GB976573A - Improvements in and relating to metal plating - Google Patents

Improvements in and relating to metal plating

Info

Publication number
GB976573A
GB976573A GB4336860A GB4336860A GB976573A GB 976573 A GB976573 A GB 976573A GB 4336860 A GB4336860 A GB 4336860A GB 4336860 A GB4336860 A GB 4336860A GB 976573 A GB976573 A GB 976573A
Authority
GB
United Kingdom
Prior art keywords
compound
benzene ring
oxygen
ring
arene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4336860A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Carbide Corp
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US862808A external-priority patent/US3305386A/en
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of GB976573A publication Critical patent/GB976573A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A process for plating solid substrates (e.g. glass, ceramics, plastics, copper, aluminium, stainless steel, silver or graphite) with V, Nb, Ta, Cr, Mo or W, comprises contacting a bis(arene) compound of the metal in an inert oxygen-free gas (e.g. A, N2, He or H2) with the substrate at a temperature above the decomposition temperature of said compound, while excluding oxygen and reative oxygen-containing compounds. The bis(arene) compound may be produced by the method of Specification 829,574 and is of the form Ar2M wherein Ar is an aromatic hydrocarbon containing an isolated benzene ring (e.g. a benzene ring per se or a fused ring compound in which any double bond in a ring fused to a benzene ring is at least two carbon atoms away from the benzene ring carbon nearest to it).
GB4336860A 1959-12-30 1960-12-16 Improvements in and relating to metal plating Expired GB976573A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US862808A US3305386A (en) 1955-10-05 1959-12-30 Metal plating process utilizing bis (arene) metal compounds

Publications (1)

Publication Number Publication Date
GB976573A true GB976573A (en) 1964-11-25

Family

ID=25339416

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4336860A Expired GB976573A (en) 1959-12-30 1960-12-16 Improvements in and relating to metal plating

Country Status (2)

Country Link
CH (1) CH405872A (en)
GB (1) GB976573A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6015917A (en) * 1998-01-23 2000-01-18 Advanced Technology Materials, Inc. Tantalum amide precursors for deposition of tantalum nitride on a substrate
US7371880B2 (en) 2004-06-16 2008-05-13 Advanced Technology Materials, Inc. Copper (I) compounds useful as deposition precursors of copper thin films
US7547796B2 (en) 2005-09-29 2009-06-16 Praxair Technology, Inc. Organometallic compounds, processes for the preparation thereof and methods of use thereof
US7750173B2 (en) 2007-01-18 2010-07-06 Advanced Technology Materials, Inc. Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films
US7959986B2 (en) 2006-08-09 2011-06-14 Praxair Technology, Inc. Organometallic compounds, processes for the preparation thereof and methods of use thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6015917A (en) * 1998-01-23 2000-01-18 Advanced Technology Materials, Inc. Tantalum amide precursors for deposition of tantalum nitride on a substrate
US6379748B1 (en) 1998-01-23 2002-04-30 Advanced Technology Materials, Inc. Tantalum amide precursors for deposition of tantalum nitride on a substrate
US7371880B2 (en) 2004-06-16 2008-05-13 Advanced Technology Materials, Inc. Copper (I) compounds useful as deposition precursors of copper thin films
US7531031B2 (en) 2004-06-16 2009-05-12 Advanced Technology Materials, Inc. Copper (I) compounds useful as deposition precursors of copper thin films
US7547796B2 (en) 2005-09-29 2009-06-16 Praxair Technology, Inc. Organometallic compounds, processes for the preparation thereof and methods of use thereof
US7959986B2 (en) 2006-08-09 2011-06-14 Praxair Technology, Inc. Organometallic compounds, processes for the preparation thereof and methods of use thereof
US7750173B2 (en) 2007-01-18 2010-07-06 Advanced Technology Materials, Inc. Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films
US7858816B2 (en) 2007-01-18 2010-12-28 Advanced Technology Materials, Inc. Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films

Also Published As

Publication number Publication date
CH405872A (en) 1966-01-15

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