JP2002501075A5 - - Google Patents

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Publication number
JP2002501075A5
JP2002501075A5 JP2000528576A JP2000528576A JP2002501075A5 JP 2002501075 A5 JP2002501075 A5 JP 2002501075A5 JP 2000528576 A JP2000528576 A JP 2000528576A JP 2000528576 A JP2000528576 A JP 2000528576A JP 2002501075 A5 JP2002501075 A5 JP 2002501075A5
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JP
Japan
Prior art keywords
group
precursor
substrate
perfluoroalkyl
alkyl
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Pending
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JP2000528576A
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English (en)
Japanese (ja)
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JP2002501075A (ja
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Priority claimed from US09/012,679 external-priority patent/US6015917A/en
Application filed filed Critical
Publication of JP2002501075A publication Critical patent/JP2002501075A/ja
Publication of JP2002501075A5 publication Critical patent/JP2002501075A5/ja
Pending legal-status Critical Current

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JP2000528576A 1998-01-23 1999-01-21 基板上に窒化タンタルを蒸着（ｄｅｐｏｓｉｔｉｏｎ）するためのタンタルアミド前駆物質 Pending JP2002501075A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/012,679 US6015917A (en) 1998-01-23 1998-01-23 Tantalum amide precursors for deposition of tantalum nitride on a substrate
US09/012,679 1998-01-23
PCT/US1999/001277 WO1999037655A1 (en) 1998-01-23 1999-01-21 Tantalum amide precursors for deposition of tantalum nitride on a substrate

Publications (2)

Publication Number Publication Date
JP2002501075A JP2002501075A (ja) 2002-01-15
JP2002501075A5 true JP2002501075A5 (enExample) 2006-03-09

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ID=21756172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000528576A Pending JP2002501075A (ja) 1998-01-23 1999-01-21 基板上に窒化タンタルを蒸着（ｄｅｐｏｓｉｔｉｏｎ）するためのタンタルアミド前駆物質

Country Status (7)

Country Link
US (2) US6015917A (enExample)
JP (1) JP2002501075A (enExample)
KR (3) KR20080075561A (enExample)
AU (1) AU2332199A (enExample)
DE (1) DE19982730C2 (enExample)
GB (1) GB2354762B (enExample)
WO (1) WO1999037655A1 (enExample)

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