JP2001244188A - 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法 - Google Patents

真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法

Info

Publication number
JP2001244188A
JP2001244188A JP2000056618A JP2000056618A JP2001244188A JP 2001244188 A JP2001244188 A JP 2001244188A JP 2000056618 A JP2000056618 A JP 2000056618A JP 2000056618 A JP2000056618 A JP 2000056618A JP 2001244188 A JP2001244188 A JP 2001244188A
Authority
JP
Japan
Prior art keywords
crucible
temperature
vacuum ultraviolet
crystal
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000056618A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001244188A5 (enExample
Inventor
Yasunao Oyama
泰直 雄山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Optron Inc
Original Assignee
Canon Inc
Optron Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc, Optron Inc filed Critical Canon Inc
Priority to JP2000056618A priority Critical patent/JP2001244188A/ja
Priority to US09/794,354 priority patent/US6813070B2/en
Priority to EP01301818A priority patent/EP1130419A3/en
Publication of JP2001244188A publication Critical patent/JP2001244188A/ja
Publication of JP2001244188A5 publication Critical patent/JP2001244188A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2000056618A 2000-03-02 2000-03-02 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法 Withdrawn JP2001244188A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000056618A JP2001244188A (ja) 2000-03-02 2000-03-02 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法
US09/794,354 US6813070B2 (en) 2000-03-02 2001-02-28 Optical member for vacuum ultraviolet, and aligner and device manufacture method using same
EP01301818A EP1130419A3 (en) 2000-03-02 2001-02-28 Optical member for vacuum ultraviolet, and aligner and device manufacture method using same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000056618A JP2001244188A (ja) 2000-03-02 2000-03-02 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2001244188A true JP2001244188A (ja) 2001-09-07
JP2001244188A5 JP2001244188A5 (enExample) 2007-03-29

Family

ID=18577528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000056618A Withdrawn JP2001244188A (ja) 2000-03-02 2000-03-02 真空紫外用光学部材およびこれを用いた露光装置ならびにデバイス製造方法

Country Status (3)

Country Link
US (1) US6813070B2 (enExample)
EP (1) EP1130419A3 (enExample)
JP (1) JP2001244188A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006251805A (ja) * 2005-03-08 2006-09-21 Schott Ag マイクロリトグラフィー用光学素子の作製方法、同方法により得られるレンズ系、及び同レンズ系の使用方法
JP2007005777A (ja) * 2005-05-25 2007-01-11 Tokuyama Corp 液浸式露光装置のラストレンズ

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DE10102969A1 (de) * 2001-01-19 2002-07-25 Kugler Gmbh Gekühlte Spiegelvorrichtung
AU2002257270A1 (en) 2001-05-16 2002-11-25 Corning Incorporated Preferred crystal orientation optical elements from cubic materials
US6649326B2 (en) 2001-09-14 2003-11-18 Corning Incorporated Photolithographic method and UV transmitting fluoride crystals with minimized spatial dispersion
US6669920B2 (en) 2001-11-20 2003-12-30 Corning Incorporated Below 160NM optical lithography crystal materials and methods of making
JP2003241049A (ja) * 2002-02-22 2003-08-27 Nikon Corp 光学素子保持方法、光学素子研磨加工方法及び光学素子成膜方法
US7075905B2 (en) 2002-09-11 2006-07-11 Qualcomm Incorporated Quality indicator bit (QIB) generation in wireless communications systems
JP2005289776A (ja) * 2004-04-05 2005-10-20 Canon Inc 結晶製造方法および結晶製造装置
US7141794B2 (en) * 2004-06-28 2006-11-28 General Electric Company Scintillator compositions, related processes, and articles of manufacture
DE102005010655A1 (de) * 2005-03-08 2006-09-14 Schott Ag Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung
US20100230601A1 (en) * 2005-03-30 2010-09-16 General Electric Company Composition, article, and method
US7700003B2 (en) * 2005-03-30 2010-04-20 General Electric Company Composition, article, and method
US20060279836A1 (en) * 2005-05-27 2006-12-14 Tokuyama Corporation Last lens of immersion lithography equipment
JP2008150276A (ja) * 2006-11-21 2008-07-03 Canon Inc 紫外光用ガラス組成物及びそれを用いた光学装置
JP2008230958A (ja) * 2007-02-22 2008-10-02 Tokuyama Corp ＢａＬｉＦ３単結晶体の製造方法
JP2009086038A (ja) * 2007-09-27 2009-04-23 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP6242917B2 (ja) * 2013-02-08 2017-12-06 カール・ツァイス・エスエムティー・ゲーエムベーハー ビーム反転モジュールおよびそのようなビーム反転モジュールを有する光パワー増幅器
US20170226641A1 (en) * 2014-08-07 2017-08-10 Okinawa Institute Of Science And Technology School Corporation System and method based on multi-source deposition for fabricating perovskite film
CN206773352U (zh) * 2017-06-16 2017-12-19 京东方科技集团股份有限公司 一种光源组件、背光模组及显示装置
CN109234684A (zh) * 2018-10-16 2019-01-18 镇江视伟光学有限公司 一种紫膜或黄绿膜镜片的镀膜方法
CN118619677B (zh) * 2024-06-03 2025-02-14 河南省科学院材料研究所 一种LiBaF3微波介质陶瓷的制备方法

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NL181960C (nl) * 1976-07-13 1987-12-01 Philips Nv Luminescerend scherm; werkwijze voor de bereiding van een luminescerend fluoride.
US4377864A (en) * 1981-08-10 1983-03-22 Gte Laboratories Incorporated Chromium (III) ordered perovskite lasers and media therefor
DE3941859C1 (enExample) * 1989-12-19 1991-01-24 Deutsche Spezialglas Ag, 3223 Gruenenplan, De
DE69409229T2 (de) * 1993-02-22 1998-07-23 British Telecommunications P.L.C., London Zusammensetzungen für halogenidglas
US5909314A (en) 1994-02-15 1999-06-01 Dai Nippon Printing Co., Ltd. Optical functional materials and process for producing the same
JP3697008B2 (ja) 1996-03-22 2005-09-21 キヤノン株式会社 フッ化物結晶及びフッ化物結晶レンズの製造方法
JPH10260349A (ja) * 1997-03-18 1998-09-29 Nikon Corp 紫外線レーザ用結像光学系
JP3337638B2 (ja) 1997-03-31 2002-10-21 キヤノン株式会社 フッ化物結晶の製造方法及び光学部品の製造方法
JPH10279378A (ja) 1997-04-01 1998-10-20 Canon Inc 結晶製造方法及び製造装置
JP4174086B2 (ja) 1997-07-02 2008-10-29 キヤノン株式会社 結晶成長用の種結晶及びフッ化物結晶
JP3969865B2 (ja) 1997-10-24 2007-09-05 キヤノン株式会社 フッ化物結晶の製造方法
JP3624082B2 (ja) * 1997-11-13 2005-02-23 キヤノン株式会社 反射防止膜及びその製造方法
JP3631063B2 (ja) 1998-10-21 2005-03-23 キヤノン株式会社 フッ化物の精製方法及びフッ化物結晶の製造方法
US6630117B2 (en) * 1999-06-04 2003-10-07 Corning Incorporated Making a dispersion managing crystal

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006251805A (ja) * 2005-03-08 2006-09-21 Schott Ag マイクロリトグラフィー用光学素子の作製方法、同方法により得られるレンズ系、及び同レンズ系の使用方法
JP2007005777A (ja) * 2005-05-25 2007-01-11 Tokuyama Corp 液浸式露光装置のラストレンズ

Also Published As

Publication number Publication date
EP1130419A2 (en) 2001-09-05
US6813070B2 (en) 2004-11-02
EP1130419A3 (en) 2004-02-04
US20010053017A1 (en) 2001-12-20

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