ITTO20000606A0 - Polimero organico antiriflettente e procedimento per la sua produzione. - Google Patents

Polimero organico antiriflettente e procedimento per la sua produzione.

Info

Publication number
ITTO20000606A0
ITTO20000606A0 IT2000TO000606A ITTO20000606A ITTO20000606A0 IT TO20000606 A0 ITTO20000606 A0 IT TO20000606A0 IT 2000TO000606 A IT2000TO000606 A IT 2000TO000606A IT TO20000606 A ITTO20000606 A IT TO20000606A IT TO20000606 A0 ITTO20000606 A0 IT TO20000606A0
Authority
IT
Italy
Prior art keywords
procedure
production
organic polymer
reflective organic
reflective
Prior art date
Application number
IT2000TO000606A
Other languages
English (en)
Inventor
Sung-Eun Hong
Min-Ho Jung
Ki-Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of ITTO20000606A0 publication Critical patent/ITTO20000606A0/it
Publication of ITTO20000606A1 publication Critical patent/ITTO20000606A1/it
Application granted granted Critical
Publication of IT1320274B1 publication Critical patent/IT1320274B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
IT2000TO000606A 1999-06-22 2000-06-21 Polimero organico antiriflettente e procedimento per la sua produzione IT1320274B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019990023382A KR100310252B1 (ko) 1999-06-22 1999-06-22 유기 반사방지 중합체 및 그의 제조방법

Publications (3)

Publication Number Publication Date
ITTO20000606A0 true ITTO20000606A0 (it) 2000-06-21
ITTO20000606A1 ITTO20000606A1 (it) 2001-12-21
IT1320274B1 IT1320274B1 (it) 2003-11-26

Family

ID=19594043

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000TO000606A IT1320274B1 (it) 1999-06-22 2000-06-21 Polimero organico antiriflettente e procedimento per la sua produzione

Country Status (10)

Country Link
US (3) US6388039B1 (it)
JP (2) JP3920537B2 (it)
KR (1) KR100310252B1 (it)
CN (1) CN1224610C (it)
DE (1) DE10028345A1 (it)
FR (1) FR2795411B1 (it)
GB (1) GB2351288B (it)
IT (1) IT1320274B1 (it)
NL (1) NL1015471C2 (it)
TW (1) TW553923B (it)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100310252B1 (ko) * 1999-06-22 2001-11-14 박종섭 유기 반사방지 중합체 및 그의 제조방법
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
KR100427440B1 (ko) * 1999-12-23 2004-04-17 주식회사 하이닉스반도체 유기 반사방지 화합물 및 그의 제조방법
KR100687851B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721181B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100687850B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721182B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR20020090584A (ko) * 2001-05-28 2002-12-05 주식회사 동진쎄미켐 유기 반사 방지막용 고분자 수지, 및 이를 이용하는ＫｒＦ 포토레지스트용 유기 반사 방지막 조성물
US6670425B2 (en) 2001-06-05 2003-12-30 Brewer Science, Inc. Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings
US6893684B2 (en) * 2001-06-05 2005-05-17 Brewer Science Inc. Anti-reflective coating compositions for use with low k dielectric materials
KR100480235B1 (ko) * 2002-07-18 2005-04-06 주식회사 하이닉스반도체 유기 반사방지막 조성물 및 이를 이용한 포토레지스트의패턴 형성 방법
US7056826B2 (en) * 2003-01-07 2006-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Method of forming copper interconnects
WO2004090640A1 (ja) * 2003-04-02 2004-10-21 Nissan Chemical Industries, Ltd. エポキシ化合物及びカルボン酸化合物を含むリソグラフィー用下層膜形成組成物
US7078336B2 (en) * 2003-11-19 2006-07-18 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for fabricating a copper barrier layer with low dielectric constant and leakage current
KR101156973B1 (ko) * 2005-03-02 2012-06-20 주식회사 동진쎄미켐 유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
KR100712999B1 (ko) * 2006-03-29 2007-05-02 주식회사 하이닉스반도체 유기 반사 방지막 중합체, 이를 포함하는 유기 반사 방지막조성물 및 이를 이용한 포토레지스트의 패턴 형성 방법
US20090253080A1 (en) * 2008-04-02 2009-10-08 Dammel Ralph R Photoresist Image-Forming Process Using Double Patterning
US20090253081A1 (en) * 2008-04-02 2009-10-08 David Abdallah Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step
JP2010034494A (ja) * 2008-06-30 2010-02-12 Sumitomo Chemical Co Ltd 有機光電変換素子
US20100040838A1 (en) * 2008-08-15 2010-02-18 Abdallah David J Hardmask Process for Forming a Reverse Tone Image
US8986561B2 (en) * 2008-12-26 2015-03-24 Tokyo Electron Limited Substrate processing method and storage medium
US8084186B2 (en) * 2009-02-10 2011-12-27 Az Electronic Materials Usa Corp. Hardmask process for forming a reverse tone image using polysilazane
JP6089743B2 (ja) * 2013-02-05 2017-03-08 Jsr株式会社 硬化膜形成用感放射線性樹脂組成物、硬化膜、その形成方法、半導体素子及び表示素子
US9772552B2 (en) 2013-03-19 2017-09-26 Eastman Kodak Company Thiosulfate polymer compositions and articles
US9005878B2 (en) 2013-03-19 2015-04-14 Eastman Kodak Company Forming patterns using thiosulfate polymer compositions
US8986924B2 (en) 2013-03-19 2015-03-24 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers
US9499650B2 (en) * 2013-03-19 2016-11-22 Eastman Kodak Company Thiosulfate polymers
US8916336B2 (en) 2013-03-19 2014-12-23 Eastman Kodak Company Patterning method using thiosulfate polymer and metal nanoparticles
KR101699382B1 (ko) * 2014-10-22 2017-01-24 유한책임회사 도요엔지니어링 가공성이 향상된 낚시릴 프레임
TWI662370B (zh) * 2015-11-30 2019-06-11 南韓商羅門哈斯電子材料韓國公司 與外塗佈光致抗蝕劑一起使用之塗料組合物

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4822718A (en) 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
US5674648A (en) 1984-08-06 1997-10-07 Brewer Science, Inc. Anti-reflective coating
JP2740837B2 (ja) 1987-01-30 1998-04-15 コニカ株式会社 多色転写画像形成方法
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
JP3268949B2 (ja) * 1993-07-20 2002-03-25 和光純薬工業株式会社 遠紫外光吸収材料及びこれを用いたパターン形成方法
US5525457A (en) 1994-12-09 1996-06-11 Japan Synthetic Rubber Co., Ltd. Reflection preventing film and process for forming resist pattern using the same
DE19516470A1 (de) * 1995-05-05 1996-11-07 Roehm Gmbh Verfahren zur Herstellung von Oximmethacrylaten
FR2736061B1 (fr) * 1995-06-27 1997-08-08 Thomson Csf Materiau electroluminescent a base de polymere, procede de fabrication et diode electroluminescente utilisant ce materiau
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US5652317A (en) * 1996-08-16 1997-07-29 Hoechst Celanese Corporation Antireflective coatings for photoresist compositions
US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
US5939236A (en) * 1997-02-07 1999-08-17 Shipley Company, L.L.C. Antireflective coating compositions comprising photoacid generators
JP4053631B2 (ja) * 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
TW457403B (en) 1998-07-03 2001-10-01 Clariant Int Ltd Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법
KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
KR100310252B1 (ko) * 1999-06-22 2001-11-14 박종섭 유기 반사방지 중합체 및 그의 제조방법

Also Published As

Publication number Publication date
FR2795411B1 (fr) 2004-01-30
NL1015471C2 (nl) 2001-04-09
ITTO20000606A1 (it) 2001-12-21
US6388039B1 (en) 2002-05-14
GB2351288B (en) 2004-02-11
GB0014257D0 (en) 2000-08-02
US6538090B2 (en) 2003-03-25
DE10028345A1 (de) 2001-01-25
IT1320274B1 (it) 2003-11-26
US20020137826A1 (en) 2002-09-26
CN1278529A (zh) 2001-01-03
US20020136834A1 (en) 2002-09-26
CN1224610C (zh) 2005-10-26
US6489423B2 (en) 2002-12-03
JP4808597B2 (ja) 2011-11-02
NL1015471A1 (nl) 2000-12-28
TW553923B (en) 2003-09-21
KR20010003188A (ko) 2001-01-15
JP3920537B2 (ja) 2007-05-30
JP2001049231A (ja) 2001-02-20
FR2795411A1 (fr) 2000-12-29
KR100310252B1 (ko) 2001-11-14
JP2007113014A (ja) 2007-05-10
GB2351288A (en) 2000-12-27

Similar Documents

Publication Publication Date Title
ITTO20000606A0 (it) Polimero organico antiriflettente e procedimento per la sua produzione.
IT1308674B1 (it) Materiale organico di rivestimento anti-riflettente e procedimento per la sua preparazione.
IT1308671B1 (it) Materiale organico di rivestimento anti-riflettente e procedimento per la sua preparazione.
IT1316394B1 (it) Scidula multistrato e procedimento per la sua produzione.
ATE314401T1 (de) Polymerisationsverfahren
ATE380203T1 (de) Polymerizationsverfahren
DE60024345D1 (de) Polymerelektrolyt
ID29399A (id) Proses polimerisasi
PT1177178E (pt) Benzimidazois hetereciclicos substituidos, sua preparacao e aplicacao
NO20015658L (no) Polymermaterialer
IT1320867B1 (it) Polimero organico per rivestimento antiriflesso e sua preparazione.
PT1043307E (pt) Derivados de 3-amino-3-arilpropan-1-ol sua producao e utilizacao
NO20021969D0 (no) Gassfase-polymerisasjonsprosess
ID26478A (id) Penggambaran kelima macam langkah produksi
DE60039789D1 (de) Polymerzelle
DE60029755D1 (de) Congawandschutz.
NL1015506A1 (nl) Organische anti-reflecterende deklaagpolymeren en werkwijze ter bereiding hiervan.
IT1320210B1 (it) Polimero organico antiriflettente e sua preparazione.
DE19980077D2 (de) Polymerzusammensetzung, ihre Herstellung, ihre Weiterverarbeitung zu Behältnissen
FI19992506A (fi) Silaanisilloitusmenetelmä
PT1043306E (pt) Derivados de 3-amino-3-arilpropan-1-ol sua producao e utilizacao
PT1235809E (pt) 1,2,3,4,5,6-hexa-hidro-2,6-metano-3-benzazocinas substituidas e sua utilizacao como medicamentos
ES1044046Y (es) Valla.
NO20013530D0 (no) Organbeskyttende lösninger
ES1044838Y (es) Friegasuelos.