NL1015471A1 - Organisch anti-reflecterend polymeer en werkwijze voor de bereiding hiervan. - Google Patents

Organisch anti-reflecterend polymeer en werkwijze voor de bereiding hiervan.

Info

Publication number
NL1015471A1
NL1015471A1 NL1015471A NL1015471A NL1015471A1 NL 1015471 A1 NL1015471 A1 NL 1015471A1 NL 1015471 A NL1015471 A NL 1015471A NL 1015471 A NL1015471 A NL 1015471A NL 1015471 A1 NL1015471 A1 NL 1015471A1
Authority
NL
Netherlands
Prior art keywords
preparation
organic anti
reflective polymer
reflective
polymer
Prior art date
Application number
NL1015471A
Other languages
English (en)
Other versions
NL1015471C2 (nl
Inventor
Min-Ho Jung
Sung-Eun Hong
Ki-Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of NL1015471A1 publication Critical patent/NL1015471A1/nl
Application granted granted Critical
Publication of NL1015471C2 publication Critical patent/NL1015471C2/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerization Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
NL1015471A 1999-06-22 2000-06-19 Organisch anti-reflecterend polymeer en werkwijze voor de bereiding hiervan. NL1015471C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR19990023382 1999-06-22
KR1019990023382A KR100310252B1 (ko) 1999-06-22 1999-06-22 유기 반사방지 중합체 및 그의 제조방법

Publications (2)

Publication Number Publication Date
NL1015471A1 true NL1015471A1 (nl) 2000-12-28
NL1015471C2 NL1015471C2 (nl) 2001-04-09

Family

ID=19594043

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1015471A NL1015471C2 (nl) 1999-06-22 2000-06-19 Organisch anti-reflecterend polymeer en werkwijze voor de bereiding hiervan.

Country Status (10)

Country Link
US (3) US6388039B1 (nl)
JP (2) JP3920537B2 (nl)
KR (1) KR100310252B1 (nl)
CN (1) CN1224610C (nl)
DE (1) DE10028345A1 (nl)
FR (1) FR2795411B1 (nl)
GB (1) GB2351288B (nl)
IT (1) IT1320274B1 (nl)
NL (1) NL1015471C2 (nl)
TW (1) TW553923B (nl)

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SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
KR100427440B1 (ko) * 1999-12-23 2004-04-17 주식회사 하이닉스반도체 유기 반사방지 화합물 및 그의 제조방법
KR100687850B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721181B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721182B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100687851B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR20020090584A (ko) * 2001-05-28 2002-12-05 주식회사 동진쎄미켐 유기 반사 방지막용 고분자 수지, 및 이를 이용하는ＫｒＦ 포토레지스트용 유기 반사 방지막 조성물
US6670425B2 (en) 2001-06-05 2003-12-30 Brewer Science, Inc. Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings
US6893684B2 (en) * 2001-06-05 2005-05-17 Brewer Science Inc. Anti-reflective coating compositions for use with low k dielectric materials
KR100480235B1 (ko) * 2002-07-18 2005-04-06 주식회사 하이닉스반도체 유기 반사방지막 조성물 및 이를 이용한 포토레지스트의패턴 형성 방법
US7056826B2 (en) * 2003-01-07 2006-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Method of forming copper interconnects
EP1617289A4 (en) 2003-04-02 2009-12-16 Nissan Chemical Ind Ltd COMPOSITION FOR FORMING A LAYERING FILM FOR LITHOGRAPHY WITH EPOXY COMPOSITION AND CARBOXYLIC ACID COMPOSITION
US7078336B2 (en) * 2003-11-19 2006-07-18 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for fabricating a copper barrier layer with low dielectric constant and leakage current
KR101156973B1 (ko) * 2005-03-02 2012-06-20 주식회사 동진쎄미켐 유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
KR100712999B1 (ko) * 2006-03-29 2007-05-02 주식회사 하이닉스반도체 유기 반사 방지막 중합체, 이를 포함하는 유기 반사 방지막조성물 및 이를 이용한 포토레지스트의 패턴 형성 방법
US20090253080A1 (en) * 2008-04-02 2009-10-08 Dammel Ralph R Photoresist Image-Forming Process Using Double Patterning
US20090253081A1 (en) * 2008-04-02 2009-10-08 David Abdallah Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step
JP2010034494A (ja) * 2008-06-30 2010-02-12 Sumitomo Chemical Co Ltd 有機光電変換素子
US20100040838A1 (en) * 2008-08-15 2010-02-18 Abdallah David J Hardmask Process for Forming a Reverse Tone Image
US8986561B2 (en) * 2008-12-26 2015-03-24 Tokyo Electron Limited Substrate processing method and storage medium
US8084186B2 (en) * 2009-02-10 2011-12-27 Az Electronic Materials Usa Corp. Hardmask process for forming a reverse tone image using polysilazane
JP6089743B2 (ja) * 2013-02-05 2017-03-08 Jsr株式会社 硬化膜形成用感放射線性樹脂組成物、硬化膜、その形成方法、半導体素子及び表示素子
US9005878B2 (en) 2013-03-19 2015-04-14 Eastman Kodak Company Forming patterns using thiosulfate polymer compositions
US8916336B2 (en) 2013-03-19 2014-12-23 Eastman Kodak Company Patterning method using thiosulfate polymer and metal nanoparticles
US9499650B2 (en) 2013-03-19 2016-11-22 Eastman Kodak Company Thiosulfate polymers
US9772552B2 (en) 2013-03-19 2017-09-26 Eastman Kodak Company Thiosulfate polymer compositions and articles
US8986924B2 (en) 2013-03-19 2015-03-24 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers
KR101699382B1 (ko) * 2014-10-22 2017-01-24 유한책임회사 도요엔지니어링 가공성이 향상된 낚시릴 프레임
TWI662370B (zh) * 2015-11-30 2019-06-11 南韓商羅門哈斯電子材料韓國公司 與外塗佈光致抗蝕劑一起使用之塗料組合物

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DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4822718A (en) 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
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JP2740837B2 (ja) 1987-01-30 1998-04-15 コニカ株式会社 多色転写画像形成方法
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FR2736061B1 (fr) * 1995-06-27 1997-08-08 Thomson Csf Materiau electroluminescent a base de polymere, procede de fabrication et diode electroluminescente utilisant ce materiau
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US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
US5939236A (en) * 1997-02-07 1999-08-17 Shipley Company, L.L.C. Antireflective coating compositions comprising photoacid generators
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TW457403B (en) 1998-07-03 2001-10-01 Clariant Int Ltd Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법
KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
KR100310252B1 (ko) * 1999-06-22 2001-11-14 박종섭 유기 반사방지 중합체 및 그의 제조방법

Also Published As

Publication number Publication date
ITTO20000606A0 (it) 2000-06-21
US20020136834A1 (en) 2002-09-26
KR100310252B1 (ko) 2001-11-14
US6538090B2 (en) 2003-03-25
CN1278529A (zh) 2001-01-03
CN1224610C (zh) 2005-10-26
US6489423B2 (en) 2002-12-03
JP3920537B2 (ja) 2007-05-30
FR2795411B1 (fr) 2004-01-30
GB2351288B (en) 2004-02-11
DE10028345A1 (de) 2001-01-25
JP4808597B2 (ja) 2011-11-02
TW553923B (en) 2003-09-21
JP2007113014A (ja) 2007-05-10
JP2001049231A (ja) 2001-02-20
US20020137826A1 (en) 2002-09-26
KR20010003188A (ko) 2001-01-15
ITTO20000606A1 (it) 2001-12-21
FR2795411A1 (fr) 2000-12-29
NL1015471C2 (nl) 2001-04-09
GB0014257D0 (en) 2000-08-02
GB2351288A (en) 2000-12-27
IT1320274B1 (it) 2003-11-26
US6388039B1 (en) 2002-05-14

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RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20010206

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MM Lapsed because of non-payment of the annual fee

Effective date: 20160701