GB1350720A - Apparatus for sputtering - Google Patents

Apparatus for sputtering

Info

Publication number
GB1350720A
GB1350720A GB5246272A GB5246272A GB1350720A GB 1350720 A GB1350720 A GB 1350720A GB 5246272 A GB5246272 A GB 5246272A GB 5246272 A GB5246272 A GB 5246272A GB 1350720 A GB1350720 A GB 1350720A
Authority
GB
United Kingdom
Prior art keywords
sputtering
nov
sputtered
heading
concurrently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5246272A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Technologies Corp
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
Publication of GB1350720A publication Critical patent/GB1350720A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Abstract

1350720 Sputtering alloys UNITED AIRCRAFT CORP 14 Nov 1972 [19 Nov 1971] 52462/72 Addition to 1339910 Heading C7F In a process for sputtering an alloy from a molten cathode, as described in Specification 1339910, the substrate is first cleaned by giving it a negative bias. Carbon, alumina or refractory metals may be concurrently sputtered from the solid state.
GB5246272A 1971-11-19 1972-11-14 Apparatus for sputtering Expired GB1350720A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00200566A US3799862A (en) 1971-11-19 1971-11-19 Apparatus for sputtering

Publications (1)

Publication Number Publication Date
GB1350720A true GB1350720A (en) 1974-04-24

Family

ID=22742254

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5246272A Expired GB1350720A (en) 1971-11-19 1972-11-14 Apparatus for sputtering

Country Status (3)

Country Link
US (1) US3799862A (en)
DE (1) DE2254434A1 (en)
GB (1) GB1350720A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138027A (en) * 1983-04-12 1984-10-17 Citizen Watch Co Ltd A process for plating an article with a gold-based alloy and an alloy therefor

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4019902A (en) * 1974-06-10 1977-04-26 Xerox Corporation Photoreceptor fabrication
US4013463A (en) * 1975-08-15 1977-03-22 Leder Lewis B Photoreceptor fabrication utilizing AC ion plating
CH667621A5 (en) * 1985-06-04 1988-10-31 Grapha Holding Ag COLLECTIBLE.
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5211824A (en) * 1991-10-31 1993-05-18 Siemens Solar Industries L.P. Method and apparatus for sputtering of a liquid
US5507931A (en) * 1993-12-30 1996-04-16 Deposition Technologies, Inc. Sputter deposition process
JPH07268622A (en) * 1994-03-01 1995-10-17 Applied Sci & Technol Inc Microwave plasma sticking source
US6432281B2 (en) * 1995-12-20 2002-08-13 Recherche Et Developpement Due Groupe Cockerill Sambre Process for formation of a coating on a substrate
BE1009838A3 (en) * 1995-12-20 1997-10-07 Cockerill Rech & Dev Method and device for forming a coating on a substrate.
EP1182272A1 (en) * 2000-08-23 2002-02-27 Cold Plasma Applications C.P.A. Process and apparatus for continuous cold plasma deposition of metallic layers
US20080217162A1 (en) * 2005-10-13 2008-09-11 Nv Bekaert Sa Method to Deposit a Coating By Sputtering
US10858754B2 (en) 2015-11-25 2020-12-08 United States Of America As Represented By The Administrator Of Nasa Rhombohedron epitaxial growth with molten target sputtering

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138027A (en) * 1983-04-12 1984-10-17 Citizen Watch Co Ltd A process for plating an article with a gold-based alloy and an alloy therefor

Also Published As

Publication number Publication date
DE2254434A1 (en) 1973-05-24
US3799862A (en) 1974-03-26

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee