IN2014DN07816A - - Google Patents
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- Publication number
- IN2014DN07816A IN2014DN07816A IN7816DEN2014A IN2014DN07816A IN 2014DN07816 A IN2014DN07816 A IN 2014DN07816A IN 7816DEN2014 A IN7816DEN2014 A IN 7816DEN2014A IN 2014DN07816 A IN2014DN07816 A IN 2014DN07816A
- Authority
- IN
- India
- Prior art keywords
- polysiloxane
- formula
- photopolymerizable layer
- compound represented
- organosilicon compound
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/04—Intermediate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/10—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by inorganic compounds, e.g. pigments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12170799 | 2012-06-05 | ||
US201261656521P | 2012-06-07 | 2012-06-07 | |
PCT/EP2013/055773 WO2013182328A1 (en) | 2012-06-05 | 2013-03-20 | A lithographic printing plate precursor |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014DN07816A true IN2014DN07816A (xx) | 2015-05-15 |
Family
ID=49711432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN7816DEN2014 IN2014DN07816A (xx) | 2012-06-05 | 2013-03-20 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9329479B2 (xx) |
EP (1) | EP2855152B1 (xx) |
CN (1) | CN104334351B (xx) |
IN (1) | IN2014DN07816A (xx) |
WO (1) | WO2013182328A1 (xx) |
Families Citing this family (47)
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JP6017894B2 (ja) * | 2012-09-03 | 2016-11-02 | 信越化学工業株式会社 | ネガ型平版印刷版原版用感光性組成物及びそれを用いたネガ型平版印刷用原版 |
EP2916171B1 (en) | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | A method for making a lithographic printing plate precursor |
US10522771B2 (en) | 2014-12-01 | 2019-12-31 | Samsung Electronics Co., Ltd. | Composition, electronic device, and thin film transistor |
JP2016145866A (ja) * | 2015-02-06 | 2016-08-12 | 株式会社Adeka | 感光性ソルダーレジスト組成物 |
KR102407114B1 (ko) | 2015-05-29 | 2022-06-08 | 삼성전자주식회사 | 절연액, 절연체, 박막 트랜지스터 및 전자 소자 |
KR102380151B1 (ko) | 2015-08-31 | 2022-03-28 | 삼성전자주식회사 | 박막 트랜지스터, 및 이를 포함하는 전자 장치 |
KR102450399B1 (ko) * | 2015-10-06 | 2022-09-30 | 삼성전자주식회사 | 박막 트랜지스터, 그 제조 방법, 그리고 상기 박막 트랜지스터를 포함하는 전자 장치 |
US10727426B2 (en) | 2015-12-21 | 2020-07-28 | Samsung Electronics Co., Ltd. | Thin film transistor, method of manufacturing the same, and electronic device including the same |
WO2017189077A1 (en) * | 2016-04-27 | 2017-11-02 | Dow Corning Corporation | Hydrophilic silanes |
US20190031691A1 (en) * | 2016-04-27 | 2019-01-31 | Dow Silicones Corporation | Hydrophilic silanes |
JP2018005046A (ja) * | 2016-07-05 | 2018-01-11 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 反転パターン形成組成物、反転パターンの形成方法、および素子の形成方法 |
CN106279242A (zh) * | 2016-07-16 | 2017-01-04 | 北京化工大学 | 一种含硅氧烷结构的三官能度丙烯酸酯单体及其制备方法 |
CN106279241A (zh) * | 2016-07-16 | 2017-01-04 | 北京化工大学 | 一种含硅氧烷结构的单官能度丙烯酸酯单体及其制备方法 |
EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
EP3431290B1 (en) * | 2017-07-20 | 2021-09-08 | Agfa Nv | A lithographic printing plate precursor |
EP3441223B1 (en) | 2017-08-07 | 2024-02-21 | Eco3 Bv | A lithographic printing plate precursor |
EP3474073B1 (en) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | A method for making a printing plate |
ES2881270T3 (es) | 2017-12-08 | 2021-11-29 | Agfa Nv | Procedimiento de fabricación de una plancha de impresión litográfica |
CN111867839A (zh) | 2018-03-22 | 2020-10-30 | 爱克发有限公司 | 平版印刷版前体 |
JP7104487B2 (ja) * | 2018-03-30 | 2022-07-21 | 株式会社松風 | 柔軟性を有するラジカル重合性シランカップリング化合物およびそれらを含有する医科歯科用硬化性組成物 |
JP7104486B2 (ja) * | 2018-03-30 | 2022-07-21 | 株式会社松風 | 高靭性シランカップリング化合物およびそれらを含有する医科歯科用硬化性組成物 |
JP7104488B2 (ja) * | 2018-03-30 | 2022-07-21 | 株式会社松風 | ウレタン結合を有するラジカル重合性シランカップリング化合物およびそれらを含有する医科歯科用硬化性組成物 |
WO2019219560A1 (en) | 2018-05-14 | 2019-11-21 | Agfa Nv | A lithographic printing plate precursor |
EP3587113B1 (en) | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
EP3587112B1 (en) | 2018-06-21 | 2024-04-03 | Eco3 Bv | A lithographic printing plate precursor |
EP3650938A1 (en) | 2018-11-09 | 2020-05-13 | Agfa Nv | A lithographic printing plate precursor |
CN113168096B (zh) | 2018-12-10 | 2024-05-24 | 易客发有限公司 | Uv或紫色敏化的平版印刷版的在机加工 |
EP3686011A1 (en) | 2019-01-23 | 2020-07-29 | Agfa Nv | A lithographic printing plate precursor |
KR20220054647A (ko) | 2019-09-18 | 2022-05-03 | 노벨리스 인크. | 결합 성능 향상을 위한 금속 표면 코팅 및 그 제조 방법 |
US20220340776A1 (en) * | 2019-10-09 | 2022-10-27 | Basf Coatings Gmbh | A Silane-Functional Hardener for Carboxyl-Functional Resins, A Binder and a 2K Coating Composition Thereof |
EP3815900A1 (en) | 2019-10-31 | 2021-05-05 | Agfa Nv | A lithographic printing plate precursor and method for making hydrophobic resin particles |
CN110862409B (zh) * | 2019-12-04 | 2021-08-20 | 江南大学 | 一种制备含二元醇结构的硅烷类化合物及其改性水性聚氨酯的方法 |
EP3875271A1 (en) | 2020-03-04 | 2021-09-08 | Agfa Nv | A lithographic printing plate precursor |
EP3892469B1 (en) | 2020-04-10 | 2023-11-08 | Eco3 Bv | Lithographic printing plate precursor |
EP3922462B1 (en) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithographic photopolymer printing plate precursor with improved daylight stability |
CN115666949A (zh) | 2020-06-24 | 2023-01-31 | 爱克发胶印有限公司 | 平版印刷版前体 |
US20230266667A1 (en) | 2020-06-24 | 2023-08-24 | Agfa Offset Bv | A Lithographic Printing Plate Precursor |
EP3928983B1 (en) | 2020-06-24 | 2023-09-27 | Eco3 Bv | A lithographic printing plate precursor |
EP3960455A1 (en) | 2020-08-31 | 2022-03-02 | Agfa Offset Bv | A lithographic printing plate precursor |
EP4225582B1 (en) | 2020-10-09 | 2024-08-28 | Eco3 Bv | A lithographic printing plate precursor |
US20240100820A1 (en) | 2020-12-16 | 2024-03-28 | Agfa Offset Bv | Lithographic Printing Press Make-Ready Method |
EP4035897A1 (en) | 2021-01-28 | 2022-08-03 | Agfa Offset Bv | A lithographic printing plate precursor |
EP4129682A1 (en) | 2021-08-05 | 2023-02-08 | Agfa Offset Bv | A lithographic printing plate precursor |
KR20240113843A (ko) * | 2021-12-09 | 2024-07-23 | 롬 앤드 하스 캄파니 | 인 함유 실리콘 코어 아크릴계 쉘 충격 개질제 |
EP4223534A1 (en) | 2022-02-07 | 2023-08-09 | Agfa Offset Bv | A lithographic printing plate precursor |
EP4239411A1 (en) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Method and apparatus for processing a lithographic printing plate precursor |
EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
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PL1788444T3 (pl) * | 2005-11-18 | 2011-06-30 | Agfa Nv | Sposób wytwarzania kliszy do druku litograficznego |
EP2772805A1 (en) | 2005-11-18 | 2014-09-03 | Agfa Graphics Nv | Method of making a lithographic printing plate |
DE602005013536D1 (de) | 2005-11-18 | 2009-05-07 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
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-
2013
- 2013-03-20 EP EP13710855.1A patent/EP2855152B1/en not_active Not-in-force
- 2013-03-20 CN CN201380029729.5A patent/CN104334351B/zh not_active Expired - Fee Related
- 2013-03-20 US US14/390,427 patent/US9329479B2/en not_active Expired - Fee Related
- 2013-03-20 WO PCT/EP2013/055773 patent/WO2013182328A1/en active Application Filing
- 2013-03-20 IN IN7816DEN2014 patent/IN2014DN07816A/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP2855152B1 (en) | 2016-03-16 |
EP2855152A1 (en) | 2015-04-08 |
CN104334351A (zh) | 2015-02-04 |
WO2013182328A1 (en) | 2013-12-12 |
CN104334351B (zh) | 2016-08-17 |
US20150168837A1 (en) | 2015-06-18 |
US9329479B2 (en) | 2016-05-03 |
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