JP2003535356A - 非球面レンズ表面が隣接して配置されている投影対物レンズ - Google Patents

非球面レンズ表面が隣接して配置されている投影対物レンズ

Info

Publication number
JP2003535356A
JP2003535356A JP2001550065A JP2001550065A JP2003535356A JP 2003535356 A JP2003535356 A JP 2003535356A JP 2001550065 A JP2001550065 A JP 2001550065A JP 2001550065 A JP2001550065 A JP 2001550065A JP 2003535356 A JP2003535356 A JP 2003535356A
Authority
JP
Japan
Prior art keywords
lens
projection objective
aspherical
lenses
double
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001550065A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003535356A5 (OSRAM
Inventor
シェファー，デイビッド・アール
シュスター，カール−ハインツ
バイエール，ヘルムート
Original Assignee
カール・ツアイス・スティフツング・トレーディング・アズ・カール・ツアイス
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2000102626 external-priority patent/DE10002626A1/de
Application filed by カール・ツアイス・スティフツング・トレーディング・アズ・カール・ツアイス filed Critical カール・ツアイス・スティフツング・トレーディング・アズ・カール・ツアイス
Publication of JP2003535356A publication Critical patent/JP2003535356A/ja
Publication of JP2003535356A5 publication Critical patent/JP2003535356A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/12—Fluid-filled or evacuated lenses
    • G02B3/14—Fluid-filled or evacuated lenses of variable focal length
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001550065A 1999-12-29 2000-12-22 非球面レンズ表面が隣接して配置されている投影対物レンズ Pending JP2003535356A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US17352399P 1999-12-29 1999-12-29
US60/173,523 1999-12-29
DE10002626.5 2000-01-22
DE2000102626 DE10002626A1 (de) 2000-01-22 2000-01-22 Katadioptrisches Objektiv mit Asphären
DE10021739.7 2000-05-04
DE10021739 2000-05-04
PCT/EP2000/013148 WO2001050171A1 (de) 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Publications (2)

Publication Number Publication Date
JP2003535356A true JP2003535356A (ja) 2003-11-25
JP2003535356A5 JP2003535356A5 (OSRAM) 2007-12-27

Family

ID=27213593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001550065A Pending JP2003535356A (ja) 1999-12-29 2000-12-22 非球面レンズ表面が隣接して配置されている投影対物レンズ

Country Status (6)

Country Link
US (3) US6646718B2 (OSRAM)
EP (1) EP1242843B1 (OSRAM)
JP (1) JP2003535356A (OSRAM)
KR (1) KR100854052B1 (OSRAM)
DE (1) DE50012452D1 (OSRAM)
WO (1) WO2001050171A1 (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007013179A (ja) * 2005-07-01 2007-01-18 Carl Zeiss Smt Ag リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ
JP2007502019A (ja) * 2003-08-12 2007-02-01 カール・ツアイス・エスエムテイ・アーゲー ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ
JP2013527986A (ja) * 2010-04-23 2013-07-04 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ系の光学要素の操作を含むリソグラフィ系を作動させる方法

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US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
JP2003535356A (ja) * 1999-12-29 2003-11-25 カール・ツアイス・スティフツング・トレーディング・アズ・カール・ツアイス 非球面レンズ表面が隣接して配置されている投影対物レンズ
JP2004516526A (ja) * 2000-12-22 2004-06-03 カール ツァイス エスエムテー アクチエンゲゼルシャフト 少なくとも１つの非球面レンズを有するレンズ系
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
KR20040015251A (ko) 2001-05-15 2004-02-18 칼 짜이스 에스엠티 아게 불화물 결정 렌즈들을 포함하는 렌즈 시스템
DE10151309A1 (de) * 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
DE10162796B4 (de) * 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
KR20040089688A (ko) * 2002-03-01 2004-10-21 칼 짜이스 에스엠테 아게 굴절투사렌즈
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
AU2003258519A1 (en) * 2002-07-18 2004-02-09 Carl Zeiss Smt Ag Catadioptric projection objective
AU2003298405A1 (en) 2002-09-03 2004-03-29 Carl Zeiss Smt Ag Optimization method for an objective with fluoride crystal lenses and objective with fluoride crystal lenses
EP1535100A1 (en) * 2002-09-03 2005-06-01 Carl Zeiss SMT AG Objective with birefringent lenses
AU2003254550A1 (en) * 2002-09-09 2004-04-30 Carl Zeiss Smt Ag Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type
TWI305872B (en) 2003-03-17 2009-02-01 Nikon Corp Optical projection system, light-exposure apparatus and light-exposure method
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2005033800A1 (de) 2003-09-09 2005-04-14 Carl Zeiss Smt Ag Lithographie-objektiv und projektionsbelichtungsanlage mit mindestens einem solchen lithographie-objektiv
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7177087B2 (en) * 2003-10-28 2007-02-13 Leupold & Stevens, Inc. Compound asperic ocular for riflescope
US7385764B2 (en) 2003-12-15 2008-06-10 Carl Zeiss Smt Ag Objectives as a microlithography projection objective with at least one liquid lens
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
CN100592210C (zh) 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7511798B2 (en) 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
TW200616043A (en) * 2004-11-10 2006-05-16 Nikon Corp Optical projection system, exposure apparatus, exposure method and method of fabricating devices
TWI454731B (zh) 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
TWI305107B (en) * 2005-09-29 2009-01-01 Young Optics Inc Optical projection apparatus
DE102008015775A1 (de) 2007-04-16 2008-12-18 Carl Zeiss Smt Ag Chromatisch korrigiertes Lithographieobjektiv
US7929115B2 (en) * 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography

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JP2001027727A (ja) * 1999-07-13 2001-01-30 Nikon Corp 反射屈折光学系及び該光学系を備える投影露光装置

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JPH10197791A (ja) * 1997-01-13 1998-07-31 Canon Inc 投影レンズ
JPH11307443A (ja) * 1998-04-24 1999-11-05 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007502019A (ja) * 2003-08-12 2007-02-01 カール・ツアイス・エスエムテイ・アーゲー ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ
JP2007013179A (ja) * 2005-07-01 2007-01-18 Carl Zeiss Smt Ag リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ
JP2013527986A (ja) * 2010-04-23 2013-07-04 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ系の光学要素の操作を含むリソグラフィ系を作動させる方法
KR101505256B1 (ko) 2010-04-23 2015-03-30 칼 짜이스 에스엠티 게엠베하 리소그래픽 시스템의 광학 소자의 조작을 포함하는 리소그래픽 시스템의 작동 방법
US9001310B2 (en) 2010-04-23 2015-04-07 Carl Zeiss Smt Gmbh Lithographic systems and processes of making and using same

Also Published As

Publication number Publication date
US20050157400A1 (en) 2005-07-21
EP1242843A1 (de) 2002-09-25
KR20020064364A (ko) 2002-08-07
US6903802B2 (en) 2005-06-07
US6646718B2 (en) 2003-11-11
DE50012452D1 (de) 2006-05-11
US7154678B2 (en) 2006-12-26
US20030179356A1 (en) 2003-09-25
WO2001050171A1 (de) 2001-07-12
KR100854052B1 (ko) 2008-08-26
EP1242843B1 (de) 2006-03-22
US20040233409A1 (en) 2004-11-25

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