1322373 C CN1322373 C CN 1322373C CN B03148266X A CNB03148266X A CN B03148266XA CN 03148266 A CN03148266 A CN 03148266A CN 1322373 C CN1322373 C CN 1322373C
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CN
China
Prior art keywords
mentioned
optical system
projection optical
lens group
light shield
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB03148266XA
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English (en)
Chinese (zh)
Other versions
CN1493924A (zh
Inventor
重松幸二
藤岛洋平
大村泰弘
石山敏朗
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Nikon Corp
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Nikon Corp
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Publication date
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Publication of CN1493924A publication Critical patent/CN1493924A/zh
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Publication of CN1322373C publication Critical patent/CN1322373C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/146—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation with corrections for use in multiple wavelength bands, such as infrared and visible light, e.g. FLIR systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CNB03148266XA 2002-07-04 2003-07-01 投影光学系统、曝光装置以及组件制造方法 Expired - Fee Related CN1322373C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002196212 2002-07-04
JP2002196212 2002-07-04
JP2003003869A JP2004086128A (ja) 2002-07-04 2003-01-10 投影光学系、露光装置、およびデバイス製造方法
JP2003003869 2003-01-10

Publications (2)

Publication Number Publication Date
CN1493924A CN1493924A (zh) 2004-05-05
CN1322373C true CN1322373C (zh) 2007-06-20

Family

ID=29720925

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB03148266XA Expired - Fee Related CN1322373C (zh) 2002-07-04 2003-07-01 投影光学系统、曝光装置以及组件制造方法

Country Status (6)

Country Link
US (1) US7154585B2 (enExample)
EP (1) EP1378780A3 (enExample)
JP (1) JP2004086128A (enExample)
KR (1) KR100989606B1 (enExample)
CN (1) CN1322373C (enExample)
TW (1) TWI308360B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
CN100538524C (zh) * 2003-12-02 2009-09-09 卡尔蔡司Smt股份有限公司 投影光学系统
US20080151365A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2014085569A (ja) * 2012-10-25 2014-05-12 Canon Inc 照明光学系および投射型表示装置
CN103499877B (zh) * 2013-10-10 2016-04-27 中国科学院光电技术研究所 一种大数值孔径的投影光学系统
EP3783416A4 (en) * 2018-03-26 2021-12-15 Sony Group Corporation OPTICAL IMAGING SYSTEM AND IMAGING DEVICE

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
EP1139138A1 (en) * 1999-09-29 2001-10-04 Nikon Corporation Projection exposure method and apparatus and projection optical system
US6333781B1 (en) * 1997-07-24 2001-12-25 Nikon Corporation Projection optical system and exposure apparatus and method
WO2002031870A1 (en) * 2000-10-11 2002-04-18 Nikon Corporation Projection optical system, aligner comprising the projection optical system, and method for manufacturing apparartus comprising the aligner
CN1353317A (zh) * 2000-11-08 2002-06-12 明碁电通股份有限公司 具有长后焦与后透光孔位置的投影变焦镜头

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07220988A (ja) 1994-01-27 1995-08-18 Canon Inc 投影露光方法及び装置及びこれを用いたデバイス製造方法
JPH11352012A (ja) 1998-06-11 1999-12-24 Nikon Corp 光学系の検査方法、光学系の製造方法及び露光装置の製造方法
JP2000075493A (ja) 1998-08-28 2000-03-14 Nikon Corp 露光装置及びその調整方法
JP2000206410A (ja) 1999-01-12 2000-07-28 Nikon Corp 投影光学系、投影露光装置、及び投影露光方法
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002365538A (ja) 2001-06-13 2002-12-18 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6333781B1 (en) * 1997-07-24 2001-12-25 Nikon Corporation Projection optical system and exposure apparatus and method
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
EP1139138A1 (en) * 1999-09-29 2001-10-04 Nikon Corporation Projection exposure method and apparatus and projection optical system
WO2002031870A1 (en) * 2000-10-11 2002-04-18 Nikon Corporation Projection optical system, aligner comprising the projection optical system, and method for manufacturing apparartus comprising the aligner
CN1353317A (zh) * 2000-11-08 2002-06-12 明碁电通股份有限公司 具有长后焦与后透光孔位置的投影变焦镜头

Also Published As

Publication number Publication date
EP1378780A3 (en) 2004-09-01
JP2004086128A (ja) 2004-03-18
TW200401337A (en) 2004-01-16
KR100989606B1 (ko) 2010-10-26
EP1378780A2 (en) 2004-01-07
CN1493924A (zh) 2004-05-05
KR20040004115A (ko) 2004-01-13
US7154585B2 (en) 2006-12-26
TWI308360B (en) 2009-04-01
US20040009415A1 (en) 2004-01-15

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