JP2003174017A5 - - Google Patents
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- Publication number
- JP2003174017A5 JP2003174017A5 JP2001332462A JP2001332462A JP2003174017A5 JP 2003174017 A5 JP2003174017 A5 JP 2003174017A5 JP 2001332462 A JP2001332462 A JP 2001332462A JP 2001332462 A JP2001332462 A JP 2001332462A JP 2003174017 A5 JP2003174017 A5 JP 2003174017A5
- Authority
- JP
- Japan
- Prior art keywords
- quartz member
- processing apparatus
- plasma
- plasma processing
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 21
- 238000001039 wet etching Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- 238000005498 polishing Methods 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 4
- 239000006061 abrasive grain Substances 0.000 claims 2
- 238000003672 processing method Methods 0.000 claims 2
- 238000004381 surface treatment Methods 0.000 claims 2
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001332462A JP4034543B2 (ja) | 2001-09-25 | 2001-10-30 | プラズマ処理装置用石英部材の加工方法，プラズマ処理装置用石英部材およびプラズマ処理装置用石英部材が実装されたプラズマ処理装置 |
| TW091120471A TW556269B (en) | 2001-09-25 | 2002-09-09 | Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon |
| CNB028186265A CN1293611C (zh) | 2001-09-25 | 2002-09-12 | 等离子体处理装置用石英部件及其加工方法、及安装有该石英部件的等离子体处理装置 |
| KR1020047004313A KR100585436B1 (ko) | 2001-09-25 | 2002-09-12 | 플라즈마 처리 장치용 석영부재의 가공 방법, 플라즈마처리 장치용 석영부재 및 플라즈마 처리 장치용석영부재가 실장된 플라즈마 처리 장치 |
| US10/490,105 US20040200804A1 (en) | 2001-09-25 | 2002-09-12 | Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon |
| PCT/JP2002/009311 WO2003028083A1 (fr) | 2001-09-25 | 2002-09-12 | Procede de traitement d'une piece de quartz pour dispositif de traitement au plasma, piece de quartz ainsi traitee, et dispositif de traitement au plasma utilisant ladite piece |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001292251 | 2001-09-25 | ||
| JP2001-292251 | 2001-09-25 | ||
| JP2001332462A JP4034543B2 (ja) | 2001-09-25 | 2001-10-30 | プラズマ処理装置用石英部材の加工方法，プラズマ処理装置用石英部材およびプラズマ処理装置用石英部材が実装されたプラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003174017A JP2003174017A (ja) | 2003-06-20 |
| JP2003174017A5 true JP2003174017A5 (https=) | 2005-06-02 |
| JP4034543B2 JP4034543B2 (ja) | 2008-01-16 |
Family
ID=26622843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001332462A Expired - Fee Related JP4034543B2 (ja) | 2001-09-25 | 2001-10-30 | プラズマ処理装置用石英部材の加工方法，プラズマ処理装置用石英部材およびプラズマ処理装置用石英部材が実装されたプラズマ処理装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20040200804A1 (https=) |
| JP (1) | JP4034543B2 (https=) |
| KR (1) | KR100585436B1 (https=) |
| CN (1) | CN1293611C (https=) |
| TW (1) | TW556269B (https=) |
| WO (1) | WO2003028083A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4888392B2 (ja) * | 2005-09-20 | 2012-02-29 | コニカミノルタオプト株式会社 | 防眩性反射防止フィルムの形成方法及び防眩性反射防止フィルム |
| KR100997839B1 (ko) * | 2006-01-31 | 2010-12-01 | 도쿄엘렉트론가부시키가이샤 | 마이크로파 플라즈마 처리 장치 및 천판 |
| JP2008037498A (ja) * | 2006-07-11 | 2008-02-21 | Kirin Brewery Co Ltd | プラスチックキャップ及びそれで密封された製品又は容器 |
| CN101740335B (zh) * | 2008-11-14 | 2011-05-04 | 中芯国际集成电路制造(北京)有限公司 | 半导体制造设备和半导体结构的刻蚀方法 |
| US20120255635A1 (en) * | 2011-04-11 | 2012-10-11 | Applied Materials, Inc. | Method and apparatus for refurbishing gas distribution plate surfaces |
| CN102807327B (zh) * | 2011-06-03 | 2014-11-19 | 中芯国际集成电路制造(上海)有限公司 | 一种降低干刻蚀腔体喷嘴内壁的粗糙度的方法 |
| KR102019817B1 (ko) * | 2017-09-07 | 2019-09-09 | 주식회사 원익큐엔씨 | 쿼츠 표면 처리 방법 |
| JP7503951B2 (ja) | 2020-07-17 | 2024-06-21 | 東京エレクトロン株式会社 | エッチング処理装置、石英部材及びプラズマ処理方法 |
| US11401608B2 (en) * | 2020-10-20 | 2022-08-02 | Sky Tech Inc. | Atomic layer deposition equipment and process method |
| CN114536158B (zh) * | 2022-01-19 | 2023-03-31 | 宁波云德半导体材料有限公司 | 一种刻蚀机反应腔的石英窗的加工方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09167755A (ja) * | 1995-12-15 | 1997-06-24 | Nec Corp | プラズマ酸化膜処理装置 |
| JP2000114353A (ja) * | 1998-09-30 | 2000-04-21 | Ibiden Co Ltd | 半導体製造装置用部品 |
| JP4256516B2 (ja) * | 1999-02-17 | 2009-04-22 | 株式会社アトック | 石英ガラス円筒体の内面研磨方法 |
| US6368410B1 (en) * | 1999-06-28 | 2002-04-09 | General Electric Company | Semiconductor processing article |
| JP2001089198A (ja) * | 1999-09-22 | 2001-04-03 | Asahi Glass Co Ltd | 半導体装置用石英ガラス治具およびその製造方法 |
| US6887576B2 (en) * | 2000-08-23 | 2005-05-03 | Herseus Quarzglas GmbH & Co. KG | Quartz glass body having improved resistance against plasma corrosion, and method for production thereof |
| US20040173313A1 (en) * | 2003-03-03 | 2004-09-09 | Bradley Beach | Fire polished showerhead electrode |
-
2001
- 2001-10-30 JP JP2001332462A patent/JP4034543B2/ja not_active Expired - Fee Related
-
2002
- 2002-09-09 TW TW091120471A patent/TW556269B/zh not_active IP Right Cessation
- 2002-09-12 US US10/490,105 patent/US20040200804A1/en not_active Abandoned
- 2002-09-12 WO PCT/JP2002/009311 patent/WO2003028083A1/ja not_active Ceased
- 2002-09-12 KR KR1020047004313A patent/KR100585436B1/ko not_active Expired - Fee Related
- 2002-09-12 CN CNB028186265A patent/CN1293611C/zh not_active Expired - Fee Related
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