TW442669B - Projection objective - Google Patents
Projection objective Download PDFInfo
- Publication number
- TW442669B TW442669B TW088119511A TW88119511A TW442669B TW 442669 B TW442669 B TW 442669B TW 088119511 A TW088119511 A TW 088119511A TW 88119511 A TW88119511 A TW 88119511A TW 442669 B TW442669 B TW 442669B
- Authority
- TW
- Taiwan
- Prior art keywords
- lens
- lenses
- patent application
- projection objective
- lens group
- Prior art date
Links
- 210000001624 hip Anatomy 0.000 claims abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 128
- 210000001015 abdomen Anatomy 0.000 claims description 29
- 230000002079 cooperative effect Effects 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 8
- 238000011161 development Methods 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 1
- 241001494479 Pecora Species 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
- 239000011575 calcium Substances 0.000 claims 1
- 239000010985 leather Substances 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 238000012937 correction Methods 0.000 abstract description 18
- 238000001393 microlithography Methods 0.000 abstract 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 58
- 229910001634 calcium fluoride Inorganic materials 0.000 description 57
- 230000004075 alteration Effects 0.000 description 24
- 239000013078 crystal Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 238000000280 densification Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 235000015170 shellfish Nutrition 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 102000040350 B family Human genes 0.000 description 1
- 108091072128 B family Proteins 0.000 description 1
- 101100326791 Caenorhabditis elegans cap-2 gene Proteins 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 244000144972 livestock Species 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
- G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
- Viewfinders (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19855157A DE19855157A1 (de) | 1998-11-30 | 1998-11-30 | Projektionsobjektiv |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW442669B true TW442669B (en) | 2001-06-23 |
Family
ID=7889476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW088119511A TW442669B (en) | 1998-11-30 | 1999-11-08 | Projection objective |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6522484B1 (enExample) |
| EP (1) | EP1006387A3 (enExample) |
| JP (1) | JP2000171699A (enExample) |
| KR (1) | KR100652498B1 (enExample) |
| DE (1) | DE19855157A1 (enExample) |
| TW (1) | TW442669B (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1195095A (ja) | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| DE19855157A1 (de) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Projektionsobjektiv |
| WO2001023933A1 (en) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection optical system |
| EP1139138A4 (en) | 1999-09-29 | 2006-03-08 | Nikon Corp | PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM |
| DE10064685A1 (de) * | 2000-12-22 | 2002-07-04 | Zeiss Carl | Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft |
| EP1344112A2 (de) * | 2000-12-22 | 2003-09-17 | Carl Zeiss SMT AG | Projektionsobjektiv |
| JP2002244034A (ja) | 2001-02-21 | 2002-08-28 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2002323653A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系，投影露光装置および投影露光方法 |
| JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法 |
| DE10138847A1 (de) * | 2001-08-15 | 2003-02-27 | Zeiss Carl | Blende für eine Integratoreinheit |
| DE10151309A1 (de) * | 2001-10-17 | 2003-05-08 | Carl Zeiss Semiconductor Mfg S | Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm |
| JP2005519332A (ja) * | 2002-03-01 | 2005-06-30 | カール・ツアイス・エスエムテイ・アーゲー | 屈折型投影対物レンズ |
| US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
| DE10221386A1 (de) | 2002-05-14 | 2003-11-27 | Zeiss Carl Smt Ag | Projektionsbelichtungssystem |
| DE10240002A1 (de) | 2002-08-27 | 2004-03-11 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Optisches Teilsystem insbesondere für eine Projektionsbelichtungsanlage mit mindestens einem in mindestens zwei Stellungen verbringbaren optischen Element |
| EP1573402B1 (en) | 2002-12-19 | 2008-03-12 | Carl Zeiss SMT AG | Illumination system having a more efficient collector optic |
| TWI305872B (en) | 2003-03-17 | 2009-02-01 | Nikon Corp | Optical projection system, light-exposure apparatus and light-exposure method |
| US7932020B2 (en) * | 2003-07-10 | 2011-04-26 | Takumi Technology Corporation | Contact or proximity printing using a magnified mask image |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US6961186B2 (en) * | 2003-09-26 | 2005-11-01 | Takumi Technology Corp. | Contact printing using a magnified mask image |
| US7055127B2 (en) * | 2003-10-27 | 2006-05-30 | Takumi Technology Corp. | Mask data preparation |
| US20080151364A1 (en) * | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| EP2628864B1 (de) | 2012-02-14 | 2017-02-01 | Heinrich Schulte GmbH + Co. KG | Spül- und Abdrückvorrichtung für eine Anschlussarmatur |
| CN109581622B (zh) * | 2017-09-29 | 2020-12-04 | 上海微电子装备（集团）股份有限公司 | 一种投影物镜 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5469299A (en) * | 1990-05-15 | 1995-11-21 | Olympus Optical Co., Ltd. | Objective lens system |
| JP3041939B2 (ja) * | 1990-10-22 | 2000-05-15 | 株式会社ニコン | 投影レンズ系 |
| JPH06313845A (ja) * | 1993-04-28 | 1994-11-08 | Olympus Optical Co Ltd | 投影レンズ系 |
| JP3360387B2 (ja) * | 1993-11-15 | 2002-12-24 | 株式会社ニコン | 投影光学系及び投影露光装置 |
| JPH08179204A (ja) * | 1994-11-10 | 1996-07-12 | Nikon Corp | 投影光学系及び投影露光装置 |
| JP3454390B2 (ja) * | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| JP3624973B2 (ja) | 1995-10-12 | 2005-03-02 | 株式会社ニコン | 投影光学系 |
| DE19548805A1 (de) * | 1995-12-27 | 1997-07-03 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| JP3750123B2 (ja) * | 1996-04-25 | 2006-03-01 | 株式会社ニコン | 投影光学系 |
| JPH1048517A (ja) * | 1996-08-07 | 1998-02-20 | Nikon Corp | 投影光学系 |
| JP3864399B2 (ja) * | 1996-08-08 | 2006-12-27 | 株式会社ニコン | 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法 |
| US5852490A (en) * | 1996-09-30 | 1998-12-22 | Nikon Corporation | Projection exposure method and apparatus |
| JP3757536B2 (ja) * | 1996-10-01 | 2006-03-22 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 |
| DE19653983A1 (de) * | 1996-12-21 | 1998-06-25 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| DE19818444A1 (de) * | 1997-04-25 | 1998-10-29 | Nikon Corp | Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren |
| US6198576B1 (en) * | 1998-07-16 | 2001-03-06 | Nikon Corporation | Projection optical system and exposure apparatus |
| DE19855157A1 (de) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Projektionsobjektiv |
-
1998
- 1998-11-30 DE DE19855157A patent/DE19855157A1/de not_active Withdrawn
-
1999
- 1999-09-16 KR KR1019990039823A patent/KR100652498B1/ko not_active Expired - Fee Related
- 1999-10-28 EP EP99121433A patent/EP1006387A3/de not_active Ceased
- 1999-11-08 JP JP11316319A patent/JP2000171699A/ja active Pending
- 1999-11-08 TW TW088119511A patent/TW442669B/zh not_active IP Right Cessation
- 1999-11-19 US US09/444,063 patent/US6522484B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1006387A2 (de) | 2000-06-07 |
| KR20000034929A (ko) | 2000-06-26 |
| JP2000171699A (ja) | 2000-06-23 |
| EP1006387A3 (de) | 2002-05-02 |
| KR100652498B1 (ko) | 2006-11-30 |
| US6522484B1 (en) | 2003-02-18 |
| DE19855157A1 (de) | 2000-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |