TWI308360B - Optical projection system, exposure device and method for making devices - Google Patents

Optical projection system, exposure device and method for making devices Download PDF

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Publication number
TWI308360B
TWI308360B TW092114235A TW92114235A TWI308360B TW I308360 B TWI308360 B TW I308360B TW 092114235 A TW092114235 A TW 092114235A TW 92114235 A TW92114235 A TW 92114235A TW I308360 B TWI308360 B TW I308360B
Authority
TW
Taiwan
Prior art keywords
optical system
projection optical
lens group
lens
height
Prior art date
Application number
TW092114235A
Other languages
English (en)
Chinese (zh)
Other versions
TW200401337A (en
Inventor
Shigematsu Koji
Fujishima Youhei
Omura Yasuhiro
Ishiyama Toshiro
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200401337A publication Critical patent/TW200401337A/zh
Application granted granted Critical
Publication of TWI308360B publication Critical patent/TWI308360B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/146—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation with corrections for use in multiple wavelength bands, such as infrared and visible light, e.g. FLIR systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW092114235A 2002-07-04 2003-05-27 Optical projection system, exposure device and method for making devices TWI308360B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002196212 2002-07-04
JP2003003869A JP2004086128A (ja) 2002-07-04 2003-01-10 投影光学系、露光装置、およびデバイス製造方法

Publications (2)

Publication Number Publication Date
TW200401337A TW200401337A (en) 2004-01-16
TWI308360B true TWI308360B (en) 2009-04-01

Family

ID=29720925

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092114235A TWI308360B (en) 2002-07-04 2003-05-27 Optical projection system, exposure device and method for making devices

Country Status (6)

Country Link
US (1) US7154585B2 (enExample)
EP (1) EP1378780A3 (enExample)
JP (1) JP2004086128A (enExample)
KR (1) KR100989606B1 (enExample)
CN (1) CN1322373C (enExample)
TW (1) TWI308360B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
EP1690139B1 (en) * 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2014085569A (ja) * 2012-10-25 2014-05-12 Canon Inc 照明光学系および投射型表示装置
CN103499877B (zh) * 2013-10-10 2016-04-27 中国科学院光电技术研究所 一种大数值孔径的投影光学系统
KR20200134214A (ko) 2018-03-26 2020-12-01 소니 주식회사 촬상 광학계 및 촬상 장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07220988A (ja) * 1994-01-27 1995-08-18 Canon Inc 投影露光方法及び装置及びこれを用いたデバイス製造方法
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH11352012A (ja) 1998-06-11 1999-12-24 Nikon Corp 光学系の検査方法、光学系の製造方法及び露光装置の製造方法
JP2000075493A (ja) 1998-08-28 2000-03-14 Nikon Corp 露光装置及びその調整方法
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
JP2000206410A (ja) 1999-01-12 2000-07-28 Nikon Corp 投影光学系、投影露光装置、及び投影露光方法
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP4296701B2 (ja) * 2000-10-11 2009-07-15 株式会社ニコン 投影光学系，該投影光学系を備えた露光装置，及び該露光装置を用いたデバイスの製造方法
US6449101B1 (en) * 2000-11-08 2002-09-10 Acer Communications And Multimedia Inc. Projection zoom lens with a long back focal length and exit pupil position
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002365538A (ja) 2001-06-13 2002-12-18 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Also Published As

Publication number Publication date
TW200401337A (en) 2004-01-16
KR100989606B1 (ko) 2010-10-26
CN1322373C (zh) 2007-06-20
US20040009415A1 (en) 2004-01-15
EP1378780A3 (en) 2004-09-01
CN1493924A (zh) 2004-05-05
EP1378780A2 (en) 2004-01-07
US7154585B2 (en) 2006-12-26
KR20040004115A (ko) 2004-01-13
JP2004086128A (ja) 2004-03-18

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MM4A Annulment or lapse of patent due to non-payment of fees