JP2003501823A5 - - Google Patents

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Publication number
JP2003501823A5
JP2003501823A5 JP2001501941A JP2001501941A JP2003501823A5 JP 2003501823 A5 JP2003501823 A5 JP 2003501823A5 JP 2001501941 A JP2001501941 A JP 2001501941A JP 2001501941 A JP2001501941 A JP 2001501941A JP 2003501823 A5 JP2003501823 A5 JP 2003501823A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2001501941A
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Japanese (ja)
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JP2003501823A (ja
JP4959080B2 (ja
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Priority claimed from PCT/US2000/015578 external-priority patent/WO2000075727A2/en
Publication of JP2003501823A publication Critical patent/JP2003501823A/ja
Publication of JP2003501823A5 publication Critical patent/JP2003501823A5/ja
Application granted granted Critical
Publication of JP4959080B2 publication Critical patent/JP4959080B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2001501941A 1999-06-07 2000-06-06 反射マスク基板のコーティング Expired - Lifetime JP4959080B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13815899P 1999-06-07 1999-06-07
US60/138,158 1999-06-07
PCT/US2000/015578 WO2000075727A2 (en) 1999-06-07 2000-06-06 Coatings on reflective mask substrates

Publications (3)

Publication Number Publication Date
JP2003501823A JP2003501823A (ja) 2003-01-14
JP2003501823A5 true JP2003501823A5 (enExample) 2007-06-07
JP4959080B2 JP4959080B2 (ja) 2012-06-20

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ID=22480708

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001501941A Expired - Lifetime JP4959080B2 (ja) 1999-06-07 2000-06-06 反射マスク基板のコーティング

Country Status (6)

Country Link
US (1) US6352803B1 (enExample)
EP (1) EP1190276A2 (enExample)
JP (1) JP4959080B2 (enExample)
KR (1) KR100805360B1 (enExample)
AU (1) AU5597000A (enExample)
WO (1) WO2000075727A2 (enExample)

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JP4958147B2 (ja) * 2006-10-18 2012-06-20 Ｈｏｙａ株式会社 露光用反射型マスクブランク及び露光用反射型マスク、多層反射膜付き基板、並びに半導体装置の製造方法
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JP5590044B2 (ja) 2009-12-09 2014-09-17 旭硝子株式会社 Ｅｕｖリソグラフィ用光学部材
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JP5533395B2 (ja) * 2010-07-26 2014-06-25 旭硝子株式会社 Ｅｕｖリソグラフィ用反射型マスクブランクの製造方法
WO2012014904A1 (ja) 2010-07-27 2012-02-02 旭硝子株式会社 Ｅｕｖリソグラフィ用反射層付基板、およびｅｕｖリソグラフィ用反射型マスクブランク
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KR101993322B1 (ko) 2011-09-28 2019-06-26 호야 가부시키가이샤 마스크블랭크용 유리기판, 다층 반사막 부착 기판, 마스크블랭크 및 마스크, 그리고 그것들의 제조방법
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JP7350571B2 (ja) 2019-08-30 2023-09-26 Hoya株式会社 導電膜付基板、反射型マスクブランク及び反射型マスク、並びに半導体デバイスの製造方法
JP7318607B2 (ja) 2020-07-28 2023-08-01 Ａｇｃ株式会社 Ｅｕｖリソグラフィ用反射型マスクブランク、ｅｕｖリソグラフィ用反射型マスク、およびそれらの製造方法
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