IL184622A - Process for producing a quartz glass component for use in semiconductor manufacture and component produced by this process - Google Patents
Process for producing a quartz glass component for use in semiconductor manufacture and component produced by this processInfo
- Publication number
- IL184622A IL184622A IL184622A IL18462207A IL184622A IL 184622 A IL184622 A IL 184622A IL 184622 A IL184622 A IL 184622A IL 18462207 A IL18462207 A IL 18462207A IL 184622 A IL184622 A IL 184622A
- Authority
- IL
- Israel
- Prior art keywords
- etching
- surface roughness
- quartz glass
- component
- average surface
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 42
- 238000000034 method Methods 0.000 title claims description 39
- 230000008569 process Effects 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000004065 semiconductor Substances 0.000 title claims description 13
- 238000005530 etching Methods 0.000 claims description 101
- 230000003746 surface roughness Effects 0.000 claims description 50
- 238000011282 treatment Methods 0.000 claims description 23
- 230000004580 weight loss Effects 0.000 claims description 19
- 238000003754 machining Methods 0.000 claims description 17
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 14
- 230000004044 response Effects 0.000 claims description 2
- 239000002245 particle Substances 0.000 description 23
- 239000000463 material Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000000227 grinding Methods 0.000 description 7
- 235000019592 roughness Nutrition 0.000 description 7
- 229960002050 hydrofluoric acid Drugs 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 2
- 238000010002 mechanical finishing Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005005196A DE102005005196B4 (de) | 2005-02-03 | 2005-02-03 | Verfahren zur Herstellung eines Bauteils aus Quarzglas für den Einsatz in der Halbleiterfertigung und nach dem Verfahren erhaltenes Bauteil |
| PCT/EP2006/000381 WO2006081940A1 (de) | 2005-02-03 | 2006-01-18 | Verfahren zur herstellung eines bauteils aus quarzglas für den einsatz in der halbleiterfertigung und nach dem verfahren erhaltenes bauteil |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL184622A0 IL184622A0 (en) | 2007-12-03 |
| IL184622A true IL184622A (en) | 2012-01-31 |
Family
ID=36480954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL184622A IL184622A (en) | 2005-02-03 | 2007-07-15 | Process for producing a quartz glass component for use in semiconductor manufacture and component produced by this process |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20080193715A1 (https=) |
| EP (1) | EP1843984B1 (https=) |
| JP (1) | JP5274022B2 (https=) |
| KR (1) | KR101345563B1 (https=) |
| CN (1) | CN101115691B (https=) |
| DE (1) | DE102005005196B4 (https=) |
| IL (1) | IL184622A (https=) |
| WO (1) | WO2006081940A1 (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005017739B4 (de) | 2005-04-15 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Halter aus Quarzglas für die Prozessierung von Halbleiterwafern und Verfahren zur Herstellung des Halters |
| CN103247551A (zh) * | 2012-02-01 | 2013-08-14 | 上海科秉电子科技有限公司 | 一种用于半导体制程中钟罩零件的粗糙度再生方法 |
| KR20170036985A (ko) | 2015-09-25 | 2017-04-04 | 한국세라믹기술원 | 석영 유리의 표면 엠보싱화 방법 |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| KR20180095618A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 다중-챔버 가열로에서 실리카 유리체의 제조 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| JP6981710B2 (ja) | 2015-12-18 | 2021-12-17 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 二酸化ケイ素造粒体からの石英ガラス体の調製 |
| EP3390304B1 (de) | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| KR102275790B1 (ko) * | 2019-11-15 | 2021-07-09 | 세메스 주식회사 | 석영 부재의 표면 처리 방법 및 석영 부재 |
| CN114102440A (zh) * | 2020-08-28 | 2022-03-01 | 长鑫存储技术有限公司 | 用于石英部件的表面处理方法 |
| KR20240036521A (ko) * | 2021-06-25 | 2024-03-20 | 신에쯔 세끼에이 가부시키가이샤 | 석영 유리 지그의 제조 방법 및 석영 유리 지그 |
| KR20230036331A (ko) | 2021-09-07 | 2023-03-14 | 임재영 | 나노 보호코팅층을 가지는 반도체 공정용 글래스 |
| CN115008027B (zh) * | 2022-06-16 | 2023-04-28 | 江苏富乐华半导体科技股份有限公司 | 一种覆铜陶瓷基板产品的追溯方式 |
| KR102825674B1 (ko) * | 2024-05-31 | 2025-06-26 | 신에쯔 세끼에이 가부시키가이샤 | 성막 처리 가스 노출용 석영 유리 부재 및 이의 제조 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19713014C2 (de) * | 1997-03-27 | 1999-01-21 | Heraeus Quarzglas | Bauteil aus Quarzglas für die Verwendung bei der Halbleiterherstellung |
| US6368410B1 (en) | 1999-06-28 | 2002-04-09 | General Electric Company | Semiconductor processing article |
| JP4294176B2 (ja) * | 1999-09-13 | 2009-07-08 | 株式会社山形信越石英 | 表面が砂目加工された石英物品の洗浄方法 |
| DE10018857C1 (de) * | 2000-04-14 | 2001-11-29 | Heraeus Quarzglas | Vorrichtung zur Herstellung eines Quarzglaskörpers |
| JP2002047034A (ja) * | 2000-07-31 | 2002-02-12 | Shinetsu Quartz Prod Co Ltd | プラズマを利用したプロセス装置用の石英ガラス治具 |
| KR100547743B1 (ko) * | 2000-09-28 | 2006-01-31 | 신에쯔 세끼에이 가부시키가이샤 | 반도체공업용 실리카유리지그 및 그 제조방법 |
| US7250114B2 (en) * | 2003-05-30 | 2007-07-31 | Lam Research Corporation | Methods of finishing quartz glass surfaces and components made by the methods |
| US7045072B2 (en) * | 2003-07-24 | 2006-05-16 | Tan Samantha S H | Cleaning process and apparatus for silicate materials |
-
2005
- 2005-02-03 DE DE102005005196A patent/DE102005005196B4/de not_active Expired - Fee Related
-
2006
- 2006-01-18 WO PCT/EP2006/000381 patent/WO2006081940A1/de not_active Ceased
- 2006-01-18 EP EP06706270.3A patent/EP1843984B1/de not_active Expired - Lifetime
- 2006-01-18 JP JP2007553493A patent/JP5274022B2/ja not_active Expired - Fee Related
- 2006-01-18 CN CN2006800039912A patent/CN101115691B/zh not_active Expired - Fee Related
- 2006-01-18 KR KR1020077017871A patent/KR101345563B1/ko not_active Expired - Fee Related
- 2006-01-18 US US11/883,617 patent/US20080193715A1/en not_active Abandoned
-
2007
- 2007-07-15 IL IL184622A patent/IL184622A/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006081940A1 (de) | 2006-08-10 |
| EP1843984B1 (de) | 2017-06-14 |
| KR101345563B1 (ko) | 2014-01-02 |
| JP5274022B2 (ja) | 2013-08-28 |
| DE102005005196B4 (de) | 2009-04-23 |
| CN101115691A (zh) | 2008-01-30 |
| CN101115691B (zh) | 2012-06-13 |
| EP1843984A1 (de) | 2007-10-17 |
| IL184622A0 (en) | 2007-12-03 |
| KR20070102700A (ko) | 2007-10-19 |
| JP2008528432A (ja) | 2008-07-31 |
| US20080193715A1 (en) | 2008-08-14 |
| DE102005005196A1 (de) | 2006-08-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FF | Patent granted | ||
| KB | Patent renewed | ||
| KB | Patent renewed | ||
| MM9K | Patent not in force due to non-payment of renewal fees |