JP2003504221A5 - - Google Patents

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Publication number
JP2003504221A5
JP2003504221A5 JP2001509997A JP2001509997A JP2003504221A5 JP 2003504221 A5 JP2003504221 A5 JP 2003504221A5 JP 2001509997 A JP2001509997 A JP 2001509997A JP 2001509997 A JP2001509997 A JP 2001509997A JP 2003504221 A5 JP2003504221 A5 JP 2003504221A5
Authority
JP
Japan
Prior art keywords
masking material
material layer
substrate
exposed portion
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001509997A
Other languages
English (en)
Japanese (ja)
Other versions
JP4851036B2 (ja
JP2003504221A (ja
Filing date
Publication date
Priority claimed from US09/352,025 external-priority patent/US6617098B1/en
Application filed filed Critical
Publication of JP2003504221A publication Critical patent/JP2003504221A/ja
Publication of JP2003504221A5 publication Critical patent/JP2003504221A5/ja
Application granted granted Critical
Publication of JP4851036B2 publication Critical patent/JP4851036B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001509997A 1999-07-13 2000-07-13 併合マスクの微細加工プロセス Expired - Fee Related JP4851036B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/352,025 US6617098B1 (en) 1999-07-13 1999-07-13 Merged-mask micro-machining process
US09/352,025 1999-07-13
PCT/US2000/019127 WO2001004638A1 (en) 1999-07-13 2000-07-13 Merged-mask micro-machining process

Publications (3)

Publication Number Publication Date
JP2003504221A JP2003504221A (ja) 2003-02-04
JP2003504221A5 true JP2003504221A5 (enExample) 2007-08-02
JP4851036B2 JP4851036B2 (ja) 2012-01-11

Family

ID=23383482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001509997A Expired - Fee Related JP4851036B2 (ja) 1999-07-13 2000-07-13 併合マスクの微細加工プロセス

Country Status (9)

Country Link
US (1) US6617098B1 (enExample)
EP (3) EP1510864B1 (enExample)
JP (1) JP4851036B2 (enExample)
AT (1) ATE285583T1 (enExample)
AU (1) AU5932700A (enExample)
CA (2) CA2378725C (enExample)
DE (1) DE60016928D1 (enExample)
NO (3) NO329678B1 (enExample)
WO (1) WO2001004638A1 (enExample)

Families Citing this family (10)

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DE60226262T2 (de) * 2001-10-19 2009-05-20 ION Geophysical Corp., Houston Digitale optische schaltvorrichtung und verfahren zu ihrer herstellung
EP1890181B1 (en) * 2001-10-19 2012-07-04 ION Geophysical Corporation Digital optical switch apparatus and process for manufacturing same
US7473644B2 (en) * 2004-07-01 2009-01-06 Micron Technology, Inc. Method for forming controlled geometry hardmasks including subresolution elements
US20080022771A1 (en) * 2006-07-28 2008-01-31 Alexander Wolter Micromechanical component
KR100868759B1 (ko) * 2007-01-25 2008-11-17 삼성전기주식회사 멤스 디바이스 및 이의 제조방법
JP4992576B2 (ja) * 2007-06-29 2012-08-08 富士通株式会社 マイクロ構造体製造方法およびマイクロ構造体
JP5775409B2 (ja) * 2011-09-29 2015-09-09 スタンレー電気株式会社 光スキャナの製造方法
DE102017215575A1 (de) * 2017-09-05 2019-03-07 Robert Bosch Gmbh Mikromechanische Vorrichtung

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