JP2001168178A5 - - Google Patents

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Publication number
JP2001168178A5
JP2001168178A5 JP2000287265A JP2000287265A JP2001168178A5 JP 2001168178 A5 JP2001168178 A5 JP 2001168178A5 JP 2000287265 A JP2000287265 A JP 2000287265A JP 2000287265 A JP2000287265 A JP 2000287265A JP 2001168178 A5 JP2001168178 A5 JP 2001168178A5
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JP
Japan
Prior art keywords
susceptor
support
members
transverse
longitudinal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000287265A
Other languages
English (en)
Japanese (ja)
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JP2001168178A (ja
JP4351374B2 (ja
Filing date
Publication date
Priority claimed from US09/399,900 external-priority patent/US6149365A/en
Application filed filed Critical
Publication of JP2001168178A publication Critical patent/JP2001168178A/ja
Publication of JP2001168178A5 publication Critical patent/JP2001168178A5/ja
Application granted granted Critical
Publication of JP4351374B2 publication Critical patent/JP4351374B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000287265A 1999-09-21 2000-09-21 基板処理システム、サセプタ支持装置、基板支持システム及びサセプタ支持フレーム Expired - Lifetime JP4351374B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/399900 1999-09-21
US09/399,900 US6149365A (en) 1999-09-21 1999-09-21 Support frame for substrates

Publications (3)

Publication Number Publication Date
JP2001168178A JP2001168178A (ja) 2001-06-22
JP2001168178A5 true JP2001168178A5 (enExample) 2005-11-04
JP4351374B2 JP4351374B2 (ja) 2009-10-28

Family

ID=23581415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000287265A Expired - Lifetime JP4351374B2 (ja) 1999-09-21 2000-09-21 基板処理システム、サセプタ支持装置、基板支持システム及びサセプタ支持フレーム

Country Status (5)

Country Link
US (2) US6149365A (enExample)
EP (1) EP1089325A3 (enExample)
JP (1) JP4351374B2 (enExample)
KR (1) KR100445392B1 (enExample)
SG (1) SG86441A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100819369B1 (ko) * 2001-12-31 2008-04-04 엘지.필립스 엘시디 주식회사 노광용 척
US6899507B2 (en) * 2002-02-08 2005-05-31 Asm Japan K.K. Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
KR20040012232A (ko) * 2002-08-01 2004-02-11 삼성전자주식회사 반도체 제조설비
KR100536797B1 (ko) * 2002-12-17 2005-12-14 동부아남반도체 주식회사 화학 기상 증착 장치
US7413612B2 (en) * 2003-07-10 2008-08-19 Applied Materials, Inc. In situ substrate holder leveling method and apparatus
KR100484017B1 (ko) * 2003-11-11 2005-04-20 주식회사 에이디피엔지니어링 이중 버퍼 및 어라이너가 구비된 로드락 챔버
US8083853B2 (en) 2004-05-12 2011-12-27 Applied Materials, Inc. Plasma uniformity control by gas diffuser hole design
US8074599B2 (en) 2004-05-12 2011-12-13 Applied Materials, Inc. Plasma uniformity control by gas diffuser curvature
US8328939B2 (en) 2004-05-12 2012-12-11 Applied Materials, Inc. Diffuser plate with slit valve compensation
US20060005771A1 (en) * 2004-07-12 2006-01-12 Applied Materials, Inc. Apparatus and method of shaping profiles of large-area PECVD electrodes
US8365682B2 (en) * 2004-06-01 2013-02-05 Applied Materials, Inc. Methods and apparatus for supporting substrates
US20060054090A1 (en) * 2004-09-15 2006-03-16 Applied Materials, Inc. PECVD susceptor support construction
US7429410B2 (en) 2004-09-20 2008-09-30 Applied Materials, Inc. Diffuser gravity support
WO2006056091A1 (en) * 2004-11-24 2006-06-01 Oc Oerlikon Balzers Ag Vacuum processing chamber for very large area substrates
US7572340B2 (en) * 2004-11-29 2009-08-11 Applied Materials, Inc. High resolution substrate holder leveling device and method
JP2006191039A (ja) * 2005-01-05 2006-07-20 Samsung Sdi Co Ltd トレイ移送装置
KR101239694B1 (ko) * 2006-03-02 2013-03-06 주성엔지니어링(주) 가장자리의 처짐 현상을 개선한 기판안치대
JP4195045B2 (ja) * 2006-05-31 2008-12-10 三笠産業株式会社 ランマーの保護カバー構造
US20080292433A1 (en) * 2007-05-11 2008-11-27 Bachrach Robert Z Batch equipment robots and methods of array to array work-piece transfer for photovoltaic factory
US20080279672A1 (en) * 2007-05-11 2008-11-13 Bachrach Robert Z Batch equipment robots and methods of stack to array work-piece transfer for photovoltaic factory
US7496423B2 (en) * 2007-05-11 2009-02-24 Applied Materials, Inc. Method of achieving high productivity fault tolerant photovoltaic factory with batch array transfer robots
US20080279658A1 (en) * 2007-05-11 2008-11-13 Bachrach Robert Z Batch equipment robots and methods within equipment work-piece transfer for photovoltaic factory
US20080317973A1 (en) * 2007-06-22 2008-12-25 White John M Diffuser support
US20090109250A1 (en) * 2007-10-26 2009-04-30 Johnston Benjamin M Method and apparatus for supporting a substrate
US8097082B2 (en) * 2008-04-28 2012-01-17 Applied Materials, Inc. Nonplanar faceplate for a plasma processing chamber
JP5306908B2 (ja) * 2009-06-03 2013-10-02 東京エレクトロン株式会社 搬送モジュール
US10770338B2 (en) 2018-12-19 2020-09-08 Globalfoundries Inc. System comprising a single wafer, reduced volume process chamber

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Publication number Priority date Publication date Assignee Title
US3830194A (en) * 1972-09-28 1974-08-20 Applied Materials Tech Susceptor support structure and docking assembly
US3836751A (en) * 1973-07-26 1974-09-17 Applied Materials Inc Temperature controlled profiling heater
US4455467A (en) * 1981-09-21 1984-06-19 General Electric Company Metal rack for microwave oven
JPS58158914A (ja) * 1982-03-16 1983-09-21 Semiconductor Res Found 半導体製造装置
GB2136937A (en) * 1983-03-18 1984-09-26 Philips Electronic Associated A furnace for rapidly heating semiconductor bodies
US4522149A (en) * 1983-11-21 1985-06-11 General Instrument Corp. Reactor and susceptor for chemical vapor deposition process
US4809421A (en) * 1984-01-16 1989-03-07 Precision Brand Products, Inc. Slotted shim
NL8602356A (nl) * 1985-10-07 1987-05-04 Epsilon Ltd Partnership Inrichting en werkwijze voor een axiaal symmetrische reactor voor het chemische uit damp neerslaan.
US5000113A (en) * 1986-12-19 1991-03-19 Applied Materials, Inc. Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
US4927991A (en) * 1987-11-10 1990-05-22 The Pillsbury Company Susceptor in combination with grid for microwave oven package
US5044943A (en) * 1990-08-16 1991-09-03 Applied Materials, Inc. Spoked susceptor support for enhanced thermal uniformity of susceptor in semiconductor wafer processing apparatus
US5173580A (en) * 1990-11-15 1992-12-22 The Pillsbury Company Susceptor with conductive border for heating foods in a microwave oven
US5820686A (en) * 1993-01-21 1998-10-13 Moore Epitaxial, Inc. Multi-layer susceptor for rapid thermal process reactors
US5444217A (en) * 1993-01-21 1995-08-22 Moore Epitaxial Inc. Rapid thermal processing apparatus for processing semiconductor wafers
US5352294A (en) * 1993-01-28 1994-10-04 White John M Alignment of a shadow frame and large flat substrates on a support
US5421893A (en) * 1993-02-26 1995-06-06 Applied Materials, Inc. Susceptor drive and wafer displacement mechanism
US5332443A (en) * 1993-06-09 1994-07-26 Applied Materials, Inc. Lift fingers for substrate processing apparatus
WO1997009737A1 (en) * 1995-09-01 1997-03-13 Advanced Semiconductor Materials America, Inc. Wafer support system
US5951770A (en) * 1997-06-04 1999-09-14 Applied Materials, Inc. Carousel wafer transfer system

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