IL81229A - Negative photoresist compositions and their use for preparing thermally stable,negative images - Google Patents

Negative photoresist compositions and their use for preparing thermally stable,negative images

Info

Publication number
IL81229A
IL81229A IL81229A IL8122987A IL81229A IL 81229 A IL81229 A IL 81229A IL 81229 A IL81229 A IL 81229A IL 8122987 A IL8122987 A IL 8122987A IL 81229 A IL81229 A IL 81229A
Authority
IL
Israel
Prior art keywords
negative
thermally stable
images
photoresist compositions
compositions
Prior art date
Application number
IL81229A
Other languages
English (en)
Other versions
IL81229A0 (en
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of IL81229A0 publication Critical patent/IL81229A0/xx
Publication of IL81229A publication Critical patent/IL81229A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Secondary Cells (AREA)
  • Polymerisation Methods In General (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
IL81229A 1986-01-13 1987-01-12 Negative photoresist compositions and their use for preparing thermally stable,negative images IL81229A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81843086A 1986-01-13 1986-01-13

Publications (2)

Publication Number Publication Date
IL81229A0 IL81229A0 (en) 1987-08-31
IL81229A true IL81229A (en) 1991-03-10

Family

ID=25225519

Family Applications (1)

Application Number Title Priority Date Filing Date
IL81229A IL81229A (en) 1986-01-13 1987-01-12 Negative photoresist compositions and their use for preparing thermally stable,negative images

Country Status (19)

Country Link
EP (1) EP0232972B1 (fr)
JP (2) JPH083635B2 (fr)
KR (1) KR950000484B1 (fr)
CN (1) CN1036489C (fr)
AT (1) ATE94295T1 (fr)
AU (1) AU593880B2 (fr)
BR (1) BR8700092A (fr)
CA (1) CA1307695C (fr)
DE (1) DE3787296T2 (fr)
DK (1) DK14087A (fr)
FI (1) FI870104A (fr)
HK (1) HK143493A (fr)
IL (1) IL81229A (fr)
IN (1) IN167612B (fr)
MX (1) MX167803B (fr)
MY (1) MY103315A (fr)
NO (1) NO870119L (fr)
PH (1) PH27327A (fr)
ZA (1) ZA87199B (fr)

Families Citing this family (108)

* Cited by examiner, † Cited by third party
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DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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DE4006190A1 (de) * 1990-02-28 1991-08-29 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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DE69130003T2 (de) * 1990-05-25 1999-02-11 Mitsubishi Chemical Corp., Tokio/Tokyo Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters
JPH04110945A (ja) * 1990-08-31 1992-04-13 Mitsubishi Kasei Corp ネガ型感光性組成物
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DE4025959A1 (de) * 1990-08-16 1992-02-20 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern
JPH04107560A (ja) * 1990-08-29 1992-04-09 Mitsubishi Kasei Corp ネガ型感光性組成物
JP2538118B2 (ja) * 1990-09-28 1996-09-25 東京応化工業株式会社 ネガ型放射線感応性レジスト組成物
JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
US5312715A (en) * 1991-03-04 1994-05-17 Shipley Company Inc. Light-sensitive composition and process
US5206116A (en) * 1991-03-04 1993-04-27 Shipley Company Inc. Light-sensitive composition for use as a soldermask and process
DE4112974A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112972A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112965A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112968A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare verbindungen, diese enthaltendes positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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DE4120174A1 (de) * 1991-06-19 1992-12-24 Hoechst Ag Strahlungsempfindliche sulfonsaeureester und deren verwendung
DE4125042A1 (de) * 1991-07-29 1993-02-04 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5292614A (en) * 1991-08-02 1994-03-08 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern
US5286600A (en) * 1991-08-27 1994-02-15 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern by means thereof
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US9063420B2 (en) 2013-07-16 2015-06-23 Rohm And Haas Electronic Materials Llc Photoresist composition, coated substrate, and method of forming electronic device
US9182669B2 (en) 2013-12-19 2015-11-10 Rohm And Haas Electronic Materials Llc Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device
JP6764636B2 (ja) 2014-10-08 2020-10-07 東京応化工業株式会社 感放射線性樹脂組成物、パターン製造方法、透明絶縁膜、及び表示装置

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JPS5423574B2 (fr) * 1972-09-13 1979-08-15
JPS49110703A (fr) * 1973-02-22 1974-10-22
US3988152A (en) * 1973-06-11 1976-10-26 American Can Company Epoxy resin photoresist with iodoform and bismuth triphenyl
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS59116744A (ja) * 1982-12-24 1984-07-05 Japan Synthetic Rubber Co Ltd 感電離放射線樹脂組成物
AU566309B2 (en) * 1983-06-27 1987-10-15 Stauffer Chemical Company Photopolymerizable composition
DK241885A (da) * 1984-06-01 1985-12-02 Rohm & Haas Fotosensible belaegningssammensaetninger, termisk stabile belaegninger fremstillet deraf og anvendelse af saadanne belaegninger til dannelse af termisk stabile polymerbilleder
CA1308596C (fr) * 1986-01-13 1992-10-13 Rohm And Haas Company Structure microplastique et methode de fabrication correspondante

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FI870104A (fi) 1987-07-14
FI870104A0 (fi) 1987-01-12
HK143493A (en) 1994-01-07
JP2000131842A (ja) 2000-05-12
IN167612B (fr) 1990-11-24
CN1036489C (zh) 1997-11-19
EP0232972A2 (fr) 1987-08-19
MY103315A (en) 1993-05-29
AU593880B2 (en) 1990-02-22
KR870007449A (ko) 1987-08-19
ZA87199B (en) 1988-09-28
DK14087A (da) 1987-07-14
EP0232972A3 (en) 1988-12-21
DE3787296T2 (de) 1994-03-31
EP0232972B1 (fr) 1993-09-08
JP3320676B2 (ja) 2002-09-03
DK14087D0 (da) 1987-01-12
PH27327A (en) 1993-06-08
NO870119D0 (no) 1987-01-13
KR950000484B1 (ko) 1995-01-20
MX167803B (es) 1993-04-12
DE3787296D1 (de) 1993-10-14
IL81229A0 (en) 1987-08-31
CN87100185A (zh) 1987-09-23
AU6752887A (en) 1987-07-16
BR8700092A (pt) 1987-12-01
NO870119L (no) 1987-07-14
ATE94295T1 (de) 1993-09-15
CA1307695C (fr) 1992-09-22
JPS62164045A (ja) 1987-07-20
JPH083635B2 (ja) 1996-01-17

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