JP2003218065A5 - - Google Patents

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Publication number
JP2003218065A5
JP2003218065A5 JP2002329878A JP2002329878A JP2003218065A5 JP 2003218065 A5 JP2003218065 A5 JP 2003218065A5 JP 2002329878 A JP2002329878 A JP 2002329878A JP 2002329878 A JP2002329878 A JP 2002329878A JP 2003218065 A5 JP2003218065 A5 JP 2003218065A5
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JP
Japan
Prior art keywords
nitride semiconductor
main surface
substrate
surface side
semiconductor device
Prior art date
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Application number
JP2002329878A
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English (en)
Japanese (ja)
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JP4244618B2 (ja
JP2003218065A (ja
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Priority to JP2002329878A priority Critical patent/JP4244618B2/ja
Priority claimed from JP2002329878A external-priority patent/JP4244618B2/ja
Publication of JP2003218065A publication Critical patent/JP2003218065A/ja
Publication of JP2003218065A5 publication Critical patent/JP2003218065A5/ja
Application granted granted Critical
Publication of JP4244618B2 publication Critical patent/JP4244618B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002329878A 2002-11-13 2002-11-13 窒化物半導体素子の製造方法 Expired - Lifetime JP4244618B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002329878A JP4244618B2 (ja) 2002-11-13 2002-11-13 窒化物半導体素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002329878A JP4244618B2 (ja) 2002-11-13 2002-11-13 窒化物半導体素子の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP34593797A Division JP3604550B2 (ja) 1997-12-16 1997-12-16 窒化物半導体素子の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008036300A Division JP5271563B2 (ja) 2008-02-18 2008-02-18 窒化物半導体素子の製造方法

Publications (3)

Publication Number Publication Date
JP2003218065A JP2003218065A (ja) 2003-07-31
JP2003218065A5 true JP2003218065A5 (enExample) 2005-06-23
JP4244618B2 JP4244618B2 (ja) 2009-03-25

Family

ID=27655810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002329878A Expired - Lifetime JP4244618B2 (ja) 2002-11-13 2002-11-13 窒化物半導体素子の製造方法

Country Status (1)

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JP (1) JP4244618B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4334321B2 (ja) 2003-11-05 2009-09-30 シャープ株式会社 窒化物半導体発光ダイオードチップの作製方法
JP2006086516A (ja) 2004-08-20 2006-03-30 Showa Denko Kk 半導体発光素子の製造方法
JP4346598B2 (ja) 2005-10-06 2009-10-21 株式会社東芝 化合物半導体素子及びその製造方法
US7557430B2 (en) * 2006-05-25 2009-07-07 Skyworks Solutions, Inc. Semiconductor seal ring
JP5556657B2 (ja) * 2008-05-14 2014-07-23 豊田合成株式会社 Iii族窒化物半導体発光素子の製造方法及びiii族窒化物半導体発光素子、並びにランプ
JP2010103424A (ja) * 2008-10-27 2010-05-06 Showa Denko Kk 半導体発光素子の製造方法
JP5573192B2 (ja) 2010-01-22 2014-08-20 三菱電機株式会社 半導体装置の製造方法

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