JP2001244188A5 - - Google Patents
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- Publication number
- JP2001244188A5 JP2001244188A5 JP2000056618A JP2000056618A JP2001244188A5 JP 2001244188 A5 JP2001244188 A5 JP 2001244188A5 JP 2000056618 A JP2000056618 A JP 2000056618A JP 2000056618 A JP2000056618 A JP 2000056618A JP 2001244188 A5 JP2001244188 A5 JP 2001244188A5
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- temperature
- furnace
- vacuum
- fluoride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000013078 crystal Substances 0.000 description 94
- 230000003287 optical effect Effects 0.000 description 62
- 238000010521 absorption reaction Methods 0.000 description 45
- 239000000463 material Substances 0.000 description 21
- 238000000137 annealing Methods 0.000 description 19
- 238000000034 method Methods 0.000 description 18
- 239000000203 mixture Substances 0.000 description 17
- 238000007670 refining Methods 0.000 description 17
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 14
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 11
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 10
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 10
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 8
- 238000012545 processing Methods 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- 238000003776 cleavage reaction Methods 0.000 description 5
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 5
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 5
- 230000007017 scission Effects 0.000 description 5
- 235000013024 sodium fluoride Nutrition 0.000 description 5
- 239000011775 sodium fluoride Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 4
- 229910001632 barium fluoride Inorganic materials 0.000 description 4
- 229910001634 calcium fluoride Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 239000010436 fluorite Substances 0.000 description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 3
- 229910001637 strontium fluoride Inorganic materials 0.000 description 3
- 229910015312 LiMgF Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 235000003270 potassium fluoride Nutrition 0.000 description 2
- 239000011698 potassium fluoride Substances 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 238000010583 slow cooling Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000056618A JP2001244188A (ja) | 2000-03-02 | 2000-03-02 | 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法 |
| EP01301818A EP1130419A3 (en) | 2000-03-02 | 2001-02-28 | Optical member for vacuum ultraviolet, and aligner and device manufacture method using same |
| US09/794,354 US6813070B2 (en) | 2000-03-02 | 2001-02-28 | Optical member for vacuum ultraviolet, and aligner and device manufacture method using same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000056618A JP2001244188A (ja) | 2000-03-02 | 2000-03-02 | 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001244188A JP2001244188A (ja) | 2001-09-07 |
| JP2001244188A5 true JP2001244188A5 (enExample) | 2007-03-29 |
Family
ID=18577528
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000056618A Withdrawn JP2001244188A (ja) | 2000-03-02 | 2000-03-02 | 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6813070B2 (enExample) |
| EP (1) | EP1130419A3 (enExample) |
| JP (1) | JP2001244188A (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10102969A1 (de) * | 2001-01-19 | 2002-07-25 | Kugler Gmbh | Gekühlte Spiegelvorrichtung |
| JP2004531764A (ja) | 2001-05-16 | 2004-10-14 | コーニング インコーポレイテッド | 好ましい結晶方位をもつ立方晶系結晶材料光学素子 |
| KR20040035780A (ko) | 2001-09-14 | 2004-04-29 | 코닝 인코포레이티드 | 포토리소그라피 방법 및 최소 공간분산을 갖는 유브이투과용 플루오라이드 결정 |
| US6669920B2 (en) | 2001-11-20 | 2003-12-30 | Corning Incorporated | Below 160NM optical lithography crystal materials and methods of making |
| JP2003241049A (ja) * | 2002-02-22 | 2003-08-27 | Nikon Corp | 光学素子保持方法、光学素子研磨加工方法及び光学素子成膜方法 |
| US7075905B2 (en) | 2002-09-11 | 2006-07-11 | Qualcomm Incorporated | Quality indicator bit (QIB) generation in wireless communications systems |
| JP2005289776A (ja) * | 2004-04-05 | 2005-10-20 | Canon Inc | 結晶製造方法および結晶製造装置 |
| US7141794B2 (en) * | 2004-06-28 | 2006-11-28 | General Electric Company | Scintillator compositions, related processes, and articles of manufacture |
| EP2280295A1 (de) * | 2005-03-08 | 2011-02-02 | Schott Ag | Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung |
| DE102005010655A1 (de) * | 2005-03-08 | 2006-09-14 | Schott Ag | Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung |
| US20100230601A1 (en) * | 2005-03-30 | 2010-09-16 | General Electric Company | Composition, article, and method |
| US7700003B2 (en) * | 2005-03-30 | 2010-04-20 | General Electric Company | Composition, article, and method |
| JP2007005777A (ja) * | 2005-05-25 | 2007-01-11 | Tokuyama Corp | 液浸式露光装置のラストレンズ |
| US20060279836A1 (en) * | 2005-05-27 | 2006-12-14 | Tokuyama Corporation | Last lens of immersion lithography equipment |
| JP2008150276A (ja) * | 2006-11-21 | 2008-07-03 | Canon Inc | 紫外光用ガラス組成物及びそれを用いた光学装置 |
| JP2008230958A (ja) * | 2007-02-22 | 2008-10-02 | Tokuyama Corp | ＢａＬｉＦ３単結晶体の製造方法 |
| JP2009086038A (ja) * | 2007-09-27 | 2009-04-23 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| WO2014121844A1 (en) * | 2013-02-08 | 2014-08-14 | Carl Zeiss Laser Optics Gmbh | Beam reverser module and optical power amplifier having such a beam reverser module |
| WO2016021112A1 (en) * | 2014-08-07 | 2016-02-11 | Okinawa Institute Of Science And Technology School Corporation | System and method based on multi-source deposition for fabricating perovskite film |
| CN206773352U (zh) * | 2017-06-16 | 2017-12-19 | 京东方科技集团股份有限公司 | 一种光源组件、背光模组及显示装置 |
| CN109234684A (zh) * | 2018-10-16 | 2019-01-18 | 镇江视伟光学有限公司 | 一种紫膜或黄绿膜镜片的镀膜方法 |
| CN118619677B (zh) * | 2024-06-03 | 2025-02-14 | 河南省科学院材料研究所 | 一种LiBaF3微波介质陶瓷的制备方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL181960C (nl) * | 1976-07-13 | 1987-12-01 | Philips Nv | Luminescerend scherm; werkwijze voor de bereiding van een luminescerend fluoride. |
| US4377864A (en) * | 1981-08-10 | 1983-03-22 | Gte Laboratories Incorporated | Chromium (III) ordered perovskite lasers and media therefor |
| DE3941859C1 (enExample) * | 1989-12-19 | 1991-01-24 | Deutsche Spezialglas Ag, 3223 Gruenenplan, De | |
| WO1994019291A1 (en) * | 1993-02-22 | 1994-09-01 | British Telecommunications Public Limited Company | Halide glass compositions |
| US5909314A (en) * | 1994-02-15 | 1999-06-01 | Dai Nippon Printing Co., Ltd. | Optical functional materials and process for producing the same |
| JP3697008B2 (ja) | 1996-03-22 | 2005-09-21 | キヤノン株式会社 | フッ化物結晶及びフッ化物結晶レンズの製造方法 |
| JPH10260349A (ja) * | 1997-03-18 | 1998-09-29 | Nikon Corp | 紫外線レーザ用結像光学系 |
| JP3337638B2 (ja) | 1997-03-31 | 2002-10-21 | キヤノン株式会社 | フッ化物結晶の製造方法及び光学部品の製造方法 |
| JPH10279378A (ja) | 1997-04-01 | 1998-10-20 | Canon Inc | 結晶製造方法及び製造装置 |
| JP4174086B2 (ja) | 1997-07-02 | 2008-10-29 | キヤノン株式会社 | 結晶成長用の種結晶及びフッ化物結晶 |
| JP3969865B2 (ja) | 1997-10-24 | 2007-09-05 | キヤノン株式会社 | フッ化物結晶の製造方法 |
| JP3624082B2 (ja) * | 1997-11-13 | 2005-02-23 | キヤノン株式会社 | 反射防止膜及びその製造方法 |
| JP3631063B2 (ja) | 1998-10-21 | 2005-03-23 | キヤノン株式会社 | フッ化物の精製方法及びフッ化物結晶の製造方法 |
| US6630117B2 (en) * | 1999-06-04 | 2003-10-07 | Corning Incorporated | Making a dispersion managing crystal |
-
2000
- 2000-03-02 JP JP2000056618A patent/JP2001244188A/ja not_active Withdrawn
-
2001
- 2001-02-28 US US09/794,354 patent/US6813070B2/en not_active Expired - Fee Related
- 2001-02-28 EP EP01301818A patent/EP1130419A3/en not_active Withdrawn
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