CH405872A - Metal coating process - Google Patents

Metal coating process

Info

Publication number
CH405872A
CH405872A CH1460060A CH1460060A CH405872A CH 405872 A CH405872 A CH 405872A CH 1460060 A CH1460060 A CH 1460060A CH 1460060 A CH1460060 A CH 1460060A CH 405872 A CH405872 A CH 405872A
Authority
CH
Switzerland
Prior art keywords
coating process
metal coating
metal
coating
Prior art date
Application number
CH1460060A
Other languages
French (fr)
Inventor
Hafner Walter
Otto Fischer Ernst
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US862808A external-priority patent/US3305386A/en
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of CH405872A publication Critical patent/CH405872A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
CH1460060A 1959-12-30 1960-12-30 Metal coating process CH405872A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US862808A US3305386A (en) 1955-10-05 1959-12-30 Metal plating process utilizing bis (arene) metal compounds

Publications (1)

Publication Number Publication Date
CH405872A true CH405872A (en) 1966-01-15

Family

ID=25339416

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1460060A CH405872A (en) 1959-12-30 1960-12-30 Metal coating process

Country Status (2)

Country Link
CH (1) CH405872A (en)
GB (1) GB976573A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6015917A (en) * 1998-01-23 2000-01-18 Advanced Technology Materials, Inc. Tantalum amide precursors for deposition of tantalum nitride on a substrate
US7166732B2 (en) 2004-06-16 2007-01-23 Advanced Technology Materials, Inc. Copper (I) compounds useful as deposition precursors of copper thin films
US7547796B2 (en) 2005-09-29 2009-06-16 Praxair Technology, Inc. Organometallic compounds, processes for the preparation thereof and methods of use thereof
US7959986B2 (en) 2006-08-09 2011-06-14 Praxair Technology, Inc. Organometallic compounds, processes for the preparation thereof and methods of use thereof
US7750173B2 (en) 2007-01-18 2010-07-06 Advanced Technology Materials, Inc. Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films

Also Published As

Publication number Publication date
GB976573A (en) 1964-11-25

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