JP2002534564A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002534564A5 JP2002534564A5 JP2000593549A JP2000593549A JP2002534564A5 JP 2002534564 A5 JP2002534564 A5 JP 2002534564A5 JP 2000593549 A JP2000593549 A JP 2000593549A JP 2000593549 A JP2000593549 A JP 2000593549A JP 2002534564 A5 JP2002534564 A5 JP 2002534564A5
- Authority
- JP
- Japan
- Prior art keywords
- water
- soluble polymer
- dithiocarbamate
- wastewater
- potassium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920003169 water-soluble polymer Polymers 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- DKVNPHBNOWQYFE-UHFFFAOYSA-N carbamodithioic acid Chemical compound NC(S)=S DKVNPHBNOWQYFE-UHFFFAOYSA-N 0.000 description 8
- 239000002351 wastewater Substances 0.000 description 7
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 4
- 239000012990 dithiocarbamate Substances 0.000 description 4
- 229910001385 heavy metal Inorganic materials 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- YIRLUIDCBMHRSU-UHFFFAOYSA-N azane;1,2-dichloroethane Chemical compound N.ClCCCl YIRLUIDCBMHRSU-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- FHHJDRFHHWUPDG-UHFFFAOYSA-N peroxysulfuric acid Chemical compound OOS(O)(=O)=O FHHJDRFHHWUPDG-UHFFFAOYSA-N 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XWNSFEAWWGGSKJ-UHFFFAOYSA-N 4-acetyl-4-methylheptanedinitrile Chemical compound N#CCCC(C)(C(=O)C)CCC#N XWNSFEAWWGGSKJ-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004153 Potassium bromate Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- SENRGCCOVBYBGK-UHFFFAOYSA-N [K].OOS(O)(=O)=O Chemical compound [K].OOS(O)(=O)=O SENRGCCOVBYBGK-UHFFFAOYSA-N 0.000 description 1
- QUEDYRXQWSDKKG-UHFFFAOYSA-M [O-2].[O-2].[V+5].[OH-] Chemical compound [O-2].[O-2].[V+5].[OH-] QUEDYRXQWSDKKG-UHFFFAOYSA-M 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000019395 ammonium persulphate Nutrition 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- WRIRWRKPLXCTFD-UHFFFAOYSA-N malonamide Chemical compound NC(=O)CC(N)=O WRIRWRKPLXCTFD-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 235000019396 potassium bromate Nutrition 0.000 description 1
- 229940094037 potassium bromate Drugs 0.000 description 1
- -1 potassium ferricyanide Chemical compound 0.000 description 1
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 description 1
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical group [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 description 1
- 239000001230 potassium iodate Substances 0.000 description 1
- 229940093930 potassium iodate Drugs 0.000 description 1
- 235000006666 potassium iodate Nutrition 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- AQLJVWUFPCUVLO-UHFFFAOYSA-N urea hydrogen peroxide Chemical compound OO.NC(N)=O AQLJVWUFPCUVLO-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23248599A | 1999-01-15 | 1999-01-15 | |
| US09/232,485 | 1999-01-15 | ||
| PCT/US1999/028477 WO2000041974A1 (en) | 1999-01-15 | 1999-12-02 | Composition and method for simultaneously precipitating metal ions from semiconductor wastewater and enhancing microfilter operation |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011050504A Division JP5570458B2 (ja) | 1999-01-15 | 2011-03-08 | 半導体廃水から金属イオンを沈殿させ、同時にマイクロフィルターの運転を向上させる組成物および方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002534564A JP2002534564A (ja) | 2002-10-15 |
| JP2002534564A5 true JP2002534564A5 (https=) | 2006-10-05 |
Family
ID=22873309
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000593549A Pending JP2002534564A (ja) | 1999-01-15 | 1999-12-02 | 半導体廃水から金属イオンを沈殿させ、同時にマイクロフィルターの運転を向上させる組成物および方法 |
| JP2011050504A Expired - Lifetime JP5570458B2 (ja) | 1999-01-15 | 2011-03-08 | 半導体廃水から金属イオンを沈殿させ、同時にマイクロフィルターの運転を向上させる組成物および方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011050504A Expired - Lifetime JP5570458B2 (ja) | 1999-01-15 | 2011-03-08 | 半導体廃水から金属イオンを沈殿させ、同時にマイクロフィルターの運転を向上させる組成物および方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US6258277B1 (https=) |
| EP (1) | EP1171389B1 (https=) |
| JP (2) | JP2002534564A (https=) |
| KR (1) | KR20010101520A (https=) |
| CN (2) | CN1978336B (https=) |
| AU (1) | AU1929600A (https=) |
| DE (1) | DE69941160D1 (https=) |
| MY (1) | MY123469A (https=) |
| TW (1) | TW508344B (https=) |
| WO (1) | WO2000041974A1 (https=) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6797195B1 (en) * | 1995-05-19 | 2004-09-28 | Lawrence Kreisler | Method for recovering and separating metals from waste streams |
| US6203705B1 (en) * | 1999-10-22 | 2001-03-20 | Koch Microelectronic Service Company, Inc. | Process for treating waste water containing copper |
| US20020003112A1 (en) * | 2000-07-07 | 2002-01-10 | Golden Josh H. | Process and apparatus for removal of heavy metals from wastewater |
| WO2002004360A1 (en) * | 2000-07-07 | 2002-01-17 | Microbar Inc. | Method of treating semiconductor waste waters |
| US6627087B1 (en) * | 2001-08-24 | 2003-09-30 | Ondeo Nalco Company | Method of removing lead from water using a high molecular weight cationic dispersion polymer |
| JP3557197B2 (ja) * | 2002-05-17 | 2004-08-25 | 三洋電機株式会社 | コロイド溶液の濾過方法 |
| US20050045852A1 (en) * | 2003-08-29 | 2005-03-03 | Ameen Joseph G. | Particle-free polishing fluid for nickel-based coating planarization |
| US7041222B1 (en) * | 2004-06-07 | 2006-05-09 | Rainer Norman B | Process for the removal of toxic metals from water |
| US7297278B2 (en) * | 2004-10-20 | 2007-11-20 | Baker Hughes Incorporated | Methods for removing metals from water |
| US7531105B2 (en) * | 2004-11-05 | 2009-05-12 | Cabot Microelectronics Corporation | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
| US7504044B2 (en) * | 2004-11-05 | 2009-03-17 | Cabot Microelectronics Corporation | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
| KR101001610B1 (ko) * | 2005-08-24 | 2010-12-17 | 가부시끼가이샤 도꾸야마 | 흄드 실리카 함유 배수의 처리 방법 |
| WO2007023872A1 (ja) * | 2005-08-24 | 2007-03-01 | Tokuyama Corporation | シリコン粉含有排水の処理方法 |
| US7381331B2 (en) * | 2005-09-30 | 2008-06-03 | General Electric Company | Hydrophilic membrane and associated method |
| US7631768B2 (en) * | 2005-11-04 | 2009-12-15 | General Electric Company | Membrane and associated method |
| US7291696B2 (en) * | 2005-11-04 | 2007-11-06 | General Electric Company | Composition and associated method |
| US7722841B2 (en) * | 2006-04-25 | 2010-05-25 | General Electric Company | Polymeric chelant and coagulant to treat metal-containing wastewater |
| US20080197075A1 (en) * | 2006-09-07 | 2008-08-21 | Musale Deepak A | Removing mercury and other heavy metals from industrial wastewater |
| US8211389B2 (en) * | 2010-04-06 | 2012-07-03 | Nalco Company | Metal scavenging polymers and uses thereof |
| US8585994B2 (en) | 2007-12-07 | 2013-11-19 | Nalco Company | Corrosion control in and selenium removal from flue gas wet scrubber systems |
| US9328003B2 (en) | 2006-09-07 | 2016-05-03 | Nalco Company | Method of heavy metal removal from water streams |
| US20080060999A1 (en) * | 2006-09-07 | 2008-03-13 | Musale Deepak A | Method of heavy metal removal from industrial wastewater using submerged ultrafiltration or microfiltration membranes |
| US20080060997A1 (en) * | 2006-09-07 | 2008-03-13 | Musale Deepak A | Method of heavy metals removal from municipal wastewater |
| SG183744A1 (en) * | 2007-08-20 | 2012-09-27 | Advanced Tech Materials | Composition and method for removing ion-implanted photoresist |
| US8753599B2 (en) * | 2007-12-07 | 2014-06-17 | Nalco Company | Corrosion control in and selenium removal from flue gas wet scrubber systems |
| US8609050B2 (en) * | 2007-12-07 | 2013-12-17 | Nalco Company | Corrosion control in and selenium removal from flue gas wet scrubber systems |
| US8632742B2 (en) | 2007-12-07 | 2014-01-21 | Nalco Company | Methods of controlling mercury emission |
| CN101215059B (zh) * | 2008-01-11 | 2011-05-11 | 清华大学 | 应对水中超标金属污染物的碱性化学沉淀饮用水处理方法 |
| US8353641B2 (en) | 2008-02-14 | 2013-01-15 | Soane Energy, Llc | Systems and methods for removing finely dispersed particulate matter from a fluid stream |
| US20100051553A1 (en) * | 2008-08-29 | 2010-03-04 | General Electric Company | Method for removing mercury from wastewater and other liquid streams |
| US8945394B2 (en) | 2009-10-27 | 2015-02-03 | Soane Energy, Llc | System, methods, processes and apparatus for removing finely dispersed particulate matter from a fluid stream |
| BRPI0923988A2 (pt) | 2009-02-27 | 2016-10-11 | Soane Energy Llc | sistema para remover matéria particulada de um fluido, método para remover matéria particulada de um fluido, método para remover matéria particulada de uma corrente de fluido, sistema para remover matéria particulada fina de um fluido e método para remover matéria particulada fina de um fluido |
| CN101649011B (zh) * | 2009-08-13 | 2011-01-19 | 同济大学 | 硫醇-烯点击化学功能化超支化聚乙烯亚胺的制备方法 |
| CA2734310C (en) * | 2010-03-17 | 2014-01-28 | Soane Mining, Llc | Removal of contaminants from waste streams using polymeric additives |
| US8747789B2 (en) * | 2010-04-06 | 2014-06-10 | Nalco Company | Metal scavenging polymers |
| US8927637B2 (en) | 2010-04-06 | 2015-01-06 | Nalco Company | Metal scavenging polymers and uses thereof |
| US10196289B2 (en) * | 2010-05-18 | 2019-02-05 | Ostara Nutrient Recovery Technologies Inc. | Treatment of phosphate-containing wastewater |
| EP2431334A1 (de) * | 2010-09-16 | 2012-03-21 | LANXESS Deutschland GmbH | Behandlung von Abwässern aus der Galvanikindustrie |
| JP5925454B2 (ja) * | 2010-12-16 | 2016-05-25 | 花王株式会社 | 磁気ディスク基板用研磨液組成物 |
| CN102120659A (zh) * | 2011-01-31 | 2011-07-13 | 无锡市霄鹰环境科技有限公司 | 一种去除化镍废水中镍的方法 |
| US9371408B2 (en) | 2011-07-12 | 2016-06-21 | General Electric Company | Polymer and method for using the same |
| WO2013094399A1 (ja) * | 2011-12-22 | 2013-06-27 | コニカミノルタ株式会社 | 研磨材再生方法及び再生研磨材 |
| CN104023915B (zh) * | 2011-12-27 | 2017-07-21 | 柯尼卡美能达株式会社 | 研磨材料分离方法及再生研磨材料 |
| AU2013277743B2 (en) | 2012-06-18 | 2016-10-06 | Soane Mining, Llc | Systems and methods for removing finely dispersed particles from mining wastewater |
| CN103801270B (zh) * | 2012-11-14 | 2016-03-30 | 长沙飞达矿冶技术有限公司 | 用于处理含复杂重金属废水的环保材料及其生产工艺 |
| EP2746230A1 (en) * | 2012-12-18 | 2014-06-25 | Total SA | Process for removing mercury from production water and condensates. |
| CN106588725B (zh) * | 2016-12-06 | 2021-05-07 | 青岛柏森环保工程有限公司 | 一种多硫代酰胺型重金属螯合剂的制备方法 |
| US11203536B1 (en) * | 2018-08-13 | 2021-12-21 | Garratt-Callahan Company | Use of hollow fiber filtration in conjunction with precipitant technologies to reclaim water from complex aqueous waste streams |
| CN109351323A (zh) * | 2018-11-09 | 2019-02-19 | 天津碧水源膜材料有限公司 | 选择性脱铵材料及其制备方法与应用 |
| JP7220894B2 (ja) * | 2018-11-29 | 2023-02-13 | 国立研究開発法人量子科学技術研究開発機構 | ジチオカルバミン酸基を有する金属吸着材とその製造方法及び金属抽出方法 |
| JP7616291B2 (ja) * | 2022-09-02 | 2025-01-17 | 東ソー株式会社 | 亜鉛及びニッケル含有排水用の処理剤及びその用途 |
| US20250074799A1 (en) | 2023-09-06 | 2025-03-06 | Ecolab Usa Inc. | Compositions and methods for removing metals from mediums |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL64967A0 (en) * | 1981-03-17 | 1982-04-30 | Aligena Ag | Semipermeable membranes containing modified polysulfones,their manufacture and their use |
| US4551506A (en) * | 1982-12-23 | 1985-11-05 | The Procter & Gamble Company | Cationic polymers having clay soil removal/anti-redeposition properties useful in detergent compositions |
| US4670180A (en) | 1985-04-26 | 1987-06-02 | Miyoshi Yushi Kabushiki Kaisha | Metal scavenger and metal scavenging process |
| US5047083A (en) | 1989-06-15 | 1991-09-10 | Nalco Chemical Company | Process for de-oiling mill scale |
| US5387365A (en) | 1989-12-20 | 1995-02-07 | Miyoshi Yushi Kabushiki Kaisha | Metal scavengers for treating waste water |
| JP2948879B2 (ja) * | 1989-12-20 | 1999-09-13 | ミヨシ油脂株式会社 | 金属捕集剤及び金属捕集方法 |
| US5143624A (en) | 1991-05-02 | 1992-09-01 | Calgon Corporation | Methods for detackification of paint spray operation wastes |
| US5164095A (en) | 1991-10-02 | 1992-11-17 | Nalco Chemical Company | Dithiocarbamate polymers |
| DE69204412T2 (de) * | 1991-10-02 | 1996-04-18 | Nalco Chemical Co | Dithiocarbamat-gruppen enthaltende Polymere. |
| US5346627A (en) * | 1992-03-03 | 1994-09-13 | Nalco Chemical Company | Method for removing metals from a fluid stream |
| JP3412842B2 (ja) * | 1992-07-28 | 2003-06-03 | ミヨシ油脂株式会社 | 金属捕集剤及びその製造方法 |
| US5444031A (en) | 1993-01-21 | 1995-08-22 | Calgon Carbon Corporation | Process for making catalytic carbon |
| US5328599A (en) | 1993-03-08 | 1994-07-12 | Nalco Chemical Company | System using sulfide ion-selective electrodes for control of chemical feed of organic sulfide products for metal ion precipitation from waste water |
| JP3343162B2 (ja) * | 1993-11-29 | 2002-11-11 | 富士写真フイルム株式会社 | 写真廃液の処理方法 |
| JP3264348B2 (ja) * | 1994-01-31 | 2002-03-11 | 日東紡績株式会社 | 高分子重金属捕集剤、ジチオカルバミン酸アルカリ金属塩化重合体、及びそれらの製造方法 |
| US5510040A (en) * | 1994-11-21 | 1996-04-23 | Nalco Chemical Company | Removal of selenium from water by complexation with polymeric dithiocarbamates |
| US5554298A (en) | 1995-01-20 | 1996-09-10 | Nalco Chemical Company | Steel mill flume water treatment |
| US5500133A (en) | 1995-02-17 | 1996-03-19 | Betz Laboratories, Inc. | Polymeric dithiocarbamate acid salt compositions and method of use |
| US5766478A (en) | 1995-05-30 | 1998-06-16 | The Regents Of The University Of California, Office Of Technology Transfer | Water-soluble polymers for recovery of metal ions from aqueous streams |
| US5965027A (en) | 1996-11-26 | 1999-10-12 | Microbar Incorporated | Process for removing silica from wastewater |
| JPH10174965A (ja) * | 1996-12-19 | 1998-06-30 | Kaijo Corp | 半導体等の洗浄水処理装置 |
| JP3569605B2 (ja) * | 1997-02-25 | 2004-09-22 | 日本碍子株式会社 | コロイダルシリカ含有廃水からの水回収方法 |
-
1999
- 1999-12-02 KR KR1020017008884A patent/KR20010101520A/ko not_active Ceased
- 1999-12-02 CN CN200610106443.4A patent/CN1978336B/zh not_active Expired - Lifetime
- 1999-12-02 EP EP99962965A patent/EP1171389B1/en not_active Expired - Lifetime
- 1999-12-02 DE DE69941160T patent/DE69941160D1/de not_active Expired - Lifetime
- 1999-12-02 CN CN99816431A patent/CN1337923A/zh active Pending
- 1999-12-02 AU AU19296/00A patent/AU1929600A/en not_active Abandoned
- 1999-12-02 WO PCT/US1999/028477 patent/WO2000041974A1/en not_active Ceased
- 1999-12-02 JP JP2000593549A patent/JP2002534564A/ja active Pending
- 1999-12-14 TW TW088121904A patent/TW508344B/zh not_active IP Right Cessation
- 1999-12-29 MY MYPI99005789A patent/MY123469A/en unknown
-
2000
- 2000-08-14 US US09/638,475 patent/US6258277B1/en not_active Expired - Lifetime
- 2000-08-14 US US09/638,434 patent/US6403726B1/en not_active Expired - Lifetime
-
2011
- 2011-03-08 JP JP2011050504A patent/JP5570458B2/ja not_active Expired - Lifetime
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2002534564A5 (https=) | ||
| EP3117451B1 (en) | Composition for tungsten cmp | |
| EP1171389B1 (en) | Composition and method for simultaneously precipitating metal ions from semiconductor wastewater and enhancing microfilter operation | |
| JP6530303B2 (ja) | 腐食を低減するための化学機械研磨スラリー及びその使用方法 | |
| EP3116970B1 (en) | Composition for tungsten cmp | |
| TWI333515B (en) | Controlled electrochemical polishing method | |
| CN114127211B (zh) | 在主体钨浆料中提高阻挡膜移除速率的方法 | |
| US20190085209A1 (en) | Composition for tungsten cmp | |
| JP2006523758A5 (https=) | ||
| EP3122836A1 (en) | Mixed abrasive tungsten cmp composition | |
| CN1809620A (zh) | 用于cmp的涂覆金属氧化物颗粒 | |
| US20160089763A1 (en) | Composition for tungsten cmp | |
| JP2018510230A5 (https=) | ||
| WO2020142354A1 (en) | Composition for tungsten cmp | |
| JP2009530811A5 (https=) | ||
| JP2003530204A5 (https=) | ||
| JP2009516928A5 (https=) | ||
| EP4441158A1 (en) | Tungsten chemical mechanical polishing slurries | |
| TH45881A3 (th) | สารผสม และวิธีการสำหรับการตกตะกอนไอออนของโลหะจากน้ำเสียจากอุตสาหกรรม สารกึ่งตัวนำ และการเพิ่มพูนการทำงานของตัวกรองระดับจุลภาคในขณะเดียวกัน | |
| JP2749256B2 (ja) | 水の高度処理方法 | |
| TH24908C3 (th) | สารผสม และวิธีการสำหรับการตกตะกอนไอออนของโลหะจากน้ำเสียจากอุตสาหกรรม สารกึ่งตัวนำ และการเพิ่มพูนการทำงานของตัวกรองระดับจุลภาคในขณะเดียวกัน | |
| WO2012055153A1 (zh) | 一种钨化学机械抛光方法 | |
| JP2022171565A (ja) | 研磨用組成物、研磨方法および研磨済基板の製造方法 | |
| JP2009539253A5 (https=) | ||
| JPH0439398B2 (https=) |