GB2398787B - Organic anti-reflective polymer and preparation thereof - Google Patents
Organic anti-reflective polymer and preparation thereofInfo
- Publication number
- GB2398787B GB2398787B GB0411333A GB0411333A GB2398787B GB 2398787 B GB2398787 B GB 2398787B GB 0411333 A GB0411333 A GB 0411333A GB 0411333 A GB0411333 A GB 0411333A GB 2398787 B GB2398787 B GB 2398787B
- Authority
- GB
- United Kingdom
- Prior art keywords
- preparation
- organic anti
- reflective polymer
- reflective
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0276—Photolithographic processes using an anti-reflective coating
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0411333A GB2398787B (en) | 2000-06-13 | 2000-06-13 | Organic anti-reflective polymer and preparation thereof |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0014258A GB2351498B (en) | 1999-06-26 | 2000-06-13 | Organic anti-reflective polymer and preparation thereof |
GB0411333A GB2398787B (en) | 2000-06-13 | 2000-06-13 | Organic anti-reflective polymer and preparation thereof |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0411333D0 GB0411333D0 (en) | 2004-06-23 |
GB2398787A GB2398787A (en) | 2004-09-01 |
GB2398787B true GB2398787B (en) | 2004-10-27 |
Family
ID=32799930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0411333A Expired - Fee Related GB2398787B (en) | 2000-06-13 | 2000-06-13 | Organic anti-reflective polymer and preparation thereof |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2398787B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115093792B (en) * | 2020-08-04 | 2023-10-13 | 吴江南玻玻璃有限公司 | Anti-reflection coating liquid and preparation method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4999584A (en) * | 1973-01-25 | 1974-09-20 | ||
JPS536394A (en) * | 1976-07-08 | 1978-01-20 | Fuji Photo Film Co Ltd | Functional high polymers |
GB2351731A (en) * | 1999-06-26 | 2001-01-10 | Hyundai Electronics Ind | N-Benzenesulphonyloxymethyl-(meth)acrylamide polymers |
-
2000
- 2000-06-13 GB GB0411333A patent/GB2398787B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4999584A (en) * | 1973-01-25 | 1974-09-20 | ||
JPS536394A (en) * | 1976-07-08 | 1978-01-20 | Fuji Photo Film Co Ltd | Functional high polymers |
GB2351731A (en) * | 1999-06-26 | 2001-01-10 | Hyundai Electronics Ind | N-Benzenesulphonyloxymethyl-(meth)acrylamide polymers |
Also Published As
Publication number | Publication date |
---|---|
GB2398787A (en) | 2004-09-01 |
GB0411333D0 (en) | 2004-06-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20130613 |