JP2003344294A - Substrate holding device - Google Patents

Substrate holding device

Info

Publication number
JP2003344294A
JP2003344294A JP2002157941A JP2002157941A JP2003344294A JP 2003344294 A JP2003344294 A JP 2003344294A JP 2002157941 A JP2002157941 A JP 2002157941A JP 2002157941 A JP2002157941 A JP 2002157941A JP 2003344294 A JP2003344294 A JP 2003344294A
Authority
JP
Japan
Prior art keywords
substrate holder
substrate
swing
holding device
edge portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002157941A
Other languages
Japanese (ja)
Other versions
JP2003344294A5 (en
JP3931111B2 (en
Inventor
Mamoru Yasuda
守 安田
Nobuo Fujisaki
暢夫 藤崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP2002157941A priority Critical patent/JP3931111B2/en
Priority to KR10-2004-7001004A priority patent/KR20050005390A/en
Priority to CNB038007347A priority patent/CN100483115C/en
Priority to PCT/JP2003/006611 priority patent/WO2003102561A1/en
Priority to TW092114436A priority patent/TWI313039B/en
Publication of JP2003344294A publication Critical patent/JP2003344294A/en
Publication of JP2003344294A5 publication Critical patent/JP2003344294A5/ja
Application granted granted Critical
Publication of JP3931111B2 publication Critical patent/JP3931111B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958Inspecting transparent materials or objects, e.g. windscreens
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513Liquid crystal panels
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/02Mechanical
    • G01N2201/021Special mounting in general

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Liquid Crystal (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To save space by preventing the increase in height of the upper end part of a large glass substrate even when raising it. <P>SOLUTION: A substrate holder 5 is rockable on a frame 1 from a horizontal state in a raising direction by the expanding and contracting operation of a jack 19. When the substrate holder 5 is raised by the rocking, the substrate holder 5 is slid to a moving block 14 provided on the hinge 10 of a linear guide 16 and protruded forward from the edge part 11 of a base 3 and lower the edge of the substrate holder 5 which forms the lower end side by raising below the edge part of the base 3 of the frame 1. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、例えば大型の液晶
ディスプレイ(LCD)やプラズマディスプレイパネル
(PDP)などのフラットパネル等のガラス基板の欠陥
検査を行うときにガラス基板を保持すると共に揺動させ
る基板保持装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention holds and swings a glass substrate when inspecting a glass substrate such as a flat panel such as a large liquid crystal display (LCD) or a plasma display panel (PDP) for a defect. The present invention relates to a substrate holding device.

【0002】[0002]

【従来の技術】近年、LCDやPDPといったフラット
パネルディスプレイの分野では、画面の大型化やコスト
削減といった要望に対応するために、フラットパネルデ
ィスプレイ製造工程において多面取りするためにガラス
基板のサイズが益々大型化する傾向にある。
2. Description of the Related Art In recent years, in the field of flat panel displays such as LCDs and PDPs, in order to meet the demands for larger screens and cost reduction, the size of glass substrates has become more and more large in order to make multiple cuts in the flat panel display manufacturing process. It tends to increase in size.

【0003】このようなフラットパネルディスプレイ製
造工程で製造された大型のガラス基板に対しては欠陥検
査が行われており、この欠陥検査の一つの手法としてマ
クロ検査とミクロ検査とを併用することが行われてい
る。マクロ検査は、ガラス基板に照明光を照射してガラ
ス基板で反射する光を目視観察し、ミクロ検査は、マク
ロ検査で特定した欠陥部分を顕微鏡で拡大観察する。
Defect inspection is performed on a large glass substrate manufactured in such a flat panel display manufacturing process, and macro inspection and micro inspection can be used together as one method of this defect inspection. Has been done. In the macro inspection, the glass substrate is irradiated with illumination light and the light reflected by the glass substrate is visually observed. In the micro inspection, the defective portion specified by the macro inspection is enlarged and observed with a microscope.

【0004】このような欠陥検査装置として例えば特開
平11−94756号公報に記載された技術があり、こ
の公報には、マクロ検査時にガラス基板をホルダ上に載
せて観察者に向って起き上げて目視によるマクロ検査を
行い、ミクロ検査時にガラス基板を水平状態に保持し、
欠陥部分を顕微鏡で拡大観察することが記載されてい
る。なお、マクロ検査時の照明は、例えば特開2000
−146846に記載されている投光装置が用いられ
る。
As such a defect inspection apparatus, for example, there is a technique described in Japanese Patent Application Laid-Open No. 11-94756. In this publication, a glass substrate is placed on a holder and raised toward an observer during macro inspection. Performs macro inspection by visual inspection, holds the glass substrate in a horizontal state during micro inspection,
It is described that the defective portion is observed by magnifying with a microscope. Illumination during macro inspection is, for example, Japanese Patent Laid-Open No. 2000-2000.
The floodlighting device described in 146846 is used.

【0005】[0005]

【発明が解決しようとする課題】フラットパネルディス
プレイ製造工程で製造されるガラス基板のサイズは、画
面の大型化やコスト削減といった要望に対応するため
に、益々大型化する傾向にあり、例えば1250×11
00mmの大型サイズが出現している。
The size of the glass substrate manufactured in the flat panel display manufacturing process tends to be larger and larger in order to meet the demand for larger screens and cost reduction, for example, 1250 ×. 11
A large size of 00 mm has appeared.

【0006】このような大型のガラス基板を上記公報に
記載されている欠陥検査装置を用いて欠陥検査すると、
マクロ検査時に、ホルダの下辺を中心にして所定の傾斜
角度に起がらせることになる。
When a defect inspection is performed on such a large glass substrate using the defect inspection apparatus described in the above publication,
At the time of macro inspection, the lower side of the holder is raised to a predetermined inclination angle.

【0007】ところが、このホルダに保持された大型ガ
ラス基板を起き上げると、起き上げたときの大型ガラス
基板の上端部分が観察者の目の位置よりも高くなってし
まい、観察者の目から大型ガラス基板の上端部分までの
距離が遠くなり、大型ガラス基板の上端部分が見えにく
くなる。
However, when the large glass substrate held by this holder is raised, the upper end portion of the large glass substrate when raised is higher than the position of the observer's eyes, which is large from the observer's eyes. The distance to the upper end portion of the glass substrate becomes longer, and it becomes difficult to see the upper end portion of the large glass substrate.

【0008】又、大型ガラス基板を起き上げたときの大
型ガラス基板の上端部分が高い位置になるために、大型
ガラス基板の揺動に必要な高さ空間が増大し、装置が大
型化する。
Further, since the upper end portion of the large glass substrate is located at a high position when the large glass substrate is raised, the height space required for swinging the large glass substrate increases and the apparatus becomes large.

【0009】そこで本発明は、大型ガラス基板を起き上
げてもその上端部分が高くならず、省スペース化を実現
できる基板保持装置を提供することを目的とする。
SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a substrate holding device capable of realizing space saving without raising the upper end portion of a large glass substrate when it is raised.

【0010】[0010]

【課題を解決するための手段】本発明は、大型基板を保
持する基板ホルダを架台上に設けた基板保持装置におい
て、架台上で基板ホルダを水平状態又は当該基板ホルダ
の起き上げ方向に揺動可能で、当該揺動により基板ホル
ダを起き上がらせると、この起き上げにより下端側とな
る基板ホルダの縁を架台上面の縁部分よりも下降させる
揺動機構を具備したことを特徴とする基板保持装置であ
る。
SUMMARY OF THE INVENTION The present invention is a substrate holding device in which a substrate holder for holding a large-sized substrate is provided on a gantry, and the substrate holder is oscillated in a horizontal state on the gantry or in a rising direction of the substrate holder. A substrate holding device provided with a swinging mechanism capable of raising the substrate holder by the swinging and lowering the edge of the substrate holder on the lower end side from the edge portion of the upper surface of the gantry by this raising. Is.

【0011】[0011]

【発明の実施の形態】以下、本発明の第1の実施の形態
について図面を参照して説明する。
DETAILED DESCRIPTION OF THE INVENTION A first embodiment of the present invention will be described below with reference to the drawings.

【0012】図1は本発明の基板保持装置を基板検査装
置に適用した断面構成図である。架台1は、脚2及びこ
の脚2上に設けられたベース3からなっている。このベ
ース3上に大型ガラス基板4を保持する基板ホルダ5が
設けられている。この基板ホルダ5の水平状態の高さ
は、搬送ロボットの受け渡し高さに設定される。ベース
3の上面は、水平に設けられている。
FIG. 1 is a sectional view of the substrate holding apparatus of the present invention applied to a substrate inspection apparatus. The gantry 1 includes legs 2 and a base 3 provided on the legs 2. A substrate holder 5 for holding a large glass substrate 4 is provided on the base 3. The horizontal height of the substrate holder 5 is set to the delivery height of the transfer robot. The upper surface of the base 3 is provided horizontally.

【0013】基板ホルダ5には、図2に示すように開口
部6が形成されると共に、この開口部6の各辺に沿って
大型ガラス基板4の基準位置を決める各基準ピン7と、
ローラ付基準ピン8と、押付けピン9とが設けられてい
る。押付けピン9は、大型ガラス基板4を基準ピン7側
に押し付ける方向に移動可能に設けられている。
An opening 6 is formed in the substrate holder 5 as shown in FIG. 2, and reference pins 7 for determining the reference position of the large glass substrate 4 are formed along each side of the opening 6.
A roller-equipped reference pin 8 and a pressing pin 9 are provided. The pressing pin 9 is provided so as to be movable in the direction in which the large glass substrate 4 is pressed against the reference pin 7 side.

【0014】この基板ホルダ5は、ベース3の上面に対
して、以下に説明する揺動機構(揺動支点であるヒンジ
10、せり出し機構としての直線ガイド15、リンク機
構17)によってヒンジ10を揺動軸として、基板ホル
ダ5を起き上げる又は水平状態に戻す方向(矢印イ方
向)に揺動可能に設けられている。このヒンジ10は、
基板保持装置を正面側から見てベース3の両端側にそれ
ぞれ設けられている。
This substrate holder 5 swings the hinge 10 with respect to the upper surface of the base 3 by a swinging mechanism (a hinge 10, which is a swinging fulcrum, a linear guide 15 as a protruding mechanism, a link mechanism 17) described below. As a moving shaft, it is swingably provided in a direction (arrow A direction) in which the substrate holder 5 is raised or returned to a horizontal state. This hinge 10
The substrate holding devices are provided on both ends of the base 3 when viewed from the front side.

【0015】ベース3に上面の正面側における縁部分1
1の両端には、図3に示すようにそれぞれヒンジ支持部
材12が設けられている。これらヒンジ支持部材12に
は、それぞれ各ヒンジ10が回動自在に設けられてい
る。これらヒンジ10の回動軸13は、基板ホルダ5を
起き上げる又は水平状態に戻す方向(矢印イ方向)に揺
動させるために正面側から見て水平方向(Y方向)に設
けられている。
An edge portion 1 on the front side of the upper surface of the base 3
As shown in FIG. 3, hinge support members 12 are provided on both ends of the unit 1. Each hinge 10 is rotatably provided on each of the hinge support members 12. The pivot shafts 13 of the hinges 10 are provided in the horizontal direction (Y direction) when viewed from the front side in order to swing the substrate holder 5 in the direction of raising it or returning it to the horizontal state (arrow A direction).

【0016】ヒンジ10には、移動ブロック14が設け
られている。この移動ブロック14には、基板ホルダ5
の裏面に設けられた直線ガイド15に嵌合する摺動用溝
16が形成されている。
The hinge 10 is provided with a moving block 14. The moving block 14 includes a substrate holder 5
Is formed with a sliding groove 16 that fits into a linear guide 15 provided on the back surface of the.

【0017】直線ガイド15は、基板ホルダ5を起き上
げたときに摺動用溝16内を摺動して基板ホルダ5を正
面側にせり出させ、ヒンジ10は回転軸13を支点とし
て基板ホルダ5を揺動させることで、基板ホルダ5の下
端をベース3上面の縁部分11よりも下降させるもの
で、直線ガイド15、ヒンジ10によりせり出し機構を
構成する。
When the substrate holder 5 is raised, the linear guide 15 slides in the sliding groove 16 to push the substrate holder 5 toward the front side, and the hinge 10 uses the rotating shaft 13 as a fulcrum to support the substrate holder 5. By swinging, the lower end of the substrate holder 5 is lowered below the edge portion 11 on the upper surface of the base 3, and the linear guide 15 and the hinge 10 constitute a protrusion mechanism.

【0018】この直線ガイド15は、基板ホルダ5の下
面の両端側にそれぞれ設けられ、ベース3の両端の各移
動ブロック14に形成された各摺動用溝16内に載って
いる。これら直線ガイド15は、基板ホルダ5を起き上
げたときに摺動用溝16内を摺動して基板ホルダ5を正
面側にせり出させ、かつ基板ホルダ5の下端側となる縁
をベース3上面の縁部分11よりも下降させるのに十分
必要な長さ、例えば基板ホルダ5の下端側から中央部よ
りやや上まで形成されている。
The linear guides 15 are provided on both ends of the lower surface of the substrate holder 5, and are placed in the sliding grooves 16 formed in the moving blocks 14 on both ends of the base 3. These linear guides 15 slide in the sliding grooves 16 when the substrate holder 5 is lifted to project the substrate holder 5 to the front side, and the edge of the lower end side of the substrate holder 5 is the upper surface of the base 3. It is formed to have a length sufficient for lowering it from the edge portion 11 of the substrate holder 5, for example, from the lower end side of the substrate holder 5 to slightly above the central portion.

【0019】これら直線ガイド15の上端側には、スト
ッパ15aが設けられている。これらストッパ15a
は、基板ホルダ5を起き上げたときに、基板ホルダ5が
予め設定された最大傾斜角度より傾き過ぎないように、
基板ホルダ5の傾きを制限するために設けられている。
A stopper 15a is provided on the upper end side of these linear guides 15. These stoppers 15a
Is so that when the substrate holder 5 is raised, the substrate holder 5 is prevented from being tilted more than a preset maximum tilt angle,
It is provided to limit the inclination of the substrate holder 5.

【0020】リンク機構17は、基板ホルダ5をベース
3上で水平状態又は起き上げ方向に揺動させる機能を有
するもので、リンク18とジャッキ19とからなる。リ
ンク18は、固定された長さに形成され、ベース3から
下方に延出された延出端部20と基板ホルダ5の下部に
設けられた支持部材21との間に設けられている。この
リンク18は、延出端部20と支持部材21とに対して
それぞれ各支点22、23で回転可能となっている。
The link mechanism 17 has a function of swinging the substrate holder 5 on the base 3 in a horizontal state or in a rising direction, and includes a link 18 and a jack 19. The link 18 is formed to have a fixed length, and is provided between an extension end 20 extending downward from the base 3 and a support member 21 provided below the substrate holder 5. The link 18 is rotatable with respect to the extending end portion 20 and the supporting member 21 at respective fulcrums 22 and 23.

【0021】ジャッキ19は、伸縮ロッド19aを有
し、リンク18における支持部材21側と脚2の水平梁
2aとの間に設けられている。このジャッキ19は、伸
縮ロッド19aの先端がリンク18に対して支点24に
回転可能に連結されると共に、ジャッキ19の下端が水
平梁2aに対して支点25に回転可能に連結されてい
る。
The jack 19 has a telescopic rod 19a and is provided between the support member 21 side of the link 18 and the horizontal beam 2a of the leg 2. In the jack 19, the tip end of the telescopic rod 19a is rotatably connected to the link 18 at a fulcrum 24, and the lower end of the jack 19 is rotatably connected to the horizontal beam 2a at a fulcrum 25.

【0022】リンク機構17は、基板保持装置を正面側
から見て基板ホルダ5の両端側にそれぞれ設けられてい
る。
The link mechanisms 17 are provided at both ends of the substrate holder 5 when the substrate holding device is viewed from the front side.

【0023】従って、ジャッキ19の伸縮ロッド19a
が伸びると、このジャッキ19の伸縮ロッド19aの先
端は、リンク18における支持部材21側に押圧を与え
る。このとき、ジャッキ19の他端が脚2の水平梁2a
に設けられ、かつリンク18の長さが固定なので、ジャ
ッキ19の伸縮ロッド19aが伸びるに従って、ジャッ
キ19は支点25を中心に回転すると共に、リンク18
は、ジャッキ19の伸縮ロッド19aの伸びにより支点
22を中心にして回転する。
Therefore, the telescopic rod 19a of the jack 19
When is extended, the tip of the telescopic rod 19a of the jack 19 applies pressure to the support member 21 side of the link 18. At this time, the other end of the jack 19 is the horizontal beam 2a of the leg 2
And the length of the link 18 is fixed, the jack 19 rotates about the fulcrum 25 as the telescopic rod 19a of the jack 19 extends, and the link 18
Is rotated about the fulcrum 22 by the extension of the telescopic rod 19a of the jack 19.

【0024】リンク18が支点22を中心にして回転す
ると、リンク18は長さが固定なので、リンク18と基
板ホルダ5の支持部材21との間で連結される支点23
は、リンク18の長さを半径として支点22を中心とし
た円弧上を移動する。
When the link 18 rotates about the fulcrum 22, the link 18 has a fixed length, so that the fulcrum 23 connected between the link 18 and the supporting member 21 of the substrate holder 5 is provided.
Moves on an arc centered on the fulcrum 22 with the length of the link 18 as the radius.

【0025】従って、リンク18が支点22を中心とし
て回転すると、基板ホルダ5は、ヒンジ10を揺動中心
として矢印イ方向に起き上げられる。このような基板ホ
ルダ5の起き上げが行われると、リンク18の両端部の
各支点22、23の間隔は固定であり、かつリンク18
の支点22とヒンジ10との間隔も固定である。これに
より各支点22、23及びヒンジ10の3点からなる三
角形を考えると、リンク18が支点22を中心として回
転するに従って支点23とヒンジ10との間隔が次第に
短くなることが分る。
Therefore, when the link 18 rotates about the fulcrum 22, the substrate holder 5 is raised in the direction of arrow A about the hinge 10. When the substrate holder 5 is raised as described above, the distance between the fulcrums 22 and 23 at both ends of the link 18 is fixed, and the link 18 is fixed.
The distance between the fulcrum 22 and the hinge 10 is also fixed. Thus, considering a triangle composed of the fulcrums 22, 23 and the hinge 10, the distance between the fulcrum 23 and the hinge 10 becomes gradually shorter as the link 18 rotates about the fulcrum 22.

【0026】しかるに、支点23とヒンジ10との間隔
が次第に短くなることから基板ホルダ5は、直線ガイド
15上を正面側に摺動し、基板ホルダ5の下端側となる
縁がベース3上面の縁部分11よりも正面側にせり出
す。
However, since the distance between the fulcrum 23 and the hinge 10 is gradually shortened, the substrate holder 5 slides on the linear guide 15 to the front side, and the edge of the substrate holder 5 on the lower end side is the upper surface of the base 3. It protrudes from the edge portion 11 to the front side.

【0027】そして、ジャッキ19の伸縮ロッド19a
の伸びが大きくなるに従って、リンク18の回転量が大
きくなり、基板ホルダ5の起き上がり角度が大きくなる
に従って、基板ホルダ5の下端側となる縁のベース3上
面の縁部分11からのせり出量が大きくなる。
The telescopic rod 19a of the jack 19
As the elongation of the substrate 18 increases, the amount of rotation of the link 18 increases, and as the rising angle of the substrate holder 5 increases, the amount of protrusion of the edge on the lower end side of the substrate holder 5 from the edge portion 11 of the upper surface of the base 3 increases. growing.

【0028】このように基板ホルダ5の起き上がり角度
が大きくなると、基板ホルダ5の下端側となる縁のせり
出量が大きるなることから、基板ホルダ5の下端側とな
った縁は、ベース3上面の縁部分11よりも下降する。
As the rising angle of the substrate holder 5 increases in this way, the amount of protrusion of the edge on the lower end side of the substrate holder 5 increases, so that the edge on the lower end side of the substrate holder 5 has the base 3 Lower than the edge portion 11 of the upper surface.

【0029】この基板ホルダ5の下端縁部分11の下降
する距離は、リンク18の長さ、直線ガイド15の長
さ、伸縮ロッド19aの伸びの長さを変更することで任
意に設定される。
The descending distance of the lower edge portion 11 of the substrate holder 5 is arbitrarily set by changing the length of the link 18, the length of the linear guide 15, and the extension length of the telescopic rod 19a.

【0030】すなわち、上記各支点22、23及びヒン
ジ10の3点からなる三角形を考えると、伸縮ロッド1
9aの伸びの長さに応じて各支点22、23を通る辺と
支点23及びヒンジ10を通る辺との成す角度が小さく
なる程、基板ホルダ5の起き上がり角度が大きくなり、
当該角度や伸縮ロッド19aの伸びの長さを調整するこ
とで、基板ホルダ5の起き上がり角度及び基板ホルダ5
の下端縁部分11の下降する距離を任意に設定できる。
That is, considering a triangle consisting of the fulcrums 22, 23 and the hinge 10 at three points, the telescopic rod 1
The smaller the angle formed by the side passing through each fulcrum 22, 23 and the side passing through the fulcrum 23 and the hinge 10 in accordance with the length of extension of 9a, the larger the rising angle of the substrate holder 5,
By adjusting the angle and the extension length of the telescopic rod 19a, the rising angle of the substrate holder 5 and the substrate holder 5 can be adjusted.
The descending distance of the lower edge portion 11 can be set arbitrarily.

【0031】なお、基板ホルダ5は、ヒンジ支持部材1
1、ヒンジ10及び移動ブロック14からなる部分と、
支持部材21とによってベース3上に水平状態に載置さ
れるものとなり、ヒンジ支持部材11、ヒンジ10及び
移動ブロック14の高さと支持部材21の高さとが同一
に形成されている。
The substrate holder 5 is the hinge support member 1
1, a portion including the hinge 10 and the moving block 14,
It is placed on the base 3 in a horizontal state by the supporting member 21, and the heights of the hinge supporting member 11, the hinge 10 and the moving block 14 are the same as the height of the supporting member 21.

【0032】基板ホルダ5の上方には、マクロ照明装置
30が設けられている。このマクロ照明装置30は、マ
クロ照明光を放射するマクロ光源31と、このマクロ光
源31から放射されたマクロ照明光を反射する反射ミラ
ー32と、この反射ミラー32で反射されたマクロ照明
光を収束するフレネルレンズ33とからなる。マクロ光
源31は例えば水平方向(X方向)にマクロ照明光を放
射するように設けられ、反射ミラー32は水平方向に対
して約50度に傾けて設けられ、照明光軸を起き上げた
大型ガラス基板側に折り曲げる。
A macro lighting device 30 is provided above the substrate holder 5. The macro lighting device 30 converges the macro light source 31 that emits macro light, a reflection mirror 32 that reflects the macro light emitted from the macro light source 31, and the macro light that is reflected by the reflection mirror 32. And a Fresnel lens 33 that does. The macro light source 31 is provided so as to emit macro illumination light in the horizontal direction (X direction), for example, and the reflection mirror 32 is provided at an angle of about 50 degrees with respect to the horizontal direction, and a large glass with the illumination optical axis raised. Bend to the board side.

【0033】ミクロ検査装置40は、ベース3上にX方
向に移動可能に設けられた門型アーム41と、この門型
アーム41の水平アームに沿ってY方向に移動可能に設
けられた顕微鏡42とからなる。
The microinspection device 40 includes a gate type arm 41 provided on the base 3 so as to be movable in the X direction, and a microscope 42 provided along the horizontal arm of the gate type arm 41 so as to be movable in the Y direction. Consists of.

【0034】制御装置43は、ジャッキ19の伸縮動作
を制御する機能と、マクロ光源31の点灯制御を行う機
能と、顕微鏡ステージ41のX方向に対する移動制御と
顕微鏡42のY方向に対する移動制御とを行って顕微鏡
42の観察視野がマクロ検査で特定された大型ガラス基
板4上の欠陥部分を捉える位置に移動させる機能とを有
する。
The control device 43 has a function of controlling the expansion / contraction operation of the jack 19, a function of controlling the lighting of the macro light source 31, a movement control of the microscope stage 41 in the X direction and a movement control of the microscope 42 in the Y direction. It has a function of moving the observation field of view of the microscope 42 to a position where the defective portion on the large-sized glass substrate 4 specified by the macro inspection is captured.

【0035】次に、上記の如く構成された装置の作用を
マクロ検査及びミクロ検査の場合について説明する。
Next, the operation of the apparatus constructed as described above will be described in the case of macro inspection and micro inspection.

【0036】検査開始前、ジャッキ19は縮んでおり、
大型ガラス基板4を載置する基板ホルダ5は水平状態に
ある。
Before starting the inspection, the jack 19 is contracted,
The substrate holder 5 on which the large glass substrate 4 is placed is in a horizontal state.

【0037】マクロ検査を行う場合、制御装置43の制
御によりジャッキ19の伸縮ロッド19aが伸び、リン
ク18が支点22を中心として回転する。このジャッキ
19の伸縮ロッド19aの伸び及びリンク18の回転に
より、基板ホルダ5の起き上げが開始される。
When conducting a macro inspection, the telescopic rod 19a of the jack 19 extends under the control of the control device 43, and the link 18 rotates about the fulcrum 22. The extension of the telescopic rod 19a of the jack 19 and the rotation of the link 18 start the raising of the substrate holder 5.

【0038】このとき、基板ホルダ5は、当該基板ホル
ダ5下面の各直線ガイド15が各摺動用溝16内を摺動
し、図4に示すようにベース3の縁部分11よりも前方
側にせり出されると共に、ヒンジ10を揺動中心として
起き上げられる。
At this time, in the substrate holder 5, the linear guides 15 on the lower surface of the substrate holder 5 slide in the sliding grooves 16 so that they are located in front of the edge portion 11 of the base 3 as shown in FIG. While being pushed out, the hinge 10 is raised around the swing center.

【0039】さらに、ジャッキ19の伸縮ロッド19a
が伸びるに従って基板ホルダ5は、起き上げられて下端
側となった基板ホルダ5の縁がベース3上面の縁部分1
1よりも下降する。
Further, the telescopic rod 19a of the jack 19
As the substrate holder 5 extends upward, the edge of the substrate holder 5 that is raised to the lower end side is the edge portion 1 of the upper surface of the base 3.
It is lower than 1.

【0040】マクロ検査を行うときは、観察者によって
ジャッキ19の伸縮ロッド19aの伸びが調整され、基
板ホルダ5がマクロ観察しやすい任意の起き上げ角度に
調整される。
When carrying out the macro inspection, the observer adjusts the extension of the telescopic rod 19a of the jack 19 so that the substrate holder 5 is adjusted to an arbitrary raising angle that facilitates macro observation.

【0041】このように起き上げられた基板ホルダ5
は、その下端側となった縁がベース3上面の縁部分11
よりも下降しているので、基板ホルダ5が架台1上に設
けられていても、大型ガラス基板4の全面が観察者に近
付き、特に大型ガラス基板4の上端部分の高さが従来よ
りも低くなり、大型ガラス基板4の上端部分と観察者と
の距離が短くなる。
The substrate holder 5 raised in this way
Is the lower end side of the edge portion 11 of the upper surface of the base 3.
Even if the substrate holder 5 is provided on the pedestal 1, the entire surface of the large glass substrate 4 approaches the observer, and in particular, the height of the upper end portion of the large glass substrate 4 is lower than in the conventional case. Therefore, the distance between the upper end portion of the large glass substrate 4 and the observer becomes short.

【0042】この状態に、マクロ光源31からマクロ照
明光が放射されると、このマクロ照明光は、反射ミラー
32で反射され、フレネルレンズ33により収束されて
基板ホルダ5上の大型ガラス基板4に照射される。
In this state, when macro illumination light is emitted from the macro light source 31, this macro illumination light is reflected by the reflection mirror 32, converged by the Fresnel lens 33, and is directed to the large glass substrate 4 on the substrate holder 5. Is irradiated.

【0043】観察者は、大型ガラス基板4で反射する光
を目視観察してマクロ検査するが、このとき大型ガラス
基板4の上端部分の高さが従来よりも低いので、大型ガ
ラス基板4の上端部分を見上げることなく、かつ大型ガ
ラス基板4の全面に亘って、例えば傷やむらなどの欠陥
部分の方向によって異なる反射方向の光を捉えて、大型
ガラス基板4に存在する欠陥部分を確実に特定できる。
The observer visually observes the light reflected by the large glass substrate 4 to perform macro inspection. At this time, since the height of the upper end portion of the large glass substrate 4 is lower than that of the conventional one, the upper end of the large glass substrate 4 is The defective portion existing on the large glass substrate 4 can be reliably identified by catching light in different reflection directions depending on the direction of the defective portion such as a scratch or unevenness over the entire surface of the large glass substrate 4 without looking up at the portion. it can.

【0044】又、マクロ検査を行うときには、例えば基
板ホルダ5がマクロ観察しやすい任意の起き上げ角度に
調整された状態で、かつ各ジャッキ19の伸縮ロッド1
9aが予め設定された伸縮長さで伸縮動作を繰り返す。
この伸縮動作の繰り返しにより基板ホルダ5は、所定周
期で矢印イ方向に連続して揺動する。
When performing a macro inspection, for example, the substrate holder 5 is adjusted to an arbitrary raising angle that facilitates macro observation, and the telescopic rod 1 of each jack 19 is adjusted.
9a repeats the stretching operation with a preset stretching length.
By repeating this expansion and contraction operation, the substrate holder 5 continuously swings in the direction of arrow A at a predetermined cycle.

【0045】この揺動する基板ホルダ5の起き上がり角
度範囲は、制御装置43に予め設定しておく。この制御
装置43は、予め設定された起き上がり角度範囲に応じ
て各ジャッキ19の伸縮ロッド19aの伸縮長さを決定
する。
The rising angle range of the swinging substrate holder 5 is preset in the controller 43. The control device 43 determines the extension / contraction length of the extension / contraction rod 19a of each jack 19 according to a preset rising angle range.

【0046】このように基板ホルダ5が連続して揺動す
れば、例えば傷やむらなどの欠陥部分の方向によって異
なる反射方向の光が観察者の視界に入るようになり、観
察者は視点の動きを少なくして上記例えば傷やむらなど
の欠陥部分を特定できる。
When the substrate holder 5 continuously swings in this way, light in different reflection directions comes into the observer's field of view depending on the direction of a defect such as a scratch or unevenness, and the observer sees the viewpoint. It is possible to specify the defective portion such as scratches or unevenness by reducing the movement.

【0047】なお、マクロ検査により特定された大型ガ
ラス基板4上の欠陥部分の座標データは、制御装置43
にインプットされる。
The coordinate data of the defective portion on the large glass substrate 4 specified by the macro inspection is the control device 43.
Is input to.

【0048】次に、ミクロ検査を行う。ジャッキ19
は、制御装置43の制御により伸縮ロッド19aが縮
み、これに応動してリンク18が支点22を中心として
基板ホルダ5の起き上げ時とは逆方向に回転し、基板ホ
ルダ5が元の水平状態に戻る。
Next, micro inspection is performed. Jack 19
Is contracted by the control device 43, and in response to this, the link 18 rotates about the fulcrum 22 in a direction opposite to that when the substrate holder 5 is raised, and the substrate holder 5 is in the original horizontal state. Return to.

【0049】基板ホルダ5がベース3上に降りて水平状
態になると、制御装置43は、マクロ検査時にインプッ
トされた欠陥部分の座標データに基づいて顕微鏡ステー
ジ41をX方向に移動制御すると共に、顕微鏡42を顕
微鏡ステージ41上でY方向に移動制御し、顕微鏡42
の観察視野をマクロ検査で特定された大型ガラス基板4
上の欠陥部分を捉える位置に移動させる。顕微鏡42に
より拡大された欠陥部分の像は、例えばCCDカメラに
より撮像され、モニタテレビジョンに表示される。観察
者は、モニタテレビジョンに表示された欠陥部分の拡大
像を観察する。
When the substrate holder 5 descends onto the base 3 and becomes horizontal, the control device 43 controls the movement of the microscope stage 41 in the X direction based on the coordinate data of the defective portion input during the macro inspection, and also the microscope. 42 is controlled to move in the Y direction on the microscope stage 41.
Large glass substrate 4 whose observation field of view was identified by macro inspection
Move to the position to catch the upper defect. The image of the defective portion magnified by the microscope 42 is captured by, for example, a CCD camera and displayed on a monitor television. The observer observes an enlarged image of the defective portion displayed on the monitor television.

【0050】なお、制御装置43は、顕微鏡ステージ4
1をX方向に移動制御すると共に、顕微鏡42を顕微鏡
ステージ41上でY方向に移動制御し、顕微鏡42の観
察視野を大型ガラス基板4の全面を走査するようにして
もよい。
Incidentally, the control device 43 controls the microscope stage 4
1 may be controlled to move in the X direction, and the microscope 42 may be controlled to move in the Y direction on the microscope stage 41 so that the observation field of the microscope 42 scans the entire surface of the large glass substrate 4.

【0051】ミクロ検査のとき、基板ホルダ5は、ヒン
ジ支持部材11、ヒンジ10及び移動ブロック14から
なる部分と、支持部材21とによってベース3上に載置
されるので、外部からの振動の影響を受けずに基板ホル
ダ5の安定性が高くなる。
During the micro inspection, the substrate holder 5 is placed on the base 3 by the portion including the hinge supporting member 11, the hinge 10 and the moving block 14 and the supporting member 21, so that the influence of external vibration is exerted. The stability of the substrate holder 5 is increased without being affected.

【0052】本発明の基板保持装置は、マクロ検査時及
びミクロ検査時に限らず、大型ガラス基板4を基板ホル
ダ5上に載置するときと、基板ホルダ5上から取り外す
ときの搬送装置としても使用できる。
The substrate holding device of the present invention is used not only during the macro inspection and the micro inspection but also as a transfer device when the large glass substrate 4 is placed on the substrate holder 5 and when it is removed from the substrate holder 5. it can.

【0053】例えば、大型ガラス基板4を基板ホルダ5
上に載置するとき、制御装置43の制御によりジャッキ
19の伸縮ロッド19aを伸ばすことにより、基板ホル
ダ5は、図4に示すようにベース3の縁部分11よりも
前方側にせり出しながらヒンジ10を揺動中心として起
き上げられ、かつ基板ホルダ5の下端側となった縁がベ
ース3上面の縁部分11よりも下降する。
For example, the large glass substrate 4 is attached to the substrate holder 5
When it is placed on the top, the expansion / contraction rod 19a of the jack 19 is extended by the control of the control device 43, so that the substrate holder 5 is pushed forward of the edge portion 11 of the base 3 as shown in FIG. The edge of the substrate holder 5 that is raised about the swing center and is on the lower end side of the substrate holder 5 is lower than the edge portion 11 of the upper surface of the base 3.

【0054】このように基板ホルダ5が起き上げられる
と、大型ガラス基板4は、略垂直方向(Z方向)に立て
た状態で図2に示す各ローラ付基準ピン8上に載置さ
れ、押付けピン9により各基準ピン7に向って押し付け
られ、基準位置にセットされる。この後、大型ガラス基
板4は、基板ホルダ5に設けられた図示しない吸着孔か
らの吸引によって、基板ホルダ5表面上に吸着固定され
る。この後、ジャッキ19の伸縮ロッド19aを縮め、
基板ホルダ5をベース3上に移動させる。
When the substrate holder 5 is raised in this manner, the large glass substrate 4 is placed on the reference pins 8 with rollers shown in FIG. 2 in a state of standing in a substantially vertical direction (Z direction) and pressed. The pin 9 is pressed toward each reference pin 7 and set in the reference position. After that, the large glass substrate 4 is sucked and fixed onto the surface of the substrate holder 5 by suction from a suction hole (not shown) provided in the substrate holder 5. After that, retract the telescopic rod 19a of the jack 19,
The substrate holder 5 is moved onto the base 3.

【0055】一方、大型ガラス基板4を基板ホルダ5上
から取り外すときは、上記載置するときと逆で、基板ホ
ルダ5が起き上げられた状態に、大型ガラス基板4に対
する吸着が解除され、大型ガラス基板4が略垂直方向
(Z方向)に立てられて基板ホルダ5から取り外され
る。
On the other hand, when the large glass substrate 4 is removed from the substrate holder 5, the adsorption to the large glass substrate 4 is released and the large glass substrate 4 is released in the state where the substrate holder 5 is raised, which is the reverse of the above placement. The glass substrate 4 is erected in a substantially vertical direction (Z direction) and removed from the substrate holder 5.

【0056】このような大型ガラス基板4の基板ホルダ
5への載置又は取り外しのとき、基板ホルダ5は、その
下端側の縁がベース3上面の縁部分11よりも下降して
いるので、大型ガラス基板4を基板ホルダ5上に載置す
る場合、大型ガラス基板4を高い位置まで持ち上げる必
要がなく、容易に大型ガラス基板4を基板ホルダ5に載
置又は取り外しができる。又、大型ガラス基板4を立て
た状態で位置決めすることで、大型ガラス基板4の自重
によりローラ付基準ピン8に下辺が位置決めされるの
で、ローラ付基準ピン8に対向する押付けピンを省くこ
とができ、かつ大型ガラス基板4と基板ホルダ5との間
の面接触抵抗が小さくなり、押付けピン9の押圧力を小
さくできる。
When such a large glass substrate 4 is placed on or removed from the substrate holder 5, the edge of the substrate holder 5 on the lower end side is lower than the edge portion 11 of the upper surface of the base 3, so that the large size of the substrate holder 5 is large. When the glass substrate 4 is placed on the substrate holder 5, it is not necessary to lift the large glass substrate 4 to a high position, and the large glass substrate 4 can be easily placed on or removed from the substrate holder 5. Further, by positioning the large glass substrate 4 in an upright state, the lower side of the large glass substrate 4 is positioned on the roller-equipped reference pin 8 by its own weight, so that the pressing pin facing the roller-equipped reference pin 8 can be omitted. In addition, the surface contact resistance between the large glass substrate 4 and the substrate holder 5 can be reduced, and the pressing force of the pressing pin 9 can be reduced.

【0057】このように上記第1の実施の形態において
は、架台1上で基板ホルダ5を水平状態又はジャッキ1
9の伸縮動作により起き上げ方向に揺動可能で、当該揺
動により基板ホルダ5を起き上がらせると、基板ホルダ
5は直線ガイド15のヒンジ10に設けられた移動ブロ
ック14に対して摺動して、ベース3の縁部分11より
前方にせり出し、かつ起き上がりにより下端側となる基
板ホルダ5の縁を架台1のベース3の縁部分11よりも
下降させるので、基板ホルダ5が架台1上に設けられて
いても、大型ガラス基板4の全面を観察者に近付けるこ
とができ、特に例えば1250×1100mmの大型ガ
ラス基板4の上端部分の高さを従来よりも低くでき、大
型ガラス基板4の上端部分と観察者との距離を短くで
き、これによって観察者は大型ガラス基板4の上端部分
を見上げることなく、かつ大型ガラス基板4の全面に亘
って、例えば傷やむらなどの欠陥部分の方向によって異
なる反射方向の光を捉えて、大型ガラス基板4に存在す
る欠陥部分を確実に特定できる。
As described above, in the first embodiment, the substrate holder 5 is placed in the horizontal state on the gantry 1 or the jack 1 is used.
When the substrate holder 5 is raised by the swinging motion, the substrate holder 5 slides with respect to the moving block 14 provided on the hinge 10 of the linear guide 15. The substrate holder 5 is provided on the pedestal 1 so that the edge of the substrate holder 5 that protrudes forward from the edge portion 11 of the base 3 and rises to the lower end side is lowered than the edge portion 11 of the base 3 of the pedestal 1. However, the entire surface of the large glass substrate 4 can be brought closer to the observer, and in particular, the height of the upper end portion of the large glass substrate 4 of, for example, 1250 × 1100 mm can be made lower than before, and The distance to the observer can be shortened, whereby the observer does not look up at the upper end portion of the large glass substrate 4 and scratches the entire surface of the large glass substrate 4, for example, scratches. Capture light of different reflection direction by the direction of the defect portion, such as, can be reliably identified defective portion present on a large glass substrate 4.

【0058】又、大型ガラス基板4を起き上げたときの
上端部分を従来よりも低くでき、これによりマクロ照明
装置30の設置位置も低くでき、基板検査装置全体の設
置スペースを小さくできる。
Further, the upper end portion when the large glass substrate 4 is raised can be made lower than in the conventional case, so that the installation position of the macro lighting device 30 can be made lower, and the installation space of the entire substrate inspection device can be made smaller.

【0059】又、マクロ検査を行うときには、例えば基
板ホルダ5がマクロ観察しやすい任意の起き上げ角度に
調整された状態で、各ジャッキ19の伸縮ロッド19a
の伸縮動作を連続して繰り返すことにより、観察者の視
点の動きを少なくして、例えば傷やむらなどの欠陥部分
の方向によって異なる反射方向の光を捉えてその欠陥部
分を特定できる。この場合、基板ホルダ5を揺動させる
角度範囲は、任意に制御装置43に設定できるので、例
えば傷やむらなどに限らず、欠け、汚れ、ダストなどの
多種多様な欠陥部分を特定することが可能である。
When conducting a macro inspection, for example, the telescopic rod 19a of each jack 19 with the substrate holder 5 adjusted to an arbitrary raising angle that facilitates macro observation.
By continuously repeating the expansion / contraction operation of, the movement of the observer's viewpoint can be reduced, and the defective portion can be specified by capturing light in a different reflection direction depending on the direction of the defective portion such as a scratch or unevenness. In this case, since the angular range in which the substrate holder 5 is swung can be arbitrarily set in the control device 43, it is possible to specify various kinds of defective portions such as chips, stains, dust, etc., as well as scratches and unevenness. It is possible.

【0060】ミクロ検査を行うときは、基板ホルダ5が
ヒンジ支持部材11、ヒンジ10及び移動ブロック14
からなる部分と、支持部材21とによってベース3上に
載置されるので、外部からの振動の影響を受けずに基板
ホルダ5の安定性を高くでき、揺れのない顕微鏡42の
拡大像で欠陥部分を観察できる。
When carrying out a micro inspection, the substrate holder 5 holds the hinge support member 11, the hinge 10 and the moving block 14.
Since it is placed on the base 3 by the part consisting of and the support member 21, the stability of the substrate holder 5 can be enhanced without being affected by external vibration, and a defect in an enlarged image of the shake-free microscope 42 can be obtained. You can observe the part.

【0061】さらに、基板ホルダ5を起き上げて下端側
となった縁をベース3の縁部分11よりも下降させた状
態で、基板ホルダ5上に対して大型ガラス基板4の載置
又は取り外し使用すれば、大型ガラス基板4を高い位置
まで持ち上げる必要がなく、容易に大型ガラス基板4の
基板ホルダ5への載置又は取り外しができる。
Further, with the substrate holder 5 raised and the edge on the lower end side lower than the edge portion 11 of the base 3, the large glass substrate 4 is placed on or removed from the substrate holder 5 for use. Then, it is not necessary to lift the large glass substrate 4 to a high position, and the large glass substrate 4 can be easily placed on or removed from the substrate holder 5.

【0062】又、基板ホルダ5をベース3の縁部分11
より前方側でせり出しながら基板ホルダ5を起き上がら
せるので、マクロ照明光を遮ることなくがない。
Further, the substrate holder 5 is attached to the edge portion 11 of the base 3.
Since the substrate holder 5 is raised while protruding toward the front side, there is no need to block the macro illumination light.

【0063】揺動機構は、揺動支点であるヒンジ10、
せり出し機構としての直線ガイド15、リンク機構17
などにより安価に構成できる。
The swing mechanism includes a hinge 10, which is a swing fulcrum,
Linear guide 15 as a protruding mechanism, link mechanism 17
It can be constructed at a low cost.

【0064】次に、本発明の第2の実施の形態について
図面を参照して説明する。なお、図1と同一部分には同
一符号を付してその詳しい説明は省略する。
Next, a second embodiment of the present invention will be described with reference to the drawings. The same parts as those in FIG. 1 are designated by the same reference numerals, and detailed description thereof will be omitted.

【0065】図5は本発明の基板保持装置を基板検査装
置に適用した構成図である。この基板保持装置におい
て、ヒンジ10、ヒンジ支持部材12、移動ブロック1
4、直線ガイド15、リンク18、ジャッキ19、延出
端部20及び支持部材21は、上記第1の実施の形態で
説明したように正面側から見てY方向の両端側にそれぞ
れ1組ずつ設けられており、本実施の形態では、これら
を各ヒンジ10,10’、各ヒンジ支持部材12,1
2’、各移動ブロック14,14’、各直線ガイド1
5,15’、各リンク18,18’、各ジャッキ19,
19’及び各支持部材21,21’の各符号を付して示
す。
FIG. 5 is a configuration diagram in which the substrate holding device of the present invention is applied to a substrate inspection device. In this substrate holding device, the hinge 10, the hinge support member 12, the moving block 1
4, the linear guide 15, the link 18, the jack 19, the extended end portion 20 and the support member 21 are provided in pairs on both end sides in the Y direction when viewed from the front side, as described in the first embodiment. In the present embodiment, these are provided as the hinges 10 and 10 ′ and the hinge support members 12 and 1.
2 ', each moving block 14, 14', each linear guide 1
5, 15 ', each link 18, 18', each jack 19,
19 'and each support member 21, 21' are attached and shown.

【0066】この基板保持装置には、図6に示すように
基板ホルダ5の起き上げ方向での揺動の軸方向に対して
垂直の軸方向で基板ホルダ5を揺動させる別方向揺動機
構50が設けられている。この別方向揺動機構50に
は、基板ホルダ5の起き上げ方向の揺動軸方向に対して
垂直な軸方向に回転(矢印ロ方向)させるヒンジユニッ
ト(回転支持部材)51が設けられている。このヒンジ
ユニット51は、ヒンジ保持アーム52と、このヒンジ
保持アーム52の両端にそれぞれ設けられた各ヒンジ支
持片52a、52bと、ヒンジ保持アーム52の底面に
おける略中央部に設けられた回転軸53とからなってい
る。このうち各ヒンジ支持片52a、52bには、それ
ぞれ各ヒンジ13、13’が回転可能に設けられてい
る。又、回転軸53は、ベース3の正面側における略中
央部に形成された回転用穴54内に回転可能に設けられ
ている。
In this substrate holding device, as shown in FIG. 6, another direction swing mechanism for swinging the substrate holder 5 in an axial direction perpendicular to the axial direction of swinging of the substrate holder 5 is raised. 50 are provided. The other-direction swing mechanism 50 is provided with a hinge unit (rotation support member) 51 for rotating (arrow arrow direction) in an axis direction perpendicular to the swing axis direction of the substrate holder 5 in the rising direction. . The hinge unit 51 includes a hinge holding arm 52, hinge supporting pieces 52a and 52b provided at both ends of the hinge holding arm 52, and a rotary shaft 53 provided at a substantially central portion of the bottom surface of the hinge holding arm 52. It consists of Of these, hinges 13 and 13 'are rotatably provided on the hinge support pieces 52a and 52b, respectively. The rotating shaft 53 is rotatably provided in a rotating hole 54 formed in a substantially central portion on the front side of the base 3.

【0067】制御装置43は、各ジャッキ19、19’
の各伸縮量をそれぞれ互いに異なる揺動量で制御する機
能、例えば一方のジャッキ19又は19’を伸縮させず
に他方のジャッキ19’又は19を伸縮させたり、又は
一方のジャッキ19又は19’を伸ばし他方のジャッキ
19’又は19を縮みさせる、さらにはこれらジャッキ
19、19’の伸縮動作を同期して伸縮させる機能を有
する。
The controller 43 controls the jacks 19 and 19 '.
Of controlling the respective expansion and contraction amounts of the respective jacks with different swinging amounts, for example, the other jack 19 'or 19' is expanded or contracted without expanding or contracting the one jack 19 or 19 ', or the one jack 19 or 19' is expanded. It has a function of contracting the other jack 19 'or 19 and further expanding and contracting in synchronization with the expansion and contraction operation of these jacks 19 and 19'.

【0068】このような構成であれば、マクロ検査を行
うときは、観察者によって各ジャッキ19、19’の各
伸縮ロッド19a、19a’の各伸びが調整され、基板
ホルダ5がマクロ観察しやすい任意の起き上げ角度に調
整される。
With such a configuration, when performing macro inspection, the observer adjusts the respective extensions of the telescopic rods 19a and 19a 'of the jacks 19 and 19' so that the substrate holder 5 can be easily macro-observed. It is adjusted to any rising angle.

【0069】この状態で、各ジャッキ19、19’の各
伸縮ロッド19a、19a’を同期させて伸縮動作を繰
り返しすれば、この伸縮動作の繰り返しにより基板ホル
ダ5は、所定周期で矢印イ方向に連続して揺動する。
In this state, if the expansion and contraction operation is repeated by synchronizing the expansion and contraction rods 19a and 19a 'of the jacks 19 and 19', the expansion and contraction operation causes the substrate holder 5 to move in the direction of arrow A at a predetermined cycle. Swing continuously.

【0070】又、各ジャッキ19、19’は、例えば一
方のジャッキ19又は19’を伸縮させずに他方のジャ
ッキ19’又は19を伸縮させたり、又は一方のジャッ
キ19又は19’を伸ばし他方のジャッキ19’又は1
9を縮みさせたり、さらにはこれらジャッキ19、1
9’の伸縮動作が連続して繰り返される。
Further, each of the jacks 19 and 19 'may be configured such that the other jack 19' or 19 'is expanded or contracted without expanding or contracting the one jack 19 or 19', or the one jack 19 or 19 'is extended or contracted. Jack 19 'or 1
9 to shrink, and further these jacks 19, 1
The expansion / contraction operation of 9'is continuously repeated.

【0071】このように各ジャッキ19、19’の伸縮
動作を変えることにより基板ホルダ5は、図6に示すヒ
ンジユニット51が回転軸53を中心として矢印ロ方向
に回転することにより、正面側から見て左右方向(以
下、首振り方向と称する)に揺動する。図7は一方のジ
ャッキ19又は19’を伸縮させずに他方のジャッキ1
9’又は19を伸縮させて基板ホルダ5を正面側から見
てみだり側に首振りした状態を示す。この首振り方向の
揺動範囲は、制御装置43に予め設定しておいてもよい
し、観察者の操作で任意に設定してもよい。
By changing the expansion / contraction operation of the jacks 19 and 19 'in this way, the substrate holder 5 is moved from the front side by rotating the hinge unit 51 shown in FIG. It swings in the left-right direction when viewed (hereinafter referred to as the swinging direction). FIG. 7 shows one jack 19 or 19 'without expanding or contracting the other jack 1 or 19'.
9 shows a state in which 9 ′ or 19 is expanded / contracted and the substrate holder 5 is swung to the outer side when viewed from the front. The swing range in the swinging direction may be set in the control device 43 in advance, or may be set arbitrarily by the operation of the observer.

【0072】このように上記第2の実施の形態によれ
ば、基板ホルダ5を首振り方向に揺動して任意の首振り
角度に設定したり、又は連続して揺動することができて
マクロ検査のバリエーションを増やすことができ、これ
により起き上がり方向(矢印イ方向)での揺動で検出で
きなかった傷やむらなどの欠陥部分からの反射光を観察
者により検出でき、当該欠陥部分を特定できる。
As described above, according to the second embodiment, the substrate holder 5 can be swung in the swinging direction to set an arbitrary swinging angle, or can be continuously swung. It is possible to increase the variation of macro inspection, so that the observer can detect the reflected light from the defect such as scratches and unevenness that could not be detected by the swing in the rising direction (arrow A direction), and the defect can be detected. Can be specified.

【0073】又、基板ホルダ5の起き上がり方向の揺動
と首振り方向の揺動とを同時に動作させて、基板ホルダ
5をあらゆる角度方向に設定したり、連続的にあらゆる
角度方向に揺動させてマクロ検査できる。
Further, the swinging of the substrate holder 5 in the rising direction and the swinging in the swinging direction are simultaneously operated to set the substrate holder 5 in any angular direction or continuously swing in any angular direction. Macro inspection.

【0074】なお、本発明は、上記第1及び第2の実施
の形態に限定されるものでなく、実施段階ではその要旨
を逸脱しない範囲で種々に変形することが可能である。
The present invention is not limited to the above-mentioned first and second embodiments, and can be variously modified at the stage of implementation without departing from the spirit of the invention.

【0075】さらに、上記実施形態には、種々の段階の
発明が含まれており、開示されている複数の構成要件に
おける適宜な組み合わせにより種々の発明が抽出でき
る。例えば、実施形態に示されている全構成要件から幾
つかの構成要件が削除されても、発明が解決しようとす
る課題の欄で述べた課題が解決でき、発明の効果の欄で
述べられている効果が得られる場合には、この構成要件
が削除された構成が発明として抽出できる。
Furthermore, the above-described embodiments include inventions at various stages, and various inventions can be extracted by appropriately combining a plurality of disclosed constituent elements. For example, even if some constituent elements are deleted from all the constituent elements shown in the embodiment, the problem described in the section of the problem to be solved by the invention can be solved, and it is described in the section of the effect of the invention. When the effect of being obtained is obtained, a configuration in which this constituent element is deleted can be extracted as an invention.

【0076】例えば、上記第1及び第2の実施の形態で
は、基板ホルダ5を起き上がらせるとき、基板ホルダ5
をベース3の縁部分11より前方にせり出しながら基板
ホルダ5の下側となる縁を架台1のベース3の縁部分1
1よりも下降させているが、これに限らず、先ずは基板
ホルダ5をベース3の縁部分11より前方にせり出さ
せ、この後に基板ホルダ5をヒンジ10の回転軸13を
中心にして回動させてベース3の縁部分11よりも下降
させてもよく、とにかく基板ホルダ5を水平状態から所
定の傾斜角度に起き上がらせたときに、基板ホルダ5の
下側となる縁をベース3の縁部分11よりも下降させる
ように揺動させればよい。このような基板ホルダ5の揺
動動作は、揺動機構の構成を種々変形することにより可
能である。
For example, in the first and second embodiments, when raising the substrate holder 5, the substrate holder 5
Edge of the base 3 of the pedestal 1 while protruding the edge of the base 3 forward of the edge 11 of the base 3.
Although it is lower than 1, the substrate holder 5 is first pushed forward from the edge portion 11 of the base 3, and then the substrate holder 5 is rotated around the rotation shaft 13 of the hinge 10. It may be moved to lower than the edge portion 11 of the base 3, and anyway, when the substrate holder 5 is raised from the horizontal state to a predetermined inclination angle, the edge below the substrate holder 5 is the edge of the base 3. It may be rocked so as to be lower than the portion 11. Such swinging movement of the substrate holder 5 can be performed by variously modifying the structure of the swinging mechanism.

【0077】又、各リンク18、18’の長さは、例え
ばジャッキに代えてもよく、これらジャッキに代えるこ
とにより、基板ホルダ5を起き上げた状態で当該ジャッ
キを伸縮させると、基板ホルダ5を上下方向に移動させ
ることができ、大型ガラス基板上の目視観察したい領域
を、観察者のマクロ検査し易い高さ位置に配置できる。
The lengths of the links 18 and 18 'may be replaced by, for example, jacks. When the jacks are expanded and contracted while the board holder 5 is raised by replacing these jacks, the board holder 5 Can be moved in the vertical direction, and the region on the large glass substrate desired to be visually observed can be arranged at the height position where the macro inspection by the observer is easy.

【0078】揺動機構は、揺動支点であるヒンジ10、
せり出し機構としての直線ガイド15、リンク機構17
などから構成したが、これに限らず、他の如何なる機構
を用いてもよく、例えば、基板ホルダ5の揺動支点とな
る各ヒンジ10,10’に揺動とスライド機能とを兼ね
備えた構成にしてもよく、又、基板ホルダ5を円弧状の
移動させる揺動機構を用いてもよい。
The swing mechanism includes a hinge 10, which is a swing fulcrum,
Linear guide 15 as a protruding mechanism, link mechanism 17
However, the present invention is not limited to this, and any other mechanism may be used. For example, each of the hinges 10 and 10 ′ serving as the swing fulcrum of the substrate holder 5 has a swing function and a slide function. Alternatively, a swinging mechanism that moves the substrate holder 5 in an arc shape may be used.

【0079】又、本発明の基板保持装置は、例えばフラ
ットパネルディスプレイ製造工程で用いる基板検査装置
に適用してマクロ検査とミクロ検査とを複合した構成に
ついて説明したが、これに限らず、マクロ検査の単体で
用いてもよく、さらには大型ガラス基板4上の膜厚測定
やパターン検査などの各種基板の検査装置に適用して、
大型ガラス基板4の保持や大型ガラス基板4への載置、
取り出しに用いることができる。
Further, although the substrate holding apparatus of the present invention is applied to, for example, a substrate inspecting apparatus used in the manufacturing process of a flat panel display, and a configuration in which a macro inspection and a micro inspection are combined is described, the present invention is not limited to this. May be used alone, and further applied to various substrate inspection devices such as film thickness measurement and pattern inspection on the large glass substrate 4,
Holding the large glass substrate 4, mounting on the large glass substrate 4,
It can be used for removal.

【0080】[0080]

【発明の効果】以上詳記したように本発明によれば、大
型ガラス基板を起き上げてもその上端部分が高くなら
ず、省スペース化を実現できる基板保持装置を提供でき
る。
As described above in detail, according to the present invention, it is possible to provide a substrate holding device capable of realizing space saving without raising the upper end portion of a large glass substrate even when it is raised.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係わる基板保持装置の第1の実施の形
態を示す構成図。
FIG. 1 is a configuration diagram showing a first embodiment of a substrate holding device according to the present invention.

【図2】本発明に係わる基板保持装置の第1の実施の形
態における基板ホルダの正面構成図。
FIG. 2 is a front configuration diagram of a substrate holder in the first embodiment of the substrate holding device according to the present invention.

【図3】本発明に係わる基板保持装置の第1の実施の形
態におけるヒンジ部分の拡大図。
FIG. 3 is an enlarged view of a hinge portion in the first embodiment of the substrate holding device according to the present invention.

【図4】本発明に係わる基板保持装置の第1の実施の形
態における基板ホルダの起き上がり動作を示す図。
FIG. 4 is a view showing a rising operation of the substrate holder in the first embodiment of the substrate holding device according to the present invention.

【図5】本発明に係わる基板保持装置の第2の実施の形
態を示す構成図。
FIG. 5 is a configuration diagram showing a second embodiment of a substrate holding device according to the present invention.

【図6】本発明に係わる基板保持装置の第2の実施の形
態における別方向揺動機構の構成図。
FIG. 6 is a configuration diagram of another direction swing mechanism in the second embodiment of the substrate holding device according to the present invention.

【図7】本発明に係わる基板保持装置の第2の実施の形
態における基板ホルダの首振り方向の揺動を示す図。
FIG. 7 is a diagram showing swinging of a substrate holder in a swinging direction in a second embodiment of a substrate holding device according to the present invention.

【符号の説明】[Explanation of symbols]

1:架台 2:脚 2a:水平梁 3:ベース 4:大型ガラス基板 5:基板ホルダ 6:開口部 7:基準ピン 8:ローラ付基準ピン 9:押付けピン 10,10’:ヒンジ 11:縁部分 12,12’:ヒンジ支持部材 13:回動軸 14,14’:移動ブロック 15,15’:直線ガイド 15a:ストッパ 16:摺動用溝 17:リンク機構 18,18’:リンク 19,19’:ジャッキ 19a:伸縮ロッド 20:延出端部 21,21’:支持部材 22,23:支点 24,25:支点 30:マクロ照明装置 31:マクロ光源 32:反射ミラー 33:フレネルレンズ 40:ミクロ検査装置 41:門型アーム 42:顕微鏡 43:制御装置 50:別方向揺動機構 51:ヒンジユニット 52:ヒンジ保持アーム 52a,52b:ヒンジ支持片 53:回転軸 54:回転用穴 1: Stand 2: leg 2a: Horizontal beam 3: Base 4: Large glass substrate 5: Substrate holder 6: opening 7: Reference pin 8: Reference pin with roller 9: Press pin 10, 10 ': Hinge 11: Edge 12, 12 ': Hinge support member 13: rotation axis 14,14 ': Moving block 15,15 ': Straight guide 15a: Stopper 16: Sliding groove 17: Link mechanism 18,18 ': Link 19, 19 ': Jack 19a: Telescopic rod 20: Extended end 21,21 ': support member 22, 23: fulcrum 24, 25: fulcrum 30: Macro lighting device 31: Macro light source 32: Reflection mirror 33: Fresnel lens 40: Micro inspection device 41: Gate type arm 42: microscope 43: Control device 50: Different direction swing mechanism 51: Hinge unit 52: Hinge holding arm 52a, 52b: Hinge support pieces 53: rotating shaft 54: hole for rotation

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2G051 AA84 DA01 DA08 2G086 EE10 2H088 FA17 FA30 HA01 MA20 5F031 CA05 HA13 KA03 LA16 MA33 PA18    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2G051 AA84 DA01 DA08                 2G086 EE10                 2H088 FA17 FA30 HA01 MA20                 5F031 CA05 HA13 KA03 LA16 MA33                       PA18

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 大型基板を保持する基板ホルダを架台上
に設けた基板保持装置において、 前記架台上で前記基板ホルダを水平状態又は当該基板ホ
ルダの起き上げ方向に揺動可能で、当該揺動により前記
基板ホルダを起き上がらせると、この起き上げにより下
端側となる前記基板ホルダの縁を前記架台上面の縁部分
よりも下降させる揺動機構、を具備したことを特徴とす
る基板保持装置。
1. A substrate holding device in which a substrate holder for holding a large-sized substrate is provided on a pedestal, wherein the substrate holder can be oscillated in a horizontal state on the gantry or in a rising direction of the substrate holder. When the substrate holder is raised by means of the above, the substrate holding device is provided with a swinging mechanism for lowering the edge of the substrate holder on the lower end side from the edge portion of the upper surface of the gantry by this raising.
【請求項2】 前記基板ホルダの起き上げ方向の揺動軸
方向に対して異なる軸方向で前記基板ホルダを揺動させ
る別方向揺動機構、を具備したことを特徴とする請求項
1記載の基板保持装置。
2. A different-direction swing mechanism that swings the substrate holder in different axial directions with respect to the swing axis direction of the rising direction of the substrate holder. Substrate holding device.
【請求項3】 前記揺動機構は、前記基板ホルダを前記
架台上面の縁部分の前方側で揺動させることを特徴とす
る請求項1又は2記載の基板保持装置。
3. The substrate holding device according to claim 1, wherein the swinging mechanism swings the substrate holder in front of an edge portion of the upper surface of the gantry.
【請求項4】 前記揺動機構は、前記基板ホルダを前記
架台上で水平状態又は起き上げ方向に揺動させるリンク
機構と、 前記架台上面の縁部分に設けられ、前記基板ホルダを起
き上げ方向に揺動させる揺動支点と、 前記リンク機構による前記基板ホルダの揺動に応動して
前記基板ホルダに対する前記揺動支点をスライド移動さ
せ、前記基板ホルダを前記架台上面の縁部分よりも前方
側にせり出させながら前記基板ホルダの起き上げにより
下側となる縁を前記架台上面の縁部分よりも下降させる
せり出し機構と、を有することを特徴とする請求項1又
は2記載の基板保持装置。
4. The link mechanism, which is provided at an edge portion of an upper surface of the gantry, includes a link mechanism that oscillates the substrate holder in a horizontal state on the gantry or in an upright direction. And a swing fulcrum for swinging the substrate holder by the link mechanism to slide the swing fulcrum with respect to the substrate holder to move the substrate holder forward of the edge portion of the pedestal upper surface. 3. The substrate holding device according to claim 1 or 2, further comprising: a protruding mechanism that lowers the lower edge of the substrate holder from the edge portion of the top surface of the gantry while raising the substrate holder.
【請求項5】 前記せり出し機構は、前記揺動支点を前
記架台上面の縁部分に設け、かつ前記揺動支点に対して
前記基板ホルダをスライド移動させるガイドを前記基板
ホルダに設けたことを特徴とする請求項4記載の基板保
持装置。
5. The protrusion mechanism is characterized in that the swing fulcrum is provided at an edge portion of the upper surface of the gantry, and a guide for slidingly moving the substrate holder with respect to the swing fulcrum is provided on the substrate holder. The substrate holding device according to claim 4.
【請求項6】 前記別方向揺動機構は、前記基板ホルダ
の起き上げ方向での前記揺動の軸方向に対して垂直の軸
方向で前記基板ホルダを揺動させることを特徴とする請
求項2記載の基板保持装置。
6. The another-direction swing mechanism swings the substrate holder in an axial direction perpendicular to the axial direction of the swing in the raising direction of the substrate holder. 2. The substrate holding device according to item 2.
【請求項7】 前記別方向揺動機構は、前記基板ホルダ
の起き上げ方向の揺動軸方向に対して垂直な軸方向に回
転可能に前記架台上面の縁部分に設けられた回転支持部
材と、 この回転支持部材に設けられ、前記基板ホルダを起き上
げ方向に揺動可能に支持する揺動支点と、 前記基板ホルダに設けられ、前記揺動支点に対して前記
基板ホルダをスライド移動させるガイドと、 前記基板ホルダの両端側にそれぞれ設けられ、これら基
板ホルダの両端側で当該基板ホルダの起き上げ方向に対
して互いに異なる揺動量で揺動させる各リンク機構と、
を有することを特徴とする請求項2記載の基板保持装
置。
7. The other-direction swing mechanism includes a rotation support member provided on an edge portion of the pedestal upper surface so as to be rotatable in an axial direction perpendicular to a swing axis direction of a rising direction of the substrate holder. A swing fulcrum provided on the rotation support member for swingably supporting the substrate holder in a rising direction; and a guide provided on the substrate holder for sliding the substrate holder with respect to the swing fulcrum. And link mechanisms that are respectively provided on both end sides of the substrate holder and that swing on both end sides of the substrate holder with different swing amounts with respect to the rising direction of the substrate holder,
The substrate holding apparatus according to claim 2, further comprising:
JP2002157941A 2002-05-30 2002-05-30 Substrate holding device and substrate inspection device Expired - Fee Related JP3931111B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2002157941A JP3931111B2 (en) 2002-05-30 2002-05-30 Substrate holding device and substrate inspection device
KR10-2004-7001004A KR20050005390A (en) 2002-05-30 2003-05-27 Substrate holding apparatus and substrate examining apparatus
CNB038007347A CN100483115C (en) 2002-05-30 2003-05-27 Substrate holding device and substrate inspection device
PCT/JP2003/006611 WO2003102561A1 (en) 2002-05-30 2003-05-27 Substrate holding device and substrate inspection device
TW092114436A TWI313039B (en) 2002-05-30 2003-05-28 Substrate holding appatatus and substrate examination apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002157941A JP3931111B2 (en) 2002-05-30 2002-05-30 Substrate holding device and substrate inspection device

Publications (3)

Publication Number Publication Date
JP2003344294A true JP2003344294A (en) 2003-12-03
JP2003344294A5 JP2003344294A5 (en) 2005-10-06
JP3931111B2 JP3931111B2 (en) 2007-06-13

Family

ID=29706474

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (5)

Country Link
JP (1) JP3931111B2 (en)
KR (1) KR20050005390A (en)
CN (1) CN100483115C (en)
TW (1) TWI313039B (en)
WO (1) WO2003102561A1 (en)

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Also Published As

Publication number Publication date
CN100483115C (en) 2009-04-29
TW200307339A (en) 2003-12-01
WO2003102561A1 (en) 2003-12-11
KR20050005390A (en) 2005-01-13
TWI313039B (en) 2009-08-01
JP3931111B2 (en) 2007-06-13
CN1578907A (en) 2005-02-09

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