ID17686A - Fotoinisiator alpha-aminoasetofenon baru - Google Patents

Fotoinisiator alpha-aminoasetofenon baru

Info

Publication number
ID17686A
ID17686A IDP973786A ID973786A ID17686A ID 17686 A ID17686 A ID 17686A ID P973786 A IDP973786 A ID P973786A ID 973786 A ID973786 A ID 973786A ID 17686 A ID17686 A ID 17686A
Authority
ID
Indonesia
Prior art keywords
photoinisiator
aminoasetofenon
new alpha
alpha
new
Prior art date
Application number
IDP973786A
Other languages
English (en)
Indonesian (id)
Inventor
Masaki Ohwa
Hitoshi Yamoto
Jean-Luc Birbaum
Hiroko Nakashima
Akira Matsumoto
Hidetaka Oka
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of ID17686A publication Critical patent/ID17686A/id

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/24—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/25—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D211/08—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms
    • C07D211/18—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D211/20—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms with hydrocarbon radicals, substituted by singly bound oxygen or sulphur atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Paper (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Hydrogenated Pyridines (AREA)
  • Pyrrole Compounds (AREA)
IDP973786A 1996-12-06 1997-11-27 Fotoinisiator alpha-aminoasetofenon baru ID17686A (id)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96810854 1996-12-06

Publications (1)

Publication Number Publication Date
ID17686A true ID17686A (id) 1998-01-22

Family

ID=8225767

Family Applications (1)

Application Number Title Priority Date Filing Date
IDP973786A ID17686A (id) 1996-12-06 1997-11-27 Fotoinisiator alpha-aminoasetofenon baru

Country Status (19)

Country Link
US (1) US6022906A (xx)
JP (1) JPH10291969A (xx)
CN (1) CN1134457C (xx)
AT (1) AT500120B1 (xx)
AU (1) AU741581B2 (xx)
BE (1) BE1012647A5 (xx)
BR (1) BR9706068A (xx)
CA (1) CA2223376A1 (xx)
CH (1) CH692422A5 (xx)
DE (1) DE19753655B4 (xx)
FR (1) FR2758139B1 (xx)
GB (1) GB2320027B (xx)
ID (1) ID17686A (xx)
IT (1) IT1296930B1 (xx)
MY (1) MY119467A (xx)
NL (1) NL1007707C2 (xx)
SG (1) SG73482A1 (xx)
TW (1) TW452575B (xx)
ZA (1) ZA9710956B (xx)

Families Citing this family (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6458864B1 (en) 1998-05-29 2002-10-01 Ciba Specialty Chemicals Corporation Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers
CA2298468A1 (en) * 1998-06-03 1999-12-09 John Gavin Macdonald Novel photoinitiators and applications therefor
EP1144512B1 (en) 1999-01-19 2003-04-23 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
EP1177182B1 (en) * 1999-05-10 2006-11-29 Ciba SC Holding AG Novel photoinitiators and their applications
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
MXPA02012011A (es) 2000-06-19 2003-04-22 Kimberly Clark Co Fotoiniciaodres novedosos y aplicaciones para los mismos.
US7001644B2 (en) * 2000-12-13 2006-02-21 Ciba Specialty Chemicals Corp. Surface-active photoinitiators
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
US20030225179A1 (en) * 2002-04-26 2003-12-04 Chiu Chingfan Chris Novel morpholinoketone derivatives, and preparation process and uses of the same
EP1388538B1 (en) 2002-07-09 2010-09-01 Merck Patent GmbH Polymerisation Initiator
GB2403478A (en) * 2003-07-04 2005-01-05 Sun Chemical Ltd Piperazine-based sensitisers
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
EP1711862B1 (en) 2004-02-02 2014-09-10 Basf Se Functionalized photoinitiators
DE102004022232A1 (de) * 2004-05-04 2005-12-01 Infineon Technologies Ag Viskoses Klebematerial zur Befestigung elektronischer Bauelemente
GB2420117A (en) * 2004-11-10 2006-05-17 Sun Chemical Ltd Piperazino based multi-functional photoinitiators
JP2007047302A (ja) * 2005-08-08 2007-02-22 Toshiba Corp ホログラム記録媒体
JP5051417B2 (ja) * 2006-03-29 2012-10-17 Ｄｉｃ株式会社 光開始剤及び重合性組成物
US8604031B2 (en) * 2006-05-18 2013-12-10 Mannkind Corporation Intracellular kinase inhibitors
CN101616807B (zh) * 2006-11-14 2013-03-20 反相有限公司 对印刷叠加层的改进
JP5701576B2 (ja) 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
RU2570902C2 (ru) * 2010-06-28 2015-12-20 Басф Се Отбеливающая композиция, не содержащая металл
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CN117532894B (zh) * 2023-12-05 2024-06-14 东莞美泰电子有限公司 一种用于保护零件的pu皮革热压贴皮工艺

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
EP0138754B1 (de) * 1983-08-15 1988-05-25 Ciba-Geigy Ag Photohärtbare Gemische
ES2054861T3 (es) * 1987-03-26 1994-08-16 Ciba Geigy Ag Nuevas alfa-aminoacetofenonas como fotoiniciadores.
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
DE69128274T2 (de) * 1990-11-05 1998-04-23 Ciba Geigy Ag Photopolymerisierbare Zusammensetzungen
US5698285A (en) * 1995-10-19 1997-12-16 Three Bond Co., Ltd. Adhesive for optical disk

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GB2320027B (en) 2001-05-09
CA2223376A1 (en) 1998-06-06
ITMI972703A1 (it) 1999-06-05
MY119467A (en) 2005-05-31
GB2320027A (en) 1998-06-10
AU741581B2 (en) 2001-12-06
ZA9710956B (en) 1998-06-15
DE19753655B4 (de) 2008-05-15
FR2758139B1 (fr) 2001-04-20
DE19753655A1 (de) 1998-06-10
JPH10291969A (ja) 1998-11-04
IT1296930B1 (it) 1999-08-03
NL1007707A1 (nl) 1998-06-09
AT500120B1 (de) 2007-03-15
CH692422A5 (de) 2002-06-14
CN1134457C (zh) 2004-01-14
CN1184117A (zh) 1998-06-10
US6022906A (en) 2000-02-08
GB9723965D0 (en) 1998-01-07
NL1007707C2 (nl) 1998-10-27
TW452575B (en) 2001-09-01
AT500120A1 (de) 2005-10-15
AU4677397A (en) 1998-06-11
BE1012647A5 (fr) 2001-02-06
BR9706068A (pt) 2000-03-21
FR2758139A1 (fr) 1998-07-10

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