JP2000171699A - 投影対物レンズ - Google Patents

投影対物レンズ

Info

Publication number
JP2000171699A
JP2000171699A JP11316319A JP31631999A JP2000171699A JP 2000171699 A JP2000171699 A JP 2000171699A JP 11316319 A JP11316319 A JP 11316319A JP 31631999 A JP31631999 A JP 31631999A JP 2000171699 A JP2000171699 A JP 2000171699A
Authority
JP
Japan
Prior art keywords
lens
projection objective
lenses
lens group
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11316319A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000171699A5 (enExample
Inventor
Karl-Heinz Schuster
カール−ハインツ・シュースター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of JP2000171699A publication Critical patent/JP2000171699A/ja
Publication of JP2000171699A5 publication Critical patent/JP2000171699A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Viewfinders (AREA)
JP11316319A 1998-11-30 1999-11-08 投影対物レンズ Pending JP2000171699A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19855157A DE19855157A1 (de) 1998-11-30 1998-11-30 Projektionsobjektiv
DE19855157.6 1998-11-30

Publications (2)

Publication Number Publication Date
JP2000171699A true JP2000171699A (ja) 2000-06-23
JP2000171699A5 JP2000171699A5 (enExample) 2006-12-21

Family

ID=7889476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11316319A Pending JP2000171699A (ja) 1998-11-30 1999-11-08 投影対物レンズ

Country Status (6)

Country Link
US (1) US6522484B1 (enExample)
EP (1) EP1006387A3 (enExample)
JP (1) JP2000171699A (enExample)
KR (1) KR100652498B1 (enExample)
DE (1) DE19855157A1 (enExample)
TW (1) TW442669B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004084281A1 (ja) * 2003-03-17 2004-09-30 Nikon Corporation 投影光学系、露光装置、および露光方法
US6806942B2 (en) 2002-05-14 2004-10-19 Carl Zeiss Smt Ag Projection exposure system
JP2020535482A (ja) * 2017-09-29 2020-12-03 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 投影対物レンズ

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
EP1139138A4 (en) 1999-09-29 2006-03-08 Nikon Corp PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
EP1344112A2 (de) * 2000-12-22 2003-09-17 Carl Zeiss SMT AG Projektionsobjektiv
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323653A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
DE10138847A1 (de) * 2001-08-15 2003-02-27 Zeiss Carl Blende für eine Integratoreinheit
DE10151309A1 (de) * 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
JP2005519332A (ja) * 2002-03-01 2005-06-30 カール・ツアイス・エスエムテイ・アーゲー 屈折型投影対物レンズ
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10240002A1 (de) 2002-08-27 2004-03-11 Carl Zeiss Semiconductor Manufacturing Technologies Ag Optisches Teilsystem insbesondere für eine Projektionsbelichtungsanlage mit mindestens einem in mindestens zwei Stellungen verbringbaren optischen Element
EP1573402B1 (en) 2002-12-19 2008-03-12 Carl Zeiss SMT AG Illumination system having a more efficient collector optic
US7932020B2 (en) * 2003-07-10 2011-04-26 Takumi Technology Corporation Contact or proximity printing using a magnified mask image
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6961186B2 (en) * 2003-09-26 2005-11-01 Takumi Technology Corp. Contact printing using a magnified mask image
US7055127B2 (en) * 2003-10-27 2006-05-30 Takumi Technology Corp. Mask data preparation
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP2628864B1 (de) 2012-02-14 2017-02-01 Heinrich Schulte GmbH + Co. KG Spül- und Abdrückvorrichtung für eine Anschlussarmatur

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07140384A (ja) * 1993-11-15 1995-06-02 Nikon Corp 投影光学系及び投影露光装置
JPH1048517A (ja) * 1996-08-07 1998-02-20 Nikon Corp 投影光学系
JPH1054936A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5469299A (en) * 1990-05-15 1995-11-21 Olympus Optical Co., Ltd. Objective lens system
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JPH06313845A (ja) * 1993-04-28 1994-11-08 Olympus Optical Co Ltd 投影レンズ系
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3624973B2 (ja) 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
DE19548805A1 (de) * 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
JP3750123B2 (ja) * 1996-04-25 2006-03-01 株式会社ニコン 投影光学系
US5852490A (en) * 1996-09-30 1998-12-22 Nikon Corporation Projection exposure method and apparatus
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
DE19653983A1 (de) * 1996-12-21 1998-06-25 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
DE19818444A1 (de) * 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07140384A (ja) * 1993-11-15 1995-06-02 Nikon Corp 投影光学系及び投影露光装置
JPH1048517A (ja) * 1996-08-07 1998-02-20 Nikon Corp 投影光学系
JPH1054936A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6806942B2 (en) 2002-05-14 2004-10-19 Carl Zeiss Smt Ag Projection exposure system
WO2004084281A1 (ja) * 2003-03-17 2004-09-30 Nikon Corporation 投影光学系、露光装置、および露光方法
US7457042B2 (en) 2003-03-17 2008-11-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2020535482A (ja) * 2017-09-29 2020-12-03 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 投影対物レンズ

Also Published As

Publication number Publication date
EP1006387A2 (de) 2000-06-07
KR20000034929A (ko) 2000-06-26
TW442669B (en) 2001-06-23
EP1006387A3 (de) 2002-05-02
KR100652498B1 (ko) 2006-11-30
US6522484B1 (en) 2003-02-18
DE19855157A1 (de) 2000-05-31

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